一种化学气相沉积碳化硅环生产用沉积设备
By designing dispersion and adjustment mechanisms, the problem of uneven gas dispersion at different heights within the furnace body was solved, resulting in improved uniformity and efficiency of silicon carbide deposition and reduced substrate wear.
CN120967320BActive Publication Date: 2026-07-17苏州鑫睿微电子设备有限公司
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- 苏州鑫睿微电子设备有限公司
- Filing Date
- 2025-07-30
- Publication Date
- 2026-07-17
AI Technical Summary
Technical Problem
In existing technologies, it is difficult for gas to disperse rapidly at different heights within the furnace, resulting in uneven silicon carbide deposition.
Method used
By employing a dispersion mechanism and an adjustment mechanism, and through the combination of a fixed pipe, a telescopic rod, a clamping seat, and a dispersion mechanism and an adjustment mechanism, uniform gas dispersion within the furnace body and effective fixation of the annular substrate are achieved, ensuring full contact between the gas and the substrate.
Benefits of technology
This achieves uniform gas dispersion within the furnace, improving the uniformity and efficiency of silicon carbide deposition and reducing wear on the substrate.
✦ Generated by Eureka AI based on patent content.
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Figure CN120967320B_ABST
Abstract
本发明公开了一种化学气相沉积碳化硅环生产用沉积设备，本发明涉及化学气相沉积技术领域。包括炉体；固定管，所述固定管安装在炉体的顶部；电机箱，所述电机箱安装在炉体的外部，所述电机箱的内部设置有电机；第一伸缩杆，所述第一伸缩杆与电机的输出端连接；卡座，所述卡座安装在第一伸缩杆的外部；固定筒，所述固定筒卡接在卡座的内部；分散机构，所述分散机构设置在固定管的外部，所述分散机构包括连接盒，所述连接盒的底部开设有通风口，所述连接盒用于将气体分散的通过通风口向下排出；所述电机用于带动固定筒、第一调节杆以及方框转动，该化学气相沉积碳化硅环生产用沉积设备，达到了提高设备的使用效率的目的。
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