碳化硅KGD测试座及测试方法

By designing the planar probe and elastic element of the silicon carbide KGD test socket, the problems of high-temperature softening and adhesion during high-current testing are solved, achieving low-cost and high-efficiency test protection, which is suitable for dynamic testing of SiC MOSFETs, Si MOSFETs and IGBTs.

CN121091045BActive Publication Date: 2026-07-17POWERTECH CO LTD

Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
POWERTECH CO LTD
Filing Date
2025-10-23
Publication Date
2026-07-17

AI Technical Summary

Technical Problem

Existing silicon carbide KGD test sockets are prone to localized high-temperature softening or melting during high-current testing, leading to adhesion and physical damage, and also have high testing costs and short lifespan.

Method used

A planar probe is used to form a surface contact with the drain electrode of the KGD under test. Combined with the elastic element design, the maximum current is controlled and the energy rise phenomenon is improved, the metal melting and adhesion are reduced, and the high temperature resistance and service life are improved.

Benefits of technology

It effectively reduces testing costs, extends the lifespan of the test socket, reduces physical damage to KGD chips, and meets the needs of high-requirement product reliability screening and mass production.

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Abstract

本发明涉及半导体制造技术领域,提供了一种碳化硅KGD测试座及测试方法,碳化硅KGD测试座包括:测试底座和测试上座;所述测试底座用于放置待测试KGD,并电连接所述待测试KGD的Drain极;所述测试上座包括上座体和平面探针;所述平面探针设置于所述上座体,所述平面探针上具有至少一接触平面;所述上座体可拆卸与所述测试底座配合,所述上座体与所述测试底座配合时,所述接触平面贴合于所述待测试KGD的Source极并电连接。通过碳化硅KGD测试座的改进以改善上述大电流测试时局部高温软化或者熔化导致的粘连,并降低对待测试KGD的物理损伤。
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