Parameter monitoring optimization method and system based on coating process and storage medium

CN120911057APending Publication Date: 2025-11-07XIAMEN BUYUN INFORMATION TECHNOLOGY CO LTD
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Patent Information

Application Number
CN202510362191.4
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2025-03-26
Publication Date
2025-11-07

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Abstract

The invention discloses a parameter monitoring optimization method and system based on a coating process and a storage medium, and belongs to the technical field of electronic components, and the method comprises the following steps: obtaining coating processing execution parameters of coating equipment, executing coating processing, and analyzing to obtain poor indexes of coating processing, thereby determining whether to execute coating drying; if coating drying is executed, a coating drying effect index is obtained through analysis, and if coating drying is not executed, coating processing execution parameters are adjusted for the first time; obtaining a printing effect standard index, analyzing to obtain a printing comprehensive effect judgment index, and analyzing to obtain a coating process inspection judgment result; if the coating process inspection and judgment result is that the coating process execution is judged to be qualified, the execution parameters are not adjusted, and if the coating process execution is judged to be unqualified, the coating processing execution parameters are adjusted for the second time; the problem that the electronic element coating treatment effect is poor due to the fact that the coating treatment execution parameters are not accurately set in the prior art is solved.
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