一种锗氟化过程中氟化氢杂质的去除方法及装置
A method and apparatus for removing hydrogen fluoride impurities during germanium fluorination includes steps such as adsorption treatment, condensation, flash purification, and re-condensation. Through adsorption treatment, the method solves the problem of removing hydrogen fluoride impurities in existing technologies, achieving highly efficient removal of hydrogen fluoride impurities from germanium tetrafluoride gas, thereby improving the purity of the product.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- THE 404 COMPANY LIMITED CHINA NAT NUCLEAR
- Filing Date
- 2025-11-27
- Publication Date
- 2026-07-17
AI Technical Summary
In existing technologies, methods for removing hydrogen fluoride impurities from germanium tetrafluoride suffer from high equipment maintenance costs and are not highly efficient, leading to equipment corrosion, reduced product yield, and increased production costs.
A method and apparatus for removing hydrogen fluoride impurities during germanium fluorination includes steps such as adsorption treatment, condensation, flash evaporation purification and re-condensation. The method utilizes an adsorbent to adsorb hydrogen fluoride impurities and temperature differences to achieve efficient separation and removal of hydrogen fluoride impurities.
This method achieves efficient removal of hydrogen fluoride impurities, improving product purity and production efficiency, and solving problems related to production costs and equipment maintenance.
Smart Images
Figure CN121314315B_ABST