Coater and method for coating a photomask

Abstract

The application discloses a uniform gluing machine and a photo mask gluing method, and belongs to the field of uniform gluing machines. The uniform gluing machine comprises a machine table, a placing plate and a positioning mechanism. The placing plate is rotationally connected in the machine table and is used for placing a substrate. The positioning mechanism is installed on the placing plate and comprises a first positioning plate, a second positioning plate and a traction assembly. The first positioning plate and the second positioning plate are symmetrically and slidingly connected on the placing plate around the center of the placing plate. The first positioning plate and the second positioning plate are connected through the traction assembly. The traction assembly is used for driving the first positioning plate and the second positioning plate to move close to or away from each other. The first positioning plate is provided with soft first clamping protrusions used for clamping the substrate. The second positioning plate is provided with soft second clamping protrusions used for clamping the substrate. The application can ensure that the centrifugal forces of the substrate at all positions are the same when the substrate rotates, the photoresist thickness of the substrate is uniform, and the substrate is not easily clamped and damaged.

Description

Technical Field

[0001] This invention relates to the field of spin coater technology, and particularly to a spin coater and a photomask coating method. Background Technology

[0002] A spin coater is a widely used piece of equipment in microelectronics manufacturing, optical thin film fabrication, and nanomaterials research. It is primarily used to uniformly coat various liquid materials, such as photoresist and thin film materials, onto a substrate. The spin coater dispenses various adhesive solutions onto a high-speed rotating substrate, using centrifugal force to evenly coat the substrate. In photomask processes, photomask substrates need to be fabricated. Fabrication of the photomask substrate includes the step of coating the substrate with photoresist using a spin coater. To align the center of the substrate with the spin coater's rotation center and ensure consistent centrifugal force throughout the substrate during rotation, some existing spin coaters incorporate clamping fixtures on the substrate placement plate. These fixtures typically consist of multiple clamping blocks and springs, with the springs pushing the clamping blocks towards the center of the placement plate. However, the clamping force of multiple clamping blocks cannot be guaranteed to be consistent, resulting in poor alignment between the substrate center and the spin coater's rotation center, and the clamping blocks can easily damage the substrate. Summary of the Invention

[0003] This invention aims to solve at least one of the technical problems existing in the prior art. To this end, this invention proposes a spin coater and a photomask coating method, which solves the problems in the prior art where the alignment between the center of the substrate and the rotation center of the spin coater is poor, and the clamping blocks easily cause damage to the substrate.

[0004] A spin coater according to an embodiment of the present invention includes: Machine tool; A placement plate is rotatably connected inside the machine tool, and the placement plate is used to place the substrate. A positioning mechanism is mounted on the placement plate. The positioning mechanism includes a first positioning plate, a second positioning plate, and a traction component. The first positioning plate and the second positioning plate are slidably connected to the placement plate in a centrally symmetrical manner around the center of the placement plate. The first positioning plate and the second positioning plate are connected by the traction component. The traction component is used to move the first positioning plate and the second positioning plate closer to each other or further away from each other. The first positioning plate is provided with a first clamping protrusion that is soft and used to clamp the substrate. The second positioning plate is provided with a second clamping protrusion that is soft and used to clamp the substrate.

[0005] The spin coater according to embodiments of the present invention has at least the following beneficial effects: By incorporating a positioning mechanism on the placement plate, after the substrate is placed on the plate, the traction component moves the first and second positioning plates closer together, allowing them to clamp the substrate. The substrate is held until its center coincides with the rotation center of the placement plate, ensuring uniform centrifugal force throughout the substrate during rotation and guaranteeing a uniform photoresist coating thickness. The first positioning plate has a soft first clamping protrusion, and the second positioning plate has a soft second clamping protrusion, minimizing the risk of damage to the substrate.

[0006] According to some embodiments of the present invention, the placement plate is provided with a first slide rail and a second slide rail, a first slider is provided protruding below the first positioning plate, a second slider is provided protruding below the second positioning plate, the first slider is slidably connected in the first slide rail, and the second slider is slidably connected in the second slide rail.

[0007] According to some embodiments of the present invention, the traction assembly includes a traction pulley and a traction rope. The traction pulley is rotatably connected within the first slide rail and is located at one end of the first slider away from the center of the placement plate. One end of the traction rope is connected to the first slider, and the other end passes around the traction pulley and is connected to the second slider.

[0008] According to some embodiments of the present invention, the positioning mechanism further includes a spring disposed in the second slide rail, the spring abutting against the second slider, and the spring being used to drive the second slider closer to the center of the placement plate.

[0009] According to some embodiments of the present invention, the positioning mechanism further includes a first adjusting bolt, the placement plate is provided with a first threaded hole communicating with the second slide rail, the first adjusting bolt is threadedly connected to the first threaded hole, the spring is sleeved on the first adjusting bolt, and the second slider is provided with a clearance hole corresponding to the position of the first adjusting bolt.

[0010] According to some embodiments of the present invention, the positioning mechanism further includes a limiting member, which is detachably connected to the middle of the first adjusting bolt, and the two ends of the spring respectively abut against the limiting member and the second slider.

[0011] According to some embodiments of the present invention, a second threaded hole is provided on the first slider, the traction rope is connected to the first slider by a second adjusting bolt, the second adjusting bolt is threadedly connected to the second threaded hole, the opening direction of the second threaded hole faces the traction pulley, a third threaded hole is provided below the second slider, and the traction rope is connected to the second slider by a connecting bolt.

[0012] According to some embodiments of the present invention, a first stop is provided on the upper surface of the first positioning plate at one end away from the center of the placement plate, and a second stop is provided on the upper surface of the second positioning plate at one end away from the center of the placement plate.

[0013] According to some embodiments of the present invention, an air extraction device is also included, which is installed inside the machine base. The air extraction device has an air extraction port, and an air suction groove is provided on the upper surface of the placement plate. An air suction channel communicating with the air suction groove is provided inside the placement plate, and the air extraction port is connected to the air suction channel.

[0014] A photomask coating method according to an embodiment of the present invention includes the following steps: S1. Move the first and second stop edges to move the first and second positioning plates away from each other; S2. Place the substrate between the first positioning plate and the second positioning plate, loosen the first and second stop edges, and the first and second clamping protrusions abut against the substrate. S3. Drop photoresist onto the substrate; S4. Rotate the placement plate to evenly coat the photoresist onto the substrate.

[0015] The photomask coating method according to embodiments of the present invention has at least the following beneficial effects: By setting a positioning mechanism on the placement plate, after the substrate is placed on the placement plate, the traction component drives the first positioning plate and the second positioning plate to move closer to each other, so that the first positioning plate and the second positioning plate can clamp the substrate and clamp the substrate until the center of the substrate coincides with the rotation center of the placement plate, ensuring that the centrifugal force is the same at all parts of the substrate when it rotates, and ensuring that the thickness of the photoresist coating on the substrate is uniform.

[0016] Additional aspects and advantages of the invention will be set forth in part in the description which follows. Attached Figure Description

[0017] The present invention will be further described below with reference to the accompanying drawings and embodiments, wherein: Figure 1 This is a schematic diagram of the spin coater according to an embodiment of the present invention; Figure 2 This is a schematic diagram of the placement plate and positioning mechanism in the spin coater according to an embodiment of the present invention. Figure 1 ; Figure 3 This is a schematic diagram of the structure of the plate placed in the spin coater according to an embodiment of the present invention; Figure 4 This is a schematic diagram of the structure of the first positioning plate in the spin coater according to an embodiment of the present invention; Figure 5 This is a schematic diagram of the structure of the second positioning plate in the spin coater according to an embodiment of the present invention; Figure 6 This is a schematic diagram of the placement plate and positioning mechanism in the spin coater according to an embodiment of the present invention. Figure 2 ; Figure 7 for Figure 6 Enlarged view of point A in the middle; Figure 8 for Figure 6 Enlarged view of point B in the middle; Figure 9 This is a schematic diagram of the connection between the first adjusting bolt and the spring in the spin coater of this invention.

[0018] Icon labels: 100. Machine base; 110. Receiving cavity; 120. Machine base; 130. Cover plate; 200, Placement plate; 210, First slide rail; 220, Second slide rail; 221, First threaded hole; 230, Suction groove; 300, Positioning mechanism; 310, First positioning plate; 311, First clamping protrusion; 312, First slider; 3121, Second threaded hole; 3122, Second adjusting bolt; 313, First stop; 320, Second positioning plate; 321, Second clamping protrusion; 322, Second slider; 3221, Alternating hole; 3222, Third threaded hole; 3223, Connecting bolt; 323, Second stop; 330, Traction assembly; 331, Traction pulley; 332, Traction rope; 340, Spring; 350, First adjusting bolt; 351, Limiting component. Detailed Implementation

[0019] Embodiments of the present invention are described in detail below. Examples of these embodiments are shown in the accompanying drawings, wherein the same or similar reference numerals denote the same or similar elements or elements having the same or similar functions throughout. The embodiments described below with reference to the accompanying drawings are exemplary and are only used to explain the present invention, and should not be construed as limiting the present invention.

[0020] In the description of this invention, it should be understood that the terms "center," "longitudinal," "lateral," "length," "width," "thickness," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," "outer," "axial," "radial," and "circumferential," etc., indicating orientation or positional relationships, are based on the orientation or positional relationships shown in the accompanying drawings and are only for the convenience of describing the invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of the invention. Furthermore, features defined with "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of this invention, unless otherwise stated, "a plurality of" means two or more.

[0021] In the description of this invention, it should be noted that, unless otherwise explicitly specified and limited, the terms "installation," "connection," and "linking" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; and they can refer to the internal connection of two components. Those skilled in the art can understand the specific meaning of the above terms in this invention based on the specific circumstances.

[0022] Please see Figure 1 , Figure 2 and Figure 3 According to an embodiment of the present invention, a spin coater includes a machine base 100, a placement plate 200, and a positioning mechanism 300. The machine base 100 has a receiving cavity 110, and the placement plate 200 is rotatably connected within the receiving cavity 110, serving as a substrate placement unit. A driving mechanism is provided within the machine base 100, and is drively connected to the placement plate 200. The driving mechanism drives the placement plate 200 to rotate and includes a drive motor. The positioning mechanism 300 is mounted on the placement plate 200 and includes a first positioning plate 310, a second positioning plate 320, and a traction assembly 330. The first positioning plate 310 and the second positioning plate 320 are slidably connected to the placement plate 200, and are centrally symmetrically arranged around the center of the placement plate 200. The first positioning plate 310 and the second positioning plate 320 are connected by the traction assembly 330, which drives the first positioning plate 310 and the second positioning plate 320 to move closer to or further away from each other. The first positioning plate 310 is provided with a plurality of first clamping protrusions 311, which are used to clamp the substrate and are made of soft material. The second positioning plate 320 is provided with a plurality of second clamping protrusions 321, which are used to clamp the substrate and are made of soft material.

[0023] By providing a positioning mechanism 300 on the placement plate 200, after the substrate is placed on the placement plate 200, the traction component 330 drives the first positioning plate 310 and the second positioning plate 320 to move closer to each other, so that the first positioning plate 310 and the second positioning plate 320 can clamp the substrate, clamping the substrate until the center of the substrate coincides with the rotation center of the placement plate 200, ensuring that the centrifugal force is the same at all points on the substrate when rotating, and ensuring that the photoresist coating thickness of the substrate is uniform. The first positioning plate 310 is provided with a soft first clamping protrusion 311, and the second positioning plate 320 is provided with a soft second clamping protrusion 321, which makes it less likely to cause damage to the substrate.

[0024] In some embodiments, see Figure 2 , Figure 3 , Figure 4 and Figure 5 The placement plate 200 is provided with a first slide rail 210 and a second slide rail 220; a first slider 312 is provided protruding below the first positioning plate 310. The structures of the first positioning plate 310 and the second positioning plate 320 are similar. A second slider 322 is provided protruding below the second positioning plate 320; the first slider 312 is slidably connected in the first slide rail 210, and the second slider 322 is slidably connected in the second slide rail 220.

[0025] The length directions of the first slide rail 210 and the second slide rail 220 are the same. The first slide rail 210 can restrict the movement direction of the first slider 312, and the second slide rail 220 can restrict the sliding direction of the second slider 322. The first slider 312 and the second slider 322 can ensure that the movement direction of the first positioning plate 310 is fixed, thereby improving the positioning accuracy of the first positioning plate 310 and the second positioning plate 320 on the substrate.

[0026] In some embodiments, see Figure 6 , Figure 7 and Figure 8 The traction assembly 330 includes a traction pulley 331 and a traction rope 332. The traction pulley 331 is rotatably connected within the first slide rail 210 and is located at the end of the first slider 312 away from the center of the placement plate 200; one end of the traction rope 332 is connected to the first slider 312, and the other end passes around the traction pulley 331 and is connected to the second slider 322.

[0027] The first positioning plate 310 is pushed closer to the center of the placement plate 200. The first slider 312 pulls the second slider 322 closer to the center of the placement plate 200 through the traction rope 332, thereby driving the second positioning plate 320 closer to the center of the placement plate 200, so that the first positioning plate 310 and the second positioning plate 320 can move closer to each other, thereby enabling the first positioning plate 310 and the second positioning plate 320 to clamp the substrate.

[0028] Pulling the first positioning plate 310 away from the center of the placement plate 200 causes the first slider 312 to move away from the center of the placement plate 200. The second positioning plate 320 then moves the second slider 322 away from the center of the placement plate 200, thus reducing the distance between the traction pulley 331 and the first slider 312 and increasing the distance between the traction pulley 331 and the second slider 322. The traction rope 332 will not affect the movement of the first positioning plate 310 and the second positioning plate 320.

[0029] In some embodiments, see Figure 6 The positioning mechanism 300 also includes a spring 340, which is located in the second slide rail 220. The spring 340 abuts against the second slider 322 and is used to drive the second slider 322 closer to the center of the placement plate 200.

[0030] Spring 340 pushes the second slider 322 toward the center of the placement plate 200, thereby causing the first positioning plate 310 to move toward the center of the placement plate 200. The substrate is placed on the placement plate 200. First, the first positioning plate 310 is pulled, causing the first positioning plate 310 and the second positioning plate 320 to move away from each other. Releasing the first positioning plate 310, under the action of spring 340, the first positioning plate 310 and the second positioning plate 320 move closer together, clamping the substrate and achieving positioning.

[0031] In some embodiments, see Figure 8 and Figure 9 The positioning mechanism 300 also includes a first adjusting bolt 350. A first threaded hole 221 is provided on the placement plate 200, connecting to the second slide rail 220. The first adjusting bolt 350 is threadedly connected to the first threaded hole 221, passing through it. A spring 340 is sleeved on the first adjusting bolt 350, and a clearance hole 3221 is provided on the second slider 322 corresponding to the position of the first adjusting bolt 350. The first adjusting bolt 350 is used to position the spring 340 and the second slider 322, ensuring that the spring 340 and the slider are securely installed within the second slide rail 220.

[0032] In some embodiments, see Figure 8 and Figure 9 The positioning mechanism 300 also includes a limiting member 351, which is detachably connected to the middle of the first adjusting bolt 350. The two ends of the spring 340 abut against the limiting member 351 and the second slider 322, respectively. The first adjusting bolt 350 has a through hole in the middle. The limiting member 351 includes a cotter pin and a washer. The cotter pin passes through the through hole, and the washer is fitted onto the first adjusting bolt 350. The washer is located between the spring 340 and the cotter pin, and the spring 340 abuts against the washer.

[0033] Rotating the third adjusting bolt can adjust the length of the first adjusting bolt 350 extending into the second slide rail 220, adjust the position of the first washer, thereby compressing the spring 340, adjusting the tightness of the spring 340, thereby adjusting the pressure of the first positioning block and the second positioning block on the substrate, and also limiting the movement range of the second slider 322.

[0034] In some embodiments, participate Figure 4 and Figure 6The first slider 312 has a second threaded hole 3121. The traction rope 332 is connected to the first slider 312 via a second adjusting bolt 3122. The second adjusting bolt 3122 is threadedly connected to the second threaded hole 3121, and the opening of the second threaded hole 3121 faces the traction pulley 331. The second slider 322 has a third threaded hole 3222 below it. The traction rope 332 is connected to the second slider 322 via a connecting bolt 3223.

[0035] Rotating the second adjusting bolt 3122 adjusts the length of the first adjusting bolt 350 protruding from the first slider 312, thereby adjusting the tension of the traction rope 332. The distance from one end of the traction rope 332 to the first slider 312 can be adjusted, thus adjusting the initial interval between the first positioning plate 310 and the second positioning plate 320 to accommodate substrates of different sizes. The traction rope 332 is connected to the second slider 322 via a connecting bolt 3223, allowing for easy assembly and disassembly.

[0036] In some embodiments, see Figure 2 Two first clamping protrusions 311 are provided, located at opposite ends on the side of the first positioning plate 310 near the center of the placement plate 200. Two second clamping protrusions 321 are provided, located at opposite ends on the side of the second positioning plate 320 near the center of the placement plate 200.

[0037] The two first clamping protrusions 311 and the two second clamping protrusions 321 can perform four-point positioning of the substrate, with high positioning accuracy. The first clamping protrusions 311 and the second clamping protrusions 321 are toothed, which makes the contact area between the first positioning plate 310 and the substrate smaller, and can reduce the influence of the first positioning plate 310 on the adhesive coating at the edge of the substrate.

[0038] In some embodiments, see Figure 2 The first positioning plate 310 has a protruding first stop 313 on its upper surface, located at the end of the first positioning plate 310 furthest from the center of the placement plate 200. The second positioning plate 320 has a protruding second stop 323 on its upper surface, located at the end of the second positioning plate 320 furthest from the center of the placement plate 200. The first stop 313 allows for easy movement of the first positioning plate 310 and also provides some protection against splattered photoresist, facilitating cleaning. The second stop 323 allows for easy movement of the second positioning plate 320 and also provides some protection against splattered photoresist, facilitating cleaning.

[0039] In some embodiments, see Figure 1 and Figure 2 The machine base 100 includes a base 120 and a cover plate 130, which can be opened to cover the base 120.

[0040] The spin coater also includes a vacuum pump and a dispensing mechanism. The vacuum pump is a vacuum pump, and the dispensing mechanism is located above the placement plate 200. The dispensing mechanism is used to dispense photoresist onto the substrate. The drive motor, vacuum pump, and dispensing mechanism are all existing technologies. The vacuum pump is installed in the accommodating cavity 110 and has a vacuum port. The upper surface of the placement plate 200 is provided with a suction groove 230, and the placement plate 200 has a suction channel communicating with the suction groove 230. The vacuum port communicates with the suction channel. The placement plate 200 is disk-shaped. The suction groove 230 includes multiple circular grooves coaxially arranged with the placement plate 200 and multiple strip grooves arranged radially along the placement plate 200. The multiple strip grooves communicate with the multiple circular grooves. After the substrate is positioned, the vacuum pump draws air, creating a negative pressure at the suction groove 230, which adsorbs the substrate onto the placement plate 200.

[0041] See Figure 1 and Figure 2 The photomask coating method according to an embodiment of the present invention includes the following steps: S1. Move the first stop 313 and the second stop 323 to move the first positioning plate 310 and the second positioning plate 320 away from each other. Under the constraint of the traction rope 332, the first positioning plate 310 and the second positioning plate 320 move equal distances.

[0042] S2. Place the substrate between the first positioning plate 310 and the second positioning plate 320. Release the first stop 313 and the second stop 323, and the first clamping protrusion 311 and the second clamping protrusion 321 abut against the substrate. Release the first stop 313 and the second stop 323, and under the action of the springs 340 and 340, the first positioning plate 310 and the second positioning plate 320 move closer to each other, clamping the substrate and achieving positioning. At the same time, under the constraint of the traction rope 332, the first positioning plate 310 and the second positioning plate 320 move equal distances, ensuring that the distance from the first positioning plate 310 to the center of the placement plate 200 is equal to the distance from the second positioning plate 320 to the center of the placement plate 200.

[0043] S3. Apply photoresist to the substrate. The dispensing mechanism dispenses the photoresist, ensuring a uniform distribution on the substrate. Static or dynamic dispensing methods can be used, with the amount of photoresist determined based on its viscosity and the size of the substrate.

[0044] S4. The drive mechanism rotates the placement plate 200, causing the photoresist to be evenly coated on the substrate. The operation buttons on the operating table 100 activate the drive motor, which rotates the placement plate 200. During high-speed rotation, the photoresist spreads onto the substrate under centrifugal force, forming a thin layer.

[0045] By setting a positioning mechanism 300 on the placement plate 200, after the substrate is placed on the placement plate 200, the traction component 330 drives the first positioning plate 310 and the second positioning plate 320 to move closer to each other, so that the first positioning plate 310 and the second positioning plate 320 can clamp the substrate and clamp the substrate until the center of the substrate coincides with the rotation center of the placement plate 200, ensuring that the centrifugal force is the same at all points of the substrate when it rotates, and ensuring that the thickness of the photoresist coating on the substrate is uniform.

[0046] In the description of this specification, the references to terms such as "one embodiment," "some embodiments," "illustrative embodiment," "example," "specific example," or "some examples," etc., indicate that a specific feature, structure, material, or characteristic described in connection with that embodiment or example is included in at least one embodiment or example of the invention. In this specification, the illustrative expressions of the above terms do not necessarily refer to the same embodiment or example. Furthermore, the specific features, structures, materials, or characteristics described may be combined in any suitable manner in one or more embodiments or examples.

[0047] Although embodiments of the invention have been shown and described, those skilled in the art will understand that various changes, modifications, substitutions and alterations can be made to these embodiments without departing from the principles and spirit of the invention, the scope of which is defined by the claims and their equivalents.

Claims

1. A spin coater, characterized in that, include: Machine tool; A placement plate is rotatably connected inside the machine tool, and the placement plate is used to place the substrate. A positioning mechanism is mounted on the placement plate. The positioning mechanism includes a first positioning plate, a second positioning plate, and a traction component. The first positioning plate and the second positioning plate are slidably connected to the placement plate in a centrally symmetrical manner around the center of the placement plate. The first positioning plate and the second positioning plate are connected by the traction component. The traction component is used to drive the first positioning plate and the second positioning plate to move closer to or further away from each other. The first positioning plate is provided with a first clamping protrusion that is soft and used to clamp the substrate. The second positioning plate is provided with a second clamping protrusion that is soft and used to clamp the substrate. The placement plate is provided with a first slide rail and a second slide rail. A first slider is provided protruding below the first positioning plate, and a second slider is provided protruding below the second positioning plate. The first slider is slidably connected in the first slide rail, and the second slider is slidably connected in the second slide rail. The traction assembly includes a traction pulley and a traction rope. The traction pulley is rotatably connected in the first slide rail and is located at the end of the first slider away from the center of the placement plate. One end of the traction rope is connected to the first slider, and the other end passes around the traction pulley and is connected to the second slider. The positioning mechanism also includes a spring, which is disposed in the second slide rail and abuts against the second slider. The spring is used to drive the second slider closer to the center of the placement plate. The positioning mechanism further includes a first adjusting bolt, the placement plate is provided with a first threaded hole communicating with the second slide, the first adjusting bolt is threadedly connected to the first threaded hole, the spring is sleeved on the first adjusting bolt, and the second slider is provided with a clearance hole corresponding to the position of the first adjusting bolt.

2. The spin coater according to claim 1, characterized in that, The positioning mechanism further includes a limiting member, which is detachably connected to the middle of the first adjusting bolt, and the two ends of the spring abut against the limiting member and the second slider, respectively.

3. The spin coater according to claim 1, characterized in that, The first slider is provided with a second threaded hole, and the traction rope is connected to the first slider through a second adjusting bolt. The second adjusting bolt is threadedly connected to the second threaded hole, and the opening direction of the second threaded hole faces the traction pulley. The second slider is provided with a third threaded hole below it, and the traction rope is connected to the second slider through a connecting bolt.

4. The spin coater according to claim 1, characterized in that, The upper surface of the first positioning plate has a first stop edge protruding from one end away from the center of the placement plate, and the upper surface of the second positioning plate has a second stop edge protruding from one end away from the center of the placement plate.

5. The spin coater according to claim 1, characterized in that, It also includes an air extraction device, which is installed inside the machine base. The air extraction device has an air extraction port. An air suction groove is provided on the upper surface of the placement plate. An air suction channel is provided inside the placement plate, which communicates with the air suction groove. The air extraction port is connected to the air suction channel.

6. A method for photomask coating using a spin coater as described in any one of claims 1-5, characterized in that, Includes the following steps: S1. Move the first and second stop edges to move the first and second positioning plates away from each other; S2. Place the substrate between the first positioning plate and the second positioning plate, loosen the first and second stop edges, and the first and second clamping protrusions abut against the substrate. S3. Drop photoresist onto the substrate; S4. Rotate the placement plate to evenly coat the photoresist onto the substrate.

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