Silicon wafer surface impurity removing and cleaning equipment

Abstract

The invention relates to the technical field of silicon wafer cleaning, in particular to silicon wafer surface impurity removing and cleaning equipment which comprises a cleaning rack with the periphery wrapped by sheet metal parts, a dust-free cleaning environment is formed, and secondary pollution of a silicon wafer in the cleaning and impurity removing process is avoided. The cleaning rack comprises a horizontally-arranged operation platform, a transfer part on the operation platform, an inlet pushing mechanism of the transfer part and an outlet pushing mechanism, the inlet pushing mechanism is used for pushing the silicon wafer baskets in a reciprocating mode in the direction of an input port, and the outlet pushing mechanism is used for pushing the silicon wafer baskets in a reciprocating mode in the direction of an output port. And loading and unloading of the silicon wafer flower basket are completed. The cleaning mechanism comprises two impurity removal tanks arranged side by side, ultrasonic transducers are attached to the outer walls of the impurity removal tanks, generated high-frequency vibration excites a special physical effect in cleaning liquid, and efficient removal of stains and impurities which are difficult to treat in a traditional cleaning mode is achieved. And the synchronous transfer assembly achieves special and efficient transfer, and the first transfer assembly and the second transfer assembly can keep the efficient and stable transfer state at the same time.

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