一种厚铜板的外层蚀刻装置

By using anti-clogging components and a Bernoulli effect slit structure in the etching device for the outer layer of thick copper plates, deposits are automatically intercepted and cleaned, solving the problem of nozzle clogging in the etching solution circulation, improving etching quality and efficiency, and reducing production costs and environmental risks.

CN121262746BActive Publication Date: 2026-07-17CHANGZHOU HAIHONG ELECTRONICS CO LTD
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Patent Information

Application Number
CN202511550833.X
Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
Filing Date
2025-10-28
Publication Date
2026-07-17
Estimated Expiration
2045-10-28

AI Technical Summary

Technical Problem

During the etching solution circulation process, the accumulation of precipitates causes nozzle blockage, affecting etching quality and efficiency. Furthermore, the uneven consumption of etching solution components increases environmental pressure.

Method used

A thick copper plate outer layer etching device is designed. The device uses an elastic sheet in the anti-clogging component to form a slit using the Bernoulli effect to intercept deposits and automatically clean the deposits when clogging occurs. Combined with an electric valve and a purification system, it ensures stable spraying and recycling of the etching solution.

Benefits of technology

It improves etching precision and efficiency, avoids nozzle clogging, reduces production costs and environmental pressure, and ensures balanced utilization of etching solution components.

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Abstract

本发明公开了一种厚铜板的外层蚀刻装置,涉及蚀刻技术领域,其特征在于,包括:上下对接的上壳体和下壳体,所述上壳体的侧壁上开设有横贯上壳体的横向通槽,所述上壳体的底部开设有横贯上壳体的纵向通槽,所述横向通槽和纵向通槽相互连通,所述下壳体的顶端开设有横贯下壳体的主流通道,本发明通过防堵组件中的两个相互平行的弹性薄片,结合流体力学和伯努利效应,在水流通过时两个弹性薄片之间自然形成一道狭缝,可提前拦截循环蚀刻液中析出的沉淀物,在狭缝被沉淀物堵塞后,结合伯努利效应两个弹性薄片会自然张开,使得沉淀物被蚀刻液冲走,并在防堵组件和电动阀门的协同作用下,使得被冲走的含有沉淀物的蚀刻液通过分流通道排出。
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Citation Information

Patent Citations

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    CN118946021A

  • Filtering device for plate glass thinning etching waste acid

    CN209696385U