A method for processing a fresnel lens by photolithography

By forming Fresnel lens patterns on photoresist stencils using photolithography, the processing challenges of Fresnel lenses have been solved, enabling the independent production of large-size Fresnel lens templates and overcoming the problem of foreign equipment monopoly.

CN121559648BActive Publication Date: 2026-07-03ZHEJIANG JINGHUA LASER TECH CO LTD
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Patent Information

Application Number
CN202511456835.2
Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
Filing Date
2025-10-13
Publication Date
2026-07-03
Estimated Expiration
2045-10-13

AI Technical Summary

Technical Problem

In the current technology, it is difficult to achieve independent production of Fresnel lenses in China, mainly due to the limitation of high-precision diamond turning equipment, which leads to the monopoly of foreign companies.

Method used

Using photolithography, a three-dimensional model of a Fresnel lens is designed, and planar projection and photolithography parameters are set. A Fresnel lens pattern is formed on a photoresist stencil using photolithography equipment, and the photoresist stencil is obtained through development, thus realizing the template transfer of the Fresnel lens.

Benefits of technology

The three-dimensional image processing of Fresnel lenses was achieved through photolithography, replacing the traditional precision diamond turning micromachining method, and enabling the independent production of large-size Fresnel lens templates.

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Abstract

This invention discloses a photolithography method for Fresnel lenses, comprising the following steps: Step A, designing a three-dimensional model of the Fresnel lens according to its design requirements; Step B, performing planar projection on the three-dimensional model of the Fresnel lens to obtain a projection mapping relationship; the projection mapping relationship includes the coordinate positions within the projection plane and the corresponding height values ​​for each coordinate position; Step C, determining the required photolithography depth for each coordinate position based on the corresponding height values; Step D, converting the required photolithography depth for each coordinate position into a photolithography parameter file; Step E, performing photolithography according to the information in the photolithography file, and then developing the photolithographically formed photoresist to obtain a photoresist with a Fresnel lens pattern. This invention can obtain a three-dimensional image of a Fresnel lens through photolithography, replacing the original micromachining method using precision diamond turning.
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Citation Information

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