An all-solid-state vacuum ultraviolet light source generation system and method

CN121584376BActive Publication Date: 2026-08-21ZHEJIANG UNIV
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Patent Information

Application Number
CN202511677763.4
Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
Filing Date
2025-11-17
Publication Date
2026-08-21
Estimated Expiration
2045-11-17

AI Technical Summary

Technical Problem

[0007]为了克服现有技术中系统运行稳定性差、真空系统复杂、转换效率低的缺陷,本发明提供了一种全固态真空紫外光源产生的方法和系统,其目的在于利用近红外飞秒脉冲驱动固体高次谐波产生高亮度的真空紫外光源

Benefits of technology

[0035] This invention uses fused silica solid target material instead of traditional gaseous media or nonlinear crystals. Fused silica, as the target material, is isotropic, ensuring efficiency stability while maintaining system stability through target rotation. The efficiency remains less than 10⁻⁻⁶. 6 The mbar vacuum chamber design prevents ultraviolet absorption, and the system does not require an active gas load. While ensuring VUV transmission efficiency, it significantly simplifies the complexity and maintenance cost of the vacuum system.

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Abstract

The application discloses a kind of all-solid-state vacuum ultraviolet light source generation system and method, belong to ultrafast laser technical field.System includes: drive laser module, solid high harmonic generation module and monochromator.The drive laser module can generate and control front-stage drive laser, provide a variety of switchable driving light field.The solid high harmonic generation module includes vacuum cavity, and rotating motor and fused quartz target material are arranged in cavity.The monochromator includes mirror with vacuum ultraviolet waveband high reflection film plated on two sides.The application generates high harmonic by different light field drive fused quartz, realizes all-solid-state, high efficiency, no vacuum load high-brightness vacuum ultraviolet waveband light source.
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Description

Technical Field

[0001] This invention belongs to the field of ultrafast laser technology, and more specifically, relates to an all-solid-state vacuum ultraviolet light source generation system and method. Background Technology

[0002] Vacuum ultraviolet (VUV, 100-200 nm) laser sources hold irreplaceable core value in basic scientific research, particularly in the measurement and ultrafast manipulation of band structures in condensed matter quantum materials, and in industrial inspection fields such as semiconductor lithography and optical inspection. Among these, multi-wavelength sources covering this band are increasingly becoming key tools for cutting-edge applications due to their ability to simultaneously meet complex needs such as broad-spectrum absorption characteristic analysis of materials, multi-channel photochemical reaction induction, and ultra-high sensitivity trace detection of various substances. Especially in the fields of precision online detection and ultrafast spectroscopy, the ability to flexibly tune or simultaneously output multiple specific vacuum ultraviolet light source wavelengths significantly improves analytical efficiency and information depth.

[0003] The current mainstream technologies for realizing vacuum ultraviolet light sources face significant limitations: while gas high-order harmonic generation can cover this band, its core gas target chamber and vacuum system bring complex load and integration challenges; frequency conversion technology based on deep ultraviolet nonlinear crystals (such as KBBF) can achieve all-solid-state operation, but it is limited by the crystal phase matching bandwidth and damage threshold, and can usually only efficiently generate a single fixed wavelength (such as 193 nm), lacking the flexibility of multi-wavelength; while synchrotron radiation has the advantage of a wide spectrum, its large facility scale and low repetition frequency characteristics cannot meet the needs of benchtop, high repetition frequency application scenarios.

[0004] In contrast, high-harmonic generation technology based on solid-state targets exhibits unique potential: this technology utilizes the interaction between a strong-field femtosecond laser and a solid medium to simultaneously excite even and odd harmonics covering the target wavelength band, naturally possessing the ability to generate multiple specific wavelengths within the 100-200 nm range. Crucially, its all-solid-state operation completely eliminates the need for gas loads, resulting in a highly compact and environmentally friendly system structure. Combined with a high-power laser driver, this technology also has the potential to achieve high repetition rates and excellent beam quality.

[0005] In existing technologies, although some studies have explored the use of solid-state high-harmonic generation for vacuum ultraviolet light source generation, such as the schemes based on bulk crystals or nanostructures reported in published literature, these schemes usually face problems such as low phase matching efficiency, damage caused by heat accumulation, and difficulty in stably generating and separating specific multi-wavelength combinations, which limit their reliability and practicality in actual multi-wavelength application scenarios.

[0006] Therefore, developing a vacuum ultraviolet light source technology based on the principle of solid-state high harmonics, capable of efficiently and stably generating and flexibly controlling multiple target wavelengths in the 100-200 nm range, while also possessing all-solid-state, gas-free load, high repetition frequency, and excellent reliability, has become a key challenge in this field to break through existing technological bottlenecks and meet the needs of emerging multi-wavelength applications. Summary of the Invention

[0007] To overcome the shortcomings of existing technologies, such as poor system stability, complex vacuum systems, and low conversion efficiency, this invention provides a method and system for generating an all-solid-state vacuum ultraviolet light source. The purpose is to use near-infrared femtosecond pulses to drive solid-state high-order harmonics to generate a high-brightness vacuum ultraviolet light source.

[0008] To achieve the above objectives, according to a first aspect of the present invention, an all-solid-state vacuum ultraviolet light source generation system is provided, the system comprising:

[0009] Drive light source module, phase adjustment module, solid-state harmonic generation module, collimation and monochromaticization module;

[0010] The driving light source module includes several light sources with different center wavelengths, a frequency doubling crystal, and an insertable reflector. Each light source has a reserved space for an insertable reflector. Each time one light source is activated, the activated light source is input into the frequency doubling crystal through the insertable reflector to generate frequency-doubled light, which is then input into the phase adjustment module.

[0011] The phase adjustment module includes a beam splitter, a visible light branch, a near-infrared branch, a beam combiner, a dual-band high-reflectivity mirror, and a focusing lens. The laser light, after passing through the frequency doubling crystal, is input into the beam splitter, and the split visible light is input into the visible light branch and the near-infrared branch before entering the beam combiner. The phase-adjusted light is then input into the solid-state harmonic generation module through the dual-band high-reflectivity mirror and the focusing lens.

[0012] The solid-state harmonic generation module includes a vacuum chamber, in which a rotating motor and a fused silica target are installed. The fused silica target is rotated by the rotating motor, and the light beam focused by the focusing lens is irradiated onto the rotating fused silica target to generate a vacuum ultraviolet light source.

[0013] The collimation and monochromaticization module is installed in the vacuum cavity of the solid-state harmonic generation module. Along the optical path, it includes a concave mirror coated with a high-reflectivity film for a specific vacuum ultraviolet wavelength and a high-reflectivity reflector coated with a specific vacuum ultraviolet wavelength, which monochromates the vacuum ultraviolet light source into specific vacuum ultraviolet light.

[0014] Furthermore, the driving light source in the driving light source module includes: a femtosecond laser with a center wavelength of 1030nm and a femtosecond laser with a center wavelength of 800nm;

[0015] When the driving light is a two-color field of 1030nm fundamental frequency light and 515nm frequency-doubled light, the system outputs light with wavelengths of 103nm, 114nm, 128nm, 147nm, 171nm, and 206nm.

[0016] When the driving light is a two-color field consisting of 800nm ​​fundamental frequency light and 400nm frequency-doubled light, the system outputs light with wavelengths of 100nm, 114nm, 133nm, 160nm, and 200nm.

[0017] Furthermore, the high reflectivity mirror coated with a specific vacuum ultraviolet wavelength is coated with a reflective film of a specific wavelength band, which is selected according to the optical wavelength band output by the system.

[0018] Furthermore, the visible light branch and the near-infrared branch are specifically as follows: the visible light branch inputs visible light into the beam combiner through a visible light high-reflection mirror, and a movable light-blocking device is also provided in the optical path; the near-infrared branch inputs into the beam combiner through a first near-infrared high-reflection mirror, a second near-infrared high-reflection mirror, and a third near-infrared high-reflection mirror.

[0019] Furthermore, the insertable reflector, the first near-infrared high-reflectivity mirror, the second near-infrared high-reflectivity mirror, and the third near-infrared high-reflectivity mirror are all coated with a 1030 nm band broadband high damage threshold reflective film.

[0020] Furthermore, the beam splitter and beam combiner are coated with special coatings so that when the relative beams are placed at a 45-degree angle, they achieve complete reflection of 515nm pulses and complete transmission of 1030nm pulses; the dual-band high-reflectivity mirror is coated with broadband high-reflectivity films for both 1030nm and 515nm bands; the focusing lens is coated with a high-transmission film covering the bandwidths of 515nm and 1030nm, and has a focal length of 500mm.

[0021] Furthermore, the vacuum chamber is capable of maintaining a vacuum level of less than 10. -6 The mbar vacuum chamber has a KF40 flange facing the beam incident surface for mounting an optical window; an ISO100 interface on the side for connecting an external controller to drive the internal rotating motor; a KF40 interface on the other side for connecting a vacuum gauge to monitor the vacuum level; an ISO100 interface on the top cover for connecting a molecular pump to achieve high vacuum; and a KF40 interface on the side of the chamber for vacuum ultraviolet light output.

[0022] Furthermore, the concave mirror coated with a specific vacuum ultraviolet wavelength high reflectivity film has a radius of curvature of 1000 mm or 800 mm, which is used to collimate the generated vacuum ultraviolet light.

[0023] Furthermore, the system also includes a vacuum ultraviolet spectrometer for calibrating the wavelength of the generated vacuum ultraviolet light source.

[0024] On the other hand, a method for generating an all-solid-state vacuum ultraviolet light source based on the aforementioned system is also provided, which specifically includes the following steps:

[0025] S1: Driving light field configuration and generation: Provides at least two driving light sources with different center wavelengths to choose from. Based on the vacuum ultraviolet wavelength combination of the target output, selects and activates one of the driving light sources. Through the preset insertable mirror in the optical path, the fundamental frequency near-infrared femtosecond pulse of the selected driving light source is guided to the frequency doubling crystal to generate its frequency-doubled light. Then, the generated fundamental frequency light and the frequency-doubled light are input together into the subsequent phase adjustment optical path.

[0026] S2: Dual-color field synthesis and phase adjustment: The composite beam containing fundamental and frequency-doubled light output from step S1 is separated into two independent sub-beams according to wavelength by a beam splitter: one beam is the frequency-doubled light in the visible light band, and the other beam is the fundamental light in the near-infrared band.

[0027] The two separate sub-beams are then directed into independent branches with different optical paths for transmission: the visible light branch is transmitted through a visible light high-reflectivity mirror; the near-infrared branch is transmitted through a reflective optical path composed of multiple near-infrared high-reflectivity mirrors.

[0028] By adjusting the optical path length of the near-infrared branch, a controllable optical path difference is introduced to achieve continuous and precise adjustment of the relative phase between the fundamental frequency light and the frequency-doubled light. Finally, the two sub-beams that have completed phase adjustment are recombined into a collinear two-color field driving light through a beam combiner.

[0029] S3: Solid-state high harmonic generation step: The dual-color field driving light synthesized in step S2 is reflected by a dual-band high-reflectivity mirror and focused by a focusing lens, and then incident on a solid target material in a vacuum cavity that maintains a high vacuum; the solid target material is preferably fused silica.

[0030] Within the vacuum chamber, the fused silica target is driven to rotate periodically around its central axis. When the high-intensity femtosecond dual-color field interacts with the rotating fused silica target, coherent radiation covering the vacuum ultraviolet band is generated through the solid-state high-harmonic generation process, which includes multiple even and odd harmonic components.

[0031] S4: Vacuum ultraviolet collimation and monochromaticization step: The vacuum ultraviolet light with broadband characteristics generated in step S3 is screened and processed to output the required specific wavelength;

[0032] First, a concave mirror coated with a high-reflectivity film for a specific vacuum ultraviolet wavelength of the target is used to collimate the generated diverging vacuum ultraviolet beam.

[0033] Then, the collimated beam is incident at a specific angle onto at least one mirror coated with a high reflectivity for the target specific vacuum ultraviolet wavelength and a high transmittance for other non-target wavelengths; the vacuum ultraviolet spectrum is filtered through this optical element, and finally a single, pure laser of a specific vacuum ultraviolet wavelength is output.

[0034] As can be seen from the above technical solutions, compared with the prior art, the all-solid-state vacuum ultraviolet light source generation method and system disclosed in this invention have the following beneficial effects:

[0035] This invention uses fused silica solid target material instead of traditional gaseous media or nonlinear crystals. Fused silica, as the target material, is isotropic, ensuring efficiency stability while maintaining system stability through target rotation. The efficiency remains less than 10⁻⁻⁶. 6 The mbar vacuum chamber design prevents ultraviolet absorption, and the system does not require an active gas load. While ensuring VUV transmission efficiency, it significantly simplifies the complexity and maintenance cost of the vacuum system.

[0036] This invention uses a stepper motor to periodically rotate a molten quartz target, which makes the laser application point uniformly distributed and supports the system to operate continuously and stably for a long time at a high repetition frequency. Attached Figure Description

[0037] To more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the drawings used in the description of the embodiments or the prior art are briefly introduced below. Obviously, the drawings in the following description are merely embodiments of the present invention.

[0038] Figure 1 This is a flowchart of the method for generating an all-solid-state vacuum ultraviolet light source used in an example of the present invention;

[0039] Figure 2 This is a schematic diagram of the all-solid-state vacuum ultraviolet light source generation system used in the example of the present invention. Detailed Implementation

[0040] The technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention. Example

[0041] like Figure 1 As shown, the present invention also provides a method for generating an all-solid-state vacuum ultraviolet light source, comprising the following steps:

[0042] The driving light source module provides switchable driving light field configurations, including optical path configurations that switch between monochromatic pulses and dual-color pulses, and optical path configurations that switch between 800nm ​​driving lasers and 1030nm driving lasers. This optical path switches the driving laser to a femtosecond laser with a center wavelength of 1030nm and a femtosecond laser with a center wavelength of 800nm ​​via an insertable mirror. The driving laser module includes a part for generating frequency-doubled light and a part for adjusting the phase of the fundamental frequency light and the frequency-doubled light. Finally, the beam is focused into the solid-state harmonic generation module.

[0043] Solid-state high-harmonic generation module, including modules capable of maintaining a vacuum level of less than 10. -6 The mbar vacuum chamber includes a rotary motor driven by a stepper motor, with a fused silica target fixedly installed in the middle. The motor is controlled to rotate the target according to a preset cycle, so that the laser action point is evenly distributed and local heat accumulation is avoided, which may cause material damage.

[0044] The monochromatic and collimation module achieves beam collimation and monochromaticity through coated concave and planar reflectors. Example

[0045] This embodiment discloses an all-solid-state vacuum ultraviolet light source generation system, referencing... Figure 2 ,include:

[0046] The driving laser module is used to generate the optimal optical field required for solid-state high-harmonic waves. It includes, in sequence along the optical path, a first laser 101, a first reflector 103, a frequency doubling crystal 105 (for generating frequency-doubled visible light laser), a dichroic beam splitter 106, a first near-infrared high-reflection mirror 107, a second near-infrared high-reflection mirror 108, a third near-infrared high-reflection mirror 109, a visible light high-reflection mirror 110, a movable light-blocking device 111, a beam combiner 112, a dual-band high-reflection mirror 113, and a focusing lens 114 (for focusing monochromatic or dichromatic pulses).

[0047] More specifically, the femtosecond laser generated by the first femtosecond laser 101 has a center wavelength of 1030 nm, a pulse width of 30 fs, and a single pulse energy adjustable from 0 to 0.5 mJ. The laser repetition frequency is adjustable from 1 kHz to 10 MHz, and the input optical power can withstand 20 W or more depending on the single pulse energy. The first reflector 103, the first near-infrared high-reflectivity mirror 107, the second near-infrared high-reflectivity mirror (108), and the third near-infrared high-reflectivity mirror 109 are all coated with a 1030 nm band broadband high-damage threshold reflective film. The visible light high-reflectivity mirror 110 is coated with a 515 nm band broadband high-damage threshold reflective film. The dichroic beam splitter 106 and the beam combiner 112 are specially coated so that when the relative beams are placed at a 45-degree angle, they achieve complete reflection of the 515 nm band pulse and complete transmission of the 1030 nm band pulse. Because broadband coatings are used throughout this optical path, the complete transmission in the 1030nm band also applies to the 800nm ​​band, and the complete reflection in the 515nm band also applies to the 400nm band. The frequency-doubling crystal 105 is a β-BBO crystal, which uses type I phase matching to double part of the 1030nm light into a 515nm pulse. The dual-band high-reflectivity mirror 113 is coated with broadband high-reflectivity films for both the 1030nm and 515nm bands. The focusing lens 114 is coated with a high-transmission film covering the bandwidths of 515nm and 1030nm, with a focal length of 500mm.

[0048] Solid-state harmonic generation module: used to generate a vacuum ultraviolet light source, which includes a vacuum cavity 201 and a fused silica target 203 along the optical path.

[0049] More specifically, the overall dimensions of the vacuum chamber 201 are 260mm × 460mm × 240mm; a KF40 flange is provided on the beam incident surface of the chamber for mounting an optical window; an ISO100 interface is provided on the side for connecting an external controller to drive the internal rotating motor; a KF40 interface is provided on the other side for connecting a vacuum gauge to monitor the vacuum level; an ISO100 interface is provided on the top cover of the chamber for connecting a molecular pump to achieve high vacuum; a KF40 interface is provided on the side of the chamber for vacuum ultraviolet light output; the fused silica target 203 is a 100μm thick, 10mm × 10mm square sheet, and the beam focusing position is located 5mm away from the two sides of the square sheet.

[0050] Monochromatic and collimation module: used to realize the monochromaticity and collimation of vacuum ultraviolet light source, and includes, in sequence along the optical path, a concave mirror 301 coated with a high reflectivity film for a specific vacuum ultraviolet wavelength, a second high reflectivity mirror 302 coated with a specific vacuum ultraviolet wavelength, and a third high reflectivity mirror 303 coated with a specific vacuum ultraviolet wavelength.

[0051] More specifically, the concave mirror 301, coated with a high-reflectivity film for a specific vacuum ultraviolet wavelength, has a radius of curvature of 1000 mm and is used to collimate the generated vacuum ultraviolet light. The second mirror 302 and the third mirror 303, coated with a high-reflectivity film for a specific vacuum ultraviolet wavelength, are used to further monochromatize the vacuum ultraviolet light; by replacing the mirrors coated with different wavelength reflective films, the selection of vacuum ultraviolet light of different wavelengths can be achieved.

[0052] Example 3: A method for generating an all-solid-state vacuum ultraviolet light source

[0053] This embodiment provides a method for generating an all-solid-state vacuum ultraviolet light source, the process of which can be found in [reference needed]. Figure 1 The method specifically includes the following steps:

[0054] S1: Driving light field configuration and generation steps.

[0055] At least two different center wavelength driving light sources are available for selection, such as a femtosecond laser with a center wavelength of 1030 nm and a femtosecond laser with a center wavelength of 800 nm. Based on the target output vacuum ultraviolet wavelength combination, one of the driving light sources is selected and activated. The fundamental frequency near-infrared femtosecond pulse of the selected driving light source is guided to a frequency-doubling crystal (such as a β-BBO crystal) via a pre-set insertable reflector 104 in the optical path, generating its frequency-doubled light (515 nm or 400 nm, respectively). Subsequently, the generated fundamental frequency light and frequency-doubled light are input together into the subsequent phase-adjustment optical path.

[0056] S2: Two-color field synthesis and phase adjustment steps.

[0057] The composite beam containing fundamental and frequency-doubled light output from step S1 is separated into two independent sub-beams by wavelength using a beam splitter (such as a dichroic beam splitter): one is frequency-doubled light in the visible light band (515nm or 400nm), and the other is fundamental light in the near-infrared band.

[0058] The two separate sub-beams are then guided into independent branches with different optical path lengths for transmission:

[0059] The visible light branch is transmitted through a visible light high-reflection mirror;

[0060] The near-infrared branch is transmitted through a reflected light path composed of multiple near-infrared high-reflectivity mirrors.

[0061] By precisely designing and adjusting the optical path length of the near-infrared branch, a controllable optical path difference is introduced, enabling continuous and precise adjustment of the relative phase between the fundamental frequency light and the second-harmonic light.

[0062] Finally, the two sub-beams that have completed phase adjustment are recombined into a collinear two-color field driving beam using a beam combiner (such as a dichromatic beam combiner).

[0063] S3: Steps for generating higher harmonics in solid-state systems.

[0064] The dual-color field driving light synthesized in step S2 is reflected by a dual-band high-reflectivity mirror, focused by a focusing lens, and then incident on a vacuum (e.g., vacuum level less than 10⁻). 6 The solid target is placed on a solid target material within a vacuum chamber (mbar). The solid target material is preferably fused silica.

[0065] Within the vacuum chamber, the fused silica target is driven to rotate periodically around its central axis, so that the femtosecond laser pulses continuously act on fresh positions on the target surface, thereby avoiding local heat accumulation that could damage the target and ensuring that the system can operate stably for a long time.

[0066] When a high-intensity femtosecond dual-color field interacts with a rotating fused silica target, coherent radiation covering the vacuum ultraviolet band (100-200 nm) is efficiently generated through a solid-state high-harmonic generation process, including multiple even and odd harmonic components.

[0067] S4: Vacuum ultraviolet collimation and monochromaticization steps.

[0068] The vacuum ultraviolet light with broad spectrum characteristics generated in step S3 is screened and processed to output the desired specific wavelength.

[0069] First, a concave mirror coated with a high-reflectivity film for a specific vacuum ultraviolet wavelength of the target is used to collimate the generated diverging vacuum ultraviolet beam.

[0070] Then, the collimated beam is incident at a specific angle onto at least one mirror (plane mirror or grating) coated with a high reflectivity for the target specific vacuum ultraviolet wavelength and a high transmittance for other non-target wavelengths. This optical element filters the vacuum ultraviolet spectrum, ultimately outputting a single, pure laser beam of a specific vacuum ultraviolet wavelength.

[0071] By changing the coating parameters on the concave mirror and subsequent reflectors, the specific vacuum ultraviolet wavelength of the selected output can be flexibly changed to meet different application requirements.

[0072] Preferably, in step S1, when a femtosecond laser with a center wavelength of 1030nm is selected as the driving light source and forms a two-color field with its 515nm frequency-doubled light, the vacuum ultraviolet light generated in step S3 can be stably output as specific vacuum ultraviolet light with wavelengths of 103nm, 114nm, 128nm, 147nm, 171nm, and 206nm after processing in step S4.

[0073] Preferably, in step S1, when a femtosecond laser with a center wavelength of 800nm ​​is selected as the driving light source and forms a two-color field with its 400nm frequency-doubled light, the vacuum ultraviolet light generated in step S3 can be stably output with specific vacuum ultraviolet light of wavelengths such as 100nm, 114nm, 133nm, 160nm, and 200nm after being processed in step S4.

[0074] Other embodiments of the invention will readily conceive of by those skilled in the art upon consideration of the specification and practice of the disclosure. This invention is intended to cover any variations, uses, or adaptations that follow the general principles of the invention and include common knowledge or customary techniques in the art. The specification and examples are to be considered exemplary only, and the true scope and spirit of the invention are indicated by the appended claims.

[0075] It should be understood that the foregoing general description and the following detailed description are exemplary and explanatory only, and are not intended to limit the invention. The invention is not limited to the precise structures described above and shown in the accompanying drawings, and various modifications and changes can be made without departing from its scope. The scope of the invention is defined only by the appended claims.

Claims

1. A fully solid-state vacuum ultraviolet light source generation system, characterized in that, The system includes: Drive light source module, phase adjustment module, solid-state harmonic generation module, collimation and monochromaticization module; The driving light source module includes several light sources with different center wavelengths, a frequency doubling crystal, and an insertable reflector. Each light source has a reserved space for an insertable reflector. Each time one light source is activated, the activated light source is input into the frequency doubling crystal through the insertable reflector to generate frequency-doubled light, which is then input into the phase adjustment module. The phase adjustment module includes a beam splitter, a visible light branch, a near-infrared branch, a beam combiner, a dual-band high-reflectivity mirror, and a focusing lens. The laser light, after passing through the frequency doubling crystal, is input into the beam splitter. The split visible light and near-infrared light are input into the visible light branch and the near-infrared branch, respectively, and then into the beam combiner. The phase-adjusted light is input into the solid-state harmonic generation module through the dual-band high-reflectivity mirror and the focusing lens. The solid-state harmonic generation module includes a vacuum chamber, in which a rotating motor and a fused silica target are installed. The fused silica target is rotated by the rotating motor, and the light beam focused by the focusing lens is irradiated onto the rotating fused silica target to generate a vacuum ultraviolet light source. The collimation and monochromaticization module is installed in the vacuum cavity of the solid-state harmonic generation module. Along the optical path, it includes a concave mirror coated with a high-reflectivity film for a specific vacuum ultraviolet wavelength and a high-reflectivity reflector coated with a specific vacuum ultraviolet wavelength, which monochromates the vacuum ultraviolet light source into specific vacuum ultraviolet light.

2. The all-solid-state vacuum ultraviolet light source generation system according to claim 1, characterized in that, The driving light source in the driving light source module includes: a femtosecond laser with a center wavelength of 1030nm and a femtosecond laser with a center wavelength of 800nm. When the driving light is a two-color field of 1030nm fundamental frequency light and 515nm frequency-doubled light, the system outputs light with wavelengths of 103nm, 114nm, 128nm, 147nm, 171nm, and 206nm. When the driving light is a two-color field consisting of 800nm ​​fundamental frequency light and 400nm frequency-doubled light, the system outputs light with wavelengths of 100nm, 114nm, 133nm, 160nm, and 200nm.

3. The all-solid-state vacuum ultraviolet light source generation system according to claim 1, characterized in that, The high-reflectivity mirror coated with a specific vacuum ultraviolet wavelength has a reflective film coated with a specific wavelength band, which is selected according to the optical wavelength band output by the system.

4. The all-solid-state vacuum ultraviolet light source generation system according to claim 1, characterized in that, The visible light branch and near-infrared branch are specifically defined as follows: the visible light branch inputs visible light into the beam combiner through a visible light high-reflection mirror, and a movable light-blocking device is also provided in the optical path; the near-infrared branch inputs the light into the beam combiner through a first near-infrared high-reflection mirror, a second near-infrared high-reflection mirror, and a third near-infrared high-reflection mirror.

5. The all-solid-state vacuum ultraviolet light source generation system according to claim 4, characterized in that, The insertable reflector, the first near-infrared high-reflectivity mirror, the second near-infrared high-reflectivity mirror, and the third near-infrared high-reflectivity mirror are all coated with a 1030 nm band broadband high damage threshold reflective film.

6. The all-solid-state vacuum ultraviolet light source generation system according to claim 1, characterized in that, The beam splitter and beam combiner are coated with special coatings so that when the relative beams are placed at a 45-degree angle, they can completely reflect 515nm pulses and completely transmit 1030nm pulses. The dual-band high-reflectivity mirror is coated with broadband high-reflectivity films for both 1030nm and 515nm bands. The focusing lens is coated with a high-transmission film covering the bandwidths of 515nm and 1030nm, and has a focal length of 500mm.

7. The all-solid-state vacuum ultraviolet light source generation system according to claim 1, characterized in that, The vacuum chamber is capable of maintaining a vacuum level of less than 10. -6 The mbar vacuum chamber has a KF40 flange facing the beam incident surface for mounting an optical window; an ISO100 interface on the side for connecting an external controller to drive the internal rotating motor; a KF40 interface on the other side for connecting a vacuum gauge to monitor the vacuum level; an ISO100 interface on the top cover for connecting a molecular pump to achieve high vacuum; and a KF40 interface on the side of the chamber for vacuum ultraviolet light output.

8. The all-solid-state vacuum ultraviolet light source generation system according to claim 1, characterized in that, The concave mirror coated with a specific vacuum ultraviolet wavelength high reflectivity film has a radius of curvature of 1000mm or 800mm and is used to collimate the generated vacuum ultraviolet light.

9. The all-solid-state vacuum ultraviolet light source generation system according to claim 1, characterized in that, The system also includes a vacuum ultraviolet spectrometer for calibrating the wavelength of the generated vacuum ultraviolet light source.

10. A method for generating an all-solid-state vacuum ultraviolet light source based on the system described in any one of claims 1-9, characterized in that, The method specifically includes the following steps: S1: Driving light field configuration and generation: Provides at least two driving light sources with different center wavelengths to choose from. Based on the vacuum ultraviolet wavelength combination of the target output, selects and activates one of the driving light sources. Through the preset insertable mirror in the optical path, the fundamental frequency near-infrared femtosecond pulse of the selected driving light source is guided to the frequency doubling crystal to generate its frequency-doubled light. Then, the generated fundamental frequency light and the frequency-doubled light are input together into the subsequent phase adjustment optical path. S2: Dual-color field synthesis and phase adjustment: The composite beam containing fundamental and frequency-doubled light output from step S1 is separated into two independent sub-beams according to wavelength by a beam splitter: one beam is the frequency-doubled light in the visible light band, and the other beam is the fundamental light in the near-infrared band. The two separate sub-beams are guided into independent branches with different optical paths for transmission: the visible light branch is transmitted through a visible light high-reflectivity mirror; the near-infrared branch is transmitted through a reflective optical path composed of multiple near-infrared high-reflectivity mirrors. By adjusting the optical path length of the near-infrared branch, a controllable optical path difference is introduced to achieve continuous and precise adjustment of the relative phase between the fundamental frequency light and the frequency-doubled light. Finally, the two sub-beams that have completed phase adjustment are recombined into a collinear two-color field driving light through a beam combiner. S3: Solid-state high harmonic generation step: The dual-color field driving light synthesized in step S2 is reflected by a dual-band high-reflectivity mirror and focused by a focusing lens before being incident on a solid target material in a vacuum chamber that maintains a high vacuum; the solid target material is fused silica. Within the vacuum chamber, the fused silica target is driven to rotate periodically around its central axis. When the high-intensity femtosecond dual-color field interacts with the rotating fused silica target, coherent radiation covering the vacuum ultraviolet band is generated through the solid-state high-harmonic generation process, which includes multiple even and odd harmonic components. S4: Vacuum ultraviolet collimation and monochromaticization step: The vacuum ultraviolet light with broadband characteristics generated in step S3 is screened and processed to output the required specific wavelength; First, a concave mirror coated with a high-reflectivity film for a specific vacuum ultraviolet wavelength of the target is used to collimate the generated diverging vacuum ultraviolet beam. Then, the collimated beam is incident at a specific angle onto at least one mirror coated with a high reflectivity for the target specific vacuum ultraviolet wavelength and a high transmittance for other non-target wavelengths; the vacuum ultraviolet spectrum is filtered through this optical element, and finally a single, pure laser of a specific vacuum ultraviolet wavelength is output.

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