Substrate processing method, storage medium, substrate processing apparatus, and computer program product

CN121666046APending Publication Date: 2026-03-13TOKYO ELECTRON LTD
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2025-08-27
Publication Date
2026-03-13

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Abstract

The invention provides a substrate processing method, a storage medium, a substrate processing apparatus, and a computer program product, which can easily execute response for eliminating faults caused by bubbles in liquid processing using a processing liquid. A substrate processing method according to one aspect of the present disclosure includes: supplying a processing liquid to a surface of a substrate by a liquid supply unit having a nozzle capable of discharging the processing liquid, a supply source of the processing liquid, and a supply pipe connecting the nozzle and the supply source; acquiring monitoring information capable of estimating whether or not bubbles are included in the processing liquid at each of a plurality of monitoring sites in the liquid supply unit; and determining one or more response actions from a plurality of response actions for removing bubbles on the basis of the monitoring information acquired at each of the plurality of monitoring sites.
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