A cleaning apparatus for semiconductor glass substrates

Abstract

The application discloses a kind of cleaning equipment for semiconductor glass substrate, it is related to glass substrate cleaning technical field.In the application, two guide bearing seats are fixed in the inside of linkage part, V-shaped guide port is arranged on the guide bearing seat, hollow negative pressure box is attached to the both sides of glass substrate, elastic positioning assembly is slidably arranged on linkage part, guide wheel part is tightly attached to the inside of V-shaped guide port, vertical gathering plate is fixed between hollow negative pressure box, when cleaning cloth pressing part presses cleaning cloth to make it attached to glass substrate, cleaning cloth passing through cleaning cloth pressing part is tightly attached to the top of vertical gathering plate, negative pressure cleaning cavity is arranged between cleaning cloth pressing part, vertical gathering plate, cleaning cloth and glass substrate, negative pressure through-flow port close to the top surface of glass substrate is arranged on one side of hollow negative pressure box.Compared with traditional single cleaning mode of drum brush, the combined action of cleaning cloth and negative pressure suction of negative pressure cleaning cavity can greatly improve the cleaning effect of glass substrate.

Description

Technical Field

[0001] This invention belongs to the field of glass substrate cleaning technology, and in particular relates to a cleaning device for semiconductor glass substrates. Background Technology

[0002] Semiconductor glass substrates, as key materials in the post-Moore era, are rapidly reshaping the integrated circuit packaging technology landscape thanks to their physical properties and process advantages. Their surface roughness is as low as Ra0.1μm, supporting 2μm / line spacing wiring, interconnect density exceeding 150% of traditional organic substrates, and can support 100 redistribution layers (RDL), enabling the integration of over a trillion transistors in a single package.

[0003] The production and processing of semiconductor glass substrates involves multiple processes, and cleaning the semiconductor glass substrate is one of the more critical steps. The cleanliness of the semiconductor glass substrate surface directly affects its subsequent production quality.

[0004] Existing cleaning methods mostly employ roller brushes, which are mounted on a sleeve. Over time, these brushes accumulate stubborn impurities, and failure to clean them promptly inevitably affects the cleaning effect on the glass substrate. Furthermore, replacing the roller brush requires disassembling the entire sleeve, significantly reducing the cleaning efficiency of semiconductor glass substrates. Therefore, we provide a cleaning device for semiconductor glass substrates to solve the aforementioned problems. Summary of the Invention

[0005] The purpose of this invention is to provide a cleaning device for semiconductor glass substrates. Through the specific structural design of the negative pressure cleaning mechanism, the cleaning cloth supply assembly, the cleaning cloth tensioning mechanism, and the cleaning cloth winding drum, this invention solves the problem that existing roller brush cleaning methods are inconvenient to replace, requiring the entire shaft to be disassembled to replace the roller brush, which greatly reduces the cleaning efficiency of semiconductor glass substrates.

[0006] To solve the above-mentioned technical problems, the present invention is achieved through the following technical solution: The present invention is a cleaning device for semiconductor glass substrates, including a negative pressure cleaning mechanism; wherein, the negative pressure cleaning mechanism includes a guide bearing assembly, the guide bearing assembly includes a slidingly disposed linkage part, two guide bearing seats are symmetrically fixed inside the linkage part, and a plurality of V-shaped guide ports are arrayed on the guide bearing seats; a negative pressure cleaning assembly is sleeved on the linkage part, the negative pressure cleaning assembly includes two symmetrically disposed hollow negative pressure boxes, the hollow negative pressure boxes are fitted and disposed on opposite sides of the glass substrate; spring The elastic positioning component is slidably mounted on the linkage part. The elastic positioning component includes a guide wheel part and a cleaning cloth pressing part that move synchronously. The guide wheel part is located directly above the cleaning cloth pressing part and closely attached to the inside of the V-shaped guide opening. A vertical gathering plate is fixedly arranged between the hollow negative pressure boxes. When the cleaning cloth pressing part presses the cleaning cloth against the glass substrate, the cleaning cloth passing through the cleaning cloth pressing part is closely attached to the top of the vertical gathering plate. A negative pressure cleaning chamber is provided between the cleaning cloth pressing part, the vertical gathering plate, the cleaning cloth and the glass substrate. A negative pressure flow port is provided on one side of the hollow negative pressure box close to the top surface of the glass substrate.

[0007] In some embodiments, the linkage includes a horizontal bearing plate, a lead screw adapter is fixedly disposed on one side of the horizontal bearing plate, a guide member is fixedly disposed on the other side of the horizontal bearing plate, a first limiting groove is disposed at the bottom of the guide bearing seat, a vertical guide rod is slidably connected inside the first limiting groove, the lead screw adapter and the guide member are respectively fixedly connected to the corresponding vertical guide rod, and a second limiting groove is provided on the circumferential side of the vertical guide rod.

[0008] In some embodiments, a connector is fixedly provided on the side of the hollow negative pressure box away from the vertical gathering plate. The connector is slidably sleeved on the corresponding vertical guide rod. A sliding member fixed on the inner wall of the connector is engaged in the second limiting groove. A first elastic member is fixedly provided on the top of the connector. The lead screw adapter and the guide member are respectively connected to the corresponding first elastic member. A limiting groove is provided on the top of the hollow negative pressure box. One of the hollow negative pressure boxes is provided with an air inlet hole communicating with its inner cavity. The other hollow negative pressure box is provided with a negative pressure suction pipe.

[0009] In some embodiments, the elastic positioning assembly further includes two symmetrically arranged lifting rods, the top of which slides through a horizontal support plate, and a connecting plate is fixedly provided on the periphery of the lifting rod. The horizontal support plate and the connecting plate below it are connected by a second elastic element. The guide wheel part includes a guide wheel rod rotatably disposed between the two lifting rods, and guide wheels that are tightly attached to the inner wall of the V-shaped guide opening are installed at both ends of the guide wheel rod. The cleaning cloth pressing part includes a support rod adapted to the limiting groove, the support rod is fixedly connected to the lifting rod above it, and a cleaning cloth pressing component is fixedly sleeved on the support rod.

[0010] In some embodiments, the present invention further includes a cleaning fabric supply assembly; wherein the cleaning fabric supply assembly includes a U-shaped carrier, two horizontal support frames are symmetrically fixed on one side of the U-shaped carrier, an installation cavity is opened at the top of the horizontal support frame, a guide bearing is fixedly disposed inside the installation cavity, and a vertical guide rod is inserted and fitted in the guide channel inside the installation cavity, wherein a first motor is installed on one of the horizontal support frames, the output end of the first motor is connected to a reciprocating lead screw that is in transmission cooperation with a lead screw adapter, and a horizontal guide rod that is slidably sleeved with a guide member is installed on the other horizontal support frame.

[0011] In some embodiments, the horizontal support frame corresponding to the horizontal guide rod has an installation port, the output end of the second motor installed on one side of the U-shaped frame is connected to a first limiting plate, a first mounting shaft that passes through the installation port is snapped onto the first limiting plate, a positioning plate is rotatably provided at the end of the first mounting shaft, the positioning plate is connected to the corresponding horizontal support frame by fasteners, a second limiting plate is fixedly provided on the circumferential side of the first mounting shaft, and the cleaning cloth tube installed on the first mounting shaft is limited by the first limiting plate and the second limiting plate.

[0012] In some embodiments, the present invention further includes a cleaning cloth tensioning mechanism; the cleaning cloth tensioning mechanism includes a tensioning assembly; the tensioning assembly includes a support frame, two L-shaped plates are symmetrically fixedly arranged at the bottom of the support frame, a guide roller is installed between the L-shaped plates, two movable traction rods are slidably arranged on the support frame, a first mounting frame is installed between the movable traction rods, a second mounting frame is fixed to one side of the first mounting frame, a support plate fixed to the movable traction rod is provided on one side of the support frame, the support plate is connected to the support frame through a third elastic element, a limiting roller fixed to the movable traction rod is provided on the side of the first mounting frame away from the support frame, and a cleaning cloth pressing groove is opened on the peripheral side of the limiting roller.

[0013] In some embodiments, the cleaning cloth tensioning mechanism further includes a pressing power assembly; wherein, the pressing power assembly includes a pressing cylinder mounted on the top of the second mounting frame, the output end of the pressing cylinder is connected to a lifting frame, a pressing rod adapted to the pressing groove of the cleaning cloth is mounted on the inner side of the lifting frame, the output end of a third motor mounted on one side of the second mounting frame is connected to a second mounting shaft, a vertical mounting plate is connected to the other side of the second mounting frame by fasteners, a third mounting shaft that engages with the second mounting shaft is rotatably mounted on the vertical mounting plate, and a cleaning cloth take-up drum is sleeved between the second mounting shaft and the third mounting shaft.

[0014] The present invention has the following beneficial effects: 1. During the cleaning process, the present invention uses a negative pressure suction pipe to extract air from the corresponding hollow negative pressure box to generate negative pressure. Since the negative pressure cleaning chamber is located between two hollow negative pressure boxes, and the air permeability of the cleaning cloth is poor, external air enters the corresponding hollow negative pressure box through the air inlet, then enters the negative pressure cleaning chamber through the negative pressure outlet on the hollow negative pressure box, and then enters through the negative pressure outlet on the other hollow negative pressure box and is discharged through the negative pressure suction pipe. In this way, the dust and other impurities accumulated inside the negative pressure cleaning chamber are extracted under negative pressure during the cleaning process, thereby realizing the dynamic cleaning process of the glass substrate and ensuring the cleaning effect on the glass substrate. Compared with the traditional single cleaning method of roller brush, the combined effect of the cleaning cloth and the negative pressure suction of the negative pressure cleaning chamber can greatly improve the cleaning effect on the glass substrate.

[0015] 2. When the cleaning time set by the control system is reached, the control system restarts the first motor. The first motor controls the reciprocating screw to rotate, causing the horizontal bearing plate to move horizontally to the right again until the guide wheel rolls to the bottom of the third V-shaped guide opening. At this time, the other part of the cleaning cloth adheres to the top surface of the glass substrate under the action of the cleaning cloth pressing component. In this way, the cleaning operation on the top surface of the glass substrate can be further realized. The same control method described above can be used to realize the batch cleaning of glass substrates. Compared with the traditional cleaning method of changing roller brushes, this cleaning control method greatly improves the cleaning efficiency.

[0016] 3. In this invention, when the guide wheel rolls to the bottom of the last V-shaped guide opening, the first motor controls the reciprocating screw to continue rotating, causing the guide wheel to move horizontally to the left along each V-shaped guide opening until the guide wheel returns to the bottom of the first V-shaped guide opening. Then, the second and third motors are started simultaneously. The second motor controls the cleaning cloth drum to rotate and gradually release a certain length of cleaning cloth, while the third motor controls the cleaning cloth take-up drum to rotate and gradually take up the cleaning cloth until the used dirty cleaning cloth is completely taken up on the cleaning cloth take-up drum. The new cleaning cloth released from the cleaning cloth drum moves between the two guide bearing seats, and then the cleaning of the glass substrate can continue to be carried out according to the above cleaning method. Compared with the traditional cleaning method of changing roller brushes, this cleaning control method greatly improves the cleaning efficiency. Attached Figure Description

[0017] To more clearly illustrate the technical solutions of the embodiments of the present invention, the accompanying drawings used in the description of the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0018] Figure 1 This is a diagram showing the working state of the cleaning equipment for semiconductor glass substrates in this invention.

[0019] Figure 2 for Figure 1 The front view of the structure.

[0020] Figure 3 This is a schematic diagram of the structure of the cleaning equipment for semiconductor glass substrates in this invention.

[0021] Figure 4 This is a schematic diagram of the cleaning cloth tensioning mechanism in this invention.

[0022] Figure 5 This is a schematic diagram of the tensioning component in this invention.

[0023] Figure 6 This is a schematic diagram of the pressure-compression power assembly in this invention.

[0024] Figure 7 This is a schematic diagram of the cleaning fabric supply assembly in this invention.

[0025] Figure 8 for Figure 7 A structural diagram from another angle.

[0026] Figure 9 This is a schematic diagram of the structure of the guide bearing component in this invention.

[0027] Figure 10 This is a schematic diagram of the negative pressure cleaning component in this invention.

[0028] Figure 11 for Figure 10 A structural diagram from another angle.

[0029] Figure 12 This is a schematic diagram of the elastic positioning component in this invention.

[0030] The attached diagram lists the components represented by each number as follows: 1-Negative pressure cleaning mechanism, 2-Guide support assembly, 201-Guide support seat, 202-V-shaped guide port, 203-Horizontal support plate, 204-Screw adapter, 205-Guide component, 206-Vertical guide rod, 3-Negative pressure cleaning assembly, 301-Hollow negative pressure box, 302-Vertical gathering plate, 303-Negative pressure outlet, 304-Connector, 305-First elastic component, 306-Limiting groove, 307-Air inlet, 308-Negative pressure suction pipe, 4-Elastic positioning assembly, 401-Lifting rod, 402-Connecting plate, 403-Second elastic component, 404-Guide wheel rod, 405-Guide wheel, 406-Support rod, 407-Cleaning cloth pressing component, 5-Cleaning cloth supply assembly, 501-U-shaped carrier, 502-Horizontal support frame, 503-Installation cavity, 504-Guide channel, 505-First electric... 506-Reciprocating screw, 507-Horizontal guide rod, 508-Mounting port, 509-Second motor, 510-First limiting plate, 511-First set shaft, 512-Positioning plate, 513-Second limiting plate, 6-Cleaning cloth tensioning mechanism, 7-Tensioning assembly, 701-Bearing frame, 702-L-shaped plate, 703-Guide roller, 704-Moving traction rod, 705-First mounting frame, 706-Second mounting frame, 707-Support plate, 708-Third elastic element, 709-Limiting roller, 710-Cleaning cloth pressing groove, 711-Third motor, 712-Second set shaft, 713-Vertical mounting plate, 714-Third set shaft, 8-Pressing power assembly, 801-Pressing cylinder, 802-Lifting frame, 803-Pressing rod, 9-Glass substrate, 10-Cleaning cloth take-up drum, 11-Transmission belt. Detailed Implementation

[0031] The technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0032] For a specific implementation example, please refer to Implementation Example 1. Figure 1-12This invention relates to a cleaning device for semiconductor glass substrates, comprising a negative pressure cleaning mechanism 1; wherein, the negative pressure cleaning mechanism 1 includes a guide bearing assembly 2, a negative pressure cleaning assembly 3, and an elastic positioning assembly 4; the guide bearing assembly 2 includes a slidingly disposed linkage part, and two guide bearing seats 201 are symmetrically fixed inside the linkage part, with a plurality of V-shaped guide openings 202 arrayed on the guide bearing seats 201; the negative pressure cleaning assembly 3 is sleeved and installed on the linkage part, and the negative pressure cleaning assembly 3 includes two symmetrically disposed hollow negative pressure boxes 301, which are fitted against opposite sides of the glass substrate 9; the elastic positioning assembly 4 slides... The movable part is set on the linkage part. The elastic positioning component 4 includes a guide wheel part and a cleaning cloth pressing part that move synchronously. The guide wheel part is set directly above the cleaning cloth pressing part and is close to the inside of the V-shaped guide port 202. A vertical gathering plate 302 is fixedly set between the hollow negative pressure boxes 301. When the cleaning cloth pressing part presses the cleaning cloth to make it adhere to the glass substrate 9, the cleaning cloth passing through the cleaning cloth pressing part is close to the top of the vertical gathering plate 302. A negative pressure cleaning cavity is provided between the cleaning cloth pressing part, the vertical gathering plate 302, the cleaning cloth and the glass substrate 9. A negative pressure flow port 303 close to the top surface of the glass substrate 9 is provided on one side of the hollow negative pressure box 301.

[0033] In some implementation schemes, such as Figure 3 , Figure 9 and Figure 10 As shown, the linkage includes a horizontal bearing plate 203. A lead screw adapter 204 is fixedly installed on one side of the horizontal bearing plate 203, and a guide member 205 is fixedly installed on the other side of the horizontal bearing plate 203. A first limiting groove is provided at the bottom of the guide bearing seat 201. A vertical guide rod 206 is slidably connected inside the first limiting groove. The lead screw adapter 204 (i.e., the component used in the prior art to cooperate with the reciprocating lead screw, which will not be described in detail) and the guide member 205 are respectively fixedly connected to the corresponding vertical guide rod 206. A second limiting groove is opened on the circumferential side of the vertical guide rod 206.

[0034] Furthermore, a connector 304 is fixedly installed on the side of the hollow negative pressure box 301 away from the vertical gathering plate 302. The connector 304 is slidably sleeved on the corresponding vertical guide rod 206. The sliding part fixed on the inner wall of the connector 304 cooperates in the second limiting groove. This ensures that the entire negative pressure cleaning assembly 3 can only slide up and down along the two vertical guide rods 206 without deflection. A first elastic element 305 is fixedly installed on the top of the connector 304. The screw adapter 204 and the guide element 205 are respectively connected to... The corresponding first elastic element 305 is connected. The top of the hollow negative pressure box 301 is provided with a limiting groove 306. The downward movement of the entire negative pressure cleaning component 3 is achieved by the force inside the limiting groove 306. One hollow negative pressure box 301 is provided with an air inlet 307 communicating with its inner cavity. The other hollow negative pressure box 301 is connected with a negative pressure suction pipe 308. The cleaning cloth is made of a flexible non-breathable or poorly breathable material. A suction device is provided on one side of the negative pressure suction pipe 308, and the suction device and The negative pressure suction pipes 308 are connected by a suction hose (with a hollow dust filter box installed on the hose). During the cleaning process, the negative pressure suction pipes 308 draw air out of the corresponding hollow negative pressure boxes 301 to generate negative pressure. Since the negative pressure cleaning chamber is located between the two hollow negative pressure boxes 301, and the cleaning cloth has poor air permeability, external air enters the corresponding hollow negative pressure box 301 through the air inlet 307, and then enters the negative pressure cleaning chamber through the negative pressure outlet 303 on the hollow negative pressure box 301. After entering through the negative pressure inlet 303 on another hollow negative pressure box 301, it is discharged through the negative pressure suction pipe 308. In this way, the dust and other impurities accumulated inside the negative pressure cleaning chamber during the cleaning process are removed by negative pressure, thereby realizing the dynamic cleaning process of the glass substrate 9 and ensuring the cleaning effect of the glass substrate 9. Compared with the traditional single cleaning method of roller brush, the combined effect of the cleaning cloth and the negative pressure suction of the negative pressure cleaning chamber in this embodiment can greatly improve the cleaning effect of the glass substrate 9.

[0035] In some implementation schemes, such as Figure 3 and Figure 12 As shown, the elastic positioning component 4 also includes two symmetrically arranged lifting rods 401. The top of the lifting rod 401 slides through the horizontal bearing plate 203. A connecting plate 402 is fixedly arranged on the periphery of the lifting rod 401. The horizontal bearing plate 203 and the connecting plate 402 below it are connected by a second elastic element 403. The elastic positioning component 4 is supported by each second elastic element 403. At the same time, the elastic positioning component 4 is further supported by the guide bearing seats 201 on both sides.

[0036] The guide wheel section includes a guide wheel rod 404 rotatably disposed between two lifting rods 401. Guide wheels 405 are installed at both ends of the guide wheel rod 404 and are tightly attached to the inner wall of the V-shaped guide opening 202 (i.e., the guide wheels 405 are tightly pressed against the inner wall of the V-shaped guide opening 202 by the elastic force of the second elastic element 403). The cleaning cloth pressing section includes a support rod 406 adapted to the limiting groove 306. The support rod 406 is fixedly connected to the lifting rod 401 above it. A cleaning cloth pressing component 407 is fixedly sleeved on the support rod 406. Through the rolling action of the guide wheel 405 along the V-shaped guide opening 202 obliquely towards the inner wall, the guide wheel rod 404 and the lifting rod 401 above it are driven to move up and down. During the up and down movement of the lifting rod 401, the support rod 406 and the cleaning cloth pressing component 407 move synchronously.

[0037] When a glass substrate 9 is transported to a set position (set by the control system) by the conveyor belt 11 (which is a component of a common belt conveyor system, so other common structures of belt conveyor systems will not be described in detail), the set position specifically refers to the position where the front end of the glass substrate 9 is just aligned with the two hollow negative pressure boxes 301, and the two hollow negative pressure boxes 301 are attached to both sides of the glass substrate 9, which can guide and limit the movement of the glass substrate 9 during the cleaning process. The glass substrate 9 is kept in the set position when the conveyor belt 11 stops running. Then, the control linkage moves horizontally, causing the vertical guide rod 206 to slide along the bottom of the guide support 201. Under the action of the horizontal support plate 203, the entire elastic positioning assembly 4 moves horizontally synchronously. During this process, the guide wheel 405 slides along the inner wall of the V-shaped guide opening 202 until the guide wheel 405 is aligned with the bottom of the V-shaped guide opening 202 at the required position (through the elastic force of the second elastic element 403). After ensuring that the guide wheel 405 is tightly attached to the inner wall of the V-shaped guide opening 202, the support rod 406 moves down to engage with the limiting groove 306 on the hollow negative pressure box 301, pushing the entire negative pressure cleaning assembly 3 to move downward. The cleaning cloth pressing part 407 moves down to adhere to the cleaning cloth below and presses the cleaning cloth to gradually approach the glass substrate 9 until the cleaning cloth adheres to the top surface of the glass substrate 9. At this time, a negative pressure cleaning chamber is formed between the cleaning cloth pressing part 407, the vertical gathering plate 302, the cleaning cloth (specifically, a section of cleaning cloth between the cleaning cloth pressing part 407 and the vertical gathering plate 302), and the glass substrate 9. Then, the glass substrate 9 is gradually transported to the rear end by the conveyor belt 11. The top surface of the glass substrate 9 is cleaned by the cleaning cloth adhered to the top surface of the glass substrate 9. During the cleaning process, the dust and other impurities accumulated inside the negative pressure cleaning chamber are extracted and collected by the negative pressure suction pipe 308, thus greatly improving the cleaning effect on the glass substrate 9.

[0038] Specific embodiment two, based on specific embodiment one, such as Figure 3 , Figure 7 and Figure 8 As shown, the present invention also includes a cleaning fabric supply assembly 5; wherein, the cleaning fabric supply assembly 5 includes a U-shaped carrier 501 (mounted on an external frame), two horizontal support frames 502 are symmetrically fixed on one side of the U-shaped carrier 501, the top of the horizontal support frame 502 is provided with a mounting cavity 503, a guide bearing seat 201 is fixedly disposed inside the mounting cavity 503, and a vertical guide rod 206 is inserted and fitted in the guide channel 504 inside the mounting cavity 503 (the horizontal movement of the vertical guide rod 206 is ensured by the setting of the guide channel 504), wherein a first motor 505 is mounted on one of the horizontal support frames 502, the first The output end of the motor 505 is connected to a reciprocating lead screw 506 that is in transmission cooperation with the lead screw adapter 204. A horizontal guide rod 507 that is slidably sleeved with the guide member 205 is installed on another horizontal support frame 502. This ensures the smooth movement of the entire negative pressure cleaning mechanism 1 between the two horizontal support frames 502. In other words, when the reciprocating lead screw 506 is rotated by the first motor 505, the horizontal bearing plate 203 can be driven to reciprocate horizontally under the action of the reciprocating lead screw 506 and the lead screw adapter 204, thereby realizing the synchronous horizontal reciprocating movement of the negative pressure cleaning component 3 and the elastic positioning component 4.

[0039] In some implementation schemes, such as Figure 7 and Figure 8 As shown, a mounting port 508 is provided on the horizontal support frame 502 corresponding to the horizontal guide rod 507. The output end of the second motor 509 installed on one side of the U-shaped carrier 501 is connected to the first limiting plate 510. A first mounting shaft 511 is snapped onto the first limiting plate 510, passing through the mounting port 508. (The snap-fit ​​connection allows the first mounting shaft 511 to rotate synchronously with the first limiting plate 510, and also allows the first mounting shaft 511 to be removed from the first limiting plate 510. The specific snap-fit ​​structure is existing technology. For example, the first mounting shaft 511...) A locking block is provided at the end, which cooperates with the locking groove on the first limiting plate 510. A positioning plate 512 is rotatably provided at the end of the first set shaft 511. The positioning plate 512 is connected to the corresponding horizontal support frame 502 by fasteners, so as to ensure the stability of the locking relationship between the first set shaft 511 and the first limiting plate 510. A second limiting plate 513 is fixedly provided on the circumferential side of the first set shaft 511. The cleaning cloth tube installed on the first set shaft 511 is limited by the first limiting plate 510 and the second limiting plate 513. A certain length of cleaning cloth is wound on the cleaning cloth tube.

[0040] In some implementation schemes, such as Figure 4 , Figure 5 and Figure 6As shown, the present invention also includes a cleaning cloth tensioning mechanism 6; the cleaning cloth tensioning mechanism 6 includes a tensioning assembly 7; the tensioning assembly 7 includes a support frame 701 (installed on an external frame), two L-shaped plates 702 are symmetrically fixed at the bottom of the support frame 701, a guide roller 703 is installed between the L-shaped plates 702, two movable traction rods 704 are slidably installed on the support frame 701, a first mounting frame 705 is installed between the movable traction rods 704, a second mounting frame 706 is fixed on one side of the first mounting frame 705, a support plate 707 fixed to the movable traction rods 704 is provided on one side of the support frame 701, the support plate 707 is connected to the support frame 701 through a third elastic element 708, a limiting roller 709 fixed to the movable traction rods 704 is provided on the side of the first mounting frame 705 away from the support frame 701, and a cleaning cloth pressing groove 710 is opened on the peripheral side of the limiting roller 709.

[0041] Furthermore, the cleaning cloth tensioning mechanism 6 also includes a pressing power assembly 8; wherein, the pressing power assembly 8 includes a pressing cylinder 801 installed on the top of the second mounting frame 706, the output end of the pressing cylinder 801 is connected to a lifting frame 802, the inner side of the lifting frame 802 is equipped with a pressing rod 803 adapted to the pressing groove 710 of the cleaning cloth, the output end of the third motor 711 installed on one side of the second mounting frame 706 is connected to a second mounting shaft 712, the other side of the second mounting frame 706 is connected to a vertical mounting plate 713 by fasteners, a third mounting shaft 714 is rotatably mounted on the vertical mounting plate 713 and engages with the second mounting shaft 712, and a cleaning cloth take-up drum 10 is sleeved between the second mounting shaft 712 and the third mounting shaft 714.

[0042] After the cleaning cloth is released by rotating the cleaning cloth cylinder under the control of the second motor 509, the movable end of the cleaning cloth is pulled through the top of the vertical gathering plate 302, then through the bottom of the cleaning cloth pressing component 407, and then through the top of the guide roller 703 and adhered to the top of the limiting roller 709. Next, the pressing cylinder 801 controls the pressing rod 803 to move downward into the cleaning cloth pressing groove 710. At this time, the cleaning cloth is confined in the cleaning cloth pressing groove 710 under the action of the pressing rod 803. Then, the movable end of the cleaning cloth is pulled through between the lifting frame 802 and the pressing rod 803, and finally the movable end of the cleaning cloth is wrapped around the cleaning cloth. The cleaning cloth is fixed on the cleaning cloth take-up drum 10. The cleaning cloth take-up drum 10 on the second set shaft 712 and the third set shaft 714 is controlled by the third motor 711 to rotate, so that the cleaning cloth is gradually rolled up on the cleaning cloth take-up drum 10 to adjust the tension of the cleaning cloth until the cleaning cloth is adjusted to just taut. As the guide wheel 405 gradually slides down the inclined inner wall of the V-shaped guide opening 202, the strong elastic force of the second elastic element 403 pushes the entire negative pressure cleaning assembly 3 and the cleaning cloth to move downward. The strong elastic force of the second elastic element 403 is sufficient to ensure that the cleaning cloth can be forcefully attached to the top surface of the glass substrate 9.

[0043] In the initial state, the guide wheel 405 is located at the bottom inside the first V-shaped guide opening 202 (i.e. Figure 3 The leftmost V-shaped guide opening 202, after the cleaning cloth is installed, is controlled by the first motor 505 to rotate the reciprocating screw 506. Under the action of the reciprocating screw 506 and the screw adapter 204, the horizontal bearing plate 203 is driven to move horizontally to the right until the guide wheel 405 rolls to the bottom of the second V-shaped guide opening 202. At this time, a part of the cleaning cloth is attached to the top surface of the glass substrate 9 under the action of the cleaning cloth pressing part 407. Thus, the cleaning operation on the top surface of the glass substrate 9 can begin. When the cleaning time set by the control system is reached, the control system restarts the first motor 505. The machine 505 controls the reciprocating screw 506 to rotate, causing the horizontal bearing plate 203 to move horizontally to the right again until the guide wheel 405 rolls to the bottom of the third V-shaped guide opening 202. At this time, the other part of the cleaning cloth adheres to the top surface of the glass substrate 9 under the action of the cleaning cloth pressing part 407. In this way, the cleaning operation of the top surface of the glass substrate 9 can be further realized. The cleaning work of the glass substrate 9 can be realized in batches by following the same control method. Compared with the traditional cleaning method of changing the roller brush, this cleaning control method greatly improves the cleaning efficiency.

[0044] When the guide wheel 405 rolls to the bottom of the last V-shaped guide opening 202 (where there is no glass substrate 9), the first motor 505 controls the reciprocating screw 506 to continue rotating, causing the guide wheel 405 to move horizontally to the left along each V-shaped guide opening 202 until the guide wheel 405 returns to the bottom of the first V-shaped guide opening 202. Then, the second motor 509 and the third motor 711 are started simultaneously. The second motor 509 controls the cleaning cloth drum to rotate and gradually release a certain length of cleaning cloth, while the third motor 711 controls the cleaning cloth take-up drum 10 to rotate and gradually take up the cleaning cloth until the used dirty cleaning cloth is completely taken up on the cleaning cloth take-up drum 10. The new cleaning cloth released from the cleaning cloth drum moves between the two guide bearing seats 201. Then, the cleaning of the glass substrate 9 can continue to be carried out in the above cleaning method. Compared with the traditional cleaning method of changing the roller brush, this cleaning control method greatly improves the cleaning efficiency.

[0045] In the description of this specification, references to terms such as "an embodiment," "example," "specific example," etc., indicate that a specific feature, structure, material, or characteristic described in connection with that embodiment or example is included in at least one embodiment or example of the invention. In this specification, illustrative expressions of the above terms do not necessarily refer to the same embodiment or example. Furthermore, the specific features, structures, materials, or characteristics described may be combined in any suitable manner in one or more embodiments or examples.

[0046] The preferred embodiments of the present invention disclosed above are merely illustrative of the invention. These preferred embodiments do not exhaustively describe all details, nor do they limit the invention to the specific implementations described. Clearly, many modifications and variations can be made based on the content of this specification. This specification selects and specifically describes these embodiments to better explain the principles and practical applications of the invention, thereby enabling those skilled in the art to better understand and utilize the invention. The invention is limited only by the claims and their full scope and equivalents.

Claims

1. A cleaning device for semiconductor glass substrates, characterized in that, Includes a negative pressure cleaning mechanism (1); wherein the negative pressure cleaning mechanism (1) includes: The guide bearing assembly (2) includes a sliding linkage part, and two guide bearing seats (201) are symmetrically fixed on the inner side of the linkage part. Several V-shaped guide ports (202) are arranged in an array on the guide bearing seats (201). Negative pressure cleaning component (3), the negative pressure cleaning component (3) is sleeved and installed on the linkage part, the negative pressure cleaning component (3) includes two hollow negative pressure boxes (301) arranged symmetrically, the hollow negative pressure boxes (301) are attached to the opposite sides of the glass substrate (9); The elastic positioning component (4) is slidably disposed on the linkage part. The elastic positioning component (4) includes a guide wheel part and a cleaning cloth pressing part that move synchronously. The guide wheel part is disposed directly above the cleaning cloth pressing part and closely attached to the inside of the V-shaped guide opening (202). A vertical gathering plate (302) is fixedly arranged between the hollow negative pressure boxes (301). When the cleaning cloth pressing part presses against the cleaning cloth to make it adhere to the glass substrate (9), the cleaning cloth passing through the cleaning cloth pressing part is tightly attached to the top of the vertical gathering plate (302). A negative pressure cleaning cavity is provided between the cleaning cloth pressing part, the vertical gathering plate (302), the cleaning cloth and the glass substrate (9). A negative pressure flow port (303) close to the top surface of the glass substrate (9) is provided on one side of the hollow negative pressure box (301).

2. The cleaning device for semiconductor glass substrates according to claim 1, characterized in that, The linkage includes a horizontal support plate (203), a screw adapter (204) is fixedly installed on one side of the horizontal support plate (203), a guide (205) is fixedly installed on the other side of the horizontal support plate (203), a first limiting groove is provided at the bottom of the guide support seat (201), a vertical guide rod (206) is slidably connected inside the first limiting groove, the screw adapter (204) and the guide (205) are respectively fixedly connected to the corresponding vertical guide rod (206), and a second limiting groove is opened on the circumferential side of the vertical guide rod (206).

3. The cleaning equipment for semiconductor glass substrates according to claim 2, characterized in that, A connector (304) is fixedly installed on the side of the hollow negative pressure box (301) away from the vertical gathering plate (302). The connector (304) is slidably sleeved on the corresponding vertical guide rod (206). The sliding part fixed on the inner wall of the connector (304) is engaged in the second limiting groove. A first elastic element (305) is fixedly installed on the top of the connector (304). The screw adapter (204) and the guide element (205) are respectively connected to the corresponding first elastic element (305). A limiting groove (306) is provided on the top of the hollow negative pressure box (301). One of the hollow negative pressure boxes (301) is provided with an air inlet (307) communicating with its inner cavity. The other hollow negative pressure box (301) is provided with a negative pressure suction pipe (308).

4. A cleaning device for semiconductor glass substrates according to claim 3, characterized in that, The elastic positioning component (4) also includes two symmetrically arranged lifting rods (401). The top of the lifting rod (401) slides through the horizontal bearing plate (203). A connecting plate (402) is fixedly arranged on the periphery of the lifting rod (401). The horizontal bearing plate (203) and the connecting plate (402) below it are connected by a second elastic element (403). The guide wheel part includes a guide wheel rod (404) rotatably disposed between two lifting rods (401), and guide wheels (405) tightly attached to the inner wall of the V-shaped guide opening (202) are installed at both ends of the guide wheel rod (404); the cleaning cloth pressing part includes a support rod (406) adapted to the limiting groove (306), the support rod (406) is fixedly connected to the lifting rod (401) above it, and a cleaning cloth pressing part (407) is fixedly sleeved on the support rod (406).

5. A cleaning device for semiconductor glass substrates according to claim 4, characterized in that, It also includes a cleaning cloth supply assembly (5); wherein the cleaning cloth supply assembly (5) includes a U-shaped carrier (501), two horizontal support frames (502) are symmetrically fixed on one side of the U-shaped carrier (501), the top of the horizontal support frame (502) is provided with an installation cavity (503), the guide bearing seat (201) is fixedly installed inside the installation cavity (503), and the vertical guide rod (206) is inserted and fitted in the guide channel (504) inside the installation cavity (503). A first motor (505) is installed on one of the horizontal support frames (502), and the output end of the first motor (505) is connected to a reciprocating screw (506) that is in transmission cooperation with the screw adapter (204). A horizontal guide rod (507) that is slidably sleeved with the guide member (205) is installed on the other horizontal support frame (502).

6. A cleaning device for semiconductor glass substrates according to claim 5, characterized in that, The horizontal support frame (502) corresponding to the horizontal guide rod (507) has an installation port (508). The output end of the second motor (509) installed on one side of the U-shaped frame (501) is connected to the first limiting plate (510). The first limiting plate (510) is fitted with a first mounting shaft (511) that passes through the installation port (508). The end of the first mounting shaft (511) is rotatably provided with a positioning plate (512). The positioning plate (512) is connected to the corresponding horizontal support frame (502) by fasteners. The second limiting plate (513) is fixedly provided on the periphery of the first mounting shaft (511). The cleaning cloth tube installed on the first mounting shaft (511) is limited by the first limiting plate (510) and the second limiting plate (513).

7. A cleaning device for semiconductor glass substrates according to claim 6, characterized in that, It also includes a cleaning cloth tensioning mechanism (6); the cleaning cloth tensioning mechanism (6) includes a tensioning component (7); The tensioning assembly (7) includes a support frame (701), two L-shaped plates (702) are symmetrically fixed at the bottom of the support frame (701), a guide roller (703) is installed between the L-shaped plates (702), two movable traction rods (704) are slidably arranged on the support frame (701), a first mounting frame (705) is installed between the movable traction rods (704), a second mounting frame (706) is fixed on one side of the first mounting frame (705), a support plate (707) is provided on one side of the support frame (701) and fixed to the movable traction rod (704), the support plate (707) is connected to the support frame (701) through a third elastic element (708), a limiting roller (709) is provided on the side of the first mounting frame (705) away from the support frame (701) and fixed to the movable traction rod (704), and a cleaning cloth pressing groove (710) is opened on the peripheral side of the limiting roller (709).

8. A cleaning device for semiconductor glass substrates according to claim 7, characterized in that, The cleaning cloth tensioning mechanism (6) further includes a pressing power assembly (8); wherein the pressing power assembly (8) includes a pressing cylinder (801) installed on the top of the second mounting frame (706), the output end of the pressing cylinder (801) is connected to a lifting frame (802), the inner side of the lifting frame (802) is equipped with a pressing rod (803) adapted to the cleaning cloth pressing groove (710), the output end of a third motor (711) installed on one side of the second mounting frame (706) is connected to a second mounting shaft (712), the other side of the second mounting frame (706) is connected to a vertical mounting plate (713) by fasteners, a third mounting shaft (714) is rotatably provided on the vertical mounting plate (713) and engages with the second mounting shaft (712), and a cleaning cloth take-up drum (10) is sleeved between the second mounting shaft (712) and the third mounting shaft (714).

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