An imaging compensation method for an electron beam device, medium and computer program product

Abstract

The application discloses an imaging compensation method of an electron beam device, a medium and a computer program product, and relates to the technical field of semiconductor measurement. The imaging compensation method of the electron beam device comprises the following steps: by applying and adjusting a deceleration voltage to an uncharged wafer, an additional electric field formed under different charged conditions can be simulated; after adjusting the deceleration voltage each time, the first definition of the first image collected is adjusted to reach a preset threshold value by adjusting the excitation current of the objective lens coil in the electron beam device; the deceleration voltage and the excitation current at this time are recorded; and based on the multiple sets of deceleration voltage and excitation current, a response relationship of the electron beam device can be fitted. The response relationship can accurately match the hardware characteristics of the electron beam device, so that the electron beam device can perform imaging compensation on multiple wafers with consistent charged conditions based on the response relationship of the electron beam device, and the imaging compensation consistency is improved.

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