一种用于校正电感耦合等离子体质谱双电荷干扰的方法及应用
By measuring the ratio K of the two-charged ions of interfering elements and calculating the pseudo-concentration contribution, the universality problem of two-charge interference correction on conventional quadrupole ICP-MS equipment was solved, achieving high-precision two-charge interference correction and improving the reliability of detection results and the detection accuracy of complex samples.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- PANZHIHUA IRON & STEEL RES INST OF PANGANG GROUP
- Filing Date
- 2025-07-31
- Publication Date
- 2026-07-17
AI Technical Summary
In the existing technology, the dual-charge interference correction method has poor universality and is difficult to achieve high-precision correction on conventional quadrupole ICP-MS equipment. Furthermore, the existing correction coefficient acquisition process is not standardized, resulting in a lack of comparability of results between different laboratories and large detection errors for complex samples.
By measuring the ratio K of interfering elements forming double-charged ions, the pseudo-concentration contribution value is calculated, and the true concentration of the analyte is corrected using the formula C5=C4-C3×(C1÷C2). This provides a standardized procedure for K value determination, applicable to conventional quadrupole mass spectrometers.
It enables efficient and accurate correction of dual-charge interference on conventional quadrupole ICP-MS equipment, improving the reliability and reproducibility of detection results, especially enhancing the accuracy of trace element detection in complex samples such as blast furnace gas sludge and vanadium extraction tailings.
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