Control device, plasma apparatus, and control method thereof

Abstract

The application relates to a control device, a plasma device and a control method thereof, wherein the control device comprises a data acquisition module, a data processing module and a driving module connected in sequence; the data acquisition module is used for acquiring an electric parameter output by a power coupling system; the data processing module is used for comparing a sampled electric parameter with a preset electric parameter to obtain an electric parameter deviation, and calculating a signal adjustment amount according to the electric parameter deviation; and the driving module is used for generating a driving signal according to the signal adjustment amount, and the driving signal is used for driving the power coupling system. The application realizes glow control of the plasma without needing external supporting equipment such as a mass spectrometer and a spectrometer, and reduces the glow control cost.

Description

Technical Field

[0001] This application relates to the field of plasma generation control, and in particular to a control device, plasma equipment and control method thereof. Background Technology

[0002] Plasma equipment is a key component of semiconductor and microelectronics manufacturing equipment. Its function is to excite special gases used for material processing into active particles, enabling high-precision and high-efficiency processing of semiconductor materials in processes such as thin film deposition, etching, and surface treatment. The ionized active gas components react upon contact with the material to be processed, thereby achieving the process requirements of thin film deposition, etching, and surface treatment. These processes require the stable formation of plasma first, followed by strictly regulated effective reaction times to meet the desired process effects. For plasma equipment, stable ignition is crucial to ensuring the successful processing of semiconductor materials in semiconductor and microelectronics manufacturing equipment.

[0003] Plasma ignition refers to the process of ionizing a gas using external energy to form plasma. The plasma device must break down gas molecules or atoms (ignition stage) and then continuously and stably output energy after plasma formation (maintenance stage). The key lies in exciting and maintaining the plasma. Accurately controlling plasma ignition and detecting its stable formation is crucial for semiconductor process flows. Only after correct ignition can the gaseous active components of the process be guaranteed to meet process requirements. Furthermore, the entire process has strict duration control, necessitating accurate determination of the plasma formation timing to control the process flow.

[0004] Traditional plasma devices require external equipment such as mass spectrometers and spectrometers to detect the plasma formation state within the cavity and subsequently control energy release. However, these external devices complicate the overall system composition and increase control costs.

[0005] Currently, no effective solution has been provided for the high cost of plasma ignition control in related technologies. Summary of the Invention

[0006] Therefore, it is necessary to provide a control device, plasma equipment, and control method that can reduce the cost of plasma ignition control in response to the above-mentioned technical problems.

[0007] In a first aspect, this application provides a control device for driving a power coupling system of a plasma device, the control device comprising: a data acquisition module, a data processing module, and a drive module connected in sequence; wherein...

[0008] The data acquisition module is used to acquire the electrical parameters output by the power coupling system;

[0009] The data processing module is used to compare the sampled electrical parameters with the preset electrical parameters to obtain the electrical parameter deviation, and to calculate the signal adjustment amount based on the electrical parameter deviation.

[0010] The driving module is used to generate a driving signal based on the signal adjustment amount, and the driving signal is used to drive the power coupling system.

[0011] In some embodiments, the data processing module includes:

[0012] A comparison unit and a loop control unit are provided, wherein the input terminal of the comparison unit is connected to the output terminal of the data acquisition module, and the output terminal of the comparison unit is connected to the input terminal of the loop control unit; wherein,

[0013] The comparison unit is used to receive electrical parameters collected by the data acquisition module, compare the sampled electrical parameters with the preset electrical parameters, and obtain the electrical parameter deviation.

[0014] The loop control unit is used to receive the electrical parameter deviation and calculate the signal adjustment amount based on the electrical parameter deviation.

[0015] In some embodiments, the data acquisition module includes:

[0016] Current sampling unit and / or voltage sampling unit; wherein,

[0017] The current sampling unit is used to collect the current output by the power coupling system;

[0018] The voltage sampling unit is used to collect the voltage output by the power coupling system.

[0019] In some embodiments, the data acquisition module further includes:

[0020] An analog-to-digital converter (ADC) is provided, wherein the input terminal of the ADC is connected to the output terminal of the current sampling unit and / or the voltage sampling unit, and the output terminal of the ADC is connected to the input terminal of the comparator unit.

[0021] The analog-to-digital converter is used to convert the acquired electrical parameters from analog signals into digital signals.

[0022] In some embodiments, the comparison unit includes:

[0023] A first comparator and / or a second comparator; wherein...

[0024] The first comparator is connected to the current sampling unit. The first comparator is used to receive the current sampling value output by the current sampling unit, compare the current sampling value with a preset current value, and obtain the current deviation.

[0025] The second comparator is connected to the voltage sampling unit. The second comparator is used to receive the voltage sampling value output by the voltage sampling unit, compare the voltage sampling value with a preset voltage value, and obtain the voltage deviation.

[0026] In some embodiments, the control device further includes:

[0027] A driving circuit, the input of which is connected to the output of the driving module, and the output of which is connected to the input of the power coupling system.

[0028] Secondly, this application provides a plasma device, comprising: a power coupling system, a cavity, and the control device described in the first aspect, wherein the power coupling system is connected to the cavity and the control device; wherein...

[0029] The cavity is used to contain gas;

[0030] The control device is used to control the output energy of the power coupling system to excite the gas in the cavity to generate plasma.

[0031] In some embodiments, the power coupling system includes:

[0032] The system includes a power generating unit and a power conversion unit. The input terminal of the power generating unit is connected to the output terminal of the control device, the output terminal of the power generating unit is coupled to the input terminal of the power conversion unit, and the output terminal of the power conversion unit is connected to the cavity.

[0033] In some embodiments, the power generating unit includes: a rectifier filter circuit, a drive circuit, and a resonant circuit;

[0034] The output terminal of the rectifier filter circuit is connected to the input terminal of the drive circuit, and the output terminal of the drive circuit is connected to the resonant circuit.

[0035] In some embodiments, the driving circuit includes a first switch, a second switch, a third switch, and a fourth switch, wherein the first switch and the second switch constitute a first bridge arm, the third switch and the fourth switch constitute a second bridge arm, and the first bridge arm and the second bridge arm are respectively connected between the same positive and negative busbars.

[0036] In some embodiments, the power conversion unit includes a transformer, the primary winding of which is connected to the output of the power generating unit, and the secondary winding of which is connected to the cavity.

[0037] Thirdly, this application provides a control method for a plasma device, applied to the control apparatus described in the first aspect above, the method comprising:

[0038] Collect the electrical parameters output by the power coupling system;

[0039] The sampled electrical parameters are compared with the preset electrical parameters to obtain the electrical parameter deviation;

[0040] The signal adjustment amount is calculated based on the electrical parameter deviation.

[0041] A drive signal is generated based on the signal adjustment amount to drive the power coupling system to output energy.

[0042] In some embodiments, before comparing the sampled electrical parameters with preset electrical parameters to obtain the electrical parameter deviation, the method further includes:

[0043] Determine whether the output voltage of the power coupling system reaches the pre-ignition threshold voltage;

[0044] If it is determined that the output voltage has not reached the pre-ignition threshold voltage, then it is determined whether the trend of the sampled electrical parameters meets the preset conditions; wherein, the preset conditions include: the output voltage drops below the voltage threshold, and / or, the output current of the power coupling system increases above the current threshold;

[0045] If the trend of the sampled electrical parameters is determined to meet the preset conditions, then the plasma pre-ignition is determined to be successful.

[0046] Determine whether the load characteristics output by the power coupling system are in a stable state;

[0047] If the load characteristics are determined to be in a stable state, then plasma ignition is considered successful.

[0048] In some embodiments, the method further includes:

[0049] If it is determined that the trend of the sampled electrical parameters does not meet the preset conditions, then the step of comparing the sampled electrical parameters with the preset electrical parameters to obtain the electrical parameter deviation is entered.

[0050] In some embodiments, the method further includes:

[0051] If the load characteristics are determined to be unstable, the current output voltage is maintained.

[0052] If the load characteristics remain unstable after the current output voltage is maintained for a preset time, then plasma ignition is determined to have failed.

[0053] In some embodiments, the method further includes:

[0054] If it is determined that the output voltage has reached the pre-ignition threshold voltage, then the current output voltage is maintained;

[0055] If the trend of the sampled electrical parameters meets the preset condition after the current output voltage is maintained for a preset time, then the plasma pre-ignition is determined to be successful, and the process proceeds to the step of determining whether the load characteristics output by the power coupling system are in a stable state.

[0056] If the trend of the sampled electrical parameters does not meet the preset condition after the current output voltage is maintained for a preset time, then plasma pre-ignition is determined to have failed.

[0057] The aforementioned control device, plasma equipment, and control method sample the electrical parameters of the power coupling system in real time through a data acquisition module. The data processing module quantizes the adjustment of the drive signal based on the sampled electrical parameters to precisely drive the power coupling system, making the energy output by the power coupling system approach the target value. This achieves plasma ignition control without the need for external supporting equipment such as mass spectrometers or spectrometers, thus reducing the cost of ignition control. Attached Figure Description

[0058] Figure 1 This is a schematic diagram of the plasma device in one embodiment;

[0059] Figure 2 This is a schematic diagram of the control device in one embodiment;

[0060] Figure 3 This is a schematic diagram of the power coupling system in one embodiment;

[0061] Figure 4 This is a schematic diagram of the cavity structure in one embodiment;

[0062] Figure 5 This is a flowchart illustrating a control method for a plasma device in one embodiment;

[0063] Figure 6 This is a flowchart illustrating the control method of a plasma device in another embodiment;

[0064] Figure 7 This is a schematic diagram of a plasma ignition data model in one embodiment;

[0065] Figure 8 This is a schematic diagram illustrating the changing trends of electrical parameters during a plasma ignition experiment in one embodiment.

[0066] Figure 9 This is a schematic diagram of the plasma device in another embodiment;

[0067] Figure 10 This is a schematic diagram of the operation process of a plasma device in one embodiment.

[0068] Reference numerals: 1. Power coupling system; 11. Power generation unit; 12. Power conversion unit; 111. Rectifier and filter circuit; 112. Drive circuit; 113. Resonant circuit; L. Inductor; C. Capacitor; Q1. First switch; Q2. Second switch; Q3. Third switch; Q4. Fourth switch; T. Transformer; P. Primary winding; S. Secondary winding; R. Sampling resistor;

[0069] 2. Cavity; 21. Air inlet; 22. Air outlet;

[0070] 3. Control device; 31. Data acquisition module; 32. Data processing module; 33. Drive module; 311. Current sampling unit; 312. Voltage sampling unit; A / D1. First analog-to-digital converter; A / D2. Second analog-to-digital converter; 321. Comparison unit; A1. First comparator; A2. Second comparator; 322. Loop control unit. Detailed Implementation

[0071] To make the objectives, technical solutions, and advantages of this application clearer, the following detailed description is provided in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative and not intended to limit the scope of this application.

[0072] Unless otherwise defined, the technical or scientific terms used in this application shall have the general meaning understood by one of ordinary skill in the art to which this application pertains. Words such as “a,” “an,” “an,” “the,” “the,” and “these” used in this application do not indicate quantitative limitation and may be singular or plural. The terms “comprising,” “including,” “having,” and any variations thereof used in this application are intended to cover non-exclusive inclusion; for example, a process, method, system, product, or device that comprises a series of steps or modules (units) is not limited to the listed steps or modules (units) but may include steps or modules (units) not listed, or may include other steps or modules (units) inherent to these processes, methods, products, or devices. Words such as “connected,” “linked,” and “coupled” used in this application are not limited to physical or mechanical connections but may include electrical connections, whether direct or indirect. “Multiple” used in this application refers to two or more. “And / or” describes the relationship between related objects, indicating that three relationships may exist; for example, “A and / or B” can represent: A alone, A and B simultaneously, and B alone. Normally, the character " / " indicates that the objects before and after it are in an "or" relationship. The terms "first," "second," "third," etc., used in this application are merely to distinguish similar objects and do not represent a specific order of objects.

[0073] In one embodiment, a plasma device is provided. The ignition methods of the plasma device include, but are not limited to, electric field ignition methods such as DC discharge, AC discharge, radio frequency discharge, and microwave discharge. After plasma is formed, energy loss occurs due to particle recombination, diffusion, and radiation. To maintain the stable existence of the plasma, energy loss can be compensated through DC discharge, AC discharge, radio frequency discharge, and microwave discharge. Specifically, DC discharge accelerates electrons through a constant strong electric field, causing them to collide and achieve ionization; AC discharge accelerates electrons through periodic changes in electrode polarity, achieving ionization during electron collisions; radio frequency discharge drives electron motion through a high-frequency alternating electric field, utilizing the inertial effect of electrons and sheath oscillations to achieve ionization; and microwave discharge directly couples a microwave magnetic field to electrons in the gas, achieving ionization through electron cyclotron resonance.

[0074] When a gas ionizes to form plasma, its composition and electrical behavior undergo a fundamental transformation, and neutral gas molecules (such as...) become plasma. It dissociates into a mixture of free electrons, positive ions, and active free radicals. Electrically, the gas transforms from an insulator into a conductor, with a sharp decrease in resistivity, enabling efficient current conduction and response to electromagnetic field modulation. Acceleration of charged particles in an electric field can trigger avalanche ionization, while the de-excitation of excited-state particles emits characteristic electromagnetic radiation (such as glow).

[0075] The plasma device in this embodiment employs a high-frequency alternating current discharge in the KHz~MHz range to achieve plasma ignition and maintain the plasma state using alternating current discharge after formation. The plasma device provides a high-frequency changing electric field, where electrons in the gas are accelerated to form seed electrons. These seed electrons collide with neutral molecules to produce new electrons and ions. This process chain-relays through the gas, creating large-area ionization, i.e., avalanche breakdown, transforming the stable gas into plasma containing a large amount of active components. In this embodiment, the plasma device can determine and control ignition based on gas composition analysis of factors such as gas type, pressure, and flow rate, combined with changes in electrical observations before and after the avalanche effect.

[0076] Figure 1 This is a schematic diagram of the plasma device in this embodiment, as shown below. Figure 1 As shown, it includes: a power coupling system 1, a cavity 2, and a control device 3. The power coupling system 1 is connected to the cavity 2 and the control device 3. The cavity 2 is used to contain gas. The control device 3 is used to control the power coupling system 1 to output energy and excite the gas in the cavity 2 to generate plasma.

[0077] The control device 3 includes a data acquisition module 31, a data processing module 32, and a drive module 33 connected in sequence.

[0078] The data acquisition module 31 is used to acquire the electrical parameters output by the power coupling system 1. The electrical parameters include current and / or voltage.

[0079] The data processing module 32 compares the sampled electrical parameters with preset electrical parameters to obtain the electrical parameter deviation, and calculates the signal conditioning amount based on the electrical parameter deviation. The electrical parameter deviation includes current deviation or voltage deviation. When calculating the signal conditioning amount based on the electrical parameter deviation, the signal conditioning amount can be calculated based on the current deviation or the voltage deviation.

[0080] The drive module 33 generates a drive signal based on the signal adjustment amount, which drives the power coupling system 1. Specifically, the drive signal can be adjusted by frequency and / or duty cycle; when these two physical quantities change, the energy output by the power coupling system 1 changes. The drive signal can be a PWM signal.

[0081] In one implementation, the control device 3 first outputs an initial drive signal to drive the power coupling system 1 to generate initial energy. Simultaneously, the data acquisition module 31 in the control device 3 samples the electrical parameters (current and / or voltage) of the power coupling system 1 in real time. If the detected electrical parameters do not reach the preset values, the data processing module 32 adjusts the drive signal according to the deviation, gradually bringing the energy output by the power coupling system 1 closer to the target value, ultimately ensuring that the output energy and the target value are within the allowable error range, thereby precisely controlling the plasma ignition.

[0082] In this embodiment, the data acquisition module 31 samples the electrical parameters of the power coupling system 1 in real time, and the data processing module 32 adjusts the driving signal according to the sampled electrical parameters to accurately drive the power coupling system 1, so that the energy output by the power coupling system 1 approaches the target value. Without the need for external supporting equipment such as mass spectrometers and spectrometers, plasma ignition control is achieved, reducing the cost of ignition control.

[0083] In one embodiment, Figure 2 A schematic diagram of another control device 3 is provided, such as Figure 2 As shown, the control device 3 includes a data acquisition module 31, a data processing module 32, and a drive module 33 connected in sequence.

[0084] The data acquisition module 31 includes a current sampling unit 311 and a voltage sampling unit 312; wherein, the current sampling unit 311 is used to acquire the current output by the power coupling system 1; and the voltage sampling unit 312 is used to acquire the voltage output by the power coupling system 1.

[0085] The data processing module 32 includes a comparison unit 321 and a loop control unit 322. The input terminal of the comparison unit 321 is connected to the output terminal of the data acquisition module 31, and the output terminal of the comparison unit 321 is connected to the input terminal of the loop control unit 322. The comparison unit 321 is used to receive the electrical parameters acquired by the data acquisition module 31, compare the sampled electrical parameters with the preset electrical parameters, and obtain the electrical parameter deviation. The loop control unit 322 is used to receive the electrical parameter deviation and calculate the signal adjustment amount based on the electrical parameter deviation.

[0086] The comparison unit 321 includes a first comparator A1 and a second comparator A2; wherein, the first comparator A1 is connected to the current sampling unit 311, and the first comparator A1 is used to receive the current sampling value output by the current sampling unit 311, compare the current sampling value with a preset current value, and obtain the current deviation; the second comparator A2 is connected to the voltage sampling unit 312, and the second comparator A2 is used to receive the voltage sampling value output by the voltage sampling unit 312, compare the voltage sampling value with a preset voltage value, and obtain the voltage deviation.

[0087] The data acquisition module 31 may further include a first analog-to-digital converter (A / D1) and a second analog-to-digital converter (A / D2); the input terminal of the first A / D1 is connected to the output terminal of the current sampling unit 311, and the output terminal of the first A / D1 is connected to the input terminal of the first comparator A1; the input terminal of the second A / D2 is connected to the output terminal of the voltage sampling unit 312, and the output terminal of the second A / D2 is connected to the input terminal of the second comparator A2; both the first A / D1 and the second A / D2 are used to convert the acquired electrical parameters from analog signals into digital signals.

[0088] The drive module 33 is used to control the drive circuit in the power coupling system 1, specifically to control the on / off state of multiple switching transistors in the drive circuit, thereby adjusting the frequency and amplitude of the output voltage to meet the conditions required for plasma ignition and maintenance.

[0089] In one embodiment, Figure 3 A schematic diagram of a power coupling system 1 is provided, as follows: Figure 3 As shown, the power coupling system 1 includes a power generating unit 11 and a power conversion unit 12. The input end of the power generating unit 11 is connected to the output end of the control device 3, the output end of the power generating unit 11 is coupled to the input end of the power conversion unit 12, and the output end of the power conversion unit 12 is connected to the cavity 2.

[0090] The power generating unit 11 includes a rectifier and filter circuit 111, a drive circuit 112, and a resonant circuit 113. The rectifier and filter circuit 111 is connected to the input terminal of the drive circuit 112, and the output terminal of the drive circuit 112 is connected to the resonant circuit 113. The drive circuit 112 includes a first switch Q1, a second switch Q2, a third switch Q3, and a fourth switch Q4. The first switch Q1 and the second switch Q2 form a first bridge arm, and the third switch Q3 and the fourth switch Q4 form a second bridge arm. The first bridge arm and the second bridge arm are respectively connected between the same positive and negative buses. The resonant circuit 113 includes an inductor L and a capacitor C.

[0091] In this embodiment, external grid power is input AC to the power generation unit 11. First, the rectifier and filter circuit 111 converts the input AC into stable DC. Then, the drive circuit 112 controls the switching states of each switch (Q1-Q4) according to the drive signal to generate a high-frequency AC signal. Finally, the resonant circuit 113 processes the high-frequency AC signal to generate a signal suitable for the subsequent operation of the power conversion unit 12. The first switch Q1, the second switch Q2, the third switch Q3, and the fourth switch Q4 are controlled by the drive module 33 to switch on and off, thereby adjusting the frequency and amplitude of the output voltage to meet the conditions required for plasma ignition and maintenance.

[0092] The power conversion unit 12 includes a transformer T. The primary winding P of the transformer T is connected to the output terminal of the power generation unit 11, and the secondary winding S of the transformer T is connected to the cavity 2. The power conversion unit 12 transfers the energy from the primary winding P to the secondary winding S, with the cavity 2 serving as the load for the secondary winding S. The power conversion unit 12 may also include a sampling resistor R. The sampling resistor R and the cavity 2 together constitute the equivalent load of the secondary winding S. There is a relatively definite impedance matching relationship between the sampling resistor R and the cavity 2. By detecting the voltage signal of the sampling resistor R, the electrical parameters output by the power conversion unit 12 can be reflected, and then the electrical parameters output by the power generation unit 11, such as voltage, current, and power, can be derived.

[0093] Figure 4 A schematic diagram of the cavity 2 is provided, as follows: Figure 4 As shown, cavity 2 includes an air inlet 21 and an air outlet 22.

[0094] In one embodiment, Figure 5 A flowchart illustrating a control method for a plasma device is provided. This method can be applied to the control device 3 in any of the above embodiments and includes the following steps:

[0095] Step S101: Collect the electrical parameters output by the power coupling system 1.

[0096] Electrical parameters include current and / or voltage.

[0097] Step S102: Compare the sampled electrical parameters with the preset electrical parameters to obtain the electrical parameter deviation.

[0098] The sampled current can be compared with the preset current to calculate the current deviation. Similarly, the sampled voltage can be compared with the preset voltage to calculate the voltage deviation.

[0099] Step S103: Calculate the signal adjustment amount based on the electrical parameter deviation.

[0100] When calculating the signal conditioning amount based on the deviation of electrical parameters, the signal conditioning amount can be calculated based on the current deviation or the voltage deviation.

[0101] Step S104: Generate a drive signal based on the signal adjustment amount to drive the power coupling system 1 to output energy.

[0102] Precise control of the output voltage can be achieved by dynamically adjusting the frequency and / or duty cycle of the drive signal using a PID algorithm, based on real-time detection of electrical parameter deviations. When the frequency and / or duty cycle of the drive signal changes, the energy output by the power coupling system 1 will change. The drive signal can be a PWM signal.

[0103] In steps S101 to S104 above, the electrical parameters of the power coupling system 1 are sampled in real time, and the driving signal is adjusted according to the sampled electrical parameters to precisely drive the power coupling system 1, so that the energy output by the power coupling system 1 approaches the target value. Without the need for detection by external supporting equipment such as mass spectrometers and spectrometers, plasma ignition control is achieved, reducing the cost of ignition control.

[0104] In one embodiment, Figure 6 A flowchart illustrating another control method for a plasma device is provided. Before comparing the sampled electrical parameters with the preset electrical parameters in step S102 above to obtain the electrical parameter deviation, the method further includes the following steps:

[0105] Step S201: Determine whether the output voltage of the power coupling system 1 has reached the pre-ignition threshold voltage.

[0106] Step S202: If it is determined that the output voltage has not reached the pre-ignition threshold voltage, then determine whether the trend of the sampled electrical parameters meets the preset conditions.

[0107] The preset conditions include: the output voltage drops below the voltage threshold, and / or the output current of the power coupling system 1 increases above the current threshold.

[0108] Voltage and current thresholds can be determined through experimental testing. Figure 7 This is a schematic diagram of the plasma ignition data model in this embodiment. Before the plasma equipment is put into operation, a data model of the plasma ignition process can be established by acquiring experimental data. This model is built based on previous experimental data. Argon is used as the ignition gas. By setting different gas flow rates and different gas pressures, plasma ignition experiments are carried out, and the change curves of electrical parameters such as voltage and current during the ignition process are recorded under each operating condition. Figure 8 This is a schematic diagram illustrating the changing trends of electrical parameters during a plasma ignition experiment. (Example:) Figure 8 As shown, during the plasma ignition test in the laboratory, an initial output parameter is first given to the power generation unit 11, and the output voltage of the power generation unit 11 is continuously increased until the pre-ignition threshold voltage is reached and maintained for a certain period of time. During this period, the formation of plasma in the cavity 2 causes the high-impedance gas load to become a low-impedance plasma load. This qualitative change causes the sampling voltage to drop below the voltage threshold due to the change in load, while the sampling current rapidly increases above the current threshold. When the plasma in the cavity 2 is in a relatively stable state, the load power and load impedance are in a relatively stable state. By judging whether the fluctuation of the load power and / or load impedance is within the threshold range, the success or failure of the plasma ignition can be determined.

[0109] Step S203: If it is determined that the trend of the sampled electrical parameters meets the preset conditions, then the plasma pre-ignition is determined to be successful.

[0110] Step S204: Determine whether the load characteristics output by the power coupling system 1 are in a stable state.

[0111] In step S205, if the load characteristics are determined to be in a stable state, then the plasma ignition is determined to be successful.

[0112] In this embodiment, the plasma ignition process involves an ignition stage and a sustaining stage. First, in the ignition stage, the plasma device breaks down gas molecules or atoms, initiating plasma formation. Then, in the sustaining stage, the plasma continuously and stably outputs energy. During this process, step S102 functions as a quantized PWM regulator to continuously increase the ignition voltage, thereby boosting the output energy of the power coupling system 1 and bringing the output energy closer to the target value, thus promoting plasma ignition. During the ignition stage, under normal circumstances, the trend of the sampled electrical parameters will meet preset conditions, which is a prerequisite for successful plasma ignition, i.e., successful pre-ignition.

[0113] During plasma ignition, the plasma device continuously increases its output voltage in an attempt to generate plasma. However, due to the inherent limitations of the plasma device, the output voltage cannot be increased indefinitely. Therefore, this embodiment sets a pre-ignition threshold voltage, which does not exceed the maximum operating voltage of the plasma device. Before the output voltage of the power coupling system 1 reaches the pre-ignition threshold voltage, the ignition voltage can be continuously increased to enhance the output energy of the power coupling system 1, bringing it closer to the target value. Once the trend of the sampled electrical parameters meets a preset condition, the ignition voltage increase is stopped. If the trend of the sampled electrical parameters does not meet the preset condition even when the output voltage of the power coupling system 1 reaches the pre-ignition threshold voltage, the plasma pre-ignition is deemed a failure, and the process ends.

[0114] In this embodiment, the load characteristics include load power and / or load impedance. This embodiment first determines whether the plasma pre-ignition is successful by observing the changing trends of the sampled current and / or sampled voltage. If the plasma pre-ignition is successful, the load characteristics are then used to further determine whether the plasma ignition is successful. Here, the load characteristics are another type of electrical parameter; using different types of electrical parameters for dual determination improves the accuracy of plasma ignition detection.

[0115] It should be noted that failing to first determine whether pre-ignition was successful could lead to another scenario. In practical applications, one situation is partial breakdown, which also causes a relatively small abrupt change in the sampling current and / or sampling voltage, while the load impedance and load power remain stable. Therefore, to avoid misjudging partial breakdown as plasma ignition, this embodiment employs a two-step judgment process: first, a pre-ignition judgment is performed to confirm the formation of plasma within cavity 2; then, a plasma ignition judgment is performed to confirm the stability of the plasma state through the stability of the load impedance and / or load power.

[0116] In some embodiments, when determining whether the trend of the sampled electrical parameters meets a preset condition, if it is determined that the trend of the sampled electrical parameters does not meet the preset condition, then proceed to step S102 above, comparing the sampled electrical parameters with the preset electrical parameters to obtain the electrical parameter deviation. Then, a signal adjustment amount is calculated based on the electrical parameter deviation, and a driving signal is generated based on the signal adjustment amount to drive the power coupling system 1 to output energy.

[0117] In some embodiments, when determining whether the load characteristics output by the power coupling system 1 are in a stable state, if it is determined that the load characteristics are not in a stable state, the current output voltage is maintained. If the load characteristics are still unstable after the current output voltage is maintained for a preset time, the plasma ignition is determined to have failed.

[0118] In some embodiments, when determining whether the output voltage of the power coupling system 1 has reached the pre-ignition threshold voltage, if it is determined that the output voltage has reached the pre-ignition threshold voltage, the current output voltage is maintained. If, after the current output voltage is maintained for a preset time, the trend of the sampled electrical parameters meets a preset condition, the plasma pre-ignition is determined to be successful, and the process proceeds to the step of determining whether the load characteristics output by the power coupling system 1 are in a stable state. If, after the current output voltage is maintained for a preset time, the trend of the sampled electrical parameters does not meet the preset condition, the plasma pre-ignition is determined to be unsuccessful.

[0119] In one embodiment, Figure 9 A schematic diagram of another plasma device is provided, such as Figure 9As shown, the plasma device includes a power coupling system 1, a cavity 2, and a control device 3. The power coupling system 1 includes a power generating unit 11 and a power conversion unit 12. The power conversion unit 12 includes a transformer T, with its primary winding P connected to the output of the power generating unit 11 and its secondary winding S connected to the cavity 2. The power generating unit 11 and the power conversion unit 12 are respectively connected to the control device 3. The control device 3 samples current from the primary winding P and voltage from the secondary winding S. Based on the sampled current and voltage, the control device 3 detects the plasma state of the cavity 2 and calculates the control quantities to be provided to the power generating unit 11.

[0120] When power generation unit 11 starts igniting, the output voltage gradually increases from a low level. When an avalanche effect occurs within cavity 2 and plasma is formed, the impedance of cavity 2 changes abruptly, manifested as a sudden increase in the current sampling value and a sudden decrease in the voltage sampling value. By detecting this characteristic change in current and voltage in real time, it can be determined whether the plasma has successfully ignited. Figure 10 A schematic diagram of the operation process of the plasma device is provided, such as... Figure 10 As shown, the process includes the following steps:

[0121] Step S301: Set the initial output voltage of power coupling system 1.

[0122] Step S302: Determine whether the output voltage of the power coupling system 1 has reached the pre-ignition threshold voltage. If not, proceed to step S303; if yes, proceed to step S305.

[0123] Step S303: Determine whether the trend of the sampled electrical parameters meets the preset conditions. If not, proceed to step S304; if yes, proceed to step S309.

[0124] Step S304: Increase the ignition voltage. After the ignition voltage is increased, return to step S302. The ignition voltage can be increased using the methods described in steps S101 to S104 of the above embodiments.

[0125] Step S305: Maintain the current output voltage.

[0126] Step S306: Determine whether the timeout has occurred. If yes, proceed to step S307; otherwise, proceed to step S308.

[0127] Step S307: Determine that plasma ignition has failed and end the process.

[0128] Step S308: Determine whether the trend of the sampled electrical parameters meets the preset conditions. If yes, proceed to step S309; ​​otherwise, return to step S305.

[0129] Step S309: The plasma pre-ignition is determined to be successful.

[0130] Step S310: Determine whether the load characteristics output by the power coupling system 1 are in a stable state. If yes, proceed to step S311; otherwise, proceed to step S312.

[0131] Step S311: Determine that the plasma ignition was successful and end the process.

[0132] Step S312: Maintain the current output voltage.

[0133] Step S313: Determine whether the timeout period has been maintained; if yes, proceed to step S314; if no, return to step S310.

[0134] Step S314: Determine that plasma ignition has failed and end the process.

[0135] Before step S301, a data model of the plasma ignition process can be constructed based on previous multi-source experimental data, incorporating factors such as flow rate, gas pressure, gas type, and temperature. A clustering algorithm is used to fit the changes in load impedance, voltage, current, and power during the ignition process. During plasma ignition, the control device 3 controls the power generation unit 11 to continuously increase the output voltage. The power generation unit 11 couples energy to the power conversion unit 12, which then delivers the energy to the cavity 2 to activate gas molecules or atoms within the cavity 2, thereby forming an active gas containing plasma. When the gas load in the cavity 2 transforms into a plasma load, the changes in the sampling current and sampling voltage can be summarized as follows: Figure 8 The variation curves shown demonstrate that, under specific gas types, pressures, and flow rates, the trends in sampling current and voltage exhibit high repeatability and determinism. Therefore, by monitoring the trends in sampling current and voltage, and combining this with the resistance characteristics and power changes of the plasma load, the success of the ignition process can be accurately determined. Compared to detection methods relying on external equipment such as mass spectrometers and spectrometers, plasma equipment has a simpler hardware structure and lower ignition control costs.

[0136] It should be understood that although the steps in the flowcharts of the embodiments described above are shown sequentially according to the arrows, these steps are not necessarily executed in the order indicated by the arrows. Unless explicitly stated herein, there is no strict order restriction on the execution of these steps, and they can be executed in other orders. Moreover, at least some of the steps in the flowcharts of the embodiments described above may include multiple steps or multiple stages. These steps or stages are not necessarily completed at the same time, but can be executed at different times. The execution order of these steps or stages is not necessarily sequential, but can be performed alternately or in turn with other steps or at least a portion of the steps or stages of other steps.

[0137] Those skilled in the art will understand that all or part of the processes in the above embodiments can be implemented by a computer program instructing related hardware. The computer program can be stored in a non-volatile computer-readable storage medium. When executed, the computer program can include the processes of the embodiments described above. Any references to memory, databases, or other media used in the embodiments provided in this application can include at least one of non-volatile and volatile memory. Non-volatile memory can include read-only memory (ROM), magnetic tape, floppy disk, flash memory, optical memory, high-density embedded non-volatile memory, resistive random access memory (ReRAM), magnetic random access memory (MRAM), ferroelectric random access memory (FRAM), phase change memory (PCM), graphene memory, etc. Volatile memory can include random access memory (RAM) or external cache memory, etc. By way of illustration and not limitation, RAM can take many forms, such as Static Random Access Memory (SRAM) or Dynamic Random Access Memory (DRAM). The databases involved in the embodiments provided in this application may include at least one type of relational database and non-relational database. Non-relational databases may include, but are not limited to, blockchain-based distributed databases. The processors involved in the embodiments provided in this application may be general-purpose processors, central processing units, graphics processing units, digital signal processors, programmable logic devices, quantum computing-based data processing logic devices, etc., and are not limited to these.

[0138] The technical features of the above embodiments can be combined in any way. For the sake of brevity, not all possible combinations of the technical features in the above embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.

[0139] The embodiments described above are merely illustrative of several implementation methods of this application, and while the descriptions are specific and detailed, they should not be construed as limiting the scope of this patent application. It should be noted that those skilled in the art can make various modifications and improvements without departing from the concept of this application, and these all fall within the protection scope of this application. Therefore, the protection scope of this application should be determined by the appended claims.

Claims

1. A control device, characterized in that, The power coupling system for driving a plasma device excites the gas in the cavity of the plasma device to generate plasma. The control device includes: a data acquisition module, a data processing module, and a drive module connected in sequence; wherein... The data acquisition module is used to acquire the electrical parameters output by the power coupling system to obtain the sampled electrical parameters; The data processing module is used to determine whether the output voltage of the power coupling system reaches the pre-ignition threshold voltage; if it is determined that the output voltage does not reach the pre-ignition threshold voltage, it is then determined whether the trend of the sampled electrical parameters meets a preset condition; wherein, the preset condition includes: the output voltage drops below the voltage threshold, and / or, the output current of the power coupling system increases above the current threshold; if it is determined that the trend of the sampled electrical parameters meets the preset condition, it is determined that the plasma pre-ignition is successful, confirming that plasma is formed in the cavity, and determining whether the load characteristics output by the power coupling system are in a stable state; if it is determined that the load characteristics are in a stable state, it is determined that the plasma state in the cavity is stable, and the plasma ignition is successful; if it is determined that the trend of the sampled electrical parameters does not meet the preset condition, the sampled electrical parameters are compared with the preset electrical parameters to obtain the electrical parameter deviation, and the signal adjustment amount is calculated based on the electrical parameter deviation; The driving module is used to generate a driving signal based on the signal adjustment amount, and the driving signal is used to drive the power coupling system.

2. The control device according to claim 1, characterized in that, The data processing module includes: A comparison unit and a loop control unit are provided, wherein the input terminal of the comparison unit is connected to the output terminal of the data acquisition module, and the output terminal of the comparison unit is connected to the input terminal of the loop control unit; wherein, The comparison unit is used to receive electrical parameters collected by the data acquisition module, compare the sampled electrical parameters with the preset electrical parameters, and obtain the electrical parameter deviation. The loop control unit is used to receive the electrical parameter deviation and calculate the signal adjustment amount based on the electrical parameter deviation.

3. The control device according to claim 2, characterized in that, The data acquisition module includes: Current sampling unit and / or voltage sampling unit; wherein, The current sampling unit is used to collect the current output by the power coupling system; The voltage sampling unit is used to collect the voltage output by the power coupling system.

4. The control device according to claim 3, characterized in that, The data acquisition module also includes: An analog-to-digital converter (ADC) is provided, wherein the input terminal of the ADC is connected to the output terminal of the current sampling unit and / or the voltage sampling unit, and the output terminal of the ADC is connected to the input terminal of the comparator unit. The analog-to-digital converter is used to convert the acquired electrical parameters from analog signals into digital signals.

5. The control device according to claim 3, characterized in that, The comparison unit includes: A first comparator and / or a second comparator; wherein... The first comparator is connected to the current sampling unit. The first comparator is used to receive the current sampling value output by the current sampling unit, compare the current sampling value with a preset current value, and obtain the current deviation. The second comparator is connected to the voltage sampling unit. The second comparator is used to receive the voltage sampling value output by the voltage sampling unit, compare the voltage sampling value with a preset voltage value, and obtain the voltage deviation.

6. A plasma device, characterized in that, include: A power coupling system, a cavity, and a control device according to any one of claims 1 to 5, wherein the power coupling system is connected to the cavity and the control device; wherein... The cavity is used to contain gas; The control device is used to control the output energy of the power coupling system to excite the gas in the cavity to generate plasma.

7. The plasma device according to claim 6, characterized in that, The power coupling system includes: The system includes a power generating unit and a power conversion unit. The input terminal of the power generating unit is connected to the output terminal of the control device, the output terminal of the power generating unit is coupled to the input terminal of the power conversion unit, and the output terminal of the power conversion unit is connected to the cavity.

8. The plasma device according to claim 7, characterized in that, The power generating unit includes: a rectifier filter circuit, a drive circuit, and a resonant circuit; The output terminal of the rectifier filter circuit is connected to the input terminal of the drive circuit, and the output terminal of the drive circuit is connected to the resonant circuit.

9. The plasma device according to claim 8, characterized in that, The driving circuit includes a first switch, a second switch, a third switch, and a fourth switch. The first switch and the second switch form a first bridge arm, and the third switch and the fourth switch form a second bridge arm. The first bridge arm and the second bridge arm are respectively connected between the same positive and negative busbars.

10. The plasma device according to claim 7, characterized in that, The power conversion unit includes a transformer, the primary winding of which is connected to the output terminal of the power generating unit, and the secondary winding of which is connected to the cavity.

11. A control method for a plasma device, characterized in that, The control device, applied to any one of claims 1 to 5, is used to drive the power coupling system of a plasma device to excite gas in the cavity of the plasma device to generate plasma; the method includes: The electrical parameters output by the power coupling system are collected to obtain the sampled electrical parameters; Determine whether the output voltage of the power coupling system reaches the pre-ignition threshold voltage; if it is determined that the output voltage has not reached the pre-ignition threshold voltage, maintain the current output voltage and determine whether the maintenance timeout occurs; if not, determine whether the trend of the sampled electrical parameters meets a preset condition; or, if it is determined that the output voltage has not reached the pre-ignition threshold voltage, determine whether the trend of the sampled electrical parameters meets a preset condition; wherein, the preset condition includes: the output voltage drops below a voltage threshold, and / or, the output current of the power coupling system increases above a current threshold; If the trend of the sampled electrical parameters is determined to meet the preset conditions, then the plasma pre-ignition is determined to be successful, plasma is determined to be formed in the cavity, and it is determined whether the load characteristics output by the power coupling system are in a stable state. If the load characteristics are determined to be in a stable state, then the plasma state inside the cavity is determined to be stable, and the plasma ignition is determined to be successful. If it is determined that the trend of the sampled electrical parameters does not meet the preset conditions, the sampled electrical parameters are compared with the preset electrical parameters to obtain the electrical parameter deviation. The signal adjustment amount is calculated based on the electrical parameter deviation. A drive signal is generated based on the signal adjustment amount to drive the power coupling system to output energy.

12. The control method for a plasma device according to claim 11, characterized in that, The method further includes: If the load characteristics are determined to be unstable, the current output voltage is maintained. If the load characteristics remain unstable after the current output voltage is maintained for a preset time, then plasma ignition is determined to have failed.

13. The control method for a plasma device according to claim 11, characterized in that, The method further includes: If it is determined that the output voltage has reached the pre-ignition threshold voltage, then the current output voltage is maintained; If the trend of the sampled electrical parameters meets the preset condition after the current output voltage is maintained for a preset time, then the plasma pre-ignition is determined to be successful, and the process proceeds to the step of determining whether the load characteristics output by the power coupling system are in a stable state. If the trend of the sampled electrical parameters does not meet the preset condition after the current output voltage is maintained for a preset time, then plasma pre-ignition is determined to have failed.

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