A polishing apparatus for ceramic processing

Abstract

This invention relates to the field of ceramic processing technology and discloses a polishing device for ceramic processing, including an operating tank. The operating tank is equipped with a chemical liquid supply system and an integrated rotary drive mechanism for clamping and rotating several ceramic products. A polisher is slidably disposed within the operating tank, comprising an arc-shaped support frame and a flexible polishing disc. The flexible polishing disc is arc-shaped, with a surface layer of a resin-based porous layer doped with diamond particles, and a micro-heating element at the bottom. This polishing device for ceramic processing, through its integrated rotary drive mechanism, achieves simultaneous clamping and independent rotation of multiple ceramic workpieces. Combined with the slidable U-shaped arc support frame and flexible polishing disc structure, it not only solves the problem of low efficiency in traditional single-point polishing but also increases batch polishing efficiency by 2-3 times.

Description

Technical Field

[0001] This invention relates to the field of ceramic processing technology, specifically to a polishing device for ceramic processing. Background Technology

[0002] Traditional ceramic polishing techniques mainly rely on purely mechanical grinding, which uses hard abrasives, such as diamond, silicon carbide, or alumina, to cut and rub the ceramic surface, thereby removing material and improving surface finish.

[0003] A typical polishing device has a polishing spindle driven by a motor. A polishing wheel or polishing head is installed at the end of the polishing spindle. The ceramic workpiece is fixed on a fixture. The polishing wheel rotates at high speed. The operator controls the polishing wheel to move along the surface of the workpiece and applies a certain pressure to grind it. Through repeated polishing, the rough layer on the surface is gradually removed, and finally a mirror effect is achieved.

[0004] The disadvantages are that only one workpiece can be polished at a time, making it unsuitable for mass production. Furthermore, manual operation or simple CNC machining makes it difficult to ensure consistent surface quality across multiple workpieces. Rigid polishing wheels are also difficult to conform to complex curved surfaces, which can easily lead to local over-polishing or uneven polishing.

[0005] Therefore, we propose a polishing device for ceramic processing to address the problems mentioned above. Summary of the Invention

[0006] The purpose of this invention is to provide a polishing device for ceramic processing, so as to solve the problems mentioned in the background art that traditional ceramic polishing devices can only polish one workpiece at a time, which is not suitable for mass production, and that manual operation or simple CNC cannot guarantee the consistent surface quality of multiple workpieces.

[0007] To solve the above-mentioned technical problems, the present invention provides the following technical solution: A polishing apparatus for ceramic processing includes an operating tank, a chemical liquid supply system inside the operating tank, and an integrated rotary drive mechanism inside the operating tank for clamping and driving several ceramic products to rotate; a polisher is slidably arranged inside the operating tank, the polisher including an arc-shaped support frame and a flexible polishing disc.

[0008] Preferably, the flexible polishing disc is arc-shaped, its surface is a resin-based porous layer doped with diamond particles, and a micro heating element is provided at the bottom of the flexible polishing disc.

[0009] Preferably, the arc-shaped support frame is configured as a U-shape with the opening facing the inside of the operating pool. The bottom of the arc-shaped support frame is provided with a guide rail, which is fixedly connected to the bottom of the operating pool. The two ends of the arc-shaped support frame near the bottom of the operating pool are slidably connected to the guide rail. One end of the operating pool is equipped with a pusher to push the arc-shaped support frame to slide.

[0010] Preferably, the pusher is a first hydraulic push rod, the telescopic end of the first hydraulic push rod is fixedly connected to one end of the arc-shaped support frame, and a displacement sensor for monitoring the moving distance is installed on the arc-shaped support frame.

[0011] Preferably, the integrated rotary drive mechanism includes a rotary frame with a circular outer surface. A first drive shaft is mounted on the rotary frame along the axial direction. Both ends of the first drive shaft are rotatably connected to the inside of the operating pool. An arc-shaped support frame is disposed outside the rotary frame, and a flexible polishing disc is installed inside the arc-shaped support frame in a liftable manner.

[0012] Preferably, the rotating frame has independent drive chambers for clamping and loading ceramic products distributed equidistantly around its circumference. The independent drive chambers have an opening at one end facing the outside of the rotating frame. Push plates are respectively provided on the inner sides of both ends of the independent drive chambers. The push plates are slidably sleeved on the outside of the first drive shaft. A second hydraulic push rod is installed inside the rotating frame to push the push plate to move horizontally. A multi-pass rotary valve connected to the oil circuit of the second hydraulic push rod is installed on the first drive shaft.

[0013] Preferably, the push plate has multiple rotating rods distributed around its circumference, with each rotating rod corresponding to the end of an independent drive chamber. A chuck is installed at the end of the rotating rod closest to the independent drive chamber, and a pressure sensor is installed between the rotating rod and the chuck. A planetary gear is fixedly connected to the outer end of the rotating rod, and a central gear ring is rotatably connected to the push plate. The central gear ring includes an outer gear ring and an inner gear ring. The planetary gear meshes with the outer gear ring. A pneumatic motor is installed on the chuck, and a drive gear is installed on the drive shaft of the pneumatic motor. The drive gear meshes with the inner gear ring.

[0014] Preferably, the chemical liquid supply system includes a storage tank and an annular distributor, which is nested on the outside of the flexible polishing disc. An electromagnetic flow valve is connected between the storage tank and the annular distributor. The distributor allows the chemical liquid to permeate through the microporous channels of the porous layer of the flexible polishing disc to the surface of the flexible polishing disc.

[0015] Preferably, the surface of the flexible polishing disc is provided with a pH-responsive gel layer, which swells upon contact with a chemical liquid, triggering the microcapsules to rupture and release the catalyst.

[0016] Preferably, the operating tank is internally connected to a waste liquid recovery and filtration system, which includes a negative pressure pipeline and a centrifugal separator, with the negative pressure pipeline connected to the bottom of the operating tank.

[0017] Compared with the prior art, the beneficial effects achieved by the present invention are: The ceramic processing and polishing device of this invention achieves synchronous clamping and independent rotational drive of multiple ceramic workpieces through an integrated rotary drive mechanism. Combined with a sliding U-shaped arc support frame and a flexible polishing disc structure, it not only solves the problem of low efficiency in traditional single-point polishing, increasing batch polishing efficiency by 2-3 times, but also ensures high consistency in polishing multiple workpieces by using a pressure sensor to monitor clamping force in real time and a displacement sensor to precisely control the polishing path. The flexible polishing disc adopts an arc-shaped porous structure design, with a resin-based composite layer doped with diamond particles on the surface and a micro-heating plate at the bottom working synergistically. This not only adapts to different curved ceramic products to avoid stress concentration, but also maximizes the activity of the chemical liquid through temperature control. Combined with the characteristics of a pH-responsive gel layer that intelligently releases catalysts, it achieves a three-effect synergistic polishing of mechanical grinding, chemical corrosion, and temperature control. The chemical liquid supply system and waste liquid recovery and filtration system form a closed loop. The supply of chemical liquid is precisely controlled by an electromagnetic flow valve, and centrifugal separation and electrodialysis technologies achieve efficient recovery and reuse of abrasives and chemical solutes, significantly reducing production costs and environmental pollution. This device fundamentally overcomes the limitations of traditional polishing techniques, such as single-workpiece processing, rigid contact, and difficulties in chemical-mechanical synergy, providing an innovative solution for the efficient and precise machining of ceramic materials. Attached Figure Description

[0018] Figure 1 This is a schematic diagram of the overall side view structure of the present invention; Figure 2 For the present invention Figure 1 A magnified schematic diagram of the structure at point A; Figure 3 This is a schematic diagram of the rotating frame structure of the present invention; Figure 4 This is a schematic cross-sectional view of the flexible polishing disc of the present invention; Figure 5 This is a schematic diagram of the overall external structure of the present invention; Figure 6 This is a schematic diagram of the connection structure between the second hydraulic push rod and the push plate of the present invention.

[0019] The components include: 1. Operating pool; 4. Polisher; 5. Arc-shaped support frame; 6. Flexible polishing disc; 7. Miniature heating element; 8. Guide rail; 10. Displacement sensor; 11. First hydraulic push rod; 12. Rotating frame; 13. First drive shaft; 14. Independent drive chamber; 15. Opening; 16. Push plate; 17. Rotating rod; 18. Chuck; 19. Pressure sensor; 20. Planetary gear; 21. Central gear ring; 22. External gear ring; 23. Internal gear ring; 24. Pneumatic motor; 25. Drive gear; 26. Liquid storage tank; 27. Annular distributor; 28. Electromagnetic flow valve; 29. ​​Second hydraulic push rod. Detailed Implementation

[0020] The technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0021] Example 1: Please see Figure 1-6 The present invention provides a technical solution: A polishing device for ceramic processing includes an operating pool 1, which is equipped with a chemical liquid supply system and an integrated rotary drive mechanism for clamping and driving several ceramic products to rotate. A polisher 4 is slidably arranged in the operating pool 1, which includes an arc-shaped support frame 5 and a flexible polishing disc 6.

[0022] The operating tank 1 serves as the main body of the polishing device, integrating a chemical liquid supply system, an integrated rotary drive mechanism, and a sliding polisher 4. The chemical liquid supply system provides a chemical corrosive medium to the polishing area, working in conjunction with mechanical polishing. The integrated rotary drive mechanism, through multi-axis synchronous drive, clamps and rotates multiple ceramic workpieces, enabling batch processing. The polisher 4 consists of an arc-shaped support frame 5 and a flexible polishing disc 6, which can slide along the guide rail 8, covering the ceramic surface for dynamic polishing. When it slides to the integrated rotary drive mechanism, it facilitates the clamping or removal of several ceramic products within the mechanism.

[0023] The ceramic workpiece is clamped on a rotary drive mechanism and rotates at high speed. Simultaneously, the polisher 4 slides back and forth along the guide rail 8 under the drive of a hydraulic pusher. The flexible polishing disc 6 adheres to the ceramic surface via a lifting mechanism. Chemical solution permeates evenly to the polishing interface through the porous polishing disc, combining the mechanical grinding and chemical corrosion reaction of the diamond abrasive to achieve highly efficient polishing. This solves the problems of low efficiency in traditional single-point polishing, poor consistency in processing multiple workpieces, and difficulty in coordinating the chemical solution and mechanical grinding.

[0024] The flexible polishing disk 6 is arc-shaped, and its surface layer is a resin-based porous layer doped with diamond particles. The bottom layer of the flexible polishing disk 6 is provided with a micro heating element 7.

[0025] The flexible polishing disc 6 features an arc-shaped design with a porous diamond resin surface layer and a micro-heating element 7 embedded in the bottom layer. Diamond particles provide cutting force as hard abrasives, and the porous structure allows for chemical penetration. The micro-heating element 7 regulates the disc temperature via a temperature control module, accelerating the chemical activity. During operation, the chemical is evenly distributed to the polishing contact surface through the porous layer, and the heating element raises the local temperature, enhancing the corrosion rate of the chemical reaction. The arc-shaped design of the flexible polishing disc 6 adapts to curved ceramic surfaces, avoiding stress concentration. Utilizing the synergistic effect of temperature control, chemical penetration, and mechanical abrasion, polishing efficiency is increased by 2-3 times.

[0026] Furthermore, the arc-shaped support frame 5 is configured as a U-shape with the opening 15 facing the inside of the operating pool 1. The bottom of the arc-shaped support frame 5 is provided with a guide rail 8, which is fixedly connected to the bottom of the operating pool 1. The two ends of the arc-shaped support frame 5 near the bottom of the operating pool 1 are slidably connected to the guide rail 8. One end of the operating pool 1 is equipped with a pusher to push the arc-shaped support frame 5 to slide.

[0027] The actuator is a first hydraulic push rod 11. The telescopic end of the first hydraulic push rod 11 is fixedly connected to one end of the arc-shaped support frame 5. A displacement sensor 10 for monitoring the moving distance is installed on the arc-shaped support frame 5.

[0028] The U-shaped arc support frame 5 has an opening 15 facing inwards towards the operating pool 1. Its bottom slides along guide rail 8, ensuring a constant contact angle between the polishing disc and the ceramic workpiece. A first hydraulic push rod 11 drives the support frame to move along guide rail 8, and a displacement sensor 10 provides real-time position data, forming a closed-loop control system. The hydraulic push rod moves the support frame according to a preset program, and the displacement sensor 10 monitors the movement distance, dynamically adjusting the polishing path. For ceramic workpieces of different sizes, the system automatically matches the sliding stroke to ensure the polishing disc covers the entire processing area.

[0029] Furthermore, the integrated rotary drive mechanism includes a rotary frame 12, which is circular on the outside. A first drive shaft 13 is mounted on the rotary frame 12 along the axial direction. Both ends of the first drive shaft 13 are rotatably connected to the inside of the operating pool 1. An arc-shaped support frame 5 is disposed on the outside of the rotary frame 12, and a flexible polishing disc 6 is installed in a liftable manner inside the arc-shaped support frame 5.

[0030] Furthermore, the rotating frame 12 has independent drive chambers 14 equidistantly distributed around its circumference for clamping and loading ceramic products. The independent drive chamber 14 has an opening 15 at one end facing the outside of the rotating frame 12. Push plates 16 are respectively provided on the inner sides of both ends of the independent drive chamber 14. The push plates 16 are slidably sleeved on the outside of the first drive shaft 13. A second hydraulic push rod 29 is installed inside the rotating frame 12 to push the push plate 16 to move horizontally. A multi-pass rotary valve connected to the second hydraulic push rod 29 is installed on the first drive shaft 13.

[0031] Furthermore, the push plate 16 has multiple rotating rods 17 distributed around its circumference. The rotating rods 17 correspond to the ends of the independent drive chamber 14. A chuck 18 is installed at the end of the rotating rod 17 near the independent drive chamber 14. A pressure sensor 19 is installed between the rotating rod 17 and the chuck 18. A planetary gear 20 is fixedly connected to the outer end of the rotating rod 17. A central gear ring 21 is rotatably connected to the push plate 16. The central gear ring 21 includes an outer gear ring 22 and an inner gear ring 23. The planetary gear 20 meshes with the outer gear ring 22. A pneumatic motor 24 is installed on the chuck 18. A drive gear 25 is installed on the drive shaft of the pneumatic motor 24. The drive gear 25 meshes with the inner gear ring 23.

[0032] The circumferentially distributed independent drive chambers 14 can simultaneously load multiple ceramic workpieces. Each drive chamber is equipped with push plates 16 at both ends. The push plates 16 are pushed by the second hydraulic push rod 29. The push plates 16 drive the rotating rod 17 and the chuck 18 to clamp the ceramic products.

[0033] The planetary gear 20 is connected to the end of the rotating rod 17. The planetary gear 20 meshes with the outer gear ring 22 of the central gear ring 21. The pneumatic motor 24 drives the drive gear 25 to rotate the inner gear ring 23.

[0034] During operation, the second hydraulic push rod 29 pushes the push plate 16 to move inward along the first drive shaft 13, and the chuck 18 at the end of the rotating rod 17 clamps the ceramic workpiece. The pressure sensor 19 monitors the clamping force in real time to prevent overload damage to the workpiece. The pneumatic motor 24 drives the drive gear 25, which in turn drives the internal gear ring 23 of the central gear ring 21 to rotate. The internal gear ring 23 drives the rotating rod 17 to rotate through the planetary gear 20, thereby driving the ceramic workpiece to rotate at a set speed.

[0035] Multiple workpieces can be clamped simultaneously and independently, and pressure closed-loop control can prevent damage. The planetary gear 20 system enables efficient power transmission in a compact space.

[0036] Furthermore, the chemical liquid supply system includes a storage tank 26 and an annular distributor 27, which is nested outside the flexible polishing disc 6. An electromagnetic flow valve 28 is connected between the storage tank 26 and the annular distributor 27. The distributor allows the chemical liquid to permeate through the microporous channels of the porous layer of the flexible polishing disc 6 to the surface of the flexible polishing disc 6.

[0037] Furthermore, the surface of the flexible polishing disc 6 is provided with a pH-responsive gel layer. When the pH-responsive gel layer comes into contact with the chemical liquid, it swells, triggering the microcapsules to rupture and release the catalyst. The catalyst reacts with the chemical liquid to generate active ions, which accelerate the chemical corrosion of the ceramic surface.

[0038] Furthermore, the chemical solution is dispensed from the storage tank 26 to the annular distributor 27 outside the polishing disc as needed via a flow valve. Microcapsules containing catalysts are encapsulated within the pH-responsive gel layer; upon contact with the chemical solution, these microcapsules swell and rupture, releasing the catalyst, such as Fe.3+ Ions and chemical solutions enter the porous layer of the polishing disc through a distributor. The pH gel swells according to the acidity or alkalinity of the polishing interface, for example, at pH 2–4, triggering the rupture of microcapsules. The catalyst reacts with the chemical solution to generate active ions; for example, hydrofluoric acid reacts with the chemical solution to generate H+. Accelerate the Si surface of ceramics Chemical corrosion. The electromagnetic flow valve 28 precisely controls the supply of chemical solution. The chemical corrosion rate is adaptively adjusted to avoid excessive corrosion leading to over-polishing of the surface or uneven material loss.

[0039] The operating pool 1 is connected to a waste liquid recovery and filtration system, which includes a negative pressure pipeline and a centrifugal separator. The negative pressure pipeline is connected to the bottom of the dynamic reaction chamber. The waste liquid is separated into diamond abrasive and chemical solute by the centrifugal separator. The abrasive is returned to the flexible polishing disc 6 through the ultrasonic cleaning module, and the chemical solute is returned to the storage tank 26 after being regenerated by electrodialysis.

[0040] The waste liquid is drawn into a centrifuge under negative pressure, where solid abrasive and liquid solute are separated by high-speed rotation at 3000-8000 rpm. The diamond abrasive is reused after being ultrasonically cleaned to remove impurities; the chemical solute is regenerated through an electrodialysis membrane, with a recovery rate greater than 85%. The diamond abrasive in the waste liquid is separated by centrifugation due to density differences, and after cleaning, it is returned to the polishing disc; the chemical solutes, such as HF and Fe... 3+ Impurity ions are removed by electrodialysis, and the regenerated solution is returned to storage tank 26 for reuse.

[0041] The working principle of this polishing device for ceramic processing is as follows: Through an integrated rotary drive mechanism and a sliding polisher 4, combined with a chemical liquid supply system, efficient polishing of ceramic workpieces is achieved. Inside the operating tank 1, the ceramic workpiece is clamped on the rotary drive mechanism and rotates at high speed. Simultaneously, the polisher 4 slides back and forth along the guide rail 8 under the drive of a hydraulic push rod, and the flexible polishing disc 6 dynamically polishes the ceramic surface. The chemical liquid penetrates evenly to the polishing interface through the porous polishing disc, working in conjunction with the diamond abrasive to achieve efficient polishing. The bottom of the flexible polishing disc 6 is equipped with a micro-heating element 7, and the temperature of the polishing disc is adjusted by a temperature control module to accelerate the activity of the chemical liquid. The U-shaped arc support frame 5 has an opening 15 facing inwards towards the operating tank 1, and its bottom slides along the guide rail 8 to ensure a constant contact angle between the polishing disc and the ceramic workpiece. The first hydraulic push rod 11 drives the support frame to move, and the displacement sensor 10 monitors the moving distance and dynamically adjusts the polishing path. The rotary drive mechanism includes a rotating frame 12 and an independent drive chamber 14, which can simultaneously load multiple ceramic workpieces. A second hydraulic push rod 29 pushes a pusher plate 16 to clamp the ceramic workpieces. A pneumatic motor 24 drives a drive gear 25 to rotate an internal gear ring 23, enabling the ceramic workpieces to rotate at a set speed. The chemical solution supply system includes a storage tank 26 and an annular distributor 27. The chemical solution is distributed as needed to the annular distributor 27 outside the polishing disc. A pH-responsive gel layer releases a catalyst, accelerating chemical corrosion of the ceramic surface. The waste liquid recovery and filtration system includes a negative pressure pipeline and a centrifuge to separate diamond abrasive and chemical solute. The abrasive is cleaned and reused, while the chemical solute is regenerated and returned to the storage tank 26 for recycling. By combining temperature control, chemical penetration, and mechanical polishing, polishing efficiency is increased by 2-3 times.

[0042] Although specific embodiments of the invention have been shown and described, it will be understood by those skilled in the art that various changes, modifications, substitutions and alterations can be made to these specific embodiments without departing from the principles and spirit, the scope of which is defined by the appended claims and their equivalents.

Claims

1. A polishing apparatus for ceramic processing, comprising an operating tank (1), characterized in that: The operation pool (1) is equipped with a chemical liquid supply system and an integrated rotary drive mechanism. The integrated rotary drive mechanism is used to clamp several ceramic products and drive them to rotate. A polisher (4) is slidably arranged in the operation pool (1). The polisher (4) includes an arc-shaped support frame (5) and a flexible polishing disc (6). The integrated rotary drive mechanism includes a rotary frame (12), which is circular on the outside. A first drive shaft (13) is installed on the rotary frame (12) along the axial direction. Both ends of the first drive shaft (13) are rotatably connected to the inside of the operating pool (1). An arc-shaped support frame (5) is set on the outside of the rotary frame (12). A flexible polishing disc (6) is installed in the arc-shaped support frame (5) in a liftable manner. The rotating frame (12) has independent drive chambers (14) for clamping and loading ceramic products distributed equidistantly around its circumference. The independent drive chambers (14) have an opening (15) at one end facing the outside of the rotating frame (12). Push plates (16) are respectively provided on the inner sides of both ends of the independent drive chambers (14). The push plates (16) are slidably sleeved on the outside of the first drive shaft (13). The rotating frame (12) is equipped with a second hydraulic push rod (29) that pushes the push plate (16) to move horizontally. The first drive shaft (13) is equipped with a multi-pass rotary valve that connects the oil circuit of the second hydraulic push rod (29). Multiple rotating rods (17) are distributed around the circumference of the push plate (16). The rotating rods (17) correspond to the ends of the independent drive chamber (14). A chuck (18) is installed at one end of the rotating rod (17) near the independent drive chamber (14). A pressure sensor (19) is installed between the rotating rod (17) and the chuck (18). A planetary gear (20) is fixedly connected to one end of the rotating rod (17). A central gear ring (21) is rotatably connected to the push plate (16). The central gear ring (21) includes an outer gear ring (22) and an inner gear ring (23). The planetary gear (20) meshes with the outer gear ring (22). A pneumatic motor (24) is installed on the chuck (18). A drive gear (25) is installed on the drive shaft of the pneumatic motor (24). The drive gear (25) meshes with the inner gear ring (23). The chemical liquid supply system includes a storage tank (26) and an annular distributor (27), which is nested on the outside of the flexible polishing disc (6). An electromagnetic flow valve (28) is connected between the storage tank (26) and the annular distributor (27). The distributor allows the chemical liquid to permeate through the microporous channels of the porous layer of the flexible polishing disc (6) to the surface of the flexible polishing disc (6).

2. The polishing apparatus for ceramic processing according to claim 1, characterized in that: The flexible polishing disk (6) is arc-shaped, and its surface layer is a resin-based porous layer doped with diamond particles. The bottom layer of the flexible polishing disk (6) is provided with a micro heating element (7).

3. A polishing apparatus for ceramic processing according to claim 1, characterized in that: The arc support frame (5) is set as a U-shape with the opening facing the inside of the operating pool (1). The bottom of the arc support frame (5) is provided with a guide rail (8). The guide rail (8) is fixedly connected to the bottom of the operating pool (1). The two ends of the arc support frame (5) near the bottom of the operating pool (1) are slidably connected to the guide rail (8). One end of the operating pool (1) is equipped with a pusher to push the arc support frame (5) to slide.

4. A polishing apparatus for ceramic processing according to claim 3, characterized in that: The pusher is a first hydraulic push rod (11). The telescopic end of the first hydraulic push rod (11) is fixedly connected to one end of the arc support frame (5). A displacement sensor (10) for monitoring the moving distance is installed on the arc support frame (5).

5. A polishing apparatus for ceramic processing according to claim 1, characterized in that: The surface of the flexible polishing disc (6) is provided with a pH-responsive gel layer. When the pH-responsive gel layer comes into contact with a chemical liquid, it swells, triggering the microcapsules to rupture and release the catalyst.

6. A polishing apparatus for ceramic processing according to claim 5, characterized in that: The operating pool (1) is internally connected to a waste liquid recovery and filtration system, which includes a negative pressure pipeline and a centrifugal separator. The negative pressure pipeline is connected to the bottom of the operating pool (1).

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