Spectral enhancement filtering metasurface method based on multi-physical field coupling

Abstract

The application provides a spectrum enhancement filtering super surface method based on multi-physical field coupling, comprising: establishing a thermal-mechanical multi-physical field model of a super surface under high-power laser incidence, obtaining a temperature field through calculation, and identifying a hot spot area based on the temperature field; calculating a thermal stress field based on the temperature field, calculating a refractive index variation and its distribution of the super surface material based on the temperature field and the thermal stress field, and further quantifying a resonance wavelength shift amount caused by the refractive index variation, and locating an optical mode mismatch area; based on the resonance wavelength shift amount and the optical mode mismatch area, reversely designing geometric parameters of a compensation structure; preparing a compensation type super surface sample according to the geometric parameters, testing a spectrum response of the compensation type super surface sample under high-power laser; based on the spectrum response, evaluating spectrum enhancement filtering stability of the compensation type super surface sample, and solving a new method of a thermal-optical mismatch problem caused by high-power laser, and realizing long-term stable operation of spectrum filtering function in a severe environment.

Description

Technical Field

[0001] This invention relates to the field of micro-nano optical device technology, and in particular to a spectral enhancement filtering metasurface method based on multi-physics coupling. Background Technology

[0002] Metasurfaces, as two-dimensional planar optical devices composed of subwavelength artificial structures, exhibit significant advantages in fields such as spectral filtering due to their flexible control over light wave properties, characterized by thinness, high integration, and customizable functions. However, metasurfaces face severe challenges in high-power laser communication, processing, and spectral measurement scenarios. High-intensity laser incident radiation causes localized heat absorption and temperature rise in the device, inducing nonlinear drift of the material's refractive index and thermal deformation of the structure. This disrupts the pre-designed electromagnetic resonance mode, resulting in performance degradation issues such as filter resonance wavelength shift and bandwidth broadening, known as the "thermal-optical mismatch" phenomenon, which severely limits their reliable application under high-load conditions.

[0003] Currently, the strategies for thermal management of metasurfaces mainly focus on passive cooling and material optimization, such as using substrates with high thermal conductivity or materials with low thermo-optical coefficients. However, these methods have significant shortcomings: First, they are static, post-hoc compensations, unable to provide real-time and precise control over the dynamic thermal field; second, they lack targeted treatment for local hotspots, while thermal runaway in small areas is often the main cause of performance degradation; third, they fail to couple and coordinate the thermal field distribution with the optical response in their design, resulting in a lack of quantitative correlation between compensation measures and performance degradation, leading to low efficiency.

[0004] Therefore, there is an urgent need for a new method that can fundamentally solve the thermal-optical mismatch problem caused by high-power lasers and achieve long-term stable operation of spectral filtering function under harsh environments. Summary of the Invention

[0005] In view of this, in order to solve the problems caused by the prior art, this application provides a spectral enhancement filtering metasurface method based on multi-physics coupling.

[0006] In a first aspect, the present invention provides a spectral enhancement filtering metasurface method based on multi-physics coupling, the method comprising: S1. Establish a thermo-mechanical multiphysics model of the metasurface under high-power laser incident, obtain its temperature field through calculation, and identify hot spot regions based on this model; S2. Calculate the thermal stress field based on the temperature field, calculate the refractive index change and its distribution of the metasurface material based on the temperature field and thermal stress field, and then quantify the resonant wavelength drift caused by it to locate the optical mode mismatch region. S3. Based on the resonant wavelength drift and the optical mode mismatch region, the geometric parameters of the compensation structure are designed in reverse. The compensation structure is used to suppress thermal effects to counteract the resonant wavelength drift. S4. Prepare a compensated metasurface sample according to the geometric parameters, and test its spectral response under high-power laser. S5. Based on the spectral response, evaluate the spectral enhancement filtering stability of the compensated metasurface sample. Optionally, S1 includes: The metasurface is geometrically discretized, and the power density distribution of the incident laser is calculated based on the Gaussian beam spatial distribution model. Based on the power density distribution and the absorptivity distribution of the metasurface, the volume heat source density distribution is calculated; Driven by the aforementioned volume heat source density, the steady-state heat conduction equation is solved to obtain the steady-state temperature field and steady-state temperature rise field of the metasurface; The heat flux density field is calculated based on the steady-state temperature rise field and Fourier's law. Based on the steady-state temperature rise field and the heat flux density field, the hot spot region is identified by setting temperature rise threshold and heat flux density threshold.

[0007] Optionally, S2 includes: The thermal stress field is calculated based on the temperature field, and the refractive index change and its distribution of the metasurface material are calculated based on the temperature field and the thermal stress field. The resonant wavelength shift is calculated based on the perturbation of the intrinsic electromagnetic mode of the metasurface caused by the change in refractive index. Based on the refractive index change and the energy distribution of the cold intrinsic electromagnetic field, the optical mode mismatch region is located.

[0008] Optionally, the calculation of the resonant wavelength drift is achieved using a first-order perturbation model, specifically as follows: Using formula Calculate the resonant wavelength shift, where, The design resonant wavelength of the metasurface in the cold state. This represents the change in dielectric constant at discrete grid cell (i,j) caused by thermal perturbation. The weighting coefficients at discrete grid cells (i,j) of the cold-state intrinsic electromagnetic field energy distribution are given. is the dielectric constant in the cold state.

[0009] Optionally, S3 includes: The resonant wavelength shift is inversely distributed to each unit in the optical mode mismatch region according to its contribution to the wavelength shift, thereby obtaining a spatially distributed target temperature rise reduction field. Based on the target temperature rise reduction field, the initial geometric parameters of the compensation structure are obtained by solving. The initial geometric parameters are discretized and quantized under manufacturing process constraints to generate the final geometric parameter set.

[0010] Optionally, the initial geometric parameters of the compensation structure obtained by solving include: The process of solving the initial geometric parameters is based on a physical model, which characterizes the quantitative relationship between the geometric parameters of the compensation structure and the resulting reduction in local temperature rise. The expression for this model is: ,in, Let be the amount of local temperature rise reduction to be achieved at the discrete grid cell (i,j). The thermal conductivity is the selected high thermal conductivity material applied to the discrete mesh element (i,j). The thermal conductivity of the metasurface substrate is given. The thickness of the high-conductivity intercalation layer applied to the discrete mesh element (i,j) and Let be the width and depth of the stress buffer microstructure located at the discrete mesh element (i,j), respectively. The coupling coefficient is calibrated through simulation or experiment.

[0011] Optionally, S4 includes: Based on the structure-modified mask and geometric dimension parameters in the final geometric parameter set, a mask layout and process stack are generated to guide nanofabrication. By executing the process stack, the high thermal conductivity material intercalation and stress buffer microstructure are sequentially processed on the metasurface sample; The spectral response curves of the prepared compensated metasurface sample were tested under high-power laser incident conditions.

[0012] Optionally, S5 includes: Extract the compensated resonant wavelength, filter bandwidth, and optical enhancement ratio from the spectral response curve; The stability of the resonant wavelength is evaluated by comparing the deviation between the compensated resonant wavelength and the cold-state design resonant wavelength. The bandwidth retention rate is evaluated by comparing the compensated filter bandwidth with the cold-state design bandwidth. The enhancement ratio is evaluated by comparing the compensated optical enhancement ratio with the design target value. When the resonant wavelength stability, bandwidth retention rate, and enhancement ratio all meet the preset tolerances, it is determined to be stable.

[0013] In a second aspect, the present invention provides an electronic device comprising a memory and at least one processor, the memory storing a computer program, and the processor executing the computer program to implement the method of the first aspect described above.

[0014] Thirdly, the present invention provides a computer storage medium storing a computer program, which, when executed, implements the method described in the first aspect.

[0015] The beneficial effects of the present invention are as follows: Compared with the prior art, the present invention has the following advantages: 1) Breaking through the limitations of traditional passive cooling and static material optimization, a precise quantitative model of multi-physics field coupling of light, heat, and force is established, enabling the mechanistic revelation and forward-looking prediction of the thermo-optical mismatch problem caused by high-power lasers. It can accurately simulate the entire process of laser energy absorption, heat conversion, temperature field distribution, thermal stress generation, and the resulting nonlinear drift of the material's refractive index, fundamentally changing the previous passive situation that relied on ex-post compensation and experience-based design.

[0016] 2) A hotspot region identification method based on dual threshold criteria and a mode mismatch region localization technology integrating optical sensitivity were proposed, enabling precise localization of the core regions of metasurface performance degradation. This allows compensation measures to be targeted and focused on the tiny areas most prone to failure, greatly improving the efficiency and pertinence of thermal management and overcoming the shortcomings of traditional global heat dissipation solutions, such as lack of focus and low resource utilization.

[0017] 3) Based on a compensation structure generation method that combines reverse design and multiphysics, the calculated performance degradation (such as resonant wavelength drift) is inversely mapped to the geometric parameters of specific high thermal conductivity interlayers and stress-buffered microstructures, achieving quantification and spatial customization of compensation measures. The final set of compensation structure design parameters has the dual functions of optical function restoration and thermal stress suppression, and conforms to the constraints of nanofabrication processes, ensuring a seamless transition from design to manufacturing.

[0018] In summary, this invention constructs a complete technical closed loop encompassing mechanism analysis, precise positioning, reverse design, and experimental verification. These elements work synergistically to ensure that the core spectral filtering function (including resonant wavelength, bandwidth, and enhancement ratio) of metasurfaces remains stable over long periods under high-power laser incidence. This provides a solid technical guarantee for the reliable application of metasurface devices in demanding scenarios such as high-power laser communication, processing, and measurement. Attached Figure Description

[0019] The accompanying drawings, which are incorporated in and form a part of this specification, illustrate embodiments consistent with this disclosure and, together with the description, serve to explain the principles of this disclosure.

[0020] Figure 1 A flowchart of the spectral enhancement filtering metasurface method based on multiphysics coupling provided in this disclosure is shown.

[0021] The accompanying drawings have illustrated specific embodiments of this disclosure, which will be described in more detail below. These drawings and descriptions are not intended to limit the scope of the concept in any way, but rather to illustrate the concepts of this disclosure to those skilled in the art through reference to particular embodiments. Detailed Implementation

[0022] The present disclosure will be further described below with reference to the accompanying drawings. The following embodiments are only used to illustrate the technical solutions of the present disclosure more clearly, and should not be used to limit the scope of protection of the present disclosure.

[0023] The components of the embodiments of the invention described and illustrated herein can typically be arranged and designed in various different configurations. Therefore, the following detailed description of the embodiments of the invention provided in the accompanying drawings is not intended to limit the scope of the claimed invention, but merely to illustrate selected embodiments of the invention. All other embodiments obtained by those skilled in the art based on the embodiments of the invention without inventive effort are within the scope of protection of the invention.

[0024] In the following, the terms “comprising,” “having,” and their cognates, which may be used in various embodiments of the invention, are intended only to indicate a particular feature, number, step, operation, element, component, or combination thereof, and should not be construed as excluding, firstly, the presence of one or more other features, numbers, steps, operations, elements, components, or combinations thereof, or adding the possibility of one or more features, numbers, steps, operations, elements, components, or combinations thereof.

[0025] Unless otherwise specified, all terms used herein (including technical and scientific terms) shall have the same meaning as commonly understood by one of ordinary skill in the art to which the various embodiments of the invention pertain. Terms (such as those defined in commonly used dictionaries) shall be interpreted as having the same meaning as in their contextual meaning in the relevant technical field and shall not be interpreted as having an idealized or overly formal meaning, unless clearly defined in the various embodiments of the invention.

[0026] Figure 1 The flowchart of the spectral enhancement filtering metasurface method based on multi-physics coupling provided in this disclosure is as follows: Figure 1 As shown, the process may include the following steps: Step S1: Establish a thermo-mechanical multiphysics model of the metasurface under high-power laser incident, obtain its temperature field through calculation, and identify hot spot regions based on this.

[0027] In applications such as high-power laser communication or spectral measurement, the intensity of the incident laser is much higher than that under conventional laboratory conditions, leading to significant localized heat accumulation in metasurface devices. Since the core of this invention relies on the synergistic effect of multiple physical fields (optical, thermal, and mechanical), drastic changes in thermal field parameters will cause a nonlinear shift in the material's refractive index, thereby disrupting the original precise electromagnetic coupling mode. The direct consequence is a shift in the filter resonant wavelength, and even irreversible performance degradation. Therefore, accurately modeling the heat source and temperature distribution under high-power laser incidence is fundamental to all subsequent compensation designs. The purpose of this step is to construct a physical model that accurately reflects the temperature rise distribution of the metasurface under actual operating conditions and precisely locate the hotspots most prone to thermal-optical mismatch. The specific implementation process is as follows: Step S1.1: Metasurface geometry discretization and incident laser power density field calculation.

[0028] In practical implementation, the physical structure of the metasurface device first needs to be mathematically characterized. The metasurface typically consists of subwavelength nanostructures arranged periodically on a substrate, i.e., the metasurface functional layer. Its overall geometry is defined by three key parameters: the period length of the unit cell in the x-direction. Period length in the y-direction And the thickness t of the functional layer structure. The units for these parameters are meters (m), and their typical value ranges are as follows: and exist to Between, the thickness t is to between.

[0029] To perform numerical calculations, the continuous metasurface region needs to be discretized into a regular two-dimensional mesh. The mesh step size s is determined based on the periodicity of the elements, and is typically taken as... The coordinates of each node in the grid are: .

[0030] Simultaneously, the physical parameters of the incident laser beam need to be defined. This includes the peak power density of the incident light at the center of the laser spot. (unit ,scope And the beam waist radius, which characterizes the energy concentration of the light spot. (Unit: m, range) That is, the light intensity decays to the center value. The radius at point (i,j). For each cell (i,j) on the grid, its corresponding local laser power density. The calculation is based on the spatial distribution model of the Gaussian beam, and the formula is as follows: This calculation yields a discrete incident laser power density distribution matrix covering the entire metasurface. This power density field clearly depicts the spatial distribution of laser energy, laying the geometric and physical foundation for subsequent calculations of light energy absorption and heat energy conversion.

[0031] Step S1.2: Calculate the volumetric heat source density based on the absorptivity distribution.

[0032] After obtaining the incident laser power density distribution, the rate at which the metasurface functional layer material absorbs light energy and converts it into heat is calculated, i.e., the volume heat source density. The absorption capacity of the metasurface functional layer for incident light at different locations is not uniform; it is determined by the electromagnetic response characteristics of the nanostructure and is characterized by a spatially varying absorptivity distribution. (dimensionless, range) ), is the optical absorptivity of the metasurface functional layer at grid cell (i,j), characterizing the proportion of light power incident on this cell at the target wavelength that is absorbed by the material and converted into heat. This distribution can be obtained in advance through electromagnetic simulation based on the geometry and material properties of the metasurface cells, or experimentally calibrated at the design wavelength, and is used as known data in this step.

[0033] For each grid cell, the heat generation rate per unit volume, i.e., the volumetric heat source density. (unit The power density is proportional to the laser surface power density absorbed at that point. Considering that the metasurface functional layer has a specific physical thickness t, the absorbed power in the surface can be equated to the bulk power. Therefore, the bulk heat source density... Through formula The calculation shows that, Let be the optical absorption rate of the metasurface functional layer at grid cell (i,j). Let be the local laser power density corresponding to grid cell (i,j). This formula equates the absorbed surface power to a bulk heat source, thus constructing the heat source distribution field that drives the subsequent temperature field solution. After calculation, the bulk heat source density distribution matrix is ​​obtained. It quantitatively describes the heating intensity at various points within the metasurface.

[0034] Step S1.3: Solve the steady-state heat conduction equation to obtain the temperature field.

[0035] Solve for the density of the in-situ heat source Driven by this process, the steady-state temperature distribution of the metasurface after reaching thermal equilibrium is described. This is a two-dimensional steady-state heat conduction problem involving an internal heat source, and its governing equation is: Where k is the thermal conductivity of the material (unit: ). ,scope T is the temperature field to be determined, and Q is the volumetric heat source density (unit: T). ), from .

[0036] To perform numerical solutions, the governing equations are discretized using the standard finite difference method (FDM) in computational heat transfer. For the internal mesh node (i,j), the Laplace operator... A central difference scheme is used for approximation. For boundary nodes, a third type of boundary condition (convective heat transfer boundary) needs to be applied. ,in It is the convective heat transfer coefficient. It is the boundary normal vector. The ambient temperature (in K) is used, and the temperature is discretized using the finite difference method. Finally, the discretized temperature is incorporated into the system of equations for solution.

[0037] Assemble the discrete equations for all nodes to obtain a equation relating the temperatures of all nodes. Large sparse linear equation systems, Let be the temperature at node (i,j). Solving this system of equations is a standard problem in computational mathematics and can be done using mature iterative methods (such as the Gauss-Seidel iteration) or direct methods. The steady-state temperature field of the entire metasurface can then be obtained after solving the system. Furthermore, the steady-state temperature rise field is defined. Temperature rise at each node Depend on Calculation, where The ambient temperature is represented by this temperature rise field. This quantitatively reveals the spatial distribution of the laser heating effect on the metasurface and serves as a direct basis for identifying hotspots.

[0038] Thus, by comprehensively solving for the temperature field and thermal stress, a thermo-mechanical multiphysics model of the metasurface under high-power laser incidence was constructed. The spatial distribution of temperature output by this model is called the temperature field, and the spatial distribution of thermal stress is called the thermal stress field. Based on this temperature field and thermal stress field, subsequent hotspot region identification can be performed.

[0039] Step S1.4: Calculate heat flux density and identify hot spot areas.

[0040] To more accurately pinpoint areas that may cause severe thermal-optical mismatch problems, the temperature field alone may not be sufficient; analysis of the heat flux distribution is also necessary. Hotspot regions often exhibit both high temperature rise and high heat flux density (i.e., a large temperature gradient).

[0041] First, calculate the heat flux density field according to Fourier's law. Heat flux density is a vector quantity with a magnitude of... This reflects the intensity of the heat flow at that point, which can be obtained by calculating the magnitude of the temperature gradient. Using the central difference approximation, the calculation formula is as follows: The heat flux density value of each grid point is obtained. (unit ), forming the heat flux density matrix H.

[0042] To identify potential risk areas (i.e., hotspots) most prone to performance degradation, it is necessary to consider both the absolute level of temperature rise and the gradient level of heat flux. Two thresholds are set: a temperature rise threshold... (e.g., 5-50K, determined based on the sensitivity of the material's thermo-optic coefficient) and heat flux density threshold. (For example (Set according to the system's heat dissipation capacity). For each grid cell, when its temperature rises... Exceeding the temperature rise threshold and heat flux density Exceeding the heat flux density threshold At that time, mark it as a hotspot, that is Otherwise, it is marked as a normal area. , A binary identifier mask is used for the hotspot region, thereby generating a binary hotspot mask matrix. ,Right now ,in The location is the identified key area of ​​interest.

[0043] Finally, a steady-state temperature rise field was obtained. The results clearly identify the most vulnerable regions of the metasurface under high-power laser incidence, providing precise targets and basis for subsequent compensation design, thereby quantitatively revealing the mechanism by which the thermal field disrupts the electromagnetic field coupling mode.

[0044] In the technical solution of this disclosure, by establishing a heat source distribution and steady-state temperature field model under high-power laser incident, the precise quantification and spatial positioning of the metasurface thermal effect are achieved. The macroscopic laser heating phenomenon is transformed into a microscopic, spatially distributed volumetric heat source and temperature rise field. Furthermore, by combining temperature gradient information, key hotspot regions exhibiting both high temperature rise and high heat flux density are identified. This quantitative analysis provides precise physical objects and spatial targets for subsequent compensation design, fundamentally changing the limitations of traditional methods that rely on empirical estimation and globally uniform processing, and laying the data foundation for the entire active compensation method.

[0045] Step S2: Calculate the thermal stress field in the temperature field, calculate the refractive index change and its distribution of the metasurface material based on the temperature field and thermal stress field, and then quantify the resonant wavelength drift caused by it, and locate the optical mode mismatch region.

[0046] This step aims to quantitatively analyze the thermal field (including the temperature rise field) calculated in step S1. The influence of the hotspot mask matrix (M) on the electromagnetic response characteristics of metasurfaces is investigated. The core of this study lies in establishing the mapping relationship between the temperature field and the material's optical parameters, and quantitatively evaluating the resonant wavelength drift and mode mismatch caused by thermal effects based on perturbation theory. The specific implementation process is as follows: Step S2.1: Calculation of refractive index distribution driven by temperature rise. In practical implementation, the steady-state temperature rise field This is mapped to the spatial distribution variation of the refractive index of the metasurface material. The calculation requires incorporating the material's own thermo-optical properties, primarily its reference refractive index at a reference temperature (e.g., ambient temperature). (dimensionless, range) Thermotropic refractive index coefficient, which characterizes the rate of change of refractive index with temperature. (unit ,scope Furthermore, the effect of stress caused by hindered thermal expansion on the refractive index must be considered, which requires the material's coefficient of linear expansion. (unit ,scope Young's modulus (unit ,scope Poisson's ratio (dimensionless, range) and stress-refractive index coefficient (unit ,scope ).

[0047] For each grid cell First, calculate the temperature rise. The resulting equivalent thermal stress Its approximate value is This is a simplified one-dimensional thermal stress model used to estimate the contribution of thermal stress to the refractive index. Subsequently, the total refractive index change of this element is calculated. It consists of two parts: thermally induced refractive index change and stress-induced refractive index change. .

[0048] Ultimately, the refractive index value at that point is By traversing all mesh elements, the refractive index distribution matrix driven by the thermal field can be obtained. and its change matrix This refractive index field is used for subsequent calculations of electromagnetic field perturbations.

[0049] Step S2.2: Dielectric constant mapping and correlation with cold-state intrinsic mode fields. In obtaining the refractive index distribution matrix Next, the corresponding dielectric constant change needs to be calculated and correlated with the intrinsic electromagnetic modes of the metasurface when it is not thermally disturbed (i.e., in a cold state). Dielectric constant With refractive index The relationship is Therefore, the cold-state (reference state) dielectric constant The change in dielectric constant caused by thermal disturbance It can be approximated as Simultaneously, the intrinsic electric field distribution under its cold operating mode (i.e., target resonance mode) is obtained from the original electromagnetic design data of the metasurface. ,unit ,in, This refers to the intrinsic electric field distribution of a metasurface in its designed resonance mode when it is undisturbed by heat (i.e., in a cold state). This field distribution is typically known through simulation or experimentation and has undergone amplitude normalization. Furthermore, the physical volume corresponding to each mesh cell... Based on grid step size and functional layer thickness Calculated, i.e. .

[0050] To quantify the contribution of each unit to the overall optical response, a field energy weighting coefficient matrix is ​​defined. Its elements are derived from the formula Calculate the weighting factor Physically proportional to the electromagnetic energy stored in the discrete grid cell by the cold-state eigenmode, it represents the change in the dielectric constant. This is linked to changes in model energy, laying the foundation for further perturbation analysis.

[0051] Step S2.3: Estimation of resonant wavelength drift under first-order perturbation. Based on electromagnetic perturbation theory, metasurface resonant wavelength The offset is closely related to the spatially weighted average of the dielectric constant perturbation. This step utilizes the results from the first two steps to determine the change in dielectric constant caused by the thermal perturbation. The sum of field energy weighting coefficient matrix To estimate the amount of resonant wavelength shift caused by thermal effects.

[0052] First, calculate the total mode energy in the cold state. (A normalization factor): Next, the equivalent perturbation energy caused by the dielectric constant perturbation is calculated. The amount of drift of the resonant wavelength (Unit: m) can be estimated using the following first-order perturbation formula: ,in This is the design resonant wavelength (in meters) in the cold state. Furthermore, to identify the region that contributes most to wavelength drift, the sensitivity of each grid cell can be defined. (Unit: m): Sensitivity matrix This visually demonstrates which regions on the metasurface experience the most significant impact of temperature rise on overall performance degradation (wavelength drift). The calculated wavelength drift is shown below. and sensitivity matrix It is a key quantitative source for subsequent compensation design.

[0053] Step S2.4: Calculation of mode mismatch range and mismatch factor. By combining thermal and electromagnetic field information, the degree of distortion caused by thermal perturbation to the target electromagnetic mode, i.e., mode mismatch, is assessed. This focuses not only on the global wavelength shift but also on localized regions that may lead to severe mode morphology distortion.

[0054] Define the relative refractive index perturbation for each element. ,in, This represents the total change in refractive index of the grid cells. The reference refractive index of the material at a reference temperature (such as ambient temperature). Define an index that reflects the degree of local pattern mismatch. It takes into account both the magnitude of the refractive index change and the energy of the cold field at that location: ,in, It is the relative refractive index perturbation of each unit. It refers to the intrinsic electric field distribution of a metasurface in its designed resonance mode when it is not subjected to thermal disturbance. This is the physical volume corresponding to each mesh cell. Combined with the hotspot mask obtained in step S1... (Identifying regions with high temperature rise and high heat flux), a dual threshold criterion is used to determine mode mismatch regions, generating a mismatch region mask. ,in Threshold (range) set according to pattern tolerance To further quantify the severity of the overall mismatch, a global mode mismatch factor is calculated. Mismatch factor (dimensionless, The larger the value, the more severe the disruption to the target operating mode caused by thermal disturbance. Ultimately, the resonant wavelength shift obtained in this step... Spatial sensitivity matrix Mode mismatch region mask and mismatch factor These results fully reveal the mechanism and extent of thermal-optical mismatch, and the masking of the mode mismatch region. It precisely identifies the physical region requiring compensation and the amount of resonant wavelength shift. The overall target quantity that needs to be compensated is quantitatively defined, and the spatial sensitivity matrix is ​​used. This provides a spatial allocation strategy for achieving this overall target quantity, and provides a comprehensive and quantitative basis for the next step of designing compensation structure parameters.

[0055] In the technical solution of this disclosure, a quantitative mapping relationship between thermal field perturbation and optical performance degradation is established, fully revealing the intrinsic physical mechanism of thermal-optical mismatch. By converting the temperature rise field into a change in refractive index distribution and using electromagnetic perturbation theory to correlate it with cold-state eigenmodes, the resonant wavelength drift is successfully quantified, and the optically sensitive region that contributes the most to performance degradation is located. This embodiment not only obtains the severity of performance degradation caused by thermal effects but also accurately identifies which regions' thermal effects are the main cause of degradation, thereby elevating the compensation target from suppressing generalized "heat" to correcting specific "performance shifts."

[0056] Step S3: Based on the resonant wavelength drift and the optical mode mismatch region, reverse design the geometric parameters of the compensation structure, which is used to suppress thermal effects to offset the resonant wavelength drift.

[0057] This step, based on the thermal-optical mismatch results obtained from the quantitative analysis in step S2, reverse-engineers a metasurface compensation structure capable of actively counteracting the mismatch effect. The basic principle is to identify hot spots and mode mismatch regions, and by introducing high thermal conductivity material intercalations and / or stress-buffering microstructures with specific geometries, alter the local heat diffusion path and stress distribution, thereby significantly reducing the temperature rise and thermal stress in these regions. This fundamentally suppresses the nonlinear drift of the refractive index, obtaining a set of optimized and manufacturability-corrected compensation structure geometric parameters that can be directly used for manufacturing, ensuring that the metasurface maintains stable spectral filtering performance under high-power laser incident light. The specific implementation process is as follows: Step S3.1: Determine the target temperature rise reduction field and the compensation domain. In practice, the first step is to integrate the comprehensive analysis results from step S2, including the refractive index increment matrix. Dielectric constant increment matrix Field energy weighting coefficient matrix Spatial sensitivity matrix Resonance wavelength shift Hotspot mask and mode mismatch region mask At the same time, it is also necessary to reuse the material's own thermo-optical coefficient. Coefficient of linear expansion Young's modulus Poisson's ratio and stress-refractive index coefficient Parameters such as these.

[0058] To eliminate the calculated resonant wavelength drift This requires determining the amount of temperature rise to be reduced at various points in space. An equivalent thermo-optic coefficient needs to be defined. To comprehensively characterize the combined effect of thermal expansion stress on the refractive index: Under the first-order approximation, the relationship between the increase in dielectric constant and temperature rise can be expressed as follows: To achieve spectral stability compensation, the resonant wavelength shift needs to be reduced. Based on its spatial origin (i.e., sensitivity) The energy is inversely allocated to the optical mode mismatch region to determine the target temperature rise reduction. This is to ensure the corrected global perturbation energy... Thus making The target temperature rise reduction required for each unit can be derived. This should be related to the unit's sensitivity to wavelength drift. and mismatch state The relationship between them can be expressed as follows: ,in, It is sensitivity average amplitude, This is a global scaling factor used to normalize the sensitivity and map it to the actual required temperature rise reduction; its value is determined by the global energy constraint. Sure, For a symbolic function, take The symbol. Meanwhile, the scope of the compensation structure is defined by the union of the hotspot region and the mode mismatch region, i.e., the compensation scope mask. ,in It is a binary variable used to identify whether the mesh element (i, j) needs to undergo compensation structural processing. This sub-step ultimately yields the target temperature rise reduction distribution matrix. and compensation domain mask This provides clear quantitative targets and spatial scope for subsequent physical compensation design.

[0059] Step S3.2: Selection of compensation materials and mapping of structural primitive parameters. To obtain the target temperature reduction in space and compensation scope This sub-step then focuses on transforming the abstract temperature rise reduction into concrete, achievable compensation structures and material parameters. Compensation is primarily achieved through two structural primitives: first, depositing high thermal conductivity material intercalations to enhance lateral heat diffusion; and second, etching stress-buffered trenches to release localized thermal stress.

[0060] During implementation, it is necessary to define candidate high thermal conductivity materials and their properties, including their thermal conductivity coefficient. Significantly higher than the thermal conductivity of the substrate material (Typical range) Simultaneously, manufacturing constraints for the trench microstructure are defined, such as the maximum allowable width of the trench. and maximum allowable depth Based on thermal simulation or empirical formulas, a model is established to reduce the temperature rise caused by unit compensation structural energy. For high-conductivity intercalation layers, the reduction effect is approximately proportional to their thickness. Compared to the thermal conductivity of the material; for trenches, its effect is approximately proportional to its opening area. This relationship can be summarized as follows: ,in, Let be the amount of local temperature rise reduction to be achieved at the discrete grid cell (i,j). The geometry-thermal coupling coefficient is obtained through simulation or experimental calibration. The dimensions are , The dimensions are , Let be the thermal conductivity of the selected high thermal conductivity material applied to the discrete mesh element (i,j), and k be the thermal conductivity of the substrate material. The thickness of the high-conductivity intercalation layer applied to the discrete mesh element (i,j) and , respectively, represent the width and depth of the stress buffer microstructure located at the discrete grid cell (i,j).

[0061] Subsequently, a target mapping is established: ,according to The size allows for the allocation of appropriate high-conductivity materials to different regions. Therefore, the thermal conductivity of the material in each unit may be different. Ultimately, this sub-step is for the compensation domain. Each grid cell within the range outputs a set of initial design variables: high-conductivity material selection. High conductivity intercalation thickness trench width and trench depth These parameters will serve as the basis for the next step of closed-form solution and optimization.

[0062] Step S3.3: Design variable closed-form solution and manufacturability trimming. This sub-step aims to transform the initially mapped design variables into discretized, realizable parameters that conform to the constraints of nanofabrication processes; that is, to perform discretization and quantization processing under manufacturing process constraints. This involves obtaining the design variable field obtained in the previous step. Target reduction amount Compensation scope And manufacturing process parameters, such as the quantization steps of various geometric quantities. (typical value) A layered strategy is employed for closed-loop solution. High-conductivity interlayers are preferentially utilized to achieve most of the temperature rise reduction target. For each element, the initial solution for the high-conductivity interlayer thickness is... Calculate the remaining target reduction amount. Then, trench geometry is used to compensate for this residual, with the initial solution for the trench width being... and make depth Subsequently, all the initial geometric parameters obtained from the above calculations were... , , To achieve mass production: , , ,in, , , These represent the manufacturing quantization steps for thickness, width, and depth, with typical values ​​ranging from 5 to 20 nm. This is a rounding function. Based on this, the expected reduction in local temperature rise can be calculated. Simultaneously, a binary structure modification mask is generated. This is used to identify which units actually require the addition of compensation structures: This step ultimately yields fabrication-friendly optimized compensated structural parameters: the high-conductivity intercalation thickness matrix. Trench width matrix Trench depth matrix and the expected reduction and structural modification mask .

[0063] Step S3.4: Predict the compensation effect and output the parameter package. Before finalizing the design and putting it into manufacturing, closed-loop prediction must be performed within the design domain to verify whether the compensated effect meets the target requirements. During implementation, the compensated temperature rise field is updated first: ,in, For the original temperature rise field, To compensate for the reduction in temperature rise caused by the structure. Subsequently, based on the updated temperature rise field. The formula in step S2.1 is reused to calculate the compensated refractive index increment. and the increment of the compensated dielectric constant ,in, The equivalent thermo-optical coefficient, The reference refractive index is the material's base refractive index at the reference temperature.

[0064] Next, based on the first-order perturbation theory in step S2.3, the compensated resonant wavelength shift is predicted: , ,in, For new perturbation energy, The field energy weighting coefficient. The predicted wavelength shift after compensation. The design resonant wavelength under cold conditions. This represents the total mode energy in the cold state. If... ( For tolerance, for example If the result is positive, the compensation design is deemed to meet the correction objective. If not, the process returns to sub-step S3.2, where the material selection or quantization step is adjusted before recalculating iteratively. Ultimately, this step yields a parameter package containing all compensation design information. The core of this parameter package is the final set of geometric parameters, which specifically includes... And the predicted post-compensation drift amount This parameter package Step S4 will be delivered directly to guide the actual preparation of the compensated metasurface sample.

[0065] In the technical solution of this disclosure, the abstract goal of suppressing thermal-optical mismatch is transformed into specific, manufacturable compensation structural geometric parameters. By inversely distributing the wavelength shift to be compensated to various points in space and mapping it to the dimensional parameters of high thermal conductivity intercalation layers and stress buffer trenches, the compensation measures are quantified and spatially customized. The final result is a set of discretized geometric parameters optimized by manufacturing process constraints, ensuring that the compensation design scheme has both high performance and high feasibility, providing a direct and reliable basis for subsequent sample preparation.

[0066] Step S4: Prepare a compensated metasurface sample according to the geometric parameters and test its spectral response under high-power laser.

[0067] This step is a crucial bridge connecting the compensation design and the final performance verification. Its core task is to package the compensation structure design parameters from step S3. The fabricated compensated metasurface sample was transformed into a real physical structure using actual nanofabrication techniques. Then, under high-power laser incident conditions simulating real-world application scenarios, the sample was subjected to spectral testing to obtain its actual optical response data. The specific implementation process is as follows: Step S4.1: Generation of compensation structure mask layout and configuration of process stack. In practice, the compensation structure parameter package from step S3 is first parsed. Its core is a structural modification mask. This mask precisely specifies which mesh elements on the metasurface require compensation structure fabrication. For these units that require modification, the specific processing parameters are determined by the high-conductivity intercalation thickness matrix. Trench width matrix Trench depth matrix and high-conductivity material selection matrix definition.

[0068] Based on these discretized design data, mask layout data that can be directly used in electron beam lithography or laser direct writing equipment is generated. The layout generation process essentially involves converting the design values ​​of each grid cell... The mapping is performed on the corresponding geometric shapes (such as rectangles and polygons) and their dimensions. The final output is a binary layout matrix. in That is, the location of the graphic on the map and The units correspond one-to-one.

[0069] At the same time, according to the material selection matrix Highly conductive materials (such as diamond and boron nitride) are selected for different regions, and corresponding nanofabrication process stacks are configured. This process stack is an ordered set of instructions that clearly defines the sequence of processing steps, process parameters, and materials used to achieve the composite structure. A typical process stack might include: ① photoresist coating and patterning on a metasurface substrate (defining high-conductivity intercalation regions); ② electron beam evaporation deposition of high-conductivity materials. ③ The stripping process removes excess high-conductivity material to form an intercalation layer; ④ A second photolithography step defines the trench region; ⑤ Reactive ion etching forms the trench structure. ⑥ Cleaning and encapsulation. Layout and process stack Together, they constitute a complete pre-package to guide sample preparation.

[0070] Step S4.2: Nanofabrication to achieve high conductivity intercalation and buffer trenches. This step is the core manufacturing process that transforms design drawings into a physical structure. In an ultra-clean environment, following the process stack... The instructions are used to sequentially perform each step of nanofabrication on the metasurface sample.

[0071] For the fabrication of highly conductive intercalation layers, the key control parameter is deposition time. The theoretical deposition time for each unit region is... Due to its target thickness and the deposition rate of the selected high-conductivity material Joint decision: In actual processing, considering process uniformity, alignment errors, and edge effects, the achieved high conductivity layer thickness... It will be slightly lower than the theoretical value, and the relationship can be expressed as follows: ,in It is a process loss factor less than 1 (usually 1). Its specific value is obtained through process calibration.

[0072] For the fabrication of trench structures, the key control parameter is etching time. The theoretical etching time for each unit region is... Due to its target depth and etching process rate Decide: The actual depth of the etched trenches The width of the trench It is then affected by the etching anisotropy factor Impact: .

[0073] Throughout the entire processing, a high-precision alignment system is required to ensure the accuracy of graphic transfer, and the center deviation between adjacent structures must not exceed the preset upper limit of alignment error. The final output of this sub-step is the geometric parameter matrix of the realized structure on the sample: the high-conductivity intercalation thickness matrix. Groove width matrix Depth matrix achieved with trenches These data form the basis for assessing how well the manufacturing results match the design objectives.

[0074] Step S4.3: Geometry and material measurement and consistency mapping. After sample preparation, the actual compensation structure needs to be measured using precision metrology equipment to verify whether it meets design requirements and manufacturing tolerances. Atomic force microscopy (AFM) or scanning electron microscopy (SEM) are used to measure the intercalation thickness, trench width, and depth in key areas.

[0075] The measured realized value With respect to the design target value in step S3 Compare and calculate the geometric deviation: According to the preset upper limit of allowable geometric deviation. For each grid cell, a pass / fail determination is performed to generate a pass / fail mask. Simultaneously, based on measured geometric parameters, the equivalent, practically achievable temperature rise reduction was calculated. : Qualified mask and measured reduction This will be used to guide the analysis and screening of subsequent test data, ensuring that only data from qualified areas are used for the final performance evaluation.

[0076] Step S4.4: High-power laser loading and spectral response test. The prepared and verified compensated metasurface sample was mounted in the test optical path to simulate its real working environment for high-power testing. The inputs to the test system included the peak power density of the high-power laser source. (scope Test the beam waist radius of the light spot and covering cold resonant wavelengths A sufficient range of wavelengths to scan nearby .

[0077] First, turn on the laser and direct the high-power laser beam onto the sample. To ensure a stable thermal field, continue applying the laser until the system temperature reaches equilibrium. Then, while maintaining a constant laser power, scan within a set wavelength range and measure the optical power of the transmitted and reflected light using a spectrometer or power meter. and Consider the detector's wavelength response. Calculate the spectral response curve of the sample: , .

[0078] in The incident light power is monitored in real time by the beam splitter. This is achieved by analyzing the transmission spectrum. Find its minimum value or the reflection spectrum Find its maximum value to determine the measured resonance wavelength. Calculate the measured value and the expected value of the compensation design. Deviation between: This deviation value directly reflects the accuracy of the compensation design in the actual device.

[0079] Step S4.5: Test data integration and verification package output. Finally, all test data and key process data are integrated to form a complete verification data package. This data package is used for the final stability evaluation. Raw spectral data: transmission spectrum and reflection spectrum Discrete sequences.

[0080] Core performance indicator: Measured resonant wavelength and its deviation from design expectations .

[0081] Quantitative indicators for process implementation: Measured equivalent temperature rise reduction Manufacturing pass rate (percentage of qualified units).

[0082] Associated design parameters: Design prediction values ​​used as a reference and compensation structure parameter package Abstract.

[0083] The data packet It is the only quantitative input for the final spectral enhancement filter stability evaluation in step S5. It comprehensively and objectively records the real performance of the compensated metasurface under high power load, providing conclusive experimental evidence for determining whether the method of the present invention can effectively suppress the thermal-optical mismatch problem.

[0084] In the technical solution of this disclosure, design parameters are transformed into real structures on samples with high quality through a standardized nanofabrication process, and the sample performance is objectively tested under high-power conditions simulating real-world operating conditions. By correlating the geometric parameters of the prepared compensation structure with measured spectral response data, a closed-loop verification from design indicators to realized indicators is completed, providing experimental evidence and data support for the effectiveness of the entire method. It serves as an indispensable bridge connecting theoretical design and final performance verification.

[0085] Step S5: Based on the spectral response, evaluate the spectral enhancement filtering stability of the compensated metasurface sample.

[0086] This step involves a comprehensive and quantitative analysis of the actual spectral response data obtained from the high-power test in step S4. It systematically evaluates whether the compensated metasurface maintains its core spectral filtering function and enhancement characteristics under high-power laser incidence. The evaluation focuses on three key performance dimensions: stability of the resonant wavelength, retention of the filter passband bandwidth, and achievement of the optical enhancement ratio target. Ultimately, a comprehensive stability assessment based on measured data is obtained, directly determining whether the method described in this invention can effectively solve the thermal-optical mismatch problem in high-power scenarios, thereby achieving the ultimate goal of spectral enhancement filtering. The specific implementation process is as follows: Step S5.1: Determine the stability of the resonant wavelength. In this embodiment, the test result package output in step S4.5 is first... The core data extracted mainly includes the measured resonance wavelength. Wavelength drift prediction during the compensation design phase Simultaneously, the designed resonant wavelength of the metasurface in the cold state (without thermal effects) is reused. As a benchmark.

[0087] The core of the calculation is to determine the total offset of the actual operating wavelength of the metasurface relative to its original design value under high power load. The offset This design integrates the drift caused by thermal effects with the correction effect introduced by the compensation structure. To determine stability, the actual effect after compensation needs to be compared with the design expectation. A wavelength stability determination mask is defined. Its value selection rules are as follows: ,in Wavelength tolerance (typical range) set according to application requirements ).like This indicates that, after compensation, the actual position of the resonant wavelength closely matches the design expectation, and the wavelength stability meets the requirements. The results obtained in this sub-step... and It is the first key indicator for overall stability evaluation.

[0088] Step S5.2: Evaluation of filter bandwidth retention. The performance of a spectral filter depends not only on the resonant wavelength, but also on its passband bandwidth. Significant changes in bandwidth can compromise the filter's selectivity. This sub-step involves analyzing the test results... Extracting transmission spectrum curves and reuse the nominal bandwidth from the cold design. .

[0089] First, from the measured transmission spectrum Extracting the bandwidth from the data. The specific method is: locating the transmission spectrum valley value (i.e., the resonant wavelength). Scanning in the direction of increasing wavelength from the point of lowest transmittance, find the wavelength corresponding to when the transmittance rises to half of the valley transmittance (i.e., the -3 dB point). Similarly, scan in the direction of decreasing wavelength to find another -3 dB wavelength. Actual bandwidth That is, the difference between these two wavelengths: .

[0090] Subsequently, the retention rate of the measured bandwidth relative to the cold-state design bandwidth was calculated. Bandwidth retention requirements are typically set as a range, for example... This means that during actual high-power operation, the filter's bandwidth variation is controlled within ±20%, which is considered undamaged. The output of this sub-step... and It quantitatively reflects the degree of influence of thermal effects and compensation structure on the filter shape.

[0091] Step S5.3: Enhancement ratio satisfaction analysis.

[0092] The "enhancement ratio" is a core metric for evaluating the performance of this metasurface filter; it characterizes its ability to enhance the optical field through resonance. This sub-step extracts test results... Extracting transmission spectra and reflection spectrum And reuse the target enhancement ratio set in the design phase .

[0093] Enhancement ratio Defined as the ratio of the peak value of the reflection spectrum to the valley value of the transmission spectrum: The larger this ratio, the stronger the metasurface's ability to confine energy within a local field at the resonance point, and the more significant its filtering and enhancement effects. To determine whether the compensated performance meets the target, the measured enhancement ratio is compared with the design target value to generate an enhancement ratio determination mask. ,in To enhance specific tolerance (typical range) ).like This indicates that even at high power operation, the metasurface's optical field enhancement capability remains above the expected level, without significant degradation due to thermal effects. The results of this sub-step... and It is a key basis for evaluating whether its optical nonlinear performance is stable.

[0094] Step S5.4: Comprehensive stability determination and result output.

[0095] This sub-step involves summarizing and logically judging the independent evaluation results obtained from the first three sub-steps to arrive at a unique conclusion regarding the overall stability of the compensated metasurface.

[0096] The comprehensive judgment is based on a simple logical "AND" relationship: only when the resonant wavelength stability, filter bandwidth retention, and enhancement ratio all meet the requirements can the compensation design be ultimately deemed successful and effective under high-power conditions. Therefore, the final stability result is defined as follows: (1 indicates successful compensation, 0 indicates failed compensation): Finally, a comprehensive results package containing all quantitative evaluation indicators and final conclusions is output: .like This demonstrates that the spectral enhancement filtering metasurface method based on multi-physics coupling described in this invention, combined with its thermo-optical mismatch compensation design, can effectively suppress the thermal drift problem caused by high-power laser incident light, enabling the device to maintain a stable resonant wavelength, undistorted filtering bandwidth, and excellent optical enhancement capability in actual operation, thus successfully achieving the ultimate goal of spectral enhancement filtering. Then, it is necessary to go back to step S3, check the design parameters of the compensation structure, and perform optimization iterations. This conclusive output provides the final and indisputable experimental evidence for the effectiveness of the entire technical solution.

[0097] In the technical solution of this disclosure, a comprehensive scientific judgment is made on the stability of the compensated metasurface based on multi-dimensional performance indicators. By examining not only the stability of the resonant wavelength but also comprehensively evaluating the retention of the filter bandwidth and the achievement of the optical enhancement ratio, the comprehensiveness and reliability of the evaluation results are ensured. The final deterministic conclusion (success or failure) provides the ultimate criterion for whether this method can effectively solve the thermal-optical mismatch problem in high-power scenarios, and fully achieves the ultimate goal of spectral enhancement filter stability.

[0098] In summary, this invention overcomes the limitations of traditional passive cooling and static material optimization. By establishing a precise quantitative model coupling multiple physical fields of light, heat, and force, it achieves a mechanistic revelation and forward-looking prediction of the thermal-optical mismatch problem caused by high-power lasers. It can accurately simulate the entire process of laser energy absorption, heat conversion, temperature field distribution, thermal stress generation, and the resulting nonlinear drift of the material's refractive index, fundamentally changing the passive approach of relying on post-compensation and empirical design. A hotspot region identification method based on dual threshold criteria (temperature rise and heat flux density) and a mode mismatch region localization technology incorporating optical sensitivity are proposed, enabling precise localization of the core areas of metasurface performance degradation. This allows compensation measures to be targeted and focused on the smallest areas most prone to failure, greatly improving the efficiency and specificity of thermal management and overcoming the shortcomings of traditional global heat dissipation schemes, such as lack of focus and low resource utilization. Based on a compensation structure generation method that combines reverse design and multiphysics, the calculated performance degradation (such as resonant wavelength drift) is inversely mapped to the geometric parameters of specific high thermal conductivity intercalation and stress-buffering microstructures, achieving quantification and spatial customization of compensation measures. The final set of compensation structure design parameters has the dual functions of optical function restoration and thermal stress suppression, and conforms to the constraints of nanofabrication processes, ensuring a seamless transition from design to manufacturing.

[0099] In summary, this invention constructs a complete technical closed loop encompassing mechanism analysis, precise positioning, reverse design, and experimental verification. These elements work synergistically to ensure that the core spectral filtering function (including resonant wavelength, bandwidth, and enhancement ratio) of metasurfaces remains stable over long periods under high-power laser incidence. This provides a solid technical guarantee for the reliable application of metasurface devices in demanding scenarios such as high-power laser communication, processing, and measurement.

[0100] According to embodiments of this disclosure, an electronic device is also provided, which may include a processor, a communications interface, a memory, and a communication bus, wherein the processor, the communications interface, and the memory communicate with each other via the communication bus. The processor can invoke logical instructions stored in the memory to execute the methods described above.

[0101] Furthermore, the logical instructions in the aforementioned memory can be implemented as software functional units and sold or used as independent products, and can be stored in a computer-readable storage medium. Based on this understanding, the technical solution of this disclosure, in essence, or the part that contributes to the prior art, or a part of the technical solution, can be embodied in the form of a software product. This computer software product is stored in a storage medium and includes several instructions to cause a computer device (which may be a personal computer, server, or network device, etc.) to execute all or part of the steps of the methods described in the various embodiments of this disclosure. The aforementioned storage medium includes various media capable of storing program code, such as USB flash drives, portable hard drives, read-only memory (ROM), random access memory (RAM), magnetic disks, or optical disks.

[0102] On the other hand, this disclosure also provides a non-transitory computer-readable storage medium having a computer program stored thereon, which, when executed by a processor, is implemented to perform the methods provided by the above methods.

[0103] The device embodiments described above are merely illustrative. The units described as separate components may or may not be physically separate. The components shown as units may or may not be physical units; that is, they may be located in one place or distributed across multiple network units. Some or all of the modules can be selected to achieve the purpose of this embodiment according to actual needs. Those skilled in the art can understand and implement this without any creative effort.

[0104] Through the above description of the embodiments, those skilled in the art can clearly understand that each embodiment can be implemented by means of software plus necessary general-purpose hardware platforms, and of course, it can also be implemented by hardware. Based on this understanding, the above technical solutions, in essence or the part that contributes to the prior art, can be embodied in the form of a software product. This computer software product can be stored in a computer-readable storage medium, such as ROM / RAM, magnetic disk, optical disk, etc., and includes several instructions to cause a computer device (which may be a personal computer, server, or network device, etc.) to execute the methods described in the various embodiments or some parts of the embodiments.

[0105] It should be understood that the above embodiments are only used to illustrate the technical solutions of this disclosure, and not to limit them; although this disclosure has been described in detail with reference to the foregoing embodiments, those skilled in the art should understand that they can still modify the technical solutions described in the foregoing embodiments, or make equivalent substitutions for some of the technical features; and these modifications or substitutions do not cause the essence of the corresponding technical solutions to deviate from the spirit and scope of the technical solutions of the embodiments of this disclosure.

Claims

1. A spectral enhancement filtering metasurface method based on multiphysics coupling, characterized in that, The method includes: S1. Establish a thermo-mechanical multiphysics model of the metasurface under high-power laser incident, obtain its temperature field through calculation, and identify hot spot regions based on this model; S2. Calculate the thermal stress field based on the temperature field, calculate the refractive index change and its distribution of the metasurface material based on the temperature field and thermal stress field, and then quantify the resonant wavelength drift caused by it to locate the optical mode mismatch region. S3. Based on the resonant wavelength drift and the optical mode mismatch region, the geometric parameters of the compensation structure are designed in reverse. The compensation structure is used to suppress thermal effects to counteract the resonant wavelength drift. S4. Prepare a compensated metasurface sample according to the geometric parameters, and test its spectral response under high-power laser. S5. Based on the spectral response, evaluate the spectral enhancement filtering stability of the compensated metasurface sample; S1 includes: The metasurface is geometrically discretized, and the power density distribution of the incident laser is calculated based on the Gaussian beam spatial distribution model. Based on the power density distribution and the absorptivity distribution of the metasurface, the volume heat source density distribution is calculated; Driven by the aforementioned volume heat source density, the steady-state heat conduction equation is solved to obtain the steady-state temperature field and steady-state temperature rise field of the metasurface; The heat flux density field is calculated based on the steady-state temperature rise field and Fourier's law. Based on the steady-state temperature rise field and the heat flux density field, the hot spot area is identified by setting a temperature rise threshold and a heat flux density threshold. S2 includes: The thermal stress field is calculated based on the temperature field, and the refractive index change and its distribution of the metasurface material are calculated based on the temperature field and the thermal stress field. The resonant wavelength shift is calculated based on the perturbation of the intrinsic electromagnetic mode of the metasurface caused by the change in refractive index. Based on the refractive index change and the energy distribution of the cold intrinsic electromagnetic field, the optical mode mismatch region is located. The calculation of the resonant wavelength drift is achieved through a first-order perturbation model, specifically: Using formula Calculate the resonant wavelength shift, where, The design resonant wavelength of the metasurface in the cold state. This represents the change in dielectric constant at discrete grid cell (i,j) caused by thermal perturbation. The weighting coefficients at discrete grid cells (i,j) of the cold-state intrinsic electromagnetic field energy distribution are given. It is the dielectric constant in the cold state; S3 includes: The resonant wavelength shift is inversely distributed to each unit in the optical mode mismatch region according to its contribution to the wavelength shift, thereby obtaining a spatially distributed target temperature rise reduction field. Based on the target temperature rise reduction field, the initial geometric parameters of the compensation structure are obtained by solving. The initial geometric parameters are discretized and quantized under manufacturing process constraints to generate the final geometric parameter set; The initial geometric parameters of the compensation structure obtained by solving include: The process of solving the initial geometric parameters is based on a physical model, which characterizes the quantitative relationship between the geometric parameters of the compensation structure and the resulting reduction in local temperature rise. The expression for this model is: ,in, Let be the amount of local temperature rise reduction to be achieved at the discrete grid cell (i,j). The thermal conductivity is the selected high thermal conductivity material applied to the discrete mesh element (i,j). The thermal conductivity of the metasurface substrate is given. The thickness of the high-conductivity intercalation layer applied to the discrete mesh element (i,j) and Let be the width and depth of the stress buffer microstructure located at the discrete mesh element (i,j), respectively. , The coupling coefficient is calibrated through simulation or experiment.

2. The spectral enhancement filtering metasurface method based on multiphysics coupling according to claim 1, characterized in that, S4 includes: Based on the structure-modified mask and geometric dimension parameters in the final geometric parameter set, a mask layout and process stack are generated to guide nanofabrication. By executing the aforementioned process stack, high thermal conductivity material intercalation and stress buffer microstructures are sequentially fabricated on the metasurface sample; The spectral response curves of the prepared compensated metasurface sample were tested under high-power laser incident conditions.

3. The spectral enhancement filtering metasurface method based on multiphysics coupling according to claim 2, characterized in that, S5 includes: Extract the compensated resonant wavelength, filter bandwidth, and optical enhancement ratio from the spectral response curve; The stability of the resonant wavelength is evaluated by comparing the deviation between the compensated resonant wavelength and the cold-state design resonant wavelength. The bandwidth retention rate is evaluated by comparing the compensated filter bandwidth with the cold-state design bandwidth. The enhancement ratio is evaluated by comparing the compensated optical enhancement ratio with the design target value. When the resonant wavelength stability, bandwidth retention rate, and enhancement ratio all meet the preset tolerances, it is determined to be stable.

4. An electronic device, characterized in that, The electronic device includes a memory and at least one processor, the memory storing a computer program, and the processor executing the computer program to implement the spectral enhancement filtering metasurface method based on multiphysics coupling as described in any one of claims 1-3.

5. A computer storage medium, characterized in that, It stores a computer program, which, when executed, implements the spectral enhancement filtering metasurface method based on multiphysics coupling according to any one of claims 1-3.

Images