A peeling film rotating device and a double-beam distribution system

Abstract

This invention relates to the field of particle acceleration technology, and more particularly to a stripping membrane rotation device and a dual-beam distribution system. The stripping membrane rotation device includes a housing, a rotating disk, and a drive mechanism. The housing has a vacuum chamber, and the rotating disk is disposed within the vacuum chamber and rotatably connected to the vacuum housing. The rotating disk has mounting holes and through holes arranged radially along the rotating disk. The stripping membrane is installed in the mounting holes. The vacuum housing has a first beam pipe and a second beam pipe communicating with the vacuum chamber. The first and second beam pipes are respectively located on opposite sides of the rotating disk along its axial direction, facing the mounting holes. The distance between the mounting holes and the center of the rotating disk is equal to the distance between the through holes and the center of the rotating disk. The rotating disk is located at the output end of the drive mechanism, which drives the rotating disk to rotate. This stripping membrane rotation device has a simple structure, occupies little space, and reduces production and operating costs.

Description

Technical Field

[0001] This invention relates to the field of particle acceleration technology, and in particular to a stripping membrane rotation device and a dual-beam distribution system. Background Technology

[0002] Particle accelerators are widely used in scientific research, industrial applications, medical technology, energy development, and national defense. They can be divided into linear accelerators and circular accelerators. In a linear accelerator, a portion of the beam is deflected upwards for target production of isotopes; the other portion is deflected downwards, stripped into protons by the main stripping membrane in the injection region, and then injected into a fast-cycle synchrotron, thus achieving a dual-purpose function. Protons, as relatively stable particles, are often used as probes, accelerated and then used to collide with other substances to study their structure and fundamental properties. Radioactive isotopes, as special therapeutic carriers in nuclear medicine, can utilize radiation to provide diagnostic information on the function of specific organs and to provide treatment.

[0003] Currently, a common method for achieving dual-purpose linear accelerators is to utilize deflecting magnets. By precisely matching the frequency of the pulsed power supply, the magnetic field direction is continuously reversed, thus splitting the negative hydrogen beam generated by the linear accelerator into two to meet different application requirements. However, during the transmission of the negative hydrogen beam, significant gas stripping occurs. When the negative hydrogen beam is deflected upwards or downwards, some protons inevitably propagate in the opposite direction. Existing technologies typically employ a high-repetition-frequency rotating waste beam station to collect and process these reverse-propagating protons, ensuring the stable operation and safety of the accelerator system.

[0004] However, setting up a rotating waste beam station is both space-consuming and technically challenging; moreover, it is quite expensive, resulting in high operating costs. Furthermore, the pulse power supply for the pulse deflection magnets in existing technologies is not only technically very difficult to use, but also significantly more expensive.

[0005] Therefore, there is an urgent need for a stripping film rotation device and a dual-beam distribution system to solve the above problems. Summary of the Invention

[0006] The purpose of this invention is to provide a peeling film rotating device and a dual-beam distribution system, which has a simple structure, occupies little space, and reduces production and usage costs.

[0007] To achieve the above objectives, the following technical solution is provided:

[0008] A peeling film rotating device includes:

[0009] The vacuum chamber is equipped with a vacuum chamber.

[0010] A rotating disk is disposed within the vacuum chamber and rotatably connected to the vacuum housing. The rotating disk has mounting holes and through holes arranged radially along the rotating disk. A release film is installed in the mounting holes. The vacuum housing is provided with a first beam pipe and a second beam pipe communicating with the vacuum chamber. The first beam pipe and the second beam pipe are respectively disposed on both sides of the axial direction of the rotating disk. The first beam pipe and the second beam pipe are directly opposite the mounting holes. The distance between the mounting holes and the center of the rotating disk and the distance between the through holes and the center of the rotating disk are equal.

[0011] A drive mechanism is provided, wherein the rotating disk is disposed at the output end of the drive mechanism, and the drive mechanism is used to drive the rotating disk to rotate.

[0012] As an optional solution, there are multiple mounting holes, which are arranged at intervals along the circumference of the rotating disk, and the through holes are provided in a one-to-one correspondence with the mounting holes.

[0013] As an alternative, one of the through holes may have a different shape than the other through holes.

[0014] As an optional solution, the enclosure includes:

[0015] A housing, one end of which has an opening.

[0016] A cover is provided over the opening, and the cover and the housing together form the vacuum chamber. The housing and the cover are detachably connected.

[0017] As an optional solution, the peeling film rotating device further includes:

[0018] The base plate and the reinforcing member are provided, with the housing disposed on the base plate and the reinforcing member connected to the base plate and / or the housing.

[0019] As an optional solution, the peeling film rotating device further includes:

[0020] The mounting plate and multiple limiting mechanisms are provided. The base plate is disposed on the mounting plate, and the limiting mechanisms are disposed on the mounting plate. The multiple limiting mechanisms are arranged at intervals along the circumference of the base plate. The limiting mechanisms can abut against the base plate to limit the relative position of the base plate and the mounting plate.

[0021] As an optional solution, the limiting mechanism includes:

[0022] A limiting seat and a limiting member are provided. The limiting seat is disposed on the mounting plate, and the limiting member is threadedly connected to the limiting seat and can abut against the base plate.

[0023] As an optional solution, the peeling film rotating device further includes a support base, and the mounting plate is disposed on the support base. The vertical distance between the mounting plate and the support base is adjustable.

[0024] As an optional solution, the peeling film rotating device further includes an adjustment mechanism, which is disposed between the mounting plate and the support base, and the adjustment mechanism includes:

[0025] A mounting base and an adjusting component, one of which is connected to the support base, and the other is connected to the mounting plate. The adjusting component is threadedly connected to the mounting base. The adjusting mechanism can be either manual or electric.

[0026] The dual-beam distribution system includes a linear accelerator, a deflecting magnet, and the aforementioned stripping film rotating device. The linear accelerator is located upstream of the stripping film rotating device, and the deflecting magnet is located downstream of the stripping film rotating device.

[0027] Compared with the prior art, the beneficial effects of the present invention are as follows:

[0028] The stripping membrane rotation device provided by this invention uses a rotation drive mechanism to drive a rotating disk. A negative hydrogen beam generated by a linear accelerator enters the vacuum chamber through a first beam channel. When the negative hydrogen beam passes through a through-hole, it flows directly through the rotating disk, exits through a second beam channel, and is then deflected downwards by a deflecting magnet, preparing for injection into a fast-cycle synchrotron, where it is stripped into protons by the main stripping membrane. When the negative hydrogen beam passes through a mounting hole containing the stripping membrane, it is stripped into a positively charged proton beam, flows out through the second beam channel, is then deflected upwards by a deflecting magnet, and is then used in an isotope device. The stripping membrane rotation device provided in this embodiment allows for the periodic upward transmission of the negative hydrogen beam and the downward transmission of the proton beam by supplying a DC power supply to the deflecting magnet. Compared to existing technologies that require a rotating waste beam station, pulsed magnets, and a power supply, this device offers advantages such as simple structure, small footprint, and reduced production and operating costs.

[0029] The dual-beam distribution system provided by this invention, by applying the above-mentioned peeling film rotation device, can occupy less space and reduce production and usage costs. Attached Figure Description

[0030] To more clearly illustrate the technical solutions in the embodiments of the present invention, the accompanying drawings used in the description of the embodiments of the present invention will be briefly introduced below. Obviously, the accompanying drawings described below are only some embodiments of the present invention. For those skilled in the art, other drawings can be obtained based on the content of the embodiments of the present invention and these drawings without creative effort.

[0031] Figure 1 This is a first structural schematic diagram of the peeling film rotating device provided in an embodiment of the present invention;

[0032] Figure 2 This is a second structural schematic diagram of the peeling film rotating device provided in an embodiment of the present invention;

[0033] Figure 3 This is a partial structural schematic diagram of the peeling film rotating device provided in an embodiment of the present invention;

[0034] Figure 4 This is a schematic diagram of the structure of the rotating disk provided in an embodiment of the present invention;

[0035] Figure 5 This is a schematic diagram of beam spot motion distance provided in an embodiment of the present invention.

[0036] Figure label:

[0037] 100. Peeling film rotating device;

[0038] 10. Housing; 1001. Vacuum chamber; 11. Shell; 12. Cover; 121. Connecting hole; 13. Lifting ring;

[0039] 20. Rotary disk; 21. Mounting hole; 22. Through hole;

[0040] 30. Drive mechanism;

[0041] 41. First beam channel; 42. Second beam channel;

[0042] 51. Base plate; 52. Reinforcing components;

[0043] 60. Mounting plate;

[0044] 70. Limiting mechanism; 71. Limiting seat; 72. Limiting component;

[0045] 80. Adjustment mechanism; 81. Mounting base; 82. Adjustment component;

[0046] 90. Support base;

[0047] 200. Peel-off membrane. Detailed Implementation

[0048] To make the above-mentioned objectives, features, and advantages of this application more apparent and understandable, the specific embodiments of this application are described in detail below with reference to the accompanying drawings. Many specific details are set forth in the following description to provide a thorough understanding of this application. However, this application can be implemented in many other ways different from those described herein, and those skilled in the art can make similar modifications without departing from the spirit of this application. Therefore, this application is not limited to the specific embodiments disclosed below.

[0049] In the description of this application, it should be understood that if terms such as "center", "longitudinal", "lateral", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", "axial", "radial", "circumferential" appear, these terms indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings, and are only for the convenience of describing this application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this application.

[0050] Furthermore, where the terms "first" and "second" appear, these terms are for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Thus, a feature defined with "first" or "second" may explicitly or implicitly include at least one of that feature. In the description of this application, where the term "multiple" appears, "multiple" means at least two, such as two, three, etc., unless otherwise explicitly specified.

[0051] In this application, unless otherwise expressly specified and limited, the terms "installation," "connection," "joining," and "fixing," etc., should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral part; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; they can refer to the internal communication of two components or the interaction between two components, unless otherwise expressly limited. Those skilled in the art can understand the specific meaning of the above terms in this application based on the specific circumstances.

[0052] In this application, unless otherwise expressly specified and limited, the use of descriptions such as "above" or "below" the second feature indicates that the first and second features are in direct contact or indirect contact via an intermediate medium. Furthermore, "above," "on top of," and "over" the second feature can mean that the first feature is directly above or diagonally above the second feature, or simply that the first feature is at a higher horizontal level than the second feature. Similarly, "below," "below," and "under" the second feature can mean that the first feature is directly below or diagonally below the second feature, or simply that the first feature is at a lower horizontal level than the second feature.

[0053] It should be noted that if an element is referred to as being "fixed to" or "set on" another element, it can be directly on the other element or there may be an intervening element. If an element is considered to be "connected to" another element, it can be directly connected to the other element or there may be an intervening element. If so, the terms "vertical," "horizontal," "upper," "lower," "left," "right," and similar expressions used in this application are for illustrative purposes only and do not represent the only possible implementation.

[0054] This embodiment provides a dual-beam distribution system, which includes a linear accelerator and a deflecting magnet. The linear accelerator is used to generate a negative hydrogen beam, and the deflecting magnet continuously reverses the magnetic field direction by precisely matching the frequency of the pulse power supply, thereby splitting the negative hydrogen beam generated by the linear accelerator into two parts. One part of the beam is deflected upward by the deflecting magnet and used for isotope production in an isotope device; the other part of the beam is deflected downward by the deflecting magnet and is prepared to be injected into a fast-cycle synchrotron to be converted into protons.

[0055] During the transmission of a negative hydrogen beam, a significant amount of gas stripping occurs. When the negative hydrogen beam deflects upwards or downwards, some protons inevitably propagate in the opposite direction. Existing technologies typically employ a high-repetition-rate rotating waste beam station to collect and process these reverse-propagating protons, ensuring the stable operation and safety of the accelerator system.

[0056] However, setting up a rotating waste beam station is both space-consuming and technically challenging; moreover, it is quite expensive, resulting in high operating costs. Furthermore, the pulse power supply for the pulse deflection magnets in existing technologies is not only technically very difficult to use, but also significantly more expensive.

[0057] To solve the above problems, such as Figures 1-3As shown, the dual-beam distribution system provided in this embodiment also includes a stripping film rotating device 100, a linear accelerator is disposed upstream of the stripping film rotating device 100, and a deflection magnet is disposed downstream of the stripping film rotating device 100. Specifically, the peeling film rotating device 100 includes a housing 10, a rotating disk 20, and a driving mechanism 30. The housing 10 is provided with a vacuum chamber 1001. The rotating disk 20 is disposed in the vacuum chamber 1001 and is rotatably connected to the vacuum housing 10. The rotating disk 20 has mounting holes 21 and through holes 22, which are arranged radially along the rotating disk 20. The peeling film 200 is installed in the mounting holes 21. The vacuum housing 10 is provided with a first beam pipe 41 and a second beam pipe 42 communicating with the vacuum chamber 1001. The first beam pipe 41 and the second beam pipe 42 are respectively disposed on both sides of the axial direction of the rotating disk 20. The first beam pipe 41 and the second beam pipe 42 are directly opposite the mounting holes 21. The distance between the mounting holes 21 and the center of the rotating disk 20 and the distance between the through holes 22 and the center of the rotating disk 20 are equal. The rotating disk 20 is disposed at the output end of the driving mechanism 30, which is used to drive the rotating disk 20 to rotate. The drive mechanism 30 can be an existing motor or hydraulic cylinder, etc.

[0058] The deflecting magnet is a trident deflecting magnet. The structure and working principle of the trident deflecting magnet and the linear accelerator are existing technologies and will not be described in detail in this embodiment.

[0059] During operation, the rotary drive mechanism 30 drives the rotating disk 20 to rotate. The negative hydrogen beam generated by the linear accelerator enters the vacuum chamber 1001 through the first beam pipe 41. When the negative hydrogen beam passes through the through hole 22, it directly passes through the rotating disk 20, flows out through the second beam pipe 42, and is then deflected downwards by the deflection magnet, preparing to be injected into the fast-cycle synchrotron and stripped into protons by the main stripping membrane. When the negative hydrogen beam passes through the mounting hole 21 containing the stripping membrane 200, it is stripped into a positively charged proton beam, flows out through the second beam pipe 42, is then deflected upwards by the deflection magnet, and is then used in the isotope device. The stripping membrane rotating device 100 provided in this embodiment, with the deflection magnet powered by a DC power supply, can realize the periodic upward transmission of the negative hydrogen beam and the downward transmission of the proton beam. Compared with the prior art, which requires the setting of a rotating waste beam station, pulsed magnets, and power supply, it has the advantages of simple structure, small space occupation, and reduced production and operating costs.

[0060] like Figure 3 and Figure 4As shown, in this embodiment, there are ten mounting holes 21, which are arranged at intervals along the circumference of the rotating disk 20. The through holes 22 correspond one-to-one with the mounting holes 21. In normal operation, after the negative hydrogen beam and the rotating stripping membrane 200 speed stabilize, only one stripping membrane 200 and its corresponding through hole 22 are used in one mounting hole 21, while the other stripping membranes 200 and through holes 22 remain idle. When a stripping membrane 200 is damaged or needs replacement, it can be readjusted to allow the negative hydrogen beam to pass through the mounting holes 21 of other spare stripping membranes 200. This not only effectively avoids negative hydrogen beam loss but also improves the stability of the stripping membrane rotating device 100. In other embodiments, the number of mounting holes 21 can be one, two, three, or more, and the number of through holes 22 corresponds one-to-one with the number of mounting holes 21.

[0061] Optionally, one of the through holes 22 has a different shape than the other through holes 22. This arrangement provides a reference for the positions of each mounting hole 21 and through hole 22. The different shapes of the through holes 22 mark the relative positions of each through hole 22 and mounting hole 21, allowing for quick identification of the location of a peeling membrane 200 when it needs to be replaced.

[0062] Optionally, the housing 10 includes a shell 11 and a cover 12. One end of the shell 11 has an opening, and the cover 12 is placed over the opening. The cover 12 and the shell 11 together form a vacuum chamber 1001. The shell 11 and the cover 12 are detachably connected, which facilitates the quick assembly and disassembly of the shell 11 and the cover 12, thereby facilitating the installation of the rotating disk 20.

[0063] Optionally, the cover 12 is provided with a connecting hole 121, which is connected to the vacuum chamber 1001. There are two connecting holes 121. One connecting hole 121 is used to connect to a negative pressure device to evacuate the vacuum chamber 1001; the other connecting hole 121 is a monitoring port to monitor the operation of the rotating disk 20 in the vacuum chamber 1001.

[0064] Optionally, the peeling film rotating device 100 also includes a support base 90, on which a mounting plate 60 is disposed, and the support base 90 is used to support the housing 10.

[0065] Optionally, the housing 10 also includes a lifting ring 13, which is disposed on the housing 11. By providing the lifting ring 13, the lifting device can be engaged with the lifting ring 13, thereby enabling the lifting, transfer and other actions of the housing 10 to be carried out by the lifting device.

[0066] Optionally, the peeling film rotating device 100 also includes a base plate 51 and a reinforcing member 52. The housing 10 is disposed on the base plate 51, and the reinforcing member 52 is connected to the base plate 51 and / or the housing 10 to improve the strength of the housing 10.

[0067] Optionally, the peeling film rotating device 100 also includes a mounting plate 60 and a plurality of limiting mechanisms 70. The base plate 51 is disposed on the mounting plate 60, and the limiting mechanisms 70 are disposed on the mounting plate 60. The plurality of limiting mechanisms 70 are arranged at intervals along the circumference of the base plate 51. The limiting mechanisms 70 can abut against the base plate 51 to limit the relative position of the base plate 51 and the mounting plate 60 and prevent the housing 10 from shifting.

[0068] Specifically, the limiting mechanism 70 includes a limiting seat 71 and a limiting member 72. The limiting seat 71 is mounted on the mounting plate 60, and the limiting member 72 is threadedly connected to the limiting seat 71 and can abut against the base plate 51. The limiting member 72 abuts against the base plate 51 by adjusting the amount of each limiting member 72 screwed into the thread of the limiting seat 71. The structure is simple and the adjustment is convenient.

[0069] Optionally, the vertical dimension of the mounting plate 60 relative to the support base 90 is adjustable to adjust the vertical position of the housing 10, thereby enabling the negative hydrogen beam to accurately enter the first beam pipe 41.

[0070] Specifically, the peeling film rotating device 100 also includes an adjusting mechanism 80, which is disposed between the mounting plate 60 and the support base 90. The adjusting mechanism 80 includes a mounting base 81 and an adjusting member 82. One of the mounting base 81 and the adjusting member 82 is connected to the support base 90, and the other is connected to the mounting plate 60. The adjusting member 82 is threadedly connected to the mounting base 81. The vertical distance between the mounting plate 60 and the support base 90 is adjusted by adjusting the amount of the adjusting member 82 screwed into the thread of the mounting base 81, thereby adjusting the position of the housing 10 in the vertical direction. The structure is simple and the adjustment is convenient.

[0071] This embodiment considers the high-precision phase matching between the negative hydrogen beam and the stripping membrane rotation device 100. The pulse width of the negative hydrogen beam generated by the linear accelerator, i.e., the single pulse of the negative hydrogen beam, has a certain length, therefore requiring a certain amount of time to pass through the stripping membrane rotation device 100. While the negative hydrogen beam passes through the rotating disk 20, the rotating disk 20 also maintains its rotational motion; therefore, both the mounting hole 21 and the stripping membrane 200 have a certain lateral width, meaning the mounting hole 21 extends circumferentially along the rotating disk 20. The lateral width of the mounting hole 21 and the stripping membrane 200 is matched with the negative hydrogen beam pulse width, the distance from the mounting hole 21 to the center of the rotating disk 20, and the rotational speed of the rotating disk 20. Specifically, as... Figure 5As shown, the product of the distance from the mounting hole 21 to the center of the rotating disk 20 and the negative hydrogen beam pulse width and angular frequency is the beam spot movement distance. The maximum dimension of the mounting hole 21 in the circumferential direction of the rotating disk 20 is the beam spot movement distance plus the lateral dimension of the negative hydrogen beam plus the safety consideration distance.

[0072] Because the stripping membrane rotating device 100 rotates when the negative hydrogen beam passes through the stripping membrane 200, the area through which the negative hydrogen beam passes through the stripping membrane 200 increases significantly, thus greatly reducing the peak temperature of the stripping membrane 200. Furthermore, since the negative hydrogen beam passes through the stripping membrane 200 only once, the peak temperature on the stripping membrane 200 does not exceed 600K, fully meeting the operational requirements.

[0073] The stripping membrane rotation device 100 of this embodiment takes into account the requirement of high repetition frequency. Specifically, the frequency of the negative hydrogen beam of the linear accelerator is 50 Hz, and in order to match the 50 Hz of the linear accelerator, the rotation speed of the stripping membrane rotation device 100 needs to reach 1500 rpm.

[0074] Note that in the description of this specification, references to terms such as "some embodiments," "other embodiments," etc., indicate that a specific feature, structure, material, or characteristic described in connection with that embodiment or example is included in at least one embodiment or example of the present invention. In this specification, the illustrative expressions of the above terms do not necessarily refer to the same embodiment or example. Furthermore, the specific features, structures, materials, or characteristics described may be combined in any suitable manner in one or more embodiments or examples.

[0075] The above description is merely a preferred embodiment of the present invention and the technical principles employed. Those skilled in the art will understand that the present invention is not limited to the specific embodiments described herein, and various obvious changes, readjustments, and substitutions can be made without departing from the scope of protection of the present invention. Therefore, although the present invention has been described in detail through the above embodiments, the present invention is not limited to the above embodiments, and may include many other equivalent embodiments without departing from the concept of the present invention, the scope of which is determined by the scope of the appended claims.

Claims

1. A dual-beam distribution system, comprising a linear accelerator and a deflecting magnet, characterized in that, It also includes a peeling film rotating device, which comprises: The housing (10) is equipped with a vacuum chamber (1001); A rotating disk (20) is disposed in the vacuum chamber (1001) and rotatably connected to the housing (10). The rotating disk (20) has a mounting hole (21) and a through hole (22). The mounting hole (21) and the through hole (22) are arranged radially along the rotating disk (20). A peeling membrane (200) is installed in the mounting hole (21). The housing (10) is provided with a first beam pipe (41) and a second beam pipe (42) communicating with the vacuum chamber (1001). The first beam pipe (41) and the second beam pipe (42) are respectively disposed on both sides of the axial direction of the rotating disk (20). The distance between the mounting hole (21) and the center of the rotating disk (20) and the distance between the through hole (22) and the center of the rotating disk (20) are equal. The drive mechanism (30) has the rotating disk (20) disposed at its output end, and the drive mechanism (30) is used to drive the rotating disk (20) to rotate. The linear accelerator is located upstream of the peeling film rotating device, and the deflection magnet is located downstream of the peeling film rotating device. When the negative hydrogen beam passes through the through hole (22), the through hole (22) is directly opposite the first beam pipe (41) and the second beam pipe (42), which allows the negative hydrogen beam to pass directly through the rotating disk, flow out through the second beam pipe (42), and then be deflected downward by the deflecting magnet. When the negative hydrogen beam passes through the mounting hole (21), the mounting hole (21) is directly opposite the first beam pipe (41) and the second beam pipe (42). The negative hydrogen beam will be stripped into a positively charged proton beam, which flows out through the second beam pipe (42) and is then deflected upward by the deflecting magnet.

2. The dual-beam distribution system according to claim 1, characterized in that, The number of mounting holes (21) is multiple, and the multiple mounting holes (21) are arranged at intervals along the circumference of the rotating disk (20). The through holes (22) are set one-to-one with the mounting holes (21).

3. The dual-beam distribution system according to claim 2, characterized in that, One of the through holes (22) has a different shape than the other through holes (22).

4. The dual-beam distribution system according to claim 1, characterized in that, The housing (10) includes: A housing (11), one end of which has an opening; A cover (12) is placed over the opening. The cover (12) and the housing (11) together form the vacuum chamber (1001). The housing (11) and the cover (12) are detachably connected.

5. The dual-beam distribution system according to claim 1, characterized in that, The peeling film rotating device further includes: The base plate (51) and the reinforcing member (52) are provided on the base plate (51) and the reinforcing member (52) is connected to the base plate (51) and / or the box body (10).

6. The dual-beam distribution system according to claim 5, characterized in that, The peeling film rotating device further includes: The mounting plate (60) and a plurality of limiting mechanisms (70) are provided. The base plate (51) is disposed on the mounting plate (60), and the limiting mechanisms (70) are disposed on the mounting plate (60). The plurality of limiting mechanisms (70) are arranged at intervals along the circumference of the base plate (51). The limiting mechanisms (70) can abut against the base plate (51) to limit the relative position of the base plate (51) and the mounting plate (60).

7. The dual-beam distribution system according to claim 6, characterized in that, The limiting mechanism (70) includes: The limiting seat (71) and the limiting member (72) are provided on the mounting plate (60), the limiting seat (71) is disposed on the mounting plate (60), and the limiting member (72) is threadedly connected to the limiting seat (71) and can abut against the base plate (51).

8. The dual-beam distribution system according to claim 6, characterized in that, The peeling film rotating device also includes a support base (90), and the mounting plate (60) is disposed on the support base (90). The vertical distance between the mounting plate (60) and the support base (90) is adjustable.

9. The dual-beam distribution system according to claim 8, characterized in that, The peeling film rotating device further includes an adjusting mechanism (80), which is disposed between the mounting plate (60) and the support base (90). The adjusting mechanism (80) includes: Mounting base (81) and adjusting member (82), one of which is connected to the support base (90) and the other is connected to the mounting plate (60), and the adjusting member (82) is threadedly connected to the mounting base (81).

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