一种采用并行数字微镜阵列的扫描式曝光方法及系统

By using benchmark target exposure detection registration and generating a block distortion field parameter table, inserting micro-markers and collecting imaging data, and extracting measured coordinates for differential calculation, the problem of mapping relationship dependence on offline calibration and difficulty in maintaining geometric consistency in parallel digital micromirror array scanning exposure is solved, and traceability and closed-loop linkage in the scanning process are realized.

CN121763673BActive Publication Date: 2026-07-17DONGGUAN HECHUAN MASCH EQUIP TECH CO LTD

Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
DONGGUAN HECHUAN MASCH EQUIP TECH CO LTD
Filing Date
2026-03-02
Publication Date
2026-07-17

AI Technical Summary

Technical Problem

In existing parallel digital micromirror array scanning exposure methods, the mapping relationship from pixel coordinates to substrate coordinates depends on offline calibration and drifts with scanning position and time. It is difficult to maintain geometric consistency between subarrays and at strip boundaries, and there is a lack of traceable observation residual collection and incremental update mechanism.

Method used

A parallel digital micromirror initial mapping is established by using a detection and registration method based on a reference target exposure. A block distortion field parameter table is generated, micro-markers are inserted and imaging data is collected. The measured coordinates are extracted and differential calculations are performed to form a residual set. The block distortion field parameter table is then updated by incremental fitting, realizing a closed-loop linkage between pattern remapping and exposure triggering.

Benefits of technology

It achieves the accessibility and traceability of mapping relationships, has a consistent coordinate reference, and the coordinate conversion within the scanning strip range has block-level manageability. Deviations during the scanning process can be structurally collected, and the scanning exposure process maintains continuous operation, achieving the effect of an implementable online correction mechanism and a complete closed-loop link.

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Abstract

本发明公开了一种采用并行数字微镜阵列的扫描式曝光方法及系统,涉及光刻曝光与掩模无掩模直写技术领域,包括通过基准靶标曝光的检测配准方法建立并行数字微镜初始映射;根据并行数字微镜初始映射生成分块畸变场参数表,基于分块畸变场参数表确定微标记插入位置并生成期望坐标;对期望坐标位置进行微标记曝光,采集插入微标记位置成像数据,从微标记位置成像数据提取实测坐标,将期望坐标与实测坐标作为输入进行差分计算,得到残差并写入残差集;根据残差集进行增量拟合,更新分块畸变场参数表,曝光控制器控制并行数字微镜阵列根据更新分块畸变场参数表重映射图案并触发曝光。本发明所述方法在坐标映射一致性、分块参数可管理性都取得更加良好的效果。
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