一种高阻隔耐热量子点UV胶及其制备方法

By combining high Tg thiol oligomers with thiol acrylic monomers and using a specific ratio of photoinitiators and heat stabilizers, a dense cross-linked network is constructed, solving the problems of insufficient water and oxygen barrier properties and heat resistance of quantum dot UV adhesives. This achieves highly efficient water and oxygen barrier properties and heat resistance, meeting the high-performance requirements of electronic display devices.

CN121718308BActive Publication Date: 2026-07-17SHANGHAI JINQIANG ADHESIVE
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
SHANGHAI JINQIANG ADHESIVE
Filing Date
2026-02-13
Publication Date
2026-07-17

AI Technical Summary

Technical Problem

Existing quantum dot UV adhesives are insufficient in terms of water and oxygen barrier properties and heat resistance, making it difficult to meet the high-performance requirements of electronic display devices. Current technologies have failed to achieve synergistic optimization of water and oxygen barrier properties, heat resistance, and processing performance simultaneously.

Method used

By combining a specific amount of high Tg thiol oligomer with thiol acrylic acid monomer, a rigid framework-flexible crosslinking synergistic system is constructed. Combined with a specific ratio of photoinitiator and heat stabilizer, a dense, non-porous crosslinking network is formed, achieving a comprehensive optimization of water and oxygen barrier properties, heat resistance, and processing performance.

Benefits of technology

Significant improvements have been achieved in the water-blocking, oxygen-barrier, and heat-resistant properties of quantum dot UV adhesives. The water vapor permeability is ≤15g/m224h, the water resistance is excellent, the viscosity is moderate, which meets the needs of continuous industrial production, and the processing performance is maintained.

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Abstract

本发明涉及UV胶技术领域，具体的，涉及一种高阻隔耐热量子点UV胶及其制备方法。按重量百分比计，组分包括：巯基低聚物24‑40%、硫醇丙烯酸单体20‑37%、热稳定剂17‑30%、活性稀释剂4‑9%、偶联剂1‑4%、助剂0.5‑2%、光引发剂1‑3%；所述巯基低聚物的Tg为90‑120℃。本发明通过限定特定含量的高Tg的巯基低聚物与硫醇丙烯酸单体复配使用，可使量子点UV胶同时实现阻水隔氧性能、耐热性与加工性能的协同优化；本发明通过限定巯基低聚物、硫醇丙烯酸单体和热稳定剂的重量比为（35‑40）：（20‑31）：（17‑25），进一步提高量子点UV胶的耐水性和固化效率。
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