一种光刻的掩膜工艺窗口分析方法及系统
By constructing exposure analysis vectors and sensitivity matrices, the mask exposure process status can be determined in real time, and the optimal control group can be selected, thus solving the problem of automated analysis of the mask exposure process and realizing stable production of the mask mass production line.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- YIXIN TECH (HANGZHOU) CO LTD
- Filing Date
- 2026-04-01
- Publication Date
- 2026-07-17
AI Technical Summary
Existing technologies fail to effectively cover the mask exposure process in mask manufacturing, and have not established a quantitative correlation between mask exposure parameters and process window indicators, making it difficult to support the automated production needs of mask mass production lines.
By collecting exposure process parameters, lithography pattern parameters, and window evaluation parameters, an exposure analysis vector is constructed. Combined with historical data from multiple batches, a sensitivity matrix is built to determine the process status in real time, select the optimal exposure control group, and execute it automatically, thus establishing an automated closed loop.
It achieves quantitative mapping between exposure parameters and process window indicators, accurately determines process status, improves process adaptability and prediction accuracy, and supports automated production in mask manufacturing lines.
Smart Images
Figure CN121956449B_ABST