Substrate processing apparatus and substrate processing method

Abstract

[Problem] To provide a technique for efficiently improving the cleanliness of a processing liquid in a circulation system. [Solution] A substrate processing apparatus comprises: a container for storing a processing liquid; a circulation line connected to the container; a pump which is provided in the circulation line and which drives the processing liquid so that the processing liquid circulates in a circulation circuit formed by the container and the circulation line; a heater that heats the processing liquid flowing through the circulation line; a first filter that filters the processing liquid flowing through the circulation line; a processing unit that processes the substrate using the processing liquid supplied from the circulation line; a filtration line that takes out a portion of the processing liquid circulating in the circulation circuit from the circulation circuit and causes the taken-out processing liquid to flow back to the circulation circuit; a cooler which is provided in the filtration line and cools the processing liquid flowing through the filtration line; and at least one second filter which is provided on the downstream side of the cooler in the filtration line and which filters the treatment liquid cooled by the cooler before the treatment liquid returns to the circulation circuit.

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