High-precision five-dimensional attitude adjustment platform

Abstract

The application provides a high-precision five-dimensional attitude adjusting table, and relates to the field of part contour measurement. The high-precision five-dimensional attitude adjusting table comprises a rotating table, an XY centering platform and a leveling platform. The rotating table table top of the rotating table is connected with the XY centering platform, and the XY centering platform and the leveling platform are arranged to be rotatable in a horizontal plane by 360 degrees. The leveling platform is located on the rotating table table top, and is used to drive a workpiece to be measured on the leveling platform to swing along at least two different horizontal axes. The XY centering platform is in transmission connection with the leveling platform, and is used to drive the leveling platform to move horizontally along the X direction or the Y direction. The XY centering platform is in a ring structure, is sleeved on the rotating table, and is located below the rotating table table top. The adjusting table can drive the workpiece to move in five directions, reduces the axial size of the overall structure, reduces the influence of attitude error on the measurement accuracy during the movement of the rotating table, and is beneficial to the miniaturization of the instrument.

Description

Technical Field

[0001] This invention relates to the field of part contour measurement technology, and in particular to a high-precision five-dimensional attitude adjustment stage. Background Technology

[0002] High-precision profile measuring instruments are essential for measuring the profiles of rotating parts. Alignment (centering and leveling) of the part's axis and its high-precision rotation are crucial steps in the measurement process. Before measurement, the part is placed on the measuring instrument's turntable. Then, the part's geometric axis of rotation is aligned with the turntable's geometric axis of rotation—this is the "centering and leveling" process. The turntable then rotates the part with high precision. During rotation, the probe reads data, and the measurement and control system records the data, thus obtaining the profile shape of the part's surface.

[0003] Part axis alignment (i.e., self-alignment and leveling) involves four-dimensional motion, and there are three types of alignment methods: manual adjustment, manual adjustment mechanism adjustment, and automatic adjustment mechanism adjustment. Manual adjustment involves gently tapping the part (self-alignment) and placing shims (leveling) to align the part axis. Manual adjustment mechanisms typically use a four-dimensional adjustment platform, usually bolt-driven. Adjustment requires manually rotating the bolt knob, using the bolt's extension and contraction to align the part axis. Automatic adjustment, compared to manual adjustment mechanisms, generally uses a motor drive. Before self-alignment and leveling, a probe sensor measures the deviation between the part axis and the turntable's rotation axis. This deviation is then input into the automatic adjustment mechanism, and the motor aligns the axis. The measuring instrument's turntable has a 360° rotation function, used to support the part and drive it for high-precision rotation.

[0004] The applicant has discovered that the prior art has at least the following technical problems: (1) Problems with manual adjustment: manual adjustment is inefficient; in addition, the adjustment process often involves tapping and adding shims, which requires a high level of experience from the operator.

[0005] (2) Adjustment problems of manual adjustment mechanism: The disadvantages of manual adjustment mechanism are similar to those of manual adjustment method. First, the efficiency is low and the experience of the operator is required. Second, most manual adjustment mechanisms are bolt driven. Due to the pitch of the bolt, it is difficult to achieve micron-level displacement. Therefore, the adjustment resolution of manual adjustment mechanism is also low.

[0006] (3) Adjustment problem of automatic adjustment mechanism: The existing automatic adjustment mechanism is placed on the upper surface of the turntable, that is, the bottom surface of the automatic adjustment mechanism is fixed on the upper surface of the turntable, and the upper surface of the automatic adjustment mechanism is the worktable surface on which the part is placed. In other words, this method will make the size of the five-dimensional adjustment mechanism (i.e., turntable + four-dimensional adjustment mechanism) too large along the turntable axis. During the rotation of the turntable, the posture of the turntable axis will change slightly, that is, an axis error will be generated. The excessive axis dimension error will be amplified during the actual measurement of the part, thus affecting the measurement accuracy.

[0007] In summary, especially for small-sized parts, the existing attitude adjustment mechanism (which functions as centering and leveling) used to align the part's axis with the turntable axis has an excessively large dimension along the turntable axis, resulting in a large measurement error. Summary of the Invention

[0008] The purpose of this invention is to provide a high-precision five-dimensional attitude adjustment stage to solve the problem of excessively large dimensions and large measurement errors along the turntable axis in existing attitude adjustment mechanisms used to align the axis of a part. The various technical effects of the preferred solutions among the many technical solutions provided by this invention are detailed below.

[0009] To achieve the above objectives, the present invention provides the following technical solution: The high-precision five-dimensional attitude adjustment stage provided by this invention includes a turntable, an XY-axis centering platform, and a leveling platform, wherein: The turntable surface is connected to the XY-axis self-aligning platform, which is used to drive the XY-axis self-aligning platform and the leveling platform to rotate 360° in the horizontal plane. The leveling platform is located on the turntable and is used to drive the workpiece to be tested on it to swing along at least two different horizontal axes. The XY-axis self-aligning platform is connected to the leveling platform via a transmission, and is used to drive the leveling platform to move horizontally along the X or Y direction. The XY-axis self-aligning platform has a ring structure, is sleeved on the outside of the turntable, and is located below the turntable surface, thereby reducing the overall axial dimension.

[0010] Preferably, the XY-axis self-aligning platform includes a first sub-base plate, a second sub-base plate, a Y-axis slide, an X-axis motion actuator, and a Y-axis motion actuator, wherein: The first sub-substrate, the second sub-substrate, and the Y-direction slide are all annular structures and are sleeved on the outside of the turntable, arranged sequentially from bottom to top; the first sub-substrate is fixedly connected to the turntable surface; The X-axis motion driver is connected to the second sub-sub ... The Y-axis motion driver is connected to the Y-axis slide drive, and the Y-axis motion driver is used to drive the Y-axis slide to move horizontally in the Y direction relative to the second sub-base plate; There is a horizontal clearance between the second sub-base plate, the Y-axis slide and the outer wall of the turntable. The horizontal clearance allows the second sub-base plate and the Y-axis slide to move horizontally in the corresponding direction so that at least one point of the axis of the workpiece to be measured coincides with the axis of the turntable surface.

[0011] Preferably, the first sub-substrate is provided with an X-guide rail, which is slidably connected to the second sub-substrate; The second sub-base plate is provided with a Y-guide rail, which is slidably connected to the Y-axis slide plate; An X-direction spring damper is provided on the second sub-sub ... A Y-direction spring damper is provided on the Y-direction slide. The Y-direction spring damper is used to reduce the impact of the movement of the Y-direction slide. When the Y-direction motion driver removes the driving force acting on the Y-direction slide, the Y-direction spring damper is used to drive the Y-direction slide to move in the opposite direction and reset.

[0012] Preferably, the leveling platform includes a worktable for fixing the workpiece to be measured. The worktable is capable of swinging at least along horizontal axis A and horizontal axis B, wherein horizontal axis A and horizontal axis B are perpendicular to each other.

[0013] Preferably, the leveling platform further includes a leveling base, a first angle adjustment driver fixed to the leveling base, and a second angle adjustment driver, wherein: There is a vertical clearance between the leveling base and the worktable in the vertical direction. The leveling base is connected to the moving part of the XY-direction self-aligning platform and is movable in the X or Y direction. When the telescopic end of the first angle adjustment driver extends, it can push the worktable, thereby causing the worktable to swing along the horizontal axis A; when the telescopic end of the second angle adjustment driver extends, it can push the worktable, thereby causing the worktable to swing along the horizontal axis B. Wherein, the horizontal line connecting the first angle adjustment driver to the central axis of the worktable and the horizontal line connecting the second angle adjustment driver to the central axis of the worktable are perpendicular to each other.

[0014] Preferably, the leveling base is provided with an arc-shaped limiting groove, and a ball joint is fixed to the bottom of the worktable, the ball joint being located within the arc-shaped limiting groove; When the first angle adjustment driver pushes the worktable, the ball joint swings along the horizontal axis A within the arc-shaped limiting groove; When the second angle adjustment driver pushes the worktable, the ball joint swings along the horizontal axis B within the arc-shaped limiting groove.

[0015] Preferably, the leveling base includes a base cylinder and a pad, wherein: The base cylinder has an annular structure and is sleeved outside the turntable, with only the pad located on the turntable surface and the arc-shaped limiting groove located on the pad. The first angle adjustment driver and the second angle adjustment driver are both fixed on the base cylinder, and the pad is provided with corresponding clearance holes. The telescopic ends of the first angle adjustment driver and the second angle adjustment driver both protrude through the corresponding clearance holes.

[0016] Preferably, a support portion is fixed on the leveling base, and the support portion protrudes from the upper surface of the leveling base; Two support parts are respectively arranged opposite to the first angle adjustment driver and the second angle adjustment driver, and are used to abut against the bottom of the worktable, thereby limiting the rotation angle of the worktable; The leveling platform also includes a tension spring, the upper end of which is fixed to the worktable, and the lower end of which is fixed to the moving part of the XY-axis self-aligning platform. All the tension springs, all the supports, the first angle adjustment driver, and the second angle adjustment driver are distributed on the outer periphery of the leveling base and are evenly spaced around the central axis of the worktable.

[0017] Preferably, the turntable includes a lower hydrostatic plate, a hemispherical mandrel, a limiting plate, and a drive device, wherein: The limiting plate is located on the lower static pressure plate, and the limiting plate is provided with a hemispherical limiting groove. The hemispherical mandrel is located in the hemispherical limiting groove. The driving device is connected to the hemispherical mandrel for driving the hemispherical mandrel to drive the turntable surface to rotate around the vertical axis.

[0018] Preferably, the turntable further includes a planar throttle and a hemispherical throttle, wherein: The hemispherical mandrel is fixed to the bottom of the turntable surface, the hemispherical throttle is located in the hemispherical limiting groove, and the hemispherical mandrel is located inside the hemispherical throttle. The planar throttle is located on the lower static pressure plate, and the limiting plate is provided with an airflow channel. The hemispherical throttle has a first air inlet groove on the side opposite to the hemispherical mandrel, and the planar throttle has a second air inlet groove on the side opposite to the lower static pressure plate. Both the planar throttle and the hemispherical throttle have dense air holes. The airflow channel is connected to the first air inlet slot and the second air inlet slot, and is used to form an air film between the hemispherical throttle and the hemispherical mandrel, and between the planar throttle and the lower static pressure plate.

[0019] The high-precision five-dimensional attitude adjustment stage provided by this invention has the following advantages compared with the prior art: the high-precision five-dimensional attitude adjustment stage can drive the workpiece to move in five dimensions, which is convenient for measuring the outer contour of the workpiece from all directions; wherein, the XY-axis centering platform drives the leveling platform to move horizontally along the X or Y direction, and the leveling platform drives the workpiece to be measured to swing along at least two different horizontal axes. The two cooperate with each other to facilitate the leveling and centering of the workpiece, so that the axis of the workpiece is collinear with the central axis of the turntable; since the XY-axis centering platform is a ring structure, sleeved outside the turntable and located below the turntable surface, the axial dimension of the overall structure of the high-precision five-dimensional attitude adjustment stage is reduced, which can reduce the influence of attitude error on measurement accuracy during turntable movement, and at the same time reduce the volume, which is conducive to the miniaturization of the instrument. Attached Figure Description

[0020] To more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0021] Figure 1 This is a schematic diagram of the overall structure of a high-precision five-dimensional attitude adjustment stage; Figure 2 This is a schematic diagram of the five motion dimensions of the high-precision five-dimensional attitude adjustment stage—X-axis, Y-axis, A-axis, B-axis, and C-axis; Figure 3 This is a schematic diagram of the exploded structure of the XY-axis centering platform; Figure 4 This is a schematic diagram of the exploded structure of the leveling platform; Figure 5 This is a cross-sectional structural diagram of a high-precision five-dimensional attitude adjustment stage; Figure 6 This is a partial cross-sectional 3D view of the high-precision five-dimensional attitude adjustment stage; Figure 7 This is a schematic diagram of the top view of the high-precision five-dimensional attitude adjustment stage after removing the worktable; Figure 8 This is a schematic diagram of the bottom view of the leveling platform after the worktable is removed.

[0022] In the diagram: 1. Turntable; 2. XY-axis self-aligning platform; 3. Leveling platform; 4. First sub-base plate; 5. X-axis guide rail; 6. Y-axis guide rail; 7. Second sub-base plate; 8. X-axis motion actuator; 9. Y-axis slide; 10. Y-axis motion actuator; 11. Y-axis spring damper; 12. Spacer; 13. X-axis spring damper; 14. Pull ring; 15. Second angle adjustment actuator; 16. Ball joint; 17. Tension spring; 18. Leveling base; 181. 182. Base cylinder; 183. Pad plate; 184. Clearance hole; 19. First angle adjustment driver; 20. Support part; 21. Worktable; 22. Arc-shaped limiting groove; 23. Airflow channel; 24. First air inlet groove; 25. Second air inlet groove; 26. Lower static pressure plate; 27. Planar throttle; 28. Hemispherical throttle; 29. ​​Hemispherical spindle; 30. Turntable surface; 31. Encoder; 32. Torque motor; 33. Limiting plate; 34. Hemispherical limiting groove. Detailed Implementation

[0023] To make the objectives, technical solutions, and advantages of this invention clearer, the technical solutions of this invention will be described in detail below. Obviously, the described embodiments are merely some embodiments of this invention, and not all embodiments. Based on the embodiments of this invention, all other implementation methods obtained by those skilled in the art without creative effort are within the scope of protection of this invention.

[0024] In the description of this invention, it should be understood that the terms "center," "length," "width," "height," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," "outer," and "side," etc., indicating orientation or positional relationships, are based on the orientation or positional relationships shown in the accompanying drawings and are only for the convenience of describing the invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of the invention. In the description of this invention, unless otherwise stated, "a plurality of" means two or more.

[0025] This invention provides a high-precision five-dimensional attitude adjustment stage, which can drive the workpiece to move in five dimensions and reduce the impact of attitude error on measurement accuracy during the turntable movement.

[0026] The following is combined with Figures 1-8 The technical solution provided by this invention will be described in more detail below.

[0027] See Figures 1-8As shown, the high-precision five-dimensional attitude adjustment stage provided by the present invention includes a turntable 1, an XY-axis self-aligning platform 2, and a leveling platform 3, wherein: the turntable surface 30 of the turntable 1 is connected to the XY-axis self-aligning platform 2, and is used to drive the XY-axis self-aligning platform 2 and the leveling platform 3 to be rotatably set in the horizontal plane; the leveling platform 3 is located on the turntable surface 30, and is used to drive the workpiece to be measured on it to swing along at least two different horizontal axes; the XY-axis self-aligning platform 2 is connected to the leveling platform 3 by transmission, and is used to drive the leveling platform 3 to move horizontally along the X or Y direction; the XY-axis self-aligning platform 2 is a ring structure, sleeved outside the turntable 1, and located below the turntable surface 30, thereby reducing the overall axial dimension.

[0028] The high-precision five-dimensional attitude adjustment stage in this embodiment can drive the workpiece to move in five dimensions. See [link / reference] Figure 2 As shown, the leveling platform 3 is located on the turntable surface 30 and is used to drive the workpiece to be measured on it to swing along horizontal axes A and B, wherein horizontal axes A and B are perpendicular to each other. Figure 2 The A-axis and B-axis are shown; the turntable surface 30 of turntable 1 is configured to rotate 360° in the horizontal plane, as shown. Figure 2 The C-axis is shown; the XY-axis self-aligning platform 2 drives the workpiece to be measured on the leveling platform 3 to move horizontally along the X or Y direction, as shown. Figure 2 The X and Y axes are shown. Therefore, when the workpiece is fixed on the leveling platform 3, it can move in the above five dimensions, thereby measuring the outer contour of the workpiece.

[0029] In this embodiment, see Figure 5 and Figure 6 As shown, by setting the XY-axis self-aligning platform 2 as a ring structure and arranging it below the turntable surface 30, the cumulative size of the attitude adjustment mechanism in the axial direction is effectively reduced. Compared with the existing structure where each platform is stacked sequentially above the turntable surface 30, this embodiment reduces the axial dimension caused by the height superposition, thereby reducing the impact of axial error on measurement accuracy during the rotation of the turntable 1. This improvement is particularly suitable for high-precision measurement scenarios of small-sized parts, providing a new technical path to solve the problem of increased measurement error caused by excessive size of the attitude adjustment mechanism along the axial direction of the turntable 1.

[0030] The specific structure of the XY-axis centering platform 2 in this embodiment is described below: See Figure 1 , Figure 3 and Figure 5As shown, the XY-axis self-aligning platform 2 includes a first sub-base plate 4, a second sub-base plate 7, a Y-axis slide plate 9, an X-axis motion actuator 8, and a Y-axis motion actuator 10. The first sub-base plate 4, the second sub-base plate 7, and the Y-axis slide plate 9 are all annular structures, fitted around the turntable 1, and arranged sequentially from bottom to top. The first sub-base plate 4 is fixedly connected to the turntable surface 30. The X-axis motion actuator 8 is driven by the second sub-base plate 7, driving the second sub-base plate 7 to move horizontally relative to the first sub-base plate 4 in the X direction. The Y-axis motion actuator 10 is driven by the Y-axis slide plate 9, driving the Y-axis slide plate 9 to move horizontally relative to the second sub-base plate 7 in the Y direction. (See also...) Figure 3 and Figure 5 As shown, the first sub-base plate 4 serves as a fixed part of the XY-axis self-aligning platform 2, and it cannot move horizontally along the X and Y directions. The first sub-base plate 4 rotates 360° with the turntable 1 under the drive of the turntable 1.

[0031] The X-axis motion actuator 8 and Y-axis motion actuator 10 can be driven by piezoelectric actuators, linear servo modules, or other drive structures. Details will not be elaborated here. Specifically, piezoelectric stack actuators, piezoelectric tube actuators, etc., can be used.

[0032] In this embodiment, the first sub-substrate 4 serves as the base layer and is fixedly connected to the turntable surface 30, ensuring the stability of the entire mechanism. The second sub-substrate 7 moves horizontally relative to the first sub-substrate 4 via the X-axis motion driver 8. This structure effectively avoids mutual interference between X-axis and Y-axis movements. The Y-axis slide 9 moves independently relative to the second sub-substrate 7 via the Y-axis motion driver 10, forming a complete two-dimensional adjustment system.

[0033] See Figure 5 As shown, there is a horizontal clearance between the second sub-subplate 7, the Y-axis slide 9 and the outer wall of the turntable 1. In other words, there is the above-mentioned clearance between the second sub-subplate 7 and the outer wall of the turntable 1, and between the Y-axis slide 9 and the outer wall of the turntable 1. The horizontal clearance allows the second sub-subplate 7 and the Y-axis slide 9 to move horizontally in the corresponding direction so that at least one point of the axis of the workpiece to be measured coincides with the axis of the turntable surface 30.

[0034] This design ensures the freedom of movement for each component during adjustment, allowing the axis of the workpiece to be precisely aligned with the axis of the turntable 1. If there were no clearance between the second substrate 7 and the outer wall of the turntable 1, or between the Y-axis slide 9 and the outer wall of the turntable 1, the turntable 1 would affect the horizontal movement of the second substrate 7 and the Y-axis slide 9. Furthermore, the use of a ring structure significantly reduces the overall axial dimension, and the nested arrangement with the turntable 1 further improves space utilization, thus resolving potential motion interference issues during self-alignment.

[0035] The above structure not only achieves precise displacement control of the XY-axis self-aligning platform 2 mechanism, but also effectively reduces the overall axial dimension, significantly improving the accuracy and reliability of the self-aligning process. As an alternative implementation, see [link to implementation details]. Figure 3 As shown, an X-axis guide rail 5 is provided on the first sub-sub ...

[0036] A Y-direction spring damper 11 is provided on the Y-direction slide 9. When the Y-direction motion driver 10 drives the Y-direction slide 9 to move, the Y-direction spring damper 11 is used to reduce the impact of the movement of the Y-direction slide 9. When the Y-direction motion driver 10 removes the driving force acting on the Y-direction slide 9, the Y-direction spring damper 11 is used to drive the Y-direction slide 9 to move in the opposite direction and reset.

[0037] See Figure 3 As shown, the X-guide rail 5 can adopt an X-direction crossed roller guide. Crossed roller guides are a rolling element structure in the prior art capable of achieving high-precision linear guidance. They can be implemented using a combination of cross-arranged cylindrical rollers and guide grooves, aiming to provide smooth and precise X-direction movement support for the second substrate 7. The Y-guide rail 6 can be understood as having a similar structure to the X-guide rail 5, but its direction of action is the Y-axis. Specifically, it can be implemented using the same crossed roller guide, aiming to ensure that the Y-direction slide 9 also possesses high precision and stability in the Y-direction movement.

[0038] The Y-direction spring damper 11 and the X-direction spring damper 13 can be spring dampers as used in the prior art. The X-direction spring damper 13 operates in two stages: when the X-direction motion actuator 8 drives the second sub-base plate 7 to move, the X-direction spring damper 13 is compressed by the second sub-base plate 7, and the damping part reduces the impact through viscous energy dissipation; when the X-direction motion actuator 8 removes the driving force acting on the second sub-base plate 7, the X-direction spring damper 13 drives the second sub-base plate 7 to move in the opposite direction and reset. The Y-direction spring damper 11 operates in the same way.

[0039] When the X-axis motion actuator 8 and the Y-axis motion actuator 10 use piezoelectric actuators in the prior art, they can only drive the corresponding second sub-base plate 7 and Y-axis slide plate 9 to move linearly in one direction. In this embodiment, the X-axis spring damper 13 and the Y-axis spring damper 11 can not only buffer the motion impact of the corresponding components and ensure the smoothness of the motion, but also drive the corresponding second sub-base plate 7 or Y-axis slide plate 9 to reset when the driving force of the X-axis motion actuator 8 and the Y-axis motion actuator 10 is removed, thereby improving the motion accuracy.

[0040] The above technical solution not only achieves high-precision horizontal movement of the XY-axis centering platform 2 mechanism, but also significantly improves the system's stability and anti-interference capability, thereby meeting the requirements for high-precision five-dimensional attitude adjustment.

[0041] As an alternative implementation, see [link to implementation details]. Figure 2 Figure 4 and Figure 5 As shown, the leveling platform 3 includes a worktable 21, which is used to fix the workpiece to be measured. The worktable 21 can swing at least along the horizontal axis A and the horizontal axis B, wherein the horizontal axis A and the horizontal axis B are perpendicular to each other.

[0042] The worktable 21 is equipped with special fixtures or fixing devices to achieve stable positioning of the workpiece to be measured. The purpose is to ensure that the workpiece will not be displaced during the adjustment process, thereby improving the measurement accuracy.

[0043] In this embodiment, the purpose of introducing two mutually perpendicular horizontal axes, A and B, is to provide two independent degrees of freedom, covering multi-directional adjustment needs within the horizontal plane, while reducing adjustment errors. The oscillation function of the worktable 21 along the A and B horizontal axes provides two non-interfering adjustment directions; this orthogonal arrangement effectively reduces coupling errors during the adjustment process. Furthermore, the combination of the oscillation function of the worktable 21 and the rotation function of the turntable 1 makes the entire adjustment process more efficient and precise. By clearly defining the oscillation axes of the worktable 21 as two orthogonal directions, not only is the overall structural compactness optimized, but the adjustment resolution is also significantly improved, solving the problem of excessive size or inaccurate adjustment that may result from unclear oscillation axis settings.

[0044] As an alternative implementation, see [link to implementation details]. Figures 4-6 As shown, the leveling platform 3 also includes a leveling base 18, a first angle adjustment driver 19 fixed on the leveling base 18, and a second angle adjustment driver 15. There is a vertical clearance between the leveling base 18 and the worktable 21 in the vertical direction. The vertical clearance refers to the vertical interval between the leveling base 18 and the worktable 21. The purpose is to provide sufficient space for the swing of the worktable 21, avoid mechanical interference, and ensure the smoothness and controllability of the swing process.

[0045] The leveling base 18 is connected to the moving part of the XY-direction self-aligning platform 2. The leveling base 18 is fixedly connected to the Y-direction slide 9 and is movable in the X or Y direction. When the telescopic end of the first angle adjustment driver 19 extends, it can push the worktable 21, thereby causing the worktable 21 to swing along the horizontal axis A. When the telescopic end of the second angle adjustment driver 15 extends, it can push the worktable 21, thereby causing the worktable 21 to swing along the horizontal axis B. The horizontal connection between the first angle adjustment driver 19 and the central axis of the worktable 21, and the horizontal connection between the second angle adjustment driver 15 and the central axis of the worktable 21 are perpendicular to each other.

[0046] The first angle adjustment actuator 19 and the second angle adjustment actuator 15 can be vertically mounted electric actuators, etc. The first angle adjustment actuator 19 and the second angle adjustment actuator 15 respectively push the worktable 21 through their telescopic ends, enabling the worktable 21 to swing independently along the horizontal axis A and the horizontal axis B. Since the horizontal line connecting the two actuators and the central axis of the worktable 21 is perpendicular to each other, a dual-axis orthogonal arrangement can be achieved, ensuring the independence and coordination of the swing control.

[0047] As an alternative implementation, see 5 and Figure 8 As shown, an arc-shaped limiting groove 22 is provided on the leveling base 18, and a ball joint 16 is fixed at the bottom of the worktable 21. The ball joint 16 is located in the arc-shaped limiting groove 22. When the first angle adjustment driver 19 pushes the worktable 21, the ball joint 16 swings along the horizontal axis A in the arc-shaped limiting groove 22. When the second angle adjustment driver 15 pushes the worktable 21, the ball joint 16 swings along the horizontal axis B in the arc-shaped limiting groove 22.

[0048] The arc-shaped limiting groove 22 refers to a groove-shaped structure with a specific curvature, which can be formed on the leveling base 18 by machining. Its purpose is to provide precise trajectory constraints for the movement of the ball joint 16. The ball joint 16 is a connector that can realize multi-degree-of-freedom rotation. Its main function is to provide a rotational fulcrum and ensure the stability of the swing direction.

[0049] The above structure, through the cooperation of the arc-shaped limiting groove 22 and the ball joint 16, achieves precise guidance of the swing of the worktable 21. When the first angle adjustment driver 19 acts on the worktable 21, the ball joint 16 swings directionally along the horizontal axis A within the arc-shaped limiting groove 22, thereby achieving angle adjustment around axis A; similarly, when the second angle adjustment driver 15 acts on the worktable 21, the ball joint 16 swings directionally along the horizontal axis B within the arc-shaped limiting groove 22, completing angle adjustment around axis B. The structure of the arc-shaped limiting groove 22 effectively limits the range of motion of the ball joint 16, avoiding possible deviation during the swing, while the presence of the ball joint 16 ensures that the force of the driver can be directly converted into precise swing along a specific axis.

[0050] Through the above structure, the swing of the worktable 21 is effectively guided and constrained, solving the problems of unstable swing direction and inaccurate angle control, thereby significantly improving the accuracy of axis alignment.

[0051] As an alternative implementation, see [link to implementation details]. Figure 5 and Figure 8 As shown, the leveling base 18 includes a base cylinder 181 and a pad 182. The base cylinder 181 is an annular structure and is sleeved on the outside of the turntable 1. Only the pad 182 is located on the turntable surface 30, and the arc-shaped limiting groove 22 is located on the pad 182. The first angle adjustment driver 19 and the second angle adjustment driver 15 are both fixed on the base cylinder 181. The pad 182 is provided with corresponding clearance holes 183. The telescopic ends of the first angle adjustment driver 19 and the second angle adjustment driver 15 both pass through the corresponding clearance holes 183.

[0052] See Figure 5 In this embodiment, the entire leveling platform 3 is not located on the turntable surface 30. Instead, the base cylinder 181 is fitted over the turntable 1, with only the pad 182 located on the turntable surface 30. Compared to directly fixing the leveling base 18 to the turntable surface 30, the structure of this embodiment can further reduce the axial dimension. The pad 182, as the main support component 20, only supports the bottom of the worktable 21 and is provided with an arc-shaped limiting groove 22, which ensures the swing function of the worktable 21 while minimizing its height occupation on the turntable surface 30.

[0053] The first angle adjustment driver 19 and the second angle adjustment driver 15 are fixed on the base cylinder 181. Their telescopic ends are connected to the worktable 21 through the clearance hole 183 on the pad 182. This arrangement not only maintains the compactness of the structure, but also ensures the normal realization of the angle adjustment function.

[0054] The aforementioned matching structure between the leveling base 18 and the turntable 1, through optimized spatial layout, significantly reduces the overall axial dimension while ensuring the leveling function, thereby reducing the risk of amplified axis error of the turntable 1 and improving the measurement accuracy of small-sized parts.

[0055] As an alternative implementation, see [link to implementation details]. Figure 5 , Figure 7 and Figure 8As shown, a support portion 20 is fixed on the leveling base 18, and the support portion 20 protrudes from the upper surface of the leveling base 18; there are two support portions 20 respectively arranged opposite to the first angle adjustment driver 19 and the second angle adjustment driver 15, which are used to abut against the bottom of the worktable 21, thereby limiting the rotation angle of the worktable 21; the leveling platform 3 also includes a tension spring 17, the upper end of the tension spring 17 is fixed on the worktable 21, and the lower end of the tension spring 17 is fixed on the moving part of the XY axis centering platform 2; all tension springs 17, all support portions 20, the first angle adjustment driver 19, and the second angle adjustment driver 15 are distributed on the outer periphery of the leveling base 18 and are evenly spaced around the central axis of the worktable 21.

[0056] The support 20 is a structure that provides physical protection to prevent excessive swaying of the worktable 21. It can be implemented as a columnar protrusion, a limiting block, or a baffle, aiming to ensure that the worktable 21 remains precisely controllable during angle adjustments. The tension spring 17 is an elastic element that provides a restorative force to the worktable 21, helping it automatically return to its original position after adjustment and reducing residual sway error. For details, see [link to details]. Figure 4 As shown, a pull ring 14 is provided on the Y-direction slide 9, and the lower end of the tension spring 17 is fixed to the pull ring 14.

[0057] See Figure 7 and Figure 8 As shown, the support part 20 directly provides physical obstruction to prevent the worktable 21 from swinging beyond the range under the action of the angle adjustment driver; the two support parts 20 are respectively arranged opposite to the first angle adjustment driver 19 and the second angle adjustment driver 15, so that the support parts 20 can be targeted to abut against the bottom of the worktable 21, and limit the rotation angle in real time when the driver pushes, avoiding overshoot or imbalance due to excessive driver force. The tension spring 17 connects the worktable 21 and the Y-axis slide 9, and uses elastic force to provide a restoring effect, helping the worktable 21 to automatically reset after adjustment and reduce residual swing error.

[0058] All tension springs 17, all supports 20, the first angle adjustment actuator 19, and the second angle adjustment actuator 15 are evenly spaced around the central axis of the worktable 21, as follows: Figure 7 As shown, all tension springs 17, all support parts 20, the first angle adjustment driver 19, and the second angle adjustment driver 15 provide eight evenly distributed support points for the worktable 21, which can achieve balanced force distribution, eliminate the risk of off-center loading, improve the overall structural stability, optimize space utilization, and maintain compact axial dimensions.

[0059] In this embodiment, the tilt angle of the worktable 21 along the horizontal axis A is adjusted by adjusting the extension height of the push rod of the first angle adjustment driver 19. Adjusting the extension height of the push rod of the first angle adjustment driver 19 can adjust the tilt angle of the worktable 21 along the horizontal axis B, thereby achieving workpiece leveling using the above method.

[0060] As an alternative implementation, see [link to implementation details]. Figure 5 and Figure 6 As shown, the turntable 1 includes a lower static pressure plate 26, a hemispherical spindle 29, a limiting plate 33, and a driving device. The limiting plate 33 is located on the lower static pressure plate 26 and has a hemispherical limiting groove 34. The hemispherical spindle 29 is located within the hemispherical limiting groove 34. The driving device is connected to the hemispherical spindle 29 and drives the hemispherical spindle 29 to rotate the turntable surface 30 around the vertical axis. (See also...) Figure 3 and Figure 5 As shown, a spacer 12 is fixed inside the Y-axis slide, and the hemispherical spindle 29 and the limiting plate 33 are located inside the spacer 12.

[0061] The lower static pressure plate 26 refers to a structure that provides stable support. It can be made of high-rigidity materials and its flatness and parallelism are ensured through precision machining. The drive device can be a torque motor 32, the rotor of which is connected to the hemispherical spindle 29 for driving the turntable surface 30 to rotate 360°. An encoder 31 can be installed on the rotor of the torque motor 32 to detect the rotation angle.

[0062] In this embodiment, the hemispherical mandrel 29 is installed within the hemispherical limiting groove 34, with its center coinciding with the central axis of the limiting disk 33. This structure ensures that the hemispherical mandrel 29 maintains a stable posture during rotation. The drive device is connected to the hemispherical mandrel 29, and its installation position is precisely calculated to ensure that the drive axis is completely coincident with the rotation axis of the hemispherical mandrel 29. This structural layout not only effectively reduces changes in the posture of the turntable 1 axis but also significantly improves rotational accuracy, thereby solving the problem of error amplification caused by minute changes in the posture of the turntable 1 axis.

[0063] As an alternative implementation, see [link to implementation details]. Figure 5 and Figure 6As shown, the turntable 1 also includes a planar throttle 27 and a hemispherical throttle 28, wherein: the hemispherical spindle 29 is fixed to the bottom of the turntable surface 30, the hemispherical throttle 28 is located in the hemispherical limiting groove 34, and the hemispherical spindle 29 is located in the hemispherical throttle 28; the planar throttle 27 is located on the lower static pressure plate 26, the limiting plate 33 is provided with an airflow channel 23, the side of the hemispherical throttle 28 away from the hemispherical spindle 29 is provided with a first air inlet groove 24, and the side of the planar throttle 27 away from the lower static pressure plate 26 is provided with a second air inlet groove 25; both the planar throttle 27 and the hemispherical throttle 28 have dense air holes, and the airflow channel 23 is connected to the first air inlet groove 24 and the second air inlet groove 25, for forming an air film between the hemispherical throttle 28 and the hemispherical spindle 29, and between the planar throttle 27 and the lower static pressure plate 26.

[0064] The planar throttle 27 refers to a device that achieves uniform gas distribution through an internal microporous structure. It can be made of porous ceramic material, sintered metal, or a graphite disk. The purpose is to form a gas film between the planar throttle 27 and the lower static pressure disk 26. The hemispherical throttle 28 can be understood as a throttling device with a specific curved surface shape. It can be made of precision-machined metal or composite material housing, and can also be made of graphite. The purpose is to form a gas film between the hemispherical throttle 28 and the hemispherical mandrel 29.

[0065] See Figure 5 and Figure 6 As shown, the first air intake groove 24 and the second air intake groove 25 refer to the air guide grooves opened on the surface of the throttle. They can be formed by machining or laser cutting, with the purpose of ensuring that the airflow can accurately enter the designated position.

[0066] The dense air holes inside the planar throttle 27 and the hemispherical throttle 28 achieve uniform airflow distribution, while the connection structure between the airflow channel 23 and the first air inlet slot 24 and the second air inlet slot 25 ensures that the airflow can be efficiently transmitted to the contact surface. Finally, a stable air film is formed between the hemispherical throttle 28 and the hemispherical spindle 29, and between the planar throttle 27 and the lower static pressure plate 26, which greatly reduces the friction of the contact surface and improves the rotational accuracy and stability of the turntable 1.

[0067] In this embodiment, the hemispherical mandrel 29 is fixed to the bottom of the turntable surface 30, which not only ensures the stable positioning of the drive core but also provides the necessary space for the formation of the air film. With this structure, the turntable 1 can effectively reduce the axial error caused by friction when carrying parts for high-precision rotation, thereby significantly improving the overall performance of the measuring instrument. In this embodiment, the air-bearing support of the gas static pressure turntable 1 adopts a structure with an upper static pressure surface hemispherical structure and a lower static pressure surface flat plate structure. This design significantly reduces the axial dimension of the high-precision five-dimensional attitude automatic adjustment stage.

[0068] The five-dimensional motion of the present invention is achieved by a torque motor 32, a first angle adjustment driver 19, and a second angle adjustment driver 15 (electric push rod). Automatic control is achieved through control, which solves the problem of low efficiency of manual adjustment mechanism.

[0069] The high-precision five-dimensional attitude adjustment platform of the present invention has a small axial dimension, which is mainly achieved through the following structure: First, the mounting base of the XY-axis self-aligning platform 2 is below the turntable surface 30, that is, the XY-axis self-aligning platform 2 is a ring structure, sleeved on the turntable 1, and located below the turntable surface 30; Second, the mounting base of the leveling platform 3 is also below the gas static pressure turntable surface 30, that is, the base cylinder 181 of the leveling base 18 is located below the turntable surface 30; Third, the bearing structure of the upper hemispherical throttle 28 and the flat plate throttle of the turntable 1 provides rotational support by forming an air film; The above structure greatly reduces the overall axial dimension, which can reduce the impact of attitude error on measurement accuracy during the movement of the gas hydrostatic bearing, and at the same time reduces the volume, which is conducive to the miniaturization of the instrument.

[0070] The specific features, structures, or characteristics described in this specification may be combined in any suitable manner in one or more embodiments or examples.

[0071] In the description of this specification, the references to terms such as "one embodiment," "some embodiments," "example," "specific example," or "some examples," etc., refer to specific features, structures, materials, or characteristics described in connection with that embodiment or example, which are included in at least one embodiment or example of the present invention. In this specification, the illustrative expressions of the above terms do not necessarily refer to the same embodiment or example. Furthermore, the specific features, structures, materials, or characteristics described may be combined in any suitable manner in one or more embodiments or examples. Moreover, without contradiction, those skilled in the art can combine and integrate the different embodiments or examples described in this specification, as well as the features of different embodiments or examples.

[0072] The above description is merely a specific embodiment of the present invention, but the scope of protection of the present invention is not limited thereto. Any variations or substitutions that can be easily conceived by those skilled in the art within the technical scope disclosed in the present invention should be included within the scope of protection of the present invention. Therefore, the scope of protection of the present invention should be determined by the scope of the claims.

Claims

1. A high-precision five-dimensional attitude adjustment stage, characterized in that, This includes a turntable, an XY axis centering platform, and a leveling platform, among which: The turntable surface is connected to the XY-axis self-aligning platform, which is used to drive the XY-axis self-aligning platform and the leveling platform to rotate 360° in the horizontal plane. The leveling platform is located on the turntable and is used to drive the workpiece to be tested on it to swing along at least two different horizontal axes. The XY-axis self-aligning platform is connected to the leveling platform via a transmission, and is used to drive the leveling platform to move horizontally along the X or Y direction; the XY-axis self-aligning platform is a ring structure, sleeved on the outside of the turntable, and located below the turntable surface, thereby reducing the overall axial dimension; The XY-axis self-aligning platform includes a first sub-base plate, a second sub-base plate, a Y-axis slide, an X-axis motion actuator, and a Y-axis motion actuator, wherein: The first sub-substrate, the second sub-substrate, and the Y-direction slide are all annular structures and are sleeved on the outside of the turntable, arranged sequentially from bottom to top; the first sub-substrate is fixedly connected to the turntable surface; The X-axis motion driver is connected to the second sub-sub ... The Y-axis motion driver is connected to the Y-axis slide drive, and the Y-axis motion driver is used to drive the Y-axis slide to move horizontally in the Y direction relative to the second sub-base plate; There is a horizontal clearance between the second sub-base plate, the Y-axis slide and the outer wall of the turntable. The horizontal clearance allows the second sub-base plate and the Y-axis slide to move horizontally in the corresponding direction so that at least one point of the axis of the workpiece to be measured coincides with the axis of the turntable surface. The leveling platform includes a worktable for fixing the workpiece to be measured. The worktable can swing at least along horizontal axis A and horizontal axis B, wherein horizontal axis A and horizontal axis B are perpendicular to each other. The leveling platform further includes a leveling base, a first angle adjustment driver and a second angle adjustment driver fixed on the leveling base, wherein: There is a vertical clearance between the leveling base and the worktable in the vertical direction. The leveling base is connected to the moving part of the XY-direction self-aligning platform and is movable in the X or Y direction. When the telescopic end of the first angle adjustment driver extends, it can push the worktable, thereby causing the worktable to swing along the horizontal axis A; when the telescopic end of the second angle adjustment driver extends, it can push the worktable, thereby causing the worktable to swing along the horizontal axis B. Wherein, the horizontal line connecting the first angle adjustment driver and the central axis of the worktable and the horizontal line connecting the second angle adjustment driver and the central axis of the worktable are perpendicular to each other; The turntable includes a lower static pressure plate, a hemispherical mandrel, a limiting plate, and a driving device, wherein: the limiting plate is located on the lower static pressure plate, the limiting plate is provided with a hemispherical limiting groove, the hemispherical mandrel is located in the hemispherical limiting groove, the driving device is connected to the hemispherical mandrel for driving the hemispherical mandrel to drive the turntable surface to rotate around the vertical axis; a spacer is fixed inside the Y-axis slide, and the hemispherical mandrel and the limiting plate are located inside the spacer.

2. The high-precision five-dimensional attitude adjustment stage according to claim 1, characterized in that, An X-guide rail is provided on the first sub-substrate, and the X-guide rail is slidably connected to the second sub-substrate; The second sub-base plate is provided with a Y-guide rail, which is slidably connected to the Y-axis slide plate; An X-direction spring damper is provided on the second sub-sub ... A Y-direction spring damper is provided on the Y-direction slide. The Y-direction spring damper is used to reduce the impact of the movement of the Y-direction slide. When the Y-direction motion driver removes the driving force acting on the Y-direction slide, the Y-direction spring damper is used to drive the Y-direction slide to move in the opposite direction and reset.

3. The high-precision five-dimensional attitude adjustment stage according to claim 1, characterized in that, The leveling base is provided with an arc-shaped limiting groove, and a ball joint is fixed at the bottom of the worktable, with the ball joint located in the arc-shaped limiting groove; When the first angle adjustment driver pushes the worktable, the ball joint swings along the horizontal axis A within the arc-shaped limiting groove; When the second angle adjustment driver pushes the worktable, the ball joint swings along the horizontal axis B within the arc-shaped limiting groove.

4. The high-precision five-dimensional attitude adjustment stage according to claim 3, characterized in that, The leveling base includes a base cylinder and a pad, wherein: The base cylinder has an annular structure and is sleeved outside the turntable, with only the pad located on the turntable surface and the arc-shaped limiting groove located on the pad. The first angle adjustment driver and the second angle adjustment driver are both fixed on the base cylinder, and the pad is provided with corresponding clearance holes. The telescopic ends of the first angle adjustment driver and the second angle adjustment driver both protrude through the corresponding clearance holes.

5. The high-precision five-dimensional attitude adjustment stage according to claim 1, characterized in that, A support portion is fixed on the leveling base, and the support portion protrudes from the upper surface of the leveling base; Two support parts are respectively arranged opposite to the first angle adjustment driver and the second angle adjustment driver, and are used to abut against the bottom of the worktable, thereby limiting the rotation angle of the worktable; The leveling platform also includes a tension spring, the upper end of which is fixed to the worktable, and the lower end of which is fixed to the moving part of the XY-axis self-aligning platform. All the tension springs, all the supports, the first angle adjustment driver, and the second angle adjustment driver are distributed on the outer periphery of the leveling base and are evenly spaced around the central axis of the worktable.

6. The high-precision five-dimensional attitude adjustment stage according to claim 1, characterized in that, The turntable also includes a planar throttle and a hemispherical throttle, wherein: The hemispherical mandrel is fixed to the bottom of the turntable surface, the hemispherical throttle is located in the hemispherical limiting groove, and the hemispherical mandrel is located inside the hemispherical throttle. The planar throttle is located on the lower static pressure plate, and the limiting plate is provided with an airflow channel. The hemispherical throttle has a first air inlet groove on the side away from the hemispherical spindle, and the planar throttle has a second air inlet groove on the side away from the lower static pressure plate. Both the planar throttle and the hemispherical throttle have dense air holes. The airflow channel is connected to the first air inlet slot and the second air inlet slot, and is used to form an air film between the hemispherical throttle and the hemispherical mandrel, and between the planar throttle and the lower static pressure plate.

Images