Method for analyzing spatial layout and cultural symbols of memorial archway by adopting interdisciplinary method

CN121660487APending Publication Date: 2026-03-13GUANGXI ARTS INST
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2025-08-27
Publication Date
2026-03-13

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Abstract

The invention provides a method for analyzing spatial layout and cultural symbols of a memorial archway by adopting an interdisciplinary method, and belongs to the technical field of digital protection of cultural heritage, and the method comprises the following steps: collecting spatial topological data of the memorial archway, constructing a memorial archway cultural symbol database, preprocessing the spatial topological data of the memorial archway, and constructing a spatial index of the memorial archway. And building memorial archway class and attribute mapping construction, memorial archway event-driven association construction and dual attribute revelation of the memorial archway, and constructing a dynamic visual platform to display the digital memorial archway. The method can perfectly interpret unique fusion of space elements and symbolic meanings for traditional medium carriers and memorial archways of material city space and inmaterial culture, constructs a replicable framework for analyzing the relationship between building landmark space and culture, embodies value in city protection and planning, and has a wide application prospect. And meanwhile, the cultural relevance of the memorial archway in the contemporary context is enhanced.
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