Low-corrosion and easy-to-remove photoresist cleaning agent as well as preparation method and application thereof

Abstract

The invention relates to a low-corrosion and easy-to-remove photoresist cleaning agent as well as a preparation method and application thereof, and the low-corrosion and easy-to-remove photoresist cleaning agent comprises the following components in parts by weight: 5-20 parts of organic amine; 1-10 parts of a cosolvent; 70-90 parts of an organic solvent; 0.1-2 parts of a first corrosion inhibitor; and 0.2-3 parts of a second corrosion inhibitor. The first corrosion inhibitor and the second corrosion inhibitor provided by the invention not only can reduce the oxidation effect of free radicals on metal Cu and further enhance the protection effect on Cu, but also can effectively inhibit the crosslinking of photoresist, so that the photoresist cleaning agent is more efficient and stable in the process of removing photoresist.

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