Vertical furnace
By coordinating the lifting components of the furnace body and process tubes, multi-state switching of the crystal boat components is achieved, solving the problems of high wafer fragmentation rate, particle contamination, and uneven film formation in vertical LPCVD equipment, and improving the safety of the equipment and the quality of film formation.
CN121855232APending Publication Date: 2026-04-14HUNAN RED SUN PHOTOELECTRICITY SCI & TECH
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Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2025-12-17
- Publication Date
- 2026-04-14
Smart Images
Figure CN121855232A_ABST
Abstract
The vertical furnace comprises a rack, a furnace body, a furnace door, a process pipe, a furnace body lifting assembly, a process pipe lifting assembly and a wafer boat assembly, the furnace body, the process pipe and the furnace door are coaxially arranged, openings are formed in the bottoms of the furnace body and the process pipe, the furnace door is fixedly arranged on the rack, and the wafer boat assembly is arranged on the furnace door. The furnace body is located above the furnace door and connected with the rack in a lifting mode through the furnace body lifting assembly, and the process pipe is located between the furnace door and the furnace body and connected with the furnace body in a lifting mode through the process pipe lifting assembly. The method has the advantages of low fragment rate, less wafer particle pollution and high film forming quality.
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