Silane and chlorosilane waste gas treatment system and treatment method
CN120960968APending Publication Date: 2025-11-18SHANDONG XINGTAI SILICON MATERIAL TECHNOLOGY CO LTD
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Patent Information
- Application Number
- CN202511366203.7
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2025-09-24
- Publication Date
- 2025-11-18
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Figure CN120960968A_ABST
Abstract
The invention belongs to the technical field of silane and chlorosilane waste gas treatment, and particularly relates to a silane and chlorosilane waste gas treatment system and a treatment method.The system integrates silane tail gas, silane safety relief gas, chlorosilane tail gas and chlorosilane safety relief gas, shares infrastructures such as an alkali liquor pool, a sedimentation pool and an exhaust funnel, and is used for treating silane and chlorosilane waste gas. The flexibility of independent operation of each unit is reserved, and the repeated investment of equipment is reduced; independent treatment units are designed for'discharge gas' and'tail gas', a combustion treatment unit is adaptive to different silane discharge amounts through a multi-stage combustion head, and a condensation recovery unit is adaptive to different chlorosilane discharge amounts through a refrigerant adjusting system, so that the waste gas treatment requirements of semiconductors and photovoltaic enterprises under different production loads and during safe discharge can be met.
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