一种新型萘吡喃光致变色化合物及其制备方法和应用

By introducing naphthylpyran photochromic compounds with pentafluorosulfur groups and polyether chain structures, the problems of PFAS limitation, contradiction between color change rate and fatigue life, and easy degradation during thermal processing of existing naphthylpyran photochromic dyes have been solved, achieving faster response, stronger weather resistance and higher solubility, making them suitable for industrial applications.

CN121318906BActive Publication Date: 2026-07-17SOUTH CHINA NORMAL UNIV

Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
SOUTH CHINA NORMAL UNIV
Filing Date
2025-12-05
Publication Date
2026-07-17

AI Technical Summary

Technical Problem

Existing naphthylpyran photochromic dyes suffer from problems such as PFAS environmental regulations, contradiction between color change speed and fatigue life, easy degradation due to thermal processing, and slow response speed. In particular, -CF3 substituted compounds have a slow response at low temperatures, a significant decrease in color depth at high temperatures, and limited fatigue stability.

Method used

The introduction of pentafluorosulfide (-SF5) strong electron-withdrawing groups improves the molecular electron cloud density, enhances solubility and resin compatibility through the polyether chain structure, and regulates photochromic properties through a multi-aromatic donor structure. The synthetic route is simple and suitable for industrial scale-up.

Benefits of technology

It significantly improves photoactivation speed, fading speed and weather resistance, meets global non-PFAS environmental regulations, improves fatigue resistance, has an efficient synthesis route, and is suitable for industrial scale-up.

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Abstract

本发明属于光功能材料技术领域,具体涉及一种新型萘吡喃光致变色化合物及其制备方法和应用。本发明化合物的结构通式如通式(Ⅰ)所示,具有萘并吡喃核心结构,在二氢茚芳环上引入五氟硫基取代基,在分子一端的二芳环上引入不同的侧链。利用五氟硫基的“强‑σ缺电子+弱‑π给电子”双重效应,实现了在不使用受限PFAS情况下仍保持高效光致变色性能的技术突破。本发明化合物摩尔消光系数高、激活速率快、热返程能垒低、着色深、响应快、热依赖性低、长期耐候性优异,10000次光循环下仍保持优异的疲劳抵抗性能。适用于光致变色眼镜镜片;光调控材料;汽车、建筑用智能调光窗;防UV / 蓝光滤光片;显示器及光学传感器中可控透光度组件等。
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