Quartz rod deposition apparatus and quartz rod deposition method

Abstract

This invention relates to the field of quartz rod preparation technology, specifically providing a quartz rod deposition apparatus and method. The apparatus includes a deposition reactor, a support, and a heat insulation component. The deposition reactor has a first opening, a reaction chamber, and a second opening. The first opening, reaction chamber, and second opening are arranged sequentially along a vertical direction. The first and second openings connect to the reaction chamber. A feed torch is installed at the first opening for feeding material into the reaction chamber. The support is positioned vertically below the feed torch. The support is movable relative to the deposition reactor in a vertical direction to deposit quartz rods. The heat insulation component is located at the second opening and connected to the deposition reactor. The heat insulation component is arranged around the outside of the support, with the heat insulation component and support spaced apart to connect to the outside and the second opening. The heat insulation component can extend and retract synchronously with the movement of the support to insulate the reaction chamber from the heat. This invention effectively improves temperature stability, reduces production costs, increases production efficiency, and improves product quality.

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