Conductive paste uniformizing device

Abstract

This invention discloses a conductive slurry homogenizing device, comprising a slurry screening mechanism, an eddy current driving mechanism, and a multi-stage diversion mechanism. The slurry screening mechanism and the eddy current driving mechanism are located inside a homogenizing tank. The multi-stage diversion mechanism is located at the valve port of the homogenizing tank. The slurry screening mechanism includes an abrasive skeleton for screening the conductive slurry. An eddy current driving mechanism, including a superconducting eddy current generator, is disposed within the central cavity of the abrasive skeleton. The superconducting eddy current generator drives the conductive slurry to form a driving eddy current. The eddy current-driven conductive slurry passes through the abrasive skeleton to complete slurry filtration. A homogenizing cavity is formed between the mounting shell of the superconducting eddy current generator and the inner wall of the homogenizing tank. The multi-stage diversion mechanism is used for particle size separation of the conductive slurry. This invention eliminates the need for mixing friction balls or abrasive grinding, reducing homogenizing tank losses and improving the grinding and shearing efficiency of the conductive slurry.

Description

Technical Field

[0001] This invention relates to the field of conductive paste dispersion and homogenization technology, and more particularly to a conductive paste homogenization device. Background Technology

[0002] Conductive paste is a functional material composed of conductive fillers, binders, solvents, and additives, widely used in photovoltaic cells, printed electronics, flexible circuits, touch screens, radio frequency identification, lithium-ion batteries, and other fields. Its core performance depends on the uniformity of the dispersion of the conductive filler, the rheological properties of the paste, and its conductivity after curing.

[0003] Novel conductive pastes are increasingly using nanomaterials as conductive fillers, but their high specific surface area and surface energy lead to easy agglomeration and difficulty in dispersion, making it difficult to achieve uniform and stable paste preparation using traditional processes.

[0004] Patent application publication number CN 108630338 A discloses a method, apparatus, and graphene conductive paste prepared therefrom for mass production, comprising: a) mixing graphite and solvent, and subjecting at least one low-speed stirring treatment and / or low-speed shearing treatment to obtain a graphite dispersion; b) subjecting the graphite dispersion to at least one sand treatment to obtain a pre-exfoliated graphene dispersion; c) subjecting the pre-exfoliated graphene dispersion to at least one high-pressure homogenization treatment and / or ultrasonic treatment to obtain a monolayer or few-layer graphene dispersion; d) dissolving a dispersant in a solvent to obtain a dispersant solution; e) mixing the monolayer or few-layer graphene dispersion and the dispersant solution, and subjecting at least one sand milling treatment to obtain a graphene conductive paste.

[0005] The performance of conductive pastes is highly dependent on their dispersion uniformity, but existing homogenization processes suffer from the following technical bottlenecks: tiny grinding beads may remain in the paste, requiring subsequent filtration, which increases production costs due to the added complexity of filtration design. High-solids-content pastes can also clog the grinding chamber, leading to complicated cleaning processes.

[0006] Therefore, those skilled in the art have provided a conductive slurry homogenizing device to solve the problems mentioned in the background art. Summary of the Invention

[0007] The technical problem to be solved by the present invention is: In order to solve the technical problems in the prior art, the present invention provides a conductive slurry uniformizing device that eliminates the need for grinding with mixing friction balls or abrasive materials, reduces the uniformizing loss of the uniformizing tank, and improves the grinding and shearing efficiency of conductive slurry.

[0008] The technical solution adopted by this invention to solve its technical problem is: Slurry screening mechanism, vortex drive mechanism and multi-stage diversion mechanism; The slurry screening mechanism and the eddy current drive mechanism are located inside the uniform material tank. The multi-stage diversion mechanism is located at the valve port of the equalization tank; The slurry screening mechanism includes an abrasive skeleton, which is used to screen conductive slurry. The abrasive skeleton is provided with an eddy current driving mechanism in the central cavity. The eddy current driving mechanism includes a superconducting eddy current generator, which is used to drive the conductive slurry to form a driving eddy current. Eddy current-driven conductive slurry passes through the abrasive skeleton to complete slurry filtration; A uniform material cavity is formed between the mounting shell of the superconducting eddy current generator and the inner wall of the uniform material barrel. The multi-stage flow divider is used for particle size separation of conductive paste.

[0009] Furthermore, the abrasive skeleton is formed by splicing a flow guide frame and a mesh to create a honeycomb mesh structure; The mesh comes into contact with the eddy current-driven conductive paste to form a convective friction structure; The gel layer coated on the mesh surface comes into contact with impurities embedded in the conductive slurry to form a filter structure; The flow guide is a triangular prism structure, and the outer wall of the flow guide is in vortex contact with the conductive slurry to form a self-rotating frictional dispersion structure; The abrasive skeleton features a progressively increasing grid density from top to bottom, with its outer side facing the frame and converging with the conductive slurry to form a conical flow guiding structure. The grid serves as the primary structure for shearing and dispersing the conductive slurry under eddy current conditions, while the flow guiding frame acts as a layered flow guiding structure, facilitating concentrated contact between the conductive slurry and the grid. The grid density can be adjusted to adapt to the slurry shearing process by varying the density of the conductive slurry at different liquid levels.

[0010] Furthermore, the flow guide is horizontally positioned on both sides of the guide bar via a rotating shaft, and the guide bar is inserted into the slot to form a dovetail wedge block limiting structure; The slots are located on the outer wall of the mounting housing and the inner wall of the material leveling tank. The guide strip structure for limiting the installation facilitates insertion and subsequent mesh replacement.

[0011] Furthermore, the interior of the flow guide frame is hollow, and the two open sides of the hollow structure of the flow guide frame are sealed with a sealing layer; The outer wall of the flow guide is integrally connected with an extension strip, which is used to facilitate frictional contact with the eddy current conductive slurry. The hollow structure of the flow guide allows for weight distribution within the hollow cavity, adapting to the viscosity of the conductive slurry. A sealing layer prevents the conductive slurry from entering the interior. The extension strip increases the contact area of ​​the eddy current conductive slurry and also increases the contact angle.

[0012] Furthermore, the superconducting eddy current generator is mounted within the abrasive cavity of the uniform material tank via a housing frame. The superconducting eddy current generator generates superconducting current eddies by magnetic flux lines penetrating the superconductor, and the conductive slurry, in conjunction with these superconducting current eddies, forms magnetic flux vortices. The design of the superconducting eddy current generator, which generates superconducting current eddies by magnetic flux lines penetrating the superconductor, and the conductive slurry forming magnetic flux vortices through these superconducting current eddies, can serve as an auxiliary stirring structure.

[0013] Furthermore, the inner wall of the uniform material tank has a double-layer structure, forming a wiring cavity between the two inner walls. The electrode wiring of the electro-ceramic array is arranged within this cavity. The electrode connectors of the electro-ceramic array face outwards along the inner wall of the uniform material tank, while the output terminals of the electro-ceramic array face inwards along the inner wall. The double-layer structure of the uniform material tank isolates the electrodes and wiring of the electro-ceramic array from the conductive paste.

[0014] Furthermore, the multi-stage diversion mechanism includes a diversion tower; The diversion tower is located at the valve port of the homogenizing tank. The diversion tower forms a conical structure from the outside in, with its horizontal cross-sectional dimensions increasing progressively from the outside in. The openings of the diversion tower, arranged from the outside in, connect with the conductive slurry to form a Sierpinski fractal hierarchical flow channel structure. The diversion tower serves as the initial diversion structure for the conductive slurry of the same structure entering the homogenizing tank. Utilizing the Sierpinski fractal hierarchical flow channel in conjunction with the initial diversion and removal of the conductive slurry improves the shearing and grinding efficiency of the conductive slurry.

[0015] The diversion tower is fixedly connected to the inner wall of the equalization tank via a support guard. This support-mounted design allows for timed replacement, preventing structural damage or blockages during long-term use.

[0016] Furthermore, the inner wall of the diversion channel of the diversion tower is provided with a flow guiding structure, which is composed of an array of several flow guiding protrusions. The flow guiding protrusions are integrally connected with the diversion tower to form a flow guiding contact layer. The flow guiding protrusions are a structural design that accelerates the diversion of conductive slurry.

[0017] Furthermore, an electro-ceramic array is embedded in the inner wall of the uniform mixing tank. The three-dimensional acoustic standing wave field output by the electro-ceramic array forms a shear circulation with the conductive slurry. The three-dimensional acoustic standing wave field output by the electro-ceramic array can assist the conductive slurry in further circulating shearing, while also reducing air bubbles within the slurry.

[0018] Furthermore, a sleeve is fixedly installed on the outer wall of the uniform material tank, and a drive wheel is installed on the outer wall of the sleeve. The outer ring of the drive wheel is integrally connected with meshing teeth, which cooperate with an external transmission gear to complete the rotational movement of the uniform material tank. The uniform material tank has a drive wheel groove and a keyway, with the keyway engaging with the inner ring transmission key of the drive wheel. A base is provided at the bottom of the uniform material tank. The meshing teeth can drive the uniform material tank to perform a slow oscillating motion through the sleeve, assisting in the shearing and dispersion of the conductive slurry.

[0019] Compared with the prior art, the beneficial effects of the present invention are: 1. In the design of the homogenizing tank, this invention employs a conductive slurry mixing structure without sand or friction balls, reducing wear on the inner wall of the tank and decreasing the air bubble content within the slurry. Eliminating the possibility of impurities introduced by medium wear further improves the purity of the conductive slurry and optimizes the separation process of sand and air bubbles.

[0020] 2. In the design of the abrasive skeleton, this invention employs multiple sets of abrasive skeletons installed inside a uniform material cavity for auxiliary grinding of conductive slurry. The grinding structure of the abrasive skeleton is fixed, and friction and shearing processes are performed during the eddy current motion of the conductive slurry. Simultaneously, the abrasive skeleton is not expelled along with the conductive slurry, thus solving the technical problem of introducing impurities into the slurry.

[0021] 3. The present invention has a flow divider at the input and output ports of the uniform feed tank, and adopts the Sierpinski fractal hierarchical flow channel structure to perform flow divider and refinement treatment on the conductive slurry, thereby improving the efficiency of the conductive slurry to generate turbulent-laminar alternating shearing through the fractal flow channel.

[0022] 4. In the design of the superconducting eddy current generator inside the homogenizing tank, the present invention uses eddy currents to drive the slurry to move continuously to complete the grinding and shearing processes. This structure generates a strong magnetic field through a low-temperature superconducting coil, inducing eddy currents in the conductive slurry and forming volume shearing driven by Lorentz force, thus solving the technical problem of auxiliary driving of the slurry. Attached Figure Description

[0023] The present invention will be further described below with reference to the accompanying drawings and embodiments.

[0024] Figure 1 This is a partial exploded view of the conductive slurry homogenizing device of the present invention. Figure 2 for Figure 1 A partial structural diagram of the uniform material tank shown. Figure 3 This is a schematic diagram of the conductive slurry leveling device of the present invention, which is installed in the leveling tank.

[0025] Figure 4This is a schematic diagram of the internal structure of the uniformizing tank of a conductive slurry uniformizing device according to the present invention.

[0026] Figure 5 This is a bottom view of the distribution tower of a conductive slurry homogenizing device according to the present invention.

[0027] Figure 6 This is a front view of the abrasive skeleton of a conductive slurry homogenizing device according to the present invention.

[0028] Figure 7 This is a schematic diagram (AA) of the abrasive skeleton of a conductive slurry homogenizing device according to the present invention. Figure 8 This is a cross-sectional view of the abrasive skeleton mesh structure of a conductive slurry homogenizing device according to the present invention; Figure 9 This is a schematic diagram of the flow guiding structure for the abrasive skeleton installation of a conductive slurry uniformizing device according to the present invention.

[0029] In the diagram: 1. Feeding tank; 2. Valve port; 3. Shell; 4. Drive wheel; 5. Meshing teeth; 6. Outer shell; 7. Grid; 8. Wiring cavity; 9. Inner wall of feeding tank; 10. Electro-ceramic array; 11. Abrasive skeleton; 12. Slot; 13. Superconducting eddy current generator; 14. Drive wheel groove; 15. Keyway; 16. Base; 17. Diverter tower; 18-1. Diverter channel; 18-2. Opening; 19. Lifting edge protector; 20. Guide strip; 21. Dovetail wedge; 23. Flow guide frame; 24. Gel layer; 25. Extension strip; 26. Shaft; 27. Sealing layer; 28. Bearing. Detailed Implementation

[0030] The present invention will now be described in further detail with reference to the accompanying drawings. These drawings are simplified schematic diagrams, illustrating only the basic structure of the invention, and therefore only show the components relevant to the invention.

[0031] Please see Figure 1-9 The working principle of the conductive slurry homogenizing device of the present invention is as follows: Workers introduce the conductive slurry to be processed into the uniform feed tank 1 through valve port 2. The abrasive skeleton 11 is immersed in the conductive slurry to form a three-dimensional screening interface, and its surface gel layer 24 captures micron-sized impurities in the slurry; the density gradient distribution of the skeleton mesh 7 guides the slurry to form an axial conical flow field, and the density increasing design allows impurities to be trapped in the upper layer of the skeleton step by step, realizing self-cleaning gradient filtration; the superconducting eddy current generator 13 generates a strong magnetic field that penetrates the uniform feed cavity, inducing the conductive slurry to form magnetic flux vortices; the vortex flow applies a tangential force to the abrasive skeleton 11, driving the triangular prism guide frame 23 to rotate, causing the skeleton mesh 7 to generate convective friction with the slurry, peeling off adsorbed impurities and preventing sieve clogging; the screened slurry enters the distribution tower 17, whose conical structure is combined with a 3-stage self-similar expansion channel; the slurry undergoes the following in the distribution channel 18-1: Primary expansion zone: Particles settle back into the homogenization cavity; Secondary acceleration zone: The guide protrusions induce Coriolis secondary flow, causing particles to accumulate towards the center of the flow channel; Three-stage clustering zone: Particles are output through the central open port 18-2, achieving three-stage particle size separation.

[0032] Slurry screening mechanism, vortex drive mechanism and multi-stage diversion mechanism; The slurry screening mechanism and the vortex drive mechanism are located inside the uniform material tank 1; The multi-stage flow divider is located at the output and input valve ports 2 of the uniform material tank 1; The slurry screening mechanism includes an abrasive skeleton 11, which is used to penetrate conductive slurry to form a slurry screening contact structure. An eddy current driving mechanism is provided in the central cavity of the abrasive skeleton 11. The eddy current driving mechanism includes a superconducting eddy current generator 13, which is used to drive the conductive paste to form driving eddy currents. Eddy current driven conductive slurry passes through abrasive skeleton 11 to complete slurry filtration; The mounting shell 6 of the superconducting eddy current generator 13 forms a uniform cavity between the uniform cavity and the inner wall 9 of the uniform cylinder, and the abrasive skeleton 11 filled in the uniform cavity forms a slurry screening structure. Multi-stage flow dividers are used for particle size separation of conductive paste.

[0033] The abrasive skeleton 11 is formed by splicing the flow guide 23 and the grid 7 to form a honeycomb mesh structure; Mesh 7 comes into contact with the eddy current-driven conductive paste to form a convective friction structure; The gel layer 24 coated on the surface of the mesh 7 comes into contact with the impurities embedded in the conductive paste to form a filter structure; The flow guide 23 has a triangular prism structure, and the outer wall of the flow guide 23 forms a self-rotating frictional dispersion structure by contacting the conductive slurry eddy current. The density of the grid 7 in the abrasive skeleton 11 increases gradually from top to bottom. The outer side of the abrasive skeleton 11 faces the frame and forms a conical flow guiding structure with the conductive paste.

[0034] Among them, the axis of the triangular prism of the flow guide 23 is perpendicular to the flow direction of the slurry, and its edges generate tangential force with the conductive slurry eddy current to drive its rotation; the density gradient of the grid 7 varies from 20 mesh / cm² to 80 mesh / cm², and guides the slurry to form an axial conical turbulence through the density difference, which accelerates the interception of impurities; the gel layer 24 is made of porous silicone with a pore size of less than 5μm to achieve micron-level impurity filtration.

[0035] The flow guide 23 is horizontally placed on both sides of the guide bar 20 via the pivot 26. The guide bar 20 is inserted into the slot 12 to form a dovetail wedge block 21 limiting structure. The slot 12 is set on the outer wall of the mounting housing 6 and the inner wall 9 of the material equalization tank.

[0036] The dovetail wedge block 21 limiting structure includes a guide slope with an inclination angle of 15°-30°, which achieves axial locking through interference fit; the two ends of the rotating shaft 26 are provided with stepped shoulders with a diameter difference of ≥0.5mm to prevent the guide frame 23 from moving axially; the depth of the slot 12 is 1.2-1.5 times the thickness of the guide strip 20 to ensure the stability of the tenon and mortise joint.

[0037] The interior of the flow guide 23 is hollow, and the two open sides of the hollow structure of the flow guide 23 are sealed with sealing layers 27; the outer wall of the flow guide 23 is integrally connected with an extension strip 25, which is used to cooperate with the eddy current conductive paste for frictional contact.

[0038] The hollow structure is filled with silicon nitride drag-reducing medium; the sealing layer 27 is a polytetrafluoroethylene film with a thickness of 0.1-0.3 mm and is thermo-sealed.

[0039] The superconducting eddy current generator 13 is mounted in the abrasive cavity of the uniform material tank 1 through the outer shell 6. The superconducting eddy current generator 13 forms a superconducting current eddy current by penetrating the superconductor through magnetic flux lines. The conductive slurry cooperates with the superconducting current eddy current to form a magnetic flux vortex.

[0040] The magnetic flux lines are generated by a permanent magnet array with a field strength of 0.5-1.2T; the resistivity of the conductive paste is ≤10. -5 Ω·m, forming a circumferential shear flow of ≥10m / s in the vortex field.

[0041] The inner wall of the uniform material tank 1 is provided with a double-layer structure, and a wiring cavity 8 is formed between the double-layer inner walls of the uniform material tank 1. The electrode wiring of the electro-ceramic array 10 is arranged in the wiring cavity 8. The electrode connector of the electro-ceramic array 10 faces outward along the inner wall 9 of the uniform material tank, and the connection end of the electro-ceramic array 10 faces inward along the inner wall 9 of the uniform material tank.

[0042] The wiring cavity 8 is 8-12mm thick and filled with aluminum oxide insulation medium; the electrode connector uses gold-nickel alloy pins with an exposed length of 2-3mm; the connection end is a tungsten-copper composite socket.

[0043] An electro-ceramic array 10 is embedded in the inner wall 9 of the uniform material tank. The three-dimensional acoustic standing wave field output by the electro-ceramic array 10 forms a shear circulation with the conductive slurry.

[0044] The acoustic standing wave field is generated by a 20-40kHz piezoelectric transducer with a sound pressure level ≥140dB; the ratio of the vortex diameter of the shear circulation to the spacing of the electro-ceramic unit is 1:1.5.

[0045] The multi-stage diversion mechanism includes a diversion tower 17; the diversion tower 17 is located at the valve port 2 of the uniform material tank 1, the diversion tower 17 forms a conical structure from the outside to the inside, the horizontal cross-sectional dimension of the diversion tower 17 increases step by step from the outside to the inside, and the opening 18-2 set from the outside to the inside of the diversion tower 17 is connected with the conductive slurry to form a Sierpinski fractal hierarchical flow channel structure.

[0046] The diversion tower 17 is fixedly connected to the inner wall 9 of the uniform feed tank via the supporting guard 19.

[0047] Among them, the step-by-step diversion structure of the diversion tower 17 completes the screening and diversion through the graded openings 18-2.

[0048] The inner wall of the diversion channel 18-1 of the diversion tower 17 is provided with a flow guiding structure. The flow guiding structure is composed of an array of several flow guiding protrusions. The flow guiding protrusions are integrally connected with the diversion tower 17 to form a flow guiding contact layer.

[0049] The guide protrusion is a semi-ellipsoid; the surface of the protrusion is coated with a tungsten carbide wear-resistant layer with a hardness ≥ HRA90.

[0050] A housing 3 is fixedly installed on the outer wall of the uniform material barrel 1. A drive wheel 4 is installed on the outer wall of the housing 3. The outer ring of the drive wheel 4 is integrally connected with a meshing tooth 5. The meshing tooth 5 is used to cooperate with the external transmission meshing gear to complete the rotational movement of the uniform material barrel 1.

[0051] A rubber damping layer is provided between the shell 3 and the uniform mixing tank 1; the uniform mixing tank 1 completes a slow swing structure through the connection of the keyway 15 and the transmission key, which can assist the uniform mixing tank in stirring. The design of the base 16 at the bottom facilitates the support of the tank body.

[0052] The above description is based on the preferred embodiments of the present invention. Through the above description, those skilled in the art can make various changes and modifications without departing from the technical concept of the present invention. The technical scope of the present invention is not limited to the contents of the specification, but must be determined by the scope of the claims.

Claims

1. An apparatus for leveling a conductive paste, the apparatus comprising: include: Slurry screening mechanism, vortex drive mechanism and multi-stage diversion mechanism; The slurry screening mechanism and the eddy current drive mechanism are located inside the uniform material tank (1); The multi-stage diversion mechanism is located at the valve port (2) of the uniform material tank (1); The slurry screening mechanism includes an abrasive skeleton (11), which is used to screen conductive slurry. The abrasive skeleton (11) is provided with a vortex drive mechanism in the central cavity. The vortex drive mechanism includes a superconducting vortex generator (13), which is used to drive the conductive paste to form a uniform vortex. Eddy current driven conductive slurry penetrates into the abrasive skeleton (11) for sieving friction; A uniform material cavity is formed between the mounting shell (6) of the superconducting eddy current generator (13) and the inner wall of the uniform material barrel (1); The multi-stage flow divider is used for particle size separation of conductive paste; The abrasive skeleton (11) is formed by splicing a flow guide (23) and a mesh (7) to form a honeycomb mesh structure; The gel layer (24) coated on the surface of the mesh (7) comes into contact with the impurities embedded in the conductive paste to form a filter structure; The guide frame (23) is a triangular prism structure, and the outer wall of the guide frame (23) forms a self-rotating frictional dispersion structure by contacting the conductive slurry eddy current. The abrasive skeleton (11) has a grid (7) distribution density that increases gradually from top to bottom. The outer side of the abrasive skeleton (11) faces the frame and forms a conical flow guiding structure with the conductive paste. The two rotating shafts (26) of the flow guide (23) are horizontally placed on both sides of the guide bar (20) through bearings (28). The guide bar (20) is inserted into the slot (12) to form a dovetail wedge block (21) limiting structure. The slot (12) is located on the outer wall of the mounting housing (6) and the inner wall (9) of the material equalization tank; The superconducting eddy current generator (13) is mounted in the abrasive cavity of the uniform material tank (1) through the outer shell (6). The superconducting eddy current generator (13) forms a superconducting current eddy current by penetrating the superconductor through magnetic flux lines. The conductive slurry cooperates with the superconducting current eddy current to form a magnetic flux vortex. The multi-stage diversion mechanism includes a diversion tower (17); The diversion tower (17) is located at the valve port (2) of the uniform material tank (1). The diversion tower (17) forms a conical structure from the outside to the inside. The horizontal cross-sectional dimensions of the diversion tower (17) increase step by step from the outside to the inside. The opening (18-2) of the diversion tower (17) from the outside to the inside is connected with the conductive slurry to form a Sierpinski fractal hierarchical flow channel structure. The diversion tower (17) is fixedly connected to the inner wall (9) of the uniform feed tank by the supporting guard (19).

2. The conductive paste uniformizing device according to claim 1, characterized in that: The interior of the flow guide (23) is hollow, and the two open sides of the hollow structure of the flow guide (23) are sealed with a sealing layer (27). The outer wall of the flow guide (23) is integrally connected with an extension strip (25), which is used to cooperate with the eddy current conductive slurry for frictional contact.

3. The conductive paste uniformizing device according to claim 1, wherein: The inner wall of the uniform material tank (1) is provided with a double-layer structure, and a wiring cavity (8) is formed between the double-layer inner walls of the uniform material tank (1). The electrode wiring of the electro-ceramic array (10) is arranged in the wiring cavity (8). The electrode connector of the electro-ceramic array (10) faces outward along the inner wall (9) of the uniform material tank, and the connection end of the electro-ceramic array (10) faces inward along the inner wall (9) of the uniform material tank.

4. The conductive paste uniformizing device according to claim 3, wherein: An electro-ceramic array (10) is embedded in the inner wall (9) of the uniform material barrel. The three-dimensional acoustic standing wave field output by the electro-ceramic array (10) forms a shear circulation with the conductive slurry.

5. The conductive paste uniformizing device according to claim 1, wherein: The inner wall of the diversion channel (18-1) of the diversion tower (17) is provided with a flow guiding structure. The flow guiding structure is composed of a plurality of flow guiding protrusions distributed in an array. The flow guiding protrusions are integrally connected with the diversion tower (17) to form a flow guiding contact layer.

6. The conductive paste uniformizing device according to claim 1, wherein: The outer wall of the uniform material barrel (1) is fixedly installed with a shell sleeve (3), and a drive wheel (4) is installed on the outer wall of the shell sleeve (3). The outer ring of the drive wheel (4) is integrally connected with a meshing tooth (5). The meshing tooth (5) is used to cooperate with the external transmission meshing gear to complete the rotational movement of the uniform material barrel (1). The material equalization bucket (1) is provided with a drive wheel groove (14) and a keyway (15). The keyway (15) is connected to the inner ring drive key of the drive wheel (4). The bottom of the material equalization bucket (1) is provided with a base (16).

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