一种多孔方酸-苯二胺聚合物及其制备方法与应用
By forming Schiff base polymers through the solvothermal reaction of porous squaric acid-phenylenediamine polymers, the problems of low efficiency and poor stability of existing photocatalytic materials are solved, achieving efficient generation of H2O2 and removal of pollutants. It is suitable for various water qualities and pH conditions and has the potential for sterilization and Fenton reaction to remove pollutants.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- SHANGHAI UNIV OF ENG SCI
- Filing Date
- 2026-01-30
- Publication Date
- 2026-07-17
AI Technical Summary
Existing photocatalytic materials suffer from low efficiency and poor stability in the preparation of hydrogen peroxide (H2O2), rely on energy-intensive and environmentally harmful industrial processes, and pose safety risks during storage and transportation. Furthermore, the homogeneity of molecular structures limits performance breakthroughs.
Using porous squaric acid-phenylenediamine polymer as a photocatalyst, a Schiff base polymer is formed through a solvothermal reaction. By utilizing the isomerization engineering of ortho- and meta-phenylenediamine to control the separation of electrons and holes, the light absorption range is broadened to the infrared region, thus realizing visible light photocatalytic H2O2 generation without sacrificial agents.
It significantly improves the H2O2 generation efficiency to 8515.0 μmol g-1h-1, possesses efficient, stable and safe photocatalytic performance, and has the ability to sterilize and remove pollutants, making it suitable for different water quality and pH conditions.
Smart Images
Figure CN121609904B_ABST