一种光学测量系统
By designing a compact optical measurement system, the problems of low integration and poor measurement stability of existing optical measurement systems in the semiconductor field are solved, enabling real-time monitoring and efficient film thickness measurement.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- RAINTREE SCI INSTR SHANGHAI
- Filing Date
- 2024-02-02
- Publication Date
- 2026-07-17
AI Technical Summary
Existing optical measurement systems in the semiconductor field suffer from problems such as low system integration, inability to monitor the measurement process in real time, and poor measurement stability.
An optical measurement system was designed, including an optical path conversion unit, an optical measurement module, and an optical imaging module. The optical path is designed to achieve compactness and integration. Combined with an autofocus module, the system enables real-time monitoring and stability of the measurement process.
This improved the system's integration and measurement efficiency, reduced optical path complexity, enabled real-time observation and efficient measurement of film thickness and other optical parameters, and enhanced the stability and accuracy of the measurement.
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Figure CN120787306B_ABST