A positioning method for a planar laser engraving machine

By establishing a combined mapping relationship and partitioning to summarize residual statistics, the problem of deviation aggregation after parameter updates of planar laser engraving machines was solved, achieving efficient parameter maintenance and improved equipment stability.

CN121945966BActive Publication Date: 2026-07-14SHENZHEN ACT IND
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
SHENZHEN ACT IND
Filing Date
2026-04-02
Publication Date
2026-07-14

AI Technical Summary

Technical Problem

Existing planar laser engraving machines lack a unified verification mechanism after parameter updates, leading to the accumulation of deviations in local areas of the scanning field, resulting in long maintenance times and the risk of batch engraving errors.

Method used

A combined mapping relationship is established from the reference image coordinates output by the vision unit to the landing point coordinates. A validation dataset is formed by sampling point set. The residual between the expected landing point coordinates and the measured landing point coordinates is calculated. The residual statistics are summarized by partition. Controlled perturbations are applied to the distortion compensation parameters and vision calibration parameters. The parameters are iteratively updated to reduce the deviation.

Benefits of technology

It enables unified quantitative verification of the effect of parameter combination, reduces the number of repeated trial and error on site, improves the success rate of parameter updates, reduces the risk of increased deviation in local areas, and promptly detects parameter drift during operation, thereby improving the stability of equipment and the availability of production lines.

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Abstract

The application discloses a positioning method of a planar laser engraving machine, and relates to the technical field of laser engraving.The method comprises the following steps: establishing a combined mapping relationship from a reference image coordinate to a landing point coordinate, generating a sampling point set covering a scanning field and forming a verification data set; calculating an expected landing point coordinate based on distortion compensation parameters and visual calibration parameters, obtaining a residual sequence by differentiating the expected landing point coordinate from a measured landing point coordinate, collecting the residual sequence according to spatial position partitioning, comparing the residual sequence with a precision threshold, and outputting a region set exceeding the threshold; applying controlled disturbance to the two types of parameters respectively to recalculate residual statistics to form responsibility, comparing the responsibility with a responsibility threshold, outputting a deviation source label, and iteratively updating the label, and encapsulating a combined parameter package when stopping; in the running stage, calculating sampling residual by sampling step, comparing the sampling residual with a drift threshold, pausing an instruction when the sampling residual exceeds the drift threshold, and recalculating; the method can verify the combined effect of the two types of parameters, aggregate and partition positioning deviations, complete recalculable attribution, reduce trial and error maintenance time, and reduce the risk of batch error engraving.
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