一种超精密蓝宝石晶体光学基板的加工方法
By optimizing the processing method of sapphire crystal optical substrates through rapid grinding and polishing, annealing, acid etching, flexible polishing and ion beam shaping, the problems of long processing cycle and low surface accuracy are solved, the processing efficiency and optical quality are improved, and it is suitable for high-end applications.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- SUZHOU LEIN OPTICAL TECHNOLOGY CO LTD
- Filing Date
- 2025-08-29
- Publication Date
- 2026-07-17
AI Technical Summary
Existing methods for processing ultra-precision sapphire crystal optical substrates suffer from problems such as long processing cycles, difficulty in improving surface accuracy, deterioration of surface roughness after ion beam shaping, and surface distortion of square substrates, which affect optical quality, especially in high-end applications.
Rapid grinding and polishing combined with high-temperature precision annealing and acid etching processes are used to eliminate mechanical stress. Then, flexible disc polishing and ring polishing replication processes are used to improve surface shape accuracy. Finally, ion beam local shaping and chemical mechanical polishing are used to improve surface roughness.
It significantly improves the processing efficiency and surface accuracy of sapphire substrates, improves surface roughness, solves the shortcomings of existing technologies that make it difficult to balance efficiency and accuracy, improves optical quality, and is suitable for high-end fields such as high-power laser systems and semiconductor equipment.
Smart Images
Figure CN120772952B_ABST
Abstract
Citation Information
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