Substrate processing method, storage medium, substrate processing apparatus, and computer program product
CN121666046APending Publication Date: 2026-03-13TOKYO ELECTRON LTD
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Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2025-08-27
- Publication Date
- 2026-03-13
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Figure CN121666046A_ABST
Abstract
The invention provides a substrate processing method, a storage medium, a substrate processing apparatus, and a computer program product, which can easily execute response for eliminating faults caused by bubbles in liquid processing using a processing liquid. A substrate processing method according to one aspect of the present disclosure includes: supplying a processing liquid to a surface of a substrate by a liquid supply unit having a nozzle capable of discharging the processing liquid, a supply source of the processing liquid, and a supply pipe connecting the nozzle and the supply source; acquiring monitoring information capable of estimating whether or not bubbles are included in the processing liquid at each of a plurality of monitoring sites in the liquid supply unit; and determining one or more response actions from a plurality of response actions for removing bubbles on the basis of the monitoring information acquired at each of the plurality of monitoring sites.
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Citation Information
Patent Citations
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