Preparation method of super-resolution liquid crystal photonic device and liquid crystal photonic device
CN121500637APending Publication Date: 2026-02-10SUZHOU UNIV +1
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Patent Information
- Application Number
- CN202411094159.4
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2024-08-09
- Publication Date
- 2026-02-10
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Figure CN121500637A_ABST
Abstract
The preparation method of the super-resolution liquid crystal photonic device comprises the following steps: preparing an alignment layer by adopting an exposure system, coating a liquid crystal polymer layer, and curing to obtain the liquid crystal photonic device, the exposure system comprises a laser, a light path system, a working platform and a control system, the method for preparing the alignment layer comprises the steps that S1, a substrate is provided, and the substrate is coated with azo dye; s2, the light path system comprises a spatial light modulator and is used for uploading a diaphragm pattern, and linearly polarized light emitted by the laser passes through the spatial light modulator and is exposed in a view field area of the azo dye to form an alignment pattern; s3, the working platform is controlled to move by a set distance, the spatial light modulator uploads a diaphragm pattern, the angle of the linearly polarized light is changed, exposure is carried out to form another alignment pattern, and the alignment pattern formed last time and the newly formed alignment pattern have first areas which are mutually overlapped and second areas which are not mutually overlapped; and S4, repeating the steps S3-S4 until the preparation of the alignment layer is completed. The invention also relates to a liquid crystal photonic device.
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