极纯溶剂型清洗剂及氮封制备工艺
By using an ultra-pure solvent-based cleaning agent formula and a high-purity nitrogen protection process, the problem of insufficient dissolution capacity of traditional cleaning agents for both polar and non-polar dirt has been solved, achieving residue-free cleaning and zero-corrosion effect in micron-sized pores, meeting the cleanliness requirements of high-end fields.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- 沈阳友谊化工制造有限公司
- Filing Date
- 2025-08-21
- Publication Date
- 2026-07-17
AI Technical Summary
Traditional cleaning agents cannot simultaneously meet the dissolution needs of both polar and non-polar dirt, cannot thoroughly remove deep stains in micron-sized pores, and have problems such as component deactivation, particle residue, and material corrosion.
The cleaning agent uses an ultra-pure solvent-based formula, including components such as 2,6,10-trimethyldodecane, triethylene glycol ethyl ether, 8-hydroxyquinoline-2-carboxylic acid, sodium perfluoropropoxybutylsulfonate, bismuth vanadate, and zinc palmitate. Through a high-purity nitrogen protection process and an intelligent control system, the synergistic effect and component stability in a low-oxygen environment are ensured.
It achieves deep cleaning of micron-sized pores, residue-free cleaning of components, prevents corrosion, improves the storage stability and antioxidant properties of the cleaning agent, and meets electronic-grade cleanliness standards.
Smart Images
Figure CN121022524B_ABST