Microparticle trap arrangement method, device, gas insulated metal transmission power equipment and system

CN121683155BActive Publication Date: 2026-08-07SHENYANG UNIVERSITY OF TECHNOLOGY
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
SHENYANG UNIVERSITY OF TECHNOLOGY
Filing Date
2025-10-22
Publication Date
2026-08-07

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Abstract

The application discloses a kind of microparticle trap layout method, device, gas insulated metal transmission equipment and system, relate to high-voltage transmission and distribution field, determine the first attribute information corresponding to the alternating voltage transmitted in bus and the first setting information corresponding to the pull-hole type microparticle trap;Determine the second setting information of baffle for being arranged at the opening of pull-hole type microparticle trap, and the second setting information includes the size information and height information of baffle;First attribute information, first setting information are used to establish simulation model, and baffle is added in simulation model according to second setting information;According to the simulation model after adding baffle, simulation is carried out, to change second setting information based on simulation result, and then re-simulation is carried out until the target setting information of baffle is obtained when reaching preset stop condition.This application sets baffle at the opening of pull-hole type microparticle trap according to target setting information, enhances the attraction ability of pull-hole type microparticle trap to metal microparticle, and is beneficial to improve microparticle capture rate.
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Description

Technical Field

[0001] This invention relates to the field of high-voltage power transmission and distribution technology, and in particular to a method, apparatus, gas-insulated metal power transmission equipment and system for setting up particulate traps. Background Technology

[0002] With the increasing demand for electricity, the requirements for the stability, safety, and transmission capacity of power transmission equipment are becoming increasingly stringent. Gas-insulated metal transmission equipment, including GIL (Gas Insulated Metal-Enclosed Transmission Line) and GIS (Gas Insulated Metal-Enclosed Switchgear), has been widely used in harsh natural environments and cross-terrain power transmission due to its advantages such as large transmission capacity, small footprint, and immunity to external electromagnetic interference. However, gas-insulated metal transmission equipment may experience insulation failures, and metal particle contamination is a major cause of these failures. To suppress the movement of metal particles, particle traps are mainly installed on gas-insulated metal transmission equipment.

[0003] Currently, the deployment schemes for these particulate traps include: The first method involves arranging particulate traps such as strip traps, grid traps, and wedge traps on the inner surface of the busbar in gas-insulated metal transmission equipment. However, this method reduces the inner diameter of the busbar cylinder wall, which can easily lead to insulation failure during short-term overvoltage. Furthermore, under AC voltage, the metal particles move at a low height and tend to stagnate in the low electric field region at the edge of the trap, failing to be captured. Under external vibration and excitation, the particles can jump again, threatening the normal operation of the equipment. The second method does not occupy the inner diameter space of the busbar cylinder wall but instead sets up a perforated particulate trap that intersects with the cylinder wall of the gas-insulated metal transmission equipment. Although this type of particulate trap has stronger mechanical reliability than the first method, and is less prone to deformation under long-term vibration, its attraction capacity for metal particles has been found to be limited in practice. Therefore, how to provide an improved perforated particulate trap deployment scheme to better capture metal particles is an urgent problem to be solved. Summary of the Invention

[0004] In view of this, the present invention provides a method, apparatus, gas-insulated metal power transmission equipment and system for deploying particulate traps. By setting a baffle at the opening of the hole-type particulate trap according to the target setting information, the attraction ability of the hole-type particulate trap for metal particles is enhanced, which is conducive to improving the particulate capture rate.

[0005] To address the aforementioned technical problems, this application provides a method for deploying particulate traps, comprising: For the busbar of the gas-insulated metal power transmission equipment, the first attribute information corresponding to the AC voltage transmitted in the busbar and the first setting information corresponding to the hole-type particle trap are determined. The hole-type particle trap is set on the cylindrical wall of the busbar and the hole-type particle trap intersects with the cylindrical wall. Second setting information for a baffle to be placed at the opening of the pore-type particle trap is determined. The second setting information includes the size information and height information of the baffle, wherein the height information is the distance between the top surface of the baffle and the inner surface of the cylinder wall. A simulation model is established based on the first attribute information and the first setting information, and the baffle is added to the simulation model according to the second setting information; The simulation model after adding the baffle is simulated so that the second setting information can be changed based on the simulation results, and then the simulation is repeated until the preset stopping condition is reached to obtain the target setting information of the baffle.

[0006] Furthermore, after establishing the simulation model based on the first attribute information and the first setting information, it also includes: Determine the second attribute information of the simulated particles used to simulate metal microparticles, so that multiple simulated particles can be arranged in a preset area around the hole-pulling microparticle trap in the simulation model based on the second attribute information; A simulation is performed based on the simulation model after adding the baffle, so that the second setting information can be changed based on the simulation results, including: Simulations were performed based on a simulation model with the baffle and the simulated particles added. Determine the particle capture rate of the pore-type particle trap; Determine whether the particle capture rate is not less than a preset threshold; If so, determine that the current second setting information is the target setting information of the baffle; If not, change the second setting information and re-add the baffle to the simulation model based on the changed second setting information in order to re-perform the simulation.

[0007] Further, determining the particle capture rate of the pore-type particle trap includes: The particle capture rate of the porosity particle trap is determined by the ratio of the number of simulated particles within the porosity particle trap to the total number of simulated particles deployed.

[0008] Furthermore, the size information of the baffle includes the diameter and thickness of the baffle; The diameter of the baffle is smaller than the diameter of the cross-section of the pore-type particle trap at the height information.

[0009] Furthermore, the baffle has a disc-shaped structure.

[0010] Furthermore, the baffle is also provided with multiple through slots; The second setting information also includes the slot spacing between two adjacent through slots and the slot width of the through slot.

[0011] Furthermore, the through slots are arranged at equal intervals.

[0012] To address the aforementioned technical problems, the present invention also provides a particle trap deployment device, comprising: Memory, used to execute computer programs; A processor is used to execute the computer program to implement the steps of the particle trap deployment method as described above.

[0013] To solve the above-mentioned technical problems, the present invention also provides a gas-insulated metal power transmission device, including a busbar, a hole-type particle trap, and a baffle set according to the particle trap deployment method described above. The busbar includes a cylindrical wall, and the perforated particle trap is disposed on the cylindrical wall and the perforated particle trap intersects with the cylindrical wall.

[0014] To address the aforementioned technical problems, the present invention also provides a system comprising the gas-insulated metal power transmission equipment as described above.

[0015] This application provides a method, apparatus, gas-insulated metal power transmission equipment, and system for deploying particulate traps. In this scheme, for the busbar of the gas-insulated metal power transmission equipment, first attribute information corresponding to the AC voltage transmitted in the busbar and first setting information corresponding to the hole-type particulate trap are determined. The hole-type particulate trap is set on the cylindrical wall of the busbar, and the hole-type particulate trap intersects with the cylindrical wall. Second setting information for a baffle used to be placed at the opening of the hole-type particulate trap is determined. The second setting information includes the size information and height information of the baffle, where the height information is the distance between the top surface of the baffle and the inner surface of the cylindrical wall. A simulation model is established based on the first attribute information and the first setting information, and the baffle is added to the simulation model according to the second setting information. Simulation is performed based on the simulation model after adding the baffle, so that the second setting information can be changed based on the simulation results, and the simulation is repeated until a preset stopping condition is reached to obtain the target setting information of the baffle. It can be seen that this application enhances the attraction ability of the hole-type particulate trap for metal particles by setting a baffle at the opening of the hole-type particulate trap according to the target setting information, which is beneficial to improving the particulate capture rate and practical application.

[0016] The above description is only an overview of the technical solution of this application. In order to better understand the technical means of this application, it can be implemented according to the contents of the specification. In order to make the above and other objects, features and advantages of this application more obvious and understandable, the following are specific embodiments of this application. Attached Figure Description

[0017] The accompanying drawings, which are included to provide a further understanding of this application and form part of this application, illustrate exemplary embodiments and are used to explain this application, but do not constitute an undue limitation of this application. In the drawings: Figure 1 A flowchart of a particle trap deployment method provided by the present invention; Figure 2 A schematic diagram of a busbar with a hole-type particle trap provided by the present invention; Figure 3 A schematic diagram illustrating the changes in axial and radial electric fields when the diameter of the baffle is changed, as provided by the present invention. Figure 4 This invention provides a schematic diagram illustrating the changes in axial and radial electric fields when the height information corresponding to the baffle is changed. Figure 5 A schematic diagram illustrating the changes in axial and radial electric fields when the thickness of the baffle is changed, as provided by the present invention. Figure 6 A schematic diagram illustrating the changes in axial and radial electric fields when the width of the through groove on the baffle is changed, as provided by the present invention. Figure 7 This is a schematic diagram of the structure of a three-dimensional simulation model of a busbar provided by the present invention; Figure 8 A schematic diagram illustrating the change in particle capture rate when the diameter of the baffle is changed, as provided by the present invention. Figure 9 This invention provides a schematic diagram illustrating the change in particle capture rate when the height information corresponding to the baffle is changed. Figure 10 A schematic diagram illustrating the change in particle capture rate when the thickness of the baffle is changed, as provided by the present invention. Figure 11 A schematic diagram illustrating the change in particle capture rate when the width of the through groove on the baffle is changed, as provided by the present invention. Figure 12 This is a schematic diagram of a particle trap deployment device provided by the present invention. Detailed Implementation

[0018] The core of this invention is to provide a method, apparatus, gas-insulated metal power transmission equipment and system for deploying particulate traps. By setting a baffle at the opening of the hole-type particulate trap according to the target setting information, the attraction ability of the hole-type particulate trap for metal particles is enhanced, which is conducive to improving the particulate capture rate.

[0019] The technical solutions of the embodiments of this application will be clearly described below with reference to the accompanying drawings. Obviously, the described embodiments are only some, not all, of the embodiments of this application. All other embodiments obtained by those skilled in the art based on the embodiments of this application are within the scope of protection of this application.

[0020] The terms "first," "second," etc., used in the specification and claims of this application are used to distinguish similar objects and not to describe a specific order or sequence. It should be understood that such use of data can be interchanged where appropriate so that embodiments of this application can be implemented in orders other than those illustrated or described herein, and the objects distinguished by "first," "second," etc., are generally of the same class and the number of objects is not limited; for example, a first object can be one or more. Furthermore, in the specification and claims, "and / or" indicates at least one of the connected objects, and the character " / " generally indicates that the preceding and following objects are in an "or" relationship.

[0021] Please refer to Figure 1 and Figure 2 , Figure 1 This invention provides a flowchart of a method for setting up particulate traps. Figure 2 This is a schematic diagram of a busbar with a hole-type particle trap provided by the present invention.

[0022] The method for setting up particle traps includes: S11: For the busbar of the gas-insulated metal power transmission equipment, determine the first attribute information corresponding to the AC voltage transmitted in the busbar and the first setting information corresponding to the hole-type particle trap. The hole-type particle trap is set on the cylindrical wall of the busbar and the hole-type particle trap intersects with the cylindrical wall. S12: Determine the second setting information for the baffle 2 used to be placed at the opening of the hole-type particle trap. The second setting information includes the size information and height information of the baffle 2. The height information is the distance between the top surface of the baffle 2 and the inner surface of the cylinder wall. S13: Establish a simulation model based on the first attribute information and the first setting information, and add baffle 2 to the simulation model according to the second setting information; S14: Perform simulation based on the simulation model after adding baffle 2, so as to change the second setting information based on the simulation results, and then re-perform the simulation until the preset stop condition is reached to obtain the target setting information of baffle 2.

[0023] Specifically, the gas-insulated metal transmission equipment here can be either GIL or GIS; the busbar includes a cylindrical wall, and its interior also includes, for example... Figure 2 The conductive rod 14, basin-type insulator 13, and flange 12 shown are included. The conductive rod 14 is used to transmit AC voltage. The hole-type particle trap penetrates the cylinder wall, and its specific installation location has been detailed in related technologies and will not be repeated here. This application focuses on the arrangement method when a baffle 2 is set at the opening of the hole-type particle trap. Multiple hole-type particle traps can be set in the busbar according to the actual application situation (such as...). Figure 2 As shown in the illustration, taking the setting of two pore-type particle traps, namely the first pore-type particle trap 15 and the second pore-type particle trap 16, as an example, there is no particular limitation on the number of traps. Each trap is equipped with a corresponding baffle 2 in the manner described above. In addition, the shape of the pore-type particle trap includes, but is not limited to, the shape of the trap as shown in the illustration. Figure 2 The cylindrical shape shown can be set according to the electric field; no special restrictions are made here.

[0024] The AC voltage transmitted in the busbar referred to in step S11 is specifically the AC voltage transmitted in the conductive rod 14 in the busbar. The first attribute information is the amplitude and frequency of the AC voltage. The first setting information includes the setting position, setting depth, setting shape (e.g., cylindrical), setting size (e.g., setting diameter) of the hole-type particle trap.

[0025] The second setting parameter information in step S12 essentially refers to the structural parameter information of the baffle 2. The size information of the baffle 2 mentioned here may include the diameter and thickness of the baffle 2, such as... Figure 2 As shown, a portion of the perforated particle trap 16 is magnified and its diameter is illustrated; the height information is the distance between the top surface (i.e., upper surface) of the baffle 2 and the inner surface of the cylinder wall, such as... Figure 2 As shown, a portion of the hole-type particle trap 15 is magnified and the distance is indicated by height.

[0026] Furthermore, the diameter of baffle 2 is smaller than the diameter of the cross-section corresponding to the height information of the hole-type particle trap. This means there is a gap between baffle 2 and the inner wall of the hole-type particle trap. This is because without the gap, the radial electric field at the edge of the hole-type particle trap would be very small, preventing metal particles from moving into the trap. Additionally, from a manufacturing perspective, when installing baffle 2, there must be at least one connection point between baffle 2 and the inner wall of the trap to secure baffle 2 to the position corresponding to the target setting information using bolts.

[0027] Furthermore, the baffle 2 is also provided with multiple through slots; the second setting information also includes the slot spacing between two adjacent through slots and the slot width. For example... Figure 2 As shown, the slot spacing and slot width are illustrated. Here, the slot width refers to the width of the through slot, and the slot spacing refers to the distance between the adjacent sides of two adjacent through slots. It can be understood that the through slots help prevent a small number of metal particles from jumping above the baffle 2 and not being captured, thereby improving the particle capture rate.

[0028] It should be noted that adding baffle 2 can change the axial electric field direction at the edge of the hole-type particle trap (here, axial refers to the extension direction of the busbar). For example, in ultra-high voltage scenarios, the depth of the hole-type particle trap is generally 10cm and the diameter is 50cm. Adding baffle 2 can also help reduce the depth of the hole-type particle trap. By changing the second setting information of baffle 2, the axial and radial electric fields at the edge of the hole-type particle trap can be adjusted. Please refer to [reference needed]. Figure 3 , Figure 4 , Figure 5 and Figure 6 , Figure 3 This invention provides a schematic diagram illustrating the changes in axial and radial electric fields when the diameter of the baffle 2 is changed. Figure 4 This invention provides a schematic diagram illustrating the changes in axial and radial electric fields when the height information corresponding to the baffle 2 is changed. Figure 5 This invention provides a schematic diagram illustrating the changes in axial and radial electric fields when the thickness of the baffle 2 is altered. Figure 6 The present invention provides a schematic diagram illustrating the changes in axial and radial electric fields when the width of the slot on the baffle 2 is changed. First, the height, thickness, and diameter of the baffle 2 have a significant impact on the axial and radial electric fields at the edge of the hole-type particle trap, while the change in slot width has a smaller impact (in practical applications, it is preferable to set the sum of the slot width and slot spacing to 20 mm, such as setting the slot width to 10 mm and the slot spacing to 10 mm). Second, as the height, diameter, and thickness of the baffle 2 increase, the axial electric field at the edge of the hole-type particle trap becomes larger, and the radial electric field becomes smaller. Since a larger axial electric field results in a larger range of motion for the metal particles in the axial direction, and a smaller radial electric field results in a lower movement height for the metal particles, adjusting the second setting parameter of the baffle 2 is beneficial for obtaining the optimal particle capture rate of the hole-type particle trap.

[0029] It should also be noted that the preset stop conditions include, but are not limited to, setting them according to the particle capture rate of the hole-type particle trap; corresponding to the hole-type particle trap, the target setting information includes the target height, target diameter and target thickness set by the baffle 2, and when the baffle 2 is provided with a through groove, the target setting information also includes the target groove distance and target groove width, and then after step S14, the baffle 2 is set at the opening of the hole-type particle trap based on the target setting information.

[0030] Furthermore, preferably, in some embodiments, the through slots are arranged at equal intervals, which is beneficial for actual engineering processing and application. The simulation model mentioned here can specifically be a three-dimensional simulation model; please refer to [reference needed]. Figure 7 , corresponding to Figure 2 The structure shown. Figure 7 This is a schematic diagram of the structure of a three-dimensional simulation model of a busbar provided by the present invention.

[0031] In summary, this application provides a method for deploying particulate traps. According to the target setting information, a baffle 2 is set at the opening of the hole-type particulate trap, which improves the hole-type particulate trap, enhances the attraction ability of the hole-type particulate trap for metal particles, helps to improve and optimize the particulate capture rate, helps to effectively control metal particulate pollution in gas-insulated metal power transmission equipment, and is beneficial to practical applications.

[0032] In some embodiments, after establishing the simulation model based on the first attribute information and the first setting information, the method further includes: Determine the second attribute information of the simulated particles used to simulate metal microparticles, so that multiple simulated particles can be arranged in a preset area around the hole-type microparticle trap in the simulation model based on the second attribute information; The simulation model after adding baffle 2 is used for simulation, so that the second setting information can be changed based on the simulation results, including: Simulations were performed based on the simulation model with added baffle 2 and simulated particles; Determine the particle capture rate of the pore-type particle trap; Determine whether the particle capture rate is not less than a preset threshold; If so, confirm that the current second setting information is the target setting information for baffle 2; If not, change the second setting information and re-add baffle 2 to the simulation model based on the changed second setting information in order to re-perform the simulation.

[0033] More specifically, in some embodiments, determining the particle capture rate of the pore-trap includes: The particle capture rate of the porosity particle trap is determined by the ratio of the number of simulated particles in the porosity particle trap to the total number of simulated particles deployed.

[0034] To elaborate, the second attribute information here can include density, diameter, charge, and the particle collision recovery coefficient corresponding to different positions when the simulated particles collide (the purpose of setting this coefficient is mainly because the particle capture rate is calculated based on the number of simulated particles entering the hole-type particle trap, and the simulated particles lose kinetic energy during movement, so this particle collision recovery coefficient is set to calibrate the velocity change of the particles before and after the collision); the preset area can be flexibly set according to actual needs, such as a 10mm×150mm area at the edge of the hole-type particle trap; in addition, in order to ensure the simulation effect, the number of simulated particles can be as large as possible, that is, the number of simulated particles is not less than the preset minimum number, which can be flexibly set according to actual needs, such as 1000, without special limitation here; in addition, the preset threshold can be flexibly set according to the actual application needs, without special limitation here.

[0035] After obtaining the simulation model with added baffle 2 and simulated particles, the simulation model is imported into the finite element simulation software. Material properties of different domain elements (i.e., different positions) are set. Simulation information is input and modified through various interfaces on the human-computer interaction interface (i.e., the interface where technicians input information). For example, material setting information can be input through the material interface, which may include relative permittivity, density, and conductivity. First attribute information and boundary condition settings such as grounding are input through the electrostatic interface. Second attribute information is set through the flow simulation particle tracking interface. In addition, when counting the number of simulated particles in the hole-pulling particle trap, a counting surface can be set at the bottom of the hole-pulling particle trap to count the simulated particles entering the hole-pulling particle trap.

[0036] More specifically, 1000 simulated particles with a diameter of 0.5 mm, used to simulate aluminum balls, are arranged in a 10 mm × 150 mm area at the edge of the hole-pulling particle trap. The simulation is conducted with an AC voltage amplitude of 1100 kV and a frequency of 50 Hz transmitted in the conductive rod 14. In principle, when the AC voltage polarity is positive and reaches the jumping voltage of the metal particles, the negatively charged metal particles will lift up. As the axial electric field increases and the polarity of the AC voltage in the conductive rod 14 changes, the metal particles will move towards the hole-pulling particle trap under the action of the electric field force. After entering the trap, due to the decrease in electric field strength, the metal particles will lose a large amount of charge and undergo multiple collisions in the space formed by the baffle 2 and the inside of the trap, thus losing kinetic energy and achieving the purpose of capturing the metal particles.

[0037] Please refer to Figure 8 , Figure 9 , Figure 10 and Figure 11 , Figure 8 This is a schematic diagram illustrating the change in particle capture rate when the diameter of the baffle 2 is changed, as provided by the present invention. Figure 9This invention provides a schematic diagram illustrating the change in particle capture rate when the height information corresponding to baffle 2 is changed. Figure 10 This is a schematic diagram illustrating the change in particle capture rate when the thickness of the baffle 2 is changed, as provided by the present invention. Figure 11 This invention provides a schematic diagram illustrating the change in particle capture rate when the width of the slot on the baffle 2 is changed. First, the capture rate of the hole-type particle trap is mainly affected by the thickness, height, and diameter of the baffle 2. Second, as the height, diameter, and thickness increase, the particle capture rate of the hole-type particle trap first increases and then decreases. Since the movement height of metal particles under AC voltage is relatively large, the change in slot width has little effect on the trap capture rate (or basically no effect). Finally, it can be seen that when the thickness of the baffle 2 is 10mm, the height is 20mm, the diameter is 495mm, and the slot width is 6mm, the particle capture rate of the hole-type particle trap reaches 54.6%, while the particle capture rate of the hole-type particle trap without the baffle 2 is only 15.3%. It can be seen that the particle capture rate is improved by 39.3% according to the scheme in this application, further proving the effectiveness of the technical solution in this application.

[0038] In some embodiments, the baffle 2 has a disc-shaped structure.

[0039] Specifically, the advantage of setting the baffle 2 as a disc-shaped structure is that the electric field distortion caused by the baffle in the gas-insulated metal power transmission equipment is smaller after adopting this setting, which can ensure the safe operation of the equipment while ensuring the particle capture rate. If the baffle 2 is set in other forms, such as a triangular structure, its sharp corners may cause excessive electric field distortion, leading to insulation breakdown.

[0040] Please refer to Figure 12 , Figure 12 This is a schematic diagram of a particle trap deployment device provided by the present invention.

[0041] The particle trap deployment device includes: Memory 31 is used to execute computer programs; The processor 32 is used to execute the computer program to implement the steps of the particle trap deployment method as described above.

[0042] For a description of the particle trap deployment device provided in this application, please refer to the embodiments of the above-described particle trap deployment method; further details will not be repeated here.

[0043] The present invention also provides a gas-insulated metal power transmission device, including a busbar, a hole-type particle trap, and a baffle 2 set according to the particle trap deployment method described above; The busbar includes a cylindrical wall 11, and a hole-type particle trap is disposed on the cylindrical wall 11, and the hole-type particle trap intersects with the cylindrical wall 11.

[0044] For a description of the gas-insulated metal power transmission equipment provided in this application, please refer to the embodiments of the above-described particulate trap deployment method; further details will not be repeated here.

[0045] The present invention also provides a system comprising the gas-insulated metal power transmission equipment as described above.

[0046] For a description of the system provided in this application, please refer to the embodiments of the particle trap deployment method described above; further details will not be repeated here. It is understood that this system is specifically an electrical system.

[0047] The various embodiments in this specification are described in a progressive manner, with each embodiment focusing on its differences from other embodiments. Similar or identical parts between embodiments can be referred to interchangeably. For the apparatus disclosed in the embodiments, since it corresponds to the method disclosed in the embodiments, the description is relatively simple; relevant parts can be referred to in the method section. Relational terms such as "first" and "second" are used merely to distinguish one entity or operation from another, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Furthermore, the terms "comprising," "including," or any other variations thereof are intended to cover non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements includes not only those elements but also other elements not expressly listed, or elements inherent to such a process, method, article, or apparatus. Without further limitations, an element defined by the phrase "comprising one" does not exclude the presence of other identical elements in the process, method, article, or apparatus that includes said element.

[0048] The above description of the disclosed embodiments enables those skilled in the art to make or use the invention. Various modifications to these embodiments will be readily apparent to those skilled in the art, and the general principles defined herein may be implemented in other embodiments without departing from the spirit or scope of the invention. Therefore, the invention is not to be limited to the embodiments shown herein, but is to be accorded the widest scope consistent with the principles and novel features disclosed herein.

Claims

1. A method for setting up particle traps, characterized in that, include: For the busbar of the gas-insulated metal power transmission equipment, the first attribute information corresponding to the AC voltage transmitted in the busbar and the first setting information corresponding to the hole-type particle trap are determined. The hole-type particle trap is set on the cylindrical wall of the busbar and the hole-type particle trap intersects with the cylindrical wall. Second setting information for a baffle to be installed at the opening of the hole-type particle trap is determined. The second setting information includes the size information and height information of the baffle. The height information is the distance between the top surface of the baffle and the inner surface of the cylinder wall. The height information is set such that the baffle is installed entirely outside the cavity of the hole-type particle trap. A simulation model is established based on the first attribute information and the first setting information, and the baffle is added to the simulation model according to the second setting information; The simulation model after adding the baffle is simulated so that the second setting information can be changed based on the simulation results, and then the simulation is repeated until the preset stopping condition is reached to obtain the target setting information of the baffle. The dimensions of the baffle include its diameter and thickness; Wherein, the diameter of the baffle is smaller than the diameter of the cross section corresponding to the height information of the hole-type particle trap; The baffle is also provided with multiple through slots; The second setting information also includes the slot spacing between two adjacent through slots and the slot width of the through slot.

2. The particulate trap deployment method as described in claim 1, characterized in that, After establishing the simulation model based on the first attribute information and the first setting information, it also includes: Determine the second attribute information of the simulated particles used to simulate metal microparticles, so that multiple simulated particles can be arranged in a preset area around the hole-pulling microparticle trap in the simulation model based on the second attribute information; A simulation is performed based on the simulation model after adding the baffle, so that the second setting information can be changed based on the simulation results, including: Simulations were performed based on a simulation model with the baffle and the simulated particles added. Determine the particle capture rate of the pore-type particle trap; Determine whether the particle capture rate is not less than a preset threshold; If so, determine that the current second setting information is the target setting information of the baffle; If not, change the second setting information and re-add the baffle to the simulation model based on the changed second setting information in order to re-perform the simulation.

3. The particulate trap deployment method as described in claim 2, characterized in that, Determining the particle capture rate of the pore-type particle trap includes: The particle capture rate of the porosity particle trap is determined by the ratio of the number of simulated particles within the porosity particle trap to the total number of simulated particles deployed.

4. The particulate trap deployment method as described in claim 1, characterized in that, The baffle has a disc-shaped structure.

5. The particulate trap deployment method as described in claim 1, characterized in that, The through slots are arranged at equal intervals.

6. A particle trap deployment device, characterized in that, include: Memory, used to execute computer programs; A processor for executing the computer program to implement the steps of the particle trap deployment method as described in any one of claims 1 to 5.

7. A gas-insulated metal power transmission device, characterized in that, Includes a busbar, a hole-type particle trap, and a baffle set according to the particle trap deployment method as described in any one of claims 1 to 5; The busbar includes a cylindrical wall, and the perforated particle trap is disposed on the cylindrical wall and the perforated particle trap intersects with the cylindrical wall.

8. A system, characterized in that, Including the gas-insulated metal power transmission equipment as described in claim 7.

Citation Information

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