High-flatness cooking film with symmetrical structure and preparation method of high-flatness cooking film

CN121650322AInactive Publication Date: 2026-03-13杭州星点包装材料有限公司
View PDF 0 Cites 0 Cited by

Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2025-12-15
Publication Date
2026-03-13
Estimated Expiration
Not applicable · inactive patent

Smart Images

  • Figure CN121650322A_ABST
    Figure CN121650322A_ABST
Patent Text Reader

Abstract

The invention discloses a high-flatness cooking film with a symmetrical structure and a preparation method thereof, the high-flatness cooking film sequentially comprises a surface heat-resistant CPP layer, a first glue layer, a PA layer, an ink layer, a second glue layer and an inner heat-resistant CPP layer, and the surface heat-resistant CPP layer and the inner heat-resistant CPP layer form the symmetrical structure; the first glue layer and the second glue layer adopt an adhesive; a unique CPP symmetrical structure design is adopted, the problem of curling deformation under high-temperature cooking is effectively solved by utilizing a stress balance mechanism, the flatness and dimensional stability of the film are remarkably improved, and the product is endowed with excellent high-temperature resistance, high barrier and interlayer bonding performance in cooperation with the specially-made cooking-resistant adhesive and the barrier layer.
Need to check novelty before this filing date? Find Prior Art