一种光刻投影镜头及具有其的光刻投影设备

By designing a photolithography projection lens with ten spherical lenses, the problems of high processing difficulty and lens deformation in the existing technology were solved, achieving high-precision imaging and substrate adaptability, and improving the imaging resolution and positioning accuracy of the photolithography projection equipment.

CN121028340BActive Publication Date: 2026-07-17ZHANGJIAGANG ZHONGHE AUTOMATION TECH

Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
ZHANGJIAGANG ZHONGHE AUTOMATION TECH
Filing Date
2024-12-19
Publication Date
2026-07-17

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Abstract

本发明公开了一种光刻投影镜头及具有其的光刻投影设备,镜头具有光焦度的透镜为由物方到像方的方向依次设置的第一透镜至第十透镜,第一透镜、第三透镜、第四透镜、第五透镜的物方光轴位置呈凸面结构,其像方光轴位置呈凹面结构;第二透镜、第九透镜为双凸镜;第六透镜、第七透镜、第八透镜、第十透镜的物方光轴位置呈凹面结构,其像方光轴位置呈凸面结构;第二透镜、第五透镜的厚度满足表达式:2.75<Th2 / Th5<4.1,或者,25mm<Th2-Th5<31mm;第九透镜、第六透镜的厚度满足表达式:2.75<Th9 / Th6<4.1,或者,25mm<Th9-Th6<31mm,以上镜头能够实现良好的光刻效果。
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