用于半导体湿法设备的排气过滤装置及其工作方法
By designing an exhaust filtration device for semiconductor wet process equipment, the problems of timely exhaust gas discharge and re-reaction of harmful gases were solved, achieving efficient exhaust gas absorption and chemical solution cleaning effects, thereby improving semiconductor production quality and process stability.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- NANTONG XIAYUE SEMICONDUCTOR TECHNOLOGY CO LTD
- Filing Date
- 2025-08-25
- Publication Date
- 2026-07-17
AI Technical Summary
In existing semiconductor wet cleaning equipment, exhaust gases are difficult to discharge in a timely manner during the cleaning process, resulting in the deposition of pollutants on the semiconductor surface, which affects production quality and process stability. At the same time, some harmful gases are blocked by the cover and react with the chemical solution again, reducing the cleaning effect.
An exhaust filtration device was designed, which includes a cleaning unit, an exhaust unit, and a splash-proof unit. The exhaust port diameter is adjusted by the suction pipe, the exhaust pipe, and the automatic telescopic rod to accelerate the discharge of exhaust gas. The condenser and PTFE microporous membrane are used to collect harmful gases and prevent the gases from coming into contact with chemical solutions.
It improves the efficiency of waste gas absorption, prevents pollutant deposition, ensures the production quality of semiconductors and the cleaning effect of chemical solutions, and ensures process stability and consistency.
Smart Images
Figure CN121054529B_ABST
Abstract
Citation Information
Patent Citations
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