一种提升薄膜厚度测量精度的装置及方法
By optimizing thin film thickness measurement using Michelson interferometers and nonlinear fitting iterative algorithms, the problems of insufficient accuracy and high cost in existing technologies are solved, achieving efficient and low-cost thin film thickness measurement, especially accurate measurement of ultrathin films.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- LASER FUSION RES CENT CHINA ACAD OF ENG PHYSICS
- Filing Date
- 2026-04-08
- Publication Date
- 2026-07-17
AI Technical Summary
Existing methods for measuring film thickness suffer from insufficient accuracy, high cost, and complex operation, especially in the measurement of ultrathin films, where it is difficult to achieve efficient and low-cost accurate measurement.
A Michelson interferometer unit consisting of a broadband light source, spatial filter, collimator, imaging lens, and spectrometer is used to obtain two-dimensional spectral interference fringe data through a single measurement. The measurement process is optimized by combining nonlinear fitting iterative algorithm and cross-correlation calculation to improve accuracy.
It achieves efficient and low-cost film thickness measurement, improves detection efficiency, reduces the stability requirements of the measurement environment, and reduces data noise and system errors, making it suitable for ultrathin film measurement.
Smart Images
Figure CN121977460B_ABST