一种双向准壁面剪力热膜传感结构的磁控溅射原位沉积制备工艺及应用
A bidirectional quasi-wall shear thermal film sensing structure was fabricated on a flexible insulating substrate using a magnetron sputtering in-situ deposition process. This solved the problems of simultaneous acquisition of two-dimensional components and insufficient device wall adhesion adaptability in the prior art, achieving high-precision bidirectional shear force measurement and structural reliability. It is suitable for quasi-wall shear force measurement under complex flow conditions.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- CIVIL AVIATION UNIV OF CHINA
- Filing Date
- 2026-03-20
- Publication Date
- 2026-07-17
AI Technical Summary
Existing quasi-wall shear thermal film measurements have shortcomings in terms of simultaneous acquisition of two-dimensional components, device wall adhesion adaptability, and consistency of thin film deposition and overlapping interconnection processes, making it difficult to achieve high-precision measurements under complex flow conditions.
A bidirectional quasi-wall shear thermal film sensing structure was fabricated on a flexible insulating substrate using magnetron sputtering in-situ deposition. By stepwise in-situ deposition of nickel sensing elements and copper leads, combined with patterning techniques, the bidirectional shear force components were simultaneously measured. Furthermore, the adhesion stability and electrothermal consistency were improved through the coordinated control of the thin film material system and deposition parameters.
It achieves high-precision, high-dynamic-response synchronous measurement of wall shear force in complex flow fields, improving the structural reliability and service life of the sensing structure, and is suitable for the manufacturing of bidirectional hot-film devices with curved surfaces.
Smart Images
Figure CN121874740B_ABST