一种用于光刻机设备的具有分布式温控功能的气浴装置
By integrating a distributed temperature control gas bath device into the lithography machine, the gas flow temperature can be monitored and adjusted in real time, solving the problems of temperature control accuracy decay and dynamic adjustment in the lithography machine's gas bath system. This achieves high-precision temperature control and improves sensor measurement accuracy and chip yield.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- ZHEJIANG CHEER TECH CO LTD
- Filing Date
- 2026-04-03
- Publication Date
- 2026-07-17
AI Technical Summary
The temperature control accuracy of existing lithography machine gas bath systems decreases during long-distance transport, making it impossible to achieve distributed temperature control and real-time dynamic adjustment. This results in fluctuations in the local temperature field of the sensor, affecting measurement accuracy and chip yield.
A gas bath device with distributed temperature control is integrated into the lithography machine. Through a distributed temperature control layer and a closed-loop feedback regulation mechanism, it monitors and adjusts the gas flow temperature in real time. It uses a thermoelectric cooler and a temperature sensor in conjunction with an external water circulation system to achieve high spatial resolution and high dynamic response temperature control.
It effectively compensates for the attenuation of temperature control accuracy, suppresses local thermal disturbances, improves the temperature uniformity and stability of the local microenvironment, and ensures the measurement accuracy of the sensor and the yield of the chip.
Smart Images
Figure CN121978873B_ABST