A gas phase device control method, device, apparatus and storage medium

Abstract

The present application relates to the technical field of gas phase device control, and discloses a gas phase device control method, device, equipment and storage medium; a first gas total pressure, a first hydrogen flow and a pipeline temperature are calculated based on a preset running liquid phase pre-judgment algorithm to obtain a liquid phase possible value; if the liquid phase possible value is greater than a possibility threshold value, a gas phase device bypass control instruction is generated; in a bypass working state, a gas phase device passage control instruction is generated according to a current vaporization state and a preset error threshold value; through multi-dimensional parameter acquisition and intelligent pre-judgment, accurate identification of liquid phase risk and reliable switching of valve paths are realized, action is only taken when complete vaporization occurs, misoperation is avoided, the system logic is rigorous, gas phase conveying automation and control precision are improved, and continuous, stable, safe and reliable operation of trichlorosilane vaporization and conveying is ensured.

Description

Technical Field

[0001] This invention relates to the field of gas phase device control technology, and in particular to a gas phase device control method, apparatus, equipment and storage medium. Background Technology

[0002] In trichlorosilane vaporization conveying and gas-phase process systems, the stability of raw material delivery and the phase state of the medium directly affect the quality of subsequent processes and equipment safety. Traditional control methods often rely on simple judgments based on single temperature or pressure thresholds, which are insufficient to comprehensively reflect the risks of liquid phase formation under the coupled effects of multiple factors such as flow fluctuations, pressure changes, and temperature deviations. This can easily lead to problems such as delayed liquid phase prediction and insufficient identification accuracy. Furthermore, the lack of verification of the vaporization state can easily result in incompletely vaporized materials entering precision systems such as pressure control, causing abnormal pressure control, pipeline blockage, and even equipment damage. Existing technologies cannot achieve multi-dimensional parameter fusion prediction and adaptive vaporization control, making it difficult to meet the demands of efficient, stable, and safe continuous production. Summary of the Invention

[0003] In order to overcome the shortcomings of the prior art, the purpose of this invention is to provide a gas phase device control method, device, equipment and storage medium.

[0004] A method for controlling a gas phase device includes: acquiring the current total gas pressure and hydrogen flow rate to obtain a first total gas pressure and a first hydrogen flow rate; acquiring the pipeline temperature; calculating the first total gas pressure, the first hydrogen flow rate, and the pipeline temperature based on a preset liquid phase prediction algorithm to obtain a possible liquid phase value; determining whether the possible liquid phase value is greater than a preset probability threshold; if the possible liquid phase value is greater than the probability threshold, generating a bypass control command for the gas phase device; acquiring the current vaporization state in bypass operation; and generating a gas phase device path control command based on the current vaporization state and a preset error threshold.

[0005] Furthermore, the calculation of the first gas total pressure, the first hydrogen flow rate, and the pipeline temperature based on the preset liquid phase prediction algorithm to obtain possible liquid phase values ​​includes: calculating the preset standard operating pressure and the first gas total pressure according to the preset pressure fluctuation calculation formula to obtain a pressure fluctuation index; collecting trichlorosilane characteristic parameters; calculating the pipeline temperature and trichlorosilane characteristic parameters according to the preset temperature fluctuation calculation formula to obtain a temperature fluctuation index; calculating the first hydrogen flow rate and the preset average hydrogen flow rate according to the preset flow rate fluctuation calculation formula to obtain a flow rate fluctuation index; and calculating the pressure fluctuation index, temperature fluctuation index, and flow rate fluctuation index based on the liquid phase prediction algorithm to obtain possible liquid phase values.

[0006] Furthermore, the step of calculating the pipe temperature and trichlorosilane characteristic parameters according to the preset temperature fluctuation calculation formula to obtain the temperature fluctuation index includes: calculating the trichlorosilane characteristic parameters according to the preset Antoni equation to obtain the saturation temperature; and calculating the preset reference temperature, pipe temperature, and saturation temperature according to the temperature fluctuation calculation formula to obtain the temperature fluctuation index.

[0007] Furthermore, the step of generating gas phase device path control commands based on the current vaporization state and a preset error threshold includes: analyzing the current vaporization state; if the current vaporization state is a fully vaporized state, collecting the hydrogen flow rate to obtain a second hydrogen flow rate; and generating gas phase device path control commands based on the second hydrogen flow rate, the preset molar mass of trichlorosilane, and the error threshold.

[0008] Further, the step of generating a gas phase device path control command based on the second hydrogen flow rate, a preset molar mass of trichlorosilane, and an error threshold includes: calculating the second hydrogen flow rate according to a preset mass calculation formula and a preset hydrogen density to obtain the mass value and mass ratio coefficient of trichlorosilane; calculating the molar mass and mass ratio coefficient of trichlorosilane to obtain the gas phase mass of trichlorosilane; calculating the difference between the mass value of trichlorosilane and the gas phase mass of trichlorosilane to obtain an error value; determining whether the error value is less than the error threshold; and generating a gas phase device path control command if the error value is less than the error threshold.

[0009] Further, the step of calculating the second hydrogen flow rate according to a preset mass calculation formula and a preset hydrogen density to obtain the trichlorosilane mass value and mass ratio coefficient includes: calculating the second hydrogen flow rate according to the mass calculation formula to obtain the trichlorosilane mass value; converting the second hydrogen flow rate according to the hydrogen density to obtain the hydrogen mass; and calculating the ratio of the trichlorosilane mass to the hydrogen mass to obtain the mass ratio coefficient.

[0010] Further, the calculation of the molar mass and mass ratio coefficient of trichlorosilane to obtain the gaseous mass of trichlorosilane includes: analyzing the mass ratio coefficient based on the preset Dalton's law of partial pressures to obtain the saturated vapor pressure; collecting the current total gas pressure to obtain the second total gas pressure; calculating the saturated vapor pressure and the second total gas pressure according to Dalton's law of partial pressures to obtain the amount of trichlorosilane in the gaseous phase; and calculating the molar mass of trichlorosilane and the amount of trichlorosilane in the gaseous phase to obtain the gaseous mass of trichlorosilane.

[0011] Furthermore, a gas phase device includes: a first data acquisition module for acquiring the current total gas pressure and hydrogen flow rate to obtain a first total gas pressure and a first hydrogen flow rate; a second data acquisition module for acquiring the pipeline temperature; a calculation module for calculating the first total gas pressure, the first hydrogen flow rate, and the pipeline temperature based on a preset liquid phase prediction algorithm to obtain a possible liquid phase value; a judgment module for judging whether the possible liquid phase value is greater than a preset probability threshold; an instruction generation module for generating a gas phase device bypass control instruction if the possible liquid phase value is greater than the probability threshold; a status module for acquiring the current vaporization state in the bypass operation state; and a control module for generating a gas phase device path control instruction based on the current vaporization state and a preset error threshold.

[0012] Furthermore, a gas phase device control device includes: a memory and at least one processor, the memory storing instructions; the at least one processor invokes the instructions in the memory to cause the gas phase device control device to perform various steps of the gas phase device control method as described above.

[0013] Furthermore, a computer-readable storage medium stores instructions that, when executed by a processor, implement the steps of the gas phase device control method described above.

[0014] In the technical solution of this invention, a highly efficient and reliable trichlorosilane gas phase transportation control system is constructed through real-time acquisition of multi-dimensional parameters, liquid phase risk prediction, precise valve switching, and vaporization state control. Real-time acquisition of flow rate, pressure, and temperature data provides a stable and accurate input for liquid phase prediction. Based on a preset liquid phase prediction algorithm, possible liquid phase values ​​are calculated to achieve accurate and real-time identification of liquid phase risks. In bypass mode, the vaporization state is further acquired, and path control commands are generated based on error thresholds. Switching is only executed when complete vaporization occurs, avoiding invalid calculations and malfunctions. The entire solution is logically rigorous, quantitatively judges, and responds promptly, improving the automation level and control accuracy of the gas phase device. This effectively ensures continuous, stable, and safe operation of the entire trichlorosilane vaporization and transportation process, enhancing overall process reliability. Attached Figure Description

[0015] The above and / or additional aspects and advantages of the present invention will become apparent and readily understood from the description of the embodiments taken in conjunction with the following drawings, in which:

[0016] Figure 1 This is a first flowchart of a gas phase device control method provided in an embodiment of the present invention;

[0017] Figure 2This is a second flowchart of a gas phase device control method provided in an embodiment of the present invention;

[0018] Figure 3 This is a third flowchart of a gas phase device control method provided in an embodiment of the present invention;

[0019] Figure 4 This is a fourth flowchart of a gas phase device control method provided in an embodiment of the present invention;

[0020] Figure 5 A fifth flowchart of a gas phase device control method provided in an embodiment of the present invention;

[0021] Figure 6 The sixth flowchart of a gas phase device control method provided in an embodiment of the present invention;

[0022] Figure 7 A seventh flowchart of a gas phase device control method provided in an embodiment of the present invention;

[0023] Figure 8 This is a schematic diagram of the structure of a gas phase device control device provided in an embodiment of the present invention;

[0024] Figure 9 This is a schematic diagram of a gas phase device control device provided in an embodiment of the present invention. Detailed Implementation

[0025] The terms "first," "second," "third," "fourth," etc. (if present) in the specification, claims, and accompanying drawings of this invention are used to distinguish similar objects and are not necessarily used to describe a specific order or sequence. It should be understood that such data can be interchanged where appropriate so that the embodiments described herein can be implemented in orders other than those illustrated or described herein. Furthermore, the terms "comprising" or "having" and any variations thereof are intended to cover a non-exclusive inclusion; for example, a process, method, system, product, or apparatus that comprises a series of steps or units is not necessarily limited to those steps or units explicitly listed, but may include other steps or units not explicitly listed or inherent to such processes, methods, products, or apparatus.

[0026] For ease of understanding, the specific process of the embodiments of the present invention is described below. Please refer to [link / reference]. Figure 1 One embodiment of a gas phase device control method according to the present invention includes:

[0027] 101. Collect the current total gas pressure and hydrogen flow rate to obtain the first total gas pressure and the first hydrogen flow rate;

[0028] 102. Collect pipeline temperature;

[0029] In this embodiment, the hydrogen flow rate is collected in real time using a hydrogen flow meter. Real-time monitoring of the current total gas pressure via a pressure sensor. And real-time acquisition of pipeline temperature via temperature sensor The system collects the first hydrogen flow rate, the first gas total pressure, and the pipeline temperature in real time through flow meters, pressure sensors, and temperature sensors. The parameter acquisition is stable and reliable. The multi-dimensional key data provides real and accurate input for the subsequent liquid phase prediction algorithm, ensuring the reliability of the calculation results and providing solid data support for the vaporization control and safe transportation of trichlorosilane.

[0030] 103. Based on the preset liquid phase prediction algorithm, the total pressure of the first gas, the flow rate of the first hydrogen gas, and the pipeline temperature are calculated to obtain the possible values ​​of the liquid phase.

[0031] In this embodiment, based on the preset liquid phase prediction algorithm, the first gas total pressure, the first hydrogen flow rate and the pipeline temperature collected in real time are comprehensively calculated to obtain the possible value of the liquid phase. Through the fusion judgment of multi-dimensional parameters, the risk of trichlorosilane liquid phase formation can be accurately and in real time identified, providing a reliable basis for subsequent valve switching and heating control, and improving the safety of device operation and process stability.

[0032] 104. Determine whether the possible value of the liquid phase is greater than the preset probability threshold;

[0033] 105. If the possible value of the liquid phase is greater than the probability threshold, a bypass control command for the gas phase device is generated.

[0034] In this embodiment, based on historical process data, when the possible value of the liquid phase is greater than the preset probability threshold, the probability R is 0.3, and there is a high probability that trichlorosilane liquid phase is present in the mixture. Therefore, it is necessary to switch the three-way proportional valve to the bypass working state according to the bypass control command of the gas phase device and continue heating and vaporization. If the possible value of the liquid phase is less than or equal to the probability threshold, there is no liquid phase in the mixture, the three-way proportional valve switches to the working path, and the gas flows into the EPC for normal pressure control.

[0035] 106. In bypass operation mode, obtain the current vaporization state;

[0036] 107. Generate gas phase device passage control commands based on the current vaporization state and the preset error threshold;

[0037] In this embodiment, the current vaporization state is taken as the premise and the error threshold is used as the standard to generate the channel control command. Parameters are collected and commands are generated only when the vaporization is complete, avoiding invalid operations and redundant calculations, improving control efficiency and pertinence, providing accurate basis for the switching of the three-way valve, and ensuring the continuous, stable and safe gas phase delivery of trichlorosilane.

[0038] In this embodiment, a highly efficient and reliable trichlorosilane gas phase transport control system is constructed through real-time acquisition of multi-dimensional parameters, liquid phase risk prediction, precise valve switching, and vaporization state control. Real-time acquisition of flow rate, pressure, and temperature data provides a stable and accurate input for liquid phase prediction. Based on a preset liquid phase prediction algorithm, possible liquid phase values ​​are calculated to achieve accurate and real-time identification of liquid phase risks. In bypass mode, the vaporization state is further acquired, and path control commands are generated based on error thresholds. Switching is only executed when complete vaporization occurs, avoiding invalid calculations and malfunctions. The entire solution is logically rigorous, quantitatively judges, and responds promptly, improving the automation level and control accuracy of the gas phase device. This effectively ensures the continuous, stable, and safe operation of the entire trichlorosilane vaporization and transport process, enhancing overall process reliability.

[0039] Please see Figure 2 In a second embodiment of the gas phase device control method of the present invention, step 103 specifically includes:

[0040] 201. Calculate the preset standard operating pressure and the total pressure of the first gas according to the preset pressure fluctuation calculation formula to obtain the pressure fluctuation index.

[0041] In this embodiment, the expression for the pressure fluctuation calculation formula is as follows:

[0042] In the formula, With a preset standard operating pressure of 50 kPa, the pressure fluctuation index can be calculated to accurately quantify the degree of total pressure fluctuation, providing reliable pressure dimension data support for liquid phase prediction, improving the accuracy of liquid phase prediction, assisting in subsequent process control, and ensuring stable trichlorosilane transportation.

[0043] 202. Collect characteristic parameters of trichlorosilane;

[0044] 203. Calculate the pipeline temperature and trichlorosilane characteristic parameters according to the preset temperature fluctuation calculation formula to obtain the temperature fluctuation index;

[0045] In this embodiment, by collecting pipeline temperature and trichlorosilane characteristic parameters (first characteristic parameter, second characteristic parameter and third characteristic parameter), and combining them with a preset temperature fluctuation calculation formula, the temperature fluctuation index is calculated. The parameter collection is consistent with the characteristics of trichlorosilane vaporization process, and the calculation logic is adapted to the temperature influence law of gas-liquid phase change. This index can accurately quantify the deviation between the actual pipeline temperature and the saturation temperature under the current pressure, intuitively reflect the risk of liquid phase condensation caused by temperature, provide accurate and reliable temperature dimension data support for liquid phase prediction, provide key temperature basis for subsequent process control, and help avoid liquid phase residue caused by temperature problems.

[0046] 204. Calculate the first hydrogen flow rate and the preset average hydrogen flow rate according to the preset flow rate fluctuation calculation formula to obtain the flow rate fluctuation index.

[0047] In this embodiment, In the formula, The average hydrogen flow rate in the first 10 seconds is used as the reference value. The flow fluctuation index is calculated based on the preset flow fluctuation calculation formula, which can accurately quantify the real-time fluctuation of hydrogen flow rate, intuitively reflect the risk of untimely vaporization of trichlorosilane caused by flow fluctuation, provide reliable flow dimension data support for liquid phase prediction, and improve the overall accuracy of liquid phase prediction.

[0048] 205. Based on the liquid phase prediction algorithm, calculate the pressure fluctuation index, temperature fluctuation index, and flow fluctuation index to obtain the possible values ​​of the liquid phase;

[0049] In this embodiment, the probability R of the liquid phase present in the mixture within the pipeline at this time is calculated in real time. The formula for calculating the probability R of the liquid phase is as follows:

[0050]

[0051] In the formula, a is the first fitting coefficient, b is the second fitting coefficient, c is the third fitting coefficient, and d is the fourth fitting coefficient. Linear fitting using pre-existing experimental data yields a = 0.35, b = 0.45, c = 0.15, and d = 0.05. The risk of trichlorosilane condensate liquid phase is comprehensively assessed based on multi-dimensional fluctuation indicators. The prediction results are accurate and stable, providing an accurate basis for subsequent path switching and heating control, effectively improving the operational safety of the gas phase device. The linear fitting process is explained below:

[0052] Experimental setup: On the existing trichlorosilane transport pipeline, after the temperature and pressure sensors and before the heating tape, an additional optical droplet detection sensor (or a high-speed camera system) is installed to monitor in real time the presence of liquid trichlorosilane in the pipeline.

[0053] Operating conditions: To cover possible scenarios in actual processes, we conducted multiple sets of experiments within the following parameter ranges:

[0054] Hydrogen flow rate: varies from 100 sccm to 2000 sccm, covering different flow rate fluctuation scenarios;

[0055] Pipeline temperature: varies from 10℃ to 60℃ (regulated by heating tape);

[0056] Total pressure: varying from 30 kPa to 80 kPa to simulate pressure fluctuations;

[0057] Data recording: Under each operating condition, data was continuously collected for 30 seconds, including hydrogen flow rate, pipeline temperature, total pressure, and the liquid phase presence indicator L(t) output by the optical sensor (0 indicates no liquid phase, 1 indicates liquid phase).

[0058] Linear regression fitting: Use the commonly used least squares method to solve for the coefficients a, b, c, d in the above formula for probability R;

[0059] In this embodiment, a fluctuation index calculation system is constructed from three key dimensions: pressure, temperature, and flow rate, to quantify the main causes of trichlorosilane liquid phase formation. The pressure fluctuation index accurately reflects the impact of total pressure changes on vaporization equilibrium, the temperature fluctuation index closely matches the phase change characteristics of trichlorosilane and intuitively reflects the risk of condensation, and the flow rate fluctuation index effectively characterizes the problem of untimely vaporization caused by flow rate fluctuations. The three indicators complement and support each other, providing a complete and reliable multi-dimensional data foundation for liquid phase prediction. Then, the liquid phase prediction algorithm is used to fuse and calculate the three types of indicators to obtain the liquid phase probability R of the mixture in the pipeline in real time, realizing a comprehensive, accurate, and online prediction of liquid phase risk. The entire scheme has rigorous calculation logic, stable parameter sources, and objective judgment results, improving the accuracy and timeliness of liquid phase risk identification, and enhancing the safety, stability, and process controllability of the gas phase transportation process for subsequent valve switching.

[0060] Please see Figure 3 In a third embodiment of the gas phase device control method of the present invention, step 103 specifically includes:

[0061] 301. Calculate the characteristic parameters of trichlorosilane according to the preset Antoni equation to obtain the saturation temperature;

[0062] In this embodiment, the Antoine equation is a classic empirical equation describing the relationship between the saturated vapor pressure and temperature of a pure substance. Its core advantages are high calculation accuracy and suitability for easily condensable substances, perfectly matching the characteristics of trichlorosilane—"easily condensable and sensitive to gas-liquid phase transitions"—and accurately reflecting the saturation temperature (critical temperature for gas-liquid phase transition) of trichlorosilane under different pressures. The saturation temperature refers to the saturation temperature of trichlorosilane under the current total gas pressure, calculated by the Antoine equation: ,

[0063] In the formula, A is the first characteristic parameter, representing the intercept coefficient for calculating the saturated vapor pressure of trichlorosilane, used for the basic numerical correction of the Antoine equation. In this embodiment, its value is 6.9146. B is the second characteristic parameter, representing the temperature coefficient for calculating the saturated vapor pressure of trichlorosilane, reflecting the intensity of the influence of temperature on the saturated vapor pressure. In this embodiment, its value is 1474.0. C is the third characteristic parameter, representing the temperature compensation coefficient for calculating the saturated vapor pressure of trichlorosilane, used to balance the calculation deviations between the high-temperature and low-temperature regions and improve the accuracy of determining the phase transition critical point. In this embodiment, its value is 258.0. The calculated saturation temperature (i.e., the saturation temperature of trichlorosilane under the current total gas pressure) is given, and specific values ​​have been set for trichlorosilane (A=6.9146, B=1474.0, C=258.0); the saturated vapor pressure of trichlorosilane in the gas phase pipeline is given. It is directly related to the total system pressure (total pressure of the first gas). When the total system pressure changes, the saturation temperature of trichlorosilane will also change synchronously, and the value will be consistent with the current total system pressure (total pressure of the first gas).

[0064] 302. Calculate the preset reference temperature, pipe temperature, and saturation temperature according to the temperature fluctuation calculation formula to obtain the temperature fluctuation index.

[0065] In this embodiment, the expression for the temperature fluctuation calculation formula is as follows:

[0066] In the formula, The preset reference temperature is used to make the temperature difference term dimensionless, and is taken as room temperature 25℃ (298K). (Molecular...) The value represents the difference between the saturation temperature and the pipe temperature. A positive difference indicates that the pipe temperature is below the saturation temperature; the larger the difference, the higher the risk of trichlorosilane condensing into a liquid phase. A negative difference indicates that the pipe temperature is above the saturation temperature; trichlorosilane can maintain its gaseous state with no risk of condensation. The denominator includes the reference temperature. The core purpose is to achieve "dimensionless" measurement, eliminate numerical differences under different temperature units and different working conditions, and make the calculation results comparable and universal.

[0067] In this embodiment, by rationally applying the Antone equation and temperature fluctuation calculation formula, accurate and reliable technical support is provided for predicting the risk of trichlorosilane condensation in the gas phase device. It employs the Antone equation adapted to the characteristics of trichlorosilane, combined with preset specific characteristic parameters, to accurately calculate the saturation temperature under the current total gas pressure, improving the accuracy of judging the critical state of gas-liquid phase transition. Simultaneously, through the temperature fluctuation calculation formula, the difference between the saturation temperature and the actual pipeline temperature is dimensionlessly processed, quantifying the degree of condensation risk, eliminating numerical differences in different operating conditions and temperature units, and ensuring the universality and comparability of the calculation results. The overall solution requires no complex debugging, reducing implementation and operating costs while improving the accuracy of liquid phase prediction, effectively avoiding equipment failures and process fluctuations caused by condensation, ensuring stable operation of the gas phase system, and exhibiting strong adaptability and scalability, thus possessing high practical value and promotional significance.

[0068] Please see Figure 4 In the fourth embodiment of the gas phase device control method of the present invention, step 107 specifically includes:

[0069] 401. Analyze the current vaporization state;

[0070] 402. If the current vaporization state is complete vaporization, then collect the hydrogen flow rate to obtain the second hydrogen flow rate;

[0071] In this embodiment, the current vaporization state of trichlorosilane is analyzed first, and the second hydrogen flow rate is collected only when it is determined to be completely vaporized. Using the vaporization state as a prerequisite for data collection effectively avoids invalid data collection and redundant calculations, improves the efficiency and relevance of the control process, and makes the subsequent parameters more closely match the actual process, thus laying a solid and accurate data foundation for the generation of pathway control commands.

[0072] 403. Generate gas phase device pathway control commands based on the second hydrogen flow rate, the preset molar mass of trichlorosilane, and the error threshold;

[0073] In this embodiment, the second hydrogen flow rate is used as the core. The calculation and judgment are carried out in combination with the preset molar mass of trichlorosilane and the error threshold to generate the channel control command. The core parameters are all known values ​​that can be collected by the process or preset. The calculation and judgment logic is in line with the actual trichlorosilane vaporization process. The control command generated based on this can accurately match the vaporization completeness judgment requirements, provide a reliable quantitative execution basis for the switching of the three-way proportional valve channel, improve the accuracy and standardization of the gas phase device channel control, and ensure the stable and orderly progress of the trichlorosilane vaporization and transportation process.

[0074] In this embodiment, efficient and precise control of the trichlorosilane vaporization pathway is achieved through a coherent process of pre-determination of vaporization state, accurate parameter acquisition, and targeted command generation. First, the current vaporization state of trichlorosilane is analyzed, and the second hydrogen flow rate is collected only when complete vaporization is determined. Using the vaporization state as a precondition for parameter acquisition effectively avoids invalid data acquisition and redundant calculations, improving the operational efficiency and targeting of the control process. This ensures that subsequent data usage is more aligned with actual process conditions, laying a solid foundation of accurate data for the generation of pathway control commands. Then, using the collected second hydrogen flow rate as the core, a series of calculations and judgments are performed in conjunction with the process-preset molar mass of trichlorosilane and error thresholds. Finally, control commands for the gas phase device pathway are generated. The core parameters are all known values ​​that can be directly acquired or preset by the process. The calculation and judgment logic aligns with the characteristics of the trichlorosilane vaporization process, and the generated control commands can accurately match the requirements for determining the completeness of vaporization. This provides a reliable quantitative execution basis for switching the three-way proportional valve pathway, improving the accuracy and standardization of the gas phase device pathway control, and comprehensively ensuring the continuous, stable, and orderly progress of the trichlorosilane vaporization and transportation process.

[0075] Please see Figure 5 In the fifth embodiment of the gas phase device control method of the present invention, step 403 specifically includes:

[0076] 501. Calculate the second hydrogen flow rate according to the preset mass calculation formula and preset hydrogen density to obtain the trichlorosilane mass value and mass ratio coefficient.

[0077] In this embodiment, based on the preset mass calculation formula and hydrogen density, combined with the real-time collected second hydrogen flow rate, the mass value and mass ratio coefficient of trichlorosilane can be accurately calculated. The core calculation parameters are all known values ​​that can be directly collected or preset in the process. The calculation logic is simple and efficient, and the results are accurate and reliable. The calculation results provide key basic data for subsequent derivation of the saturated vapor pressure of trichlorosilane, calculation of gas phase mass, and determination of vaporization error, effectively improving the coherence and accuracy of the overall control logic and ensuring the stable progress of the trichlorosilane vaporization and transportation process.

[0078] 502. Calculate the molar mass and mass ratio coefficient of trichlorosilane to obtain the mass of trichlorosilane in the gas phase;

[0079] In this embodiment, the saturated vapor pressure is derived based on the mass ratio coefficient and Dalton's law of partial pressures. Then, the amount of trichlorosilane in the gas phase is calculated. Finally, the mass of trichlorosilane in the gas phase is obtained by calculating the molar mass of trichlorosilane. This provides core data support for subsequent error judgment and pathway control, improves the control accuracy of the gas phase device, and ensures the stability of the vaporization process.

[0080] 503. Calculate the difference between the mass value of trichlorosilane and the mass of trichlorosilane in the gas phase to obtain the error value;

[0081] 504. Determine whether the error value is less than the error threshold;

[0082] 505. If the error value is less than the error threshold, a gas phase device access control command is generated.

[0083] In this embodiment, the error threshold value includes 1%. If the error value is less than the error threshold, it is determined that the trichlorosilane in the pipeline has achieved complete vaporization at the process level. Then, a gas phase device passage control command is generated to trigger the three-way proportional valve to switch from the bypass heating state to the working passage state, making the judgment and control more objective, accurate and standardized.

[0084] In this embodiment, relying on the preset mass calculation formula, hydrogen density, and real-time collected second hydrogen flow rate, the mass value and mass ratio coefficient of trichlorosilane can be calculated efficiently and accurately. The parameters are easy to obtain and the calculation logic is simple, providing a key foundation for subsequent full-process data derivation and improving the coherence and accuracy of the control logic. Then, using the mass ratio coefficient as the core, the gas phase mass of trichlorosilane is calculated, providing core data support for error judgment and path control, effectively improving the control accuracy of the gas phase device. Finally, the error value is obtained by subtracting the mass value from the gas phase mass, and the vaporization state is quantified with a 1% threshold. After the standard is met, a path control command is automatically generated to trigger valve switching, making the vaporization judgment and path control more objective and standardized, strictly controlling the complete vaporization standard at the process level, and comprehensively ensuring the continuous, stable, and safe operation of the trichlorosilane vaporization and transportation process.

[0085] Please see Figure 6 In the sixth embodiment of a gas phase device control method of the present invention, step 103 specifically includes:

[0086] 601. Calculate the second hydrogen flow rate according to the mass calculation formula to obtain the mass value of trichlorosilane;

[0087] In this embodiment, the second hydrogen flow rate is calculated according to the mass calculation formula to obtain the mass of trichlorosilane carried by the hydrogen bubbling: ,

[0088] In the formula, For the quality of trichlorosilane, The second hydrogen flow rate is used as the reference. By using a preset mass calculation formula and combining the collected second hydrogen flow rate, the mass value of trichlorosilane carried by the hydrogen bubbling is accurately calculated. The formula is simple and clear, the parameters are easy to collect, and no complicated debugging is required. It effectively avoids calculation errors. The result provides a reliable basis for subsequent calculation of mass ratio coefficient, gas phase mass and error value, helps to accurately generate gas phase device path control commands, improves system control accuracy and ensures stable operation.

[0089] 602. The second hydrogen flow rate is converted based on the hydrogen density to obtain the hydrogen mass;

[0090] In this embodiment, hydrogen mass = second hydrogen flow rate Hydrogen density is used to directly and simply convert the second hydrogen flow rate to accurately obtain the hydrogen mass. The result provides a reliable basis for subsequent mass ratio coefficient calculation, improves the accuracy and stability of system control, and meets the safe operation requirements of gas phase devices.

[0091] 603. Calculate the ratio of the mass of trichlorosilane to the mass of hydrogen to obtain the mass ratio coefficient;

[0092] In this embodiment, the mass ratio of hydrogen to trichlorosilane is: In the formula, For hydrogen mass, this coefficient provides core support for subsequent calculations of saturated vapor pressure and gas phase mass, helps to improve the control logic of the gas phase device, enhances the system control accuracy, and ensures stable operation.

[0093] In this embodiment, the mass value of trichlorosilane carried by hydrogen bubbling is accurately calculated by combining the collected second hydrogen flow rate. The parameters are easy to collect and do not require complex debugging, effectively avoiding calculation errors. Then, the hydrogen density is directly converted to the second hydrogen flow rate to quickly obtain accurate hydrogen mass. Finally, the mass ratio coefficient is obtained by calculating the ratio of the two, which lays a solid foundation for subsequent calculations of saturated vapor pressure, gas phase mass and error value. It also helps to improve the control logic of the gas phase device, accurately generate path control commands, improve the system control accuracy and stability, effectively ensure the stability of gas phase operating conditions, and meet the requirements of safe and efficient operation of the device.

[0094] Please see Figure 7 In the seventh embodiment of a gas phase device control method of the present invention, step 502 specifically includes:

[0095] 701. Analyze the mass ratio coefficient based on the preset Dalton partial pressure law to obtain the saturated vapor pressure;

[0096] In this embodiment, after complete vaporization, the mixture of hydrogen and trichlorosilane conforms to Dalton's law of partial pressures, the expression of which includes:

[0097] ,

[0098] In the formula, To collect the trichlorosilane gas pressure value in the gas phase pipeline in real time using a pressure sensor. To collect the hydrogen pressure value in the gas phase pipeline in real time using a pressure sensor;

[0099] According to the fundamental formula for the amount of substance, the relationship between the amount of substance and mass and molar mass is as follows:

[0100] , For the amount of substance, Let M be the mass, and M be the molar mass.

[0101] Dalton's law of partial pressures states that the ratio of the partial pressures of each component in a gas mixture is equal to the ratio of their amounts of substance, i.e.:

[0102] ,

[0103] In the formula, This refers to the amount of trichlorosilane. This represents the amount of hydrogen gas.

[0104] Substituting the amount of substance formula into the partial pressure ratio formula and rearranging, we obtain the mass ratio of trichlorosilane to hydrogen:

[0105]

[0106] In the formula, The molar mass of trichlorosilane is... is the molar mass of hydrogen gas;

[0107] Combining Dalton's law of partial pressure and the mass ratio coefficient Substituting into the above equation, when completely vaporized, the saturated vapor pressure of trichlorosilane satisfies: Solving this equation yields the saturated vapor pressure of trichlorosilane required for complete vaporization. ;

[0108] 702. Collect the current total gas pressure to obtain the second total gas pressure;

[0109] 703. Calculate the saturated vapor pressure and the total pressure of the second gas according to Dalton's law of partial pressures to obtain the amount of gaseous trichlorosilane.

[0110] In this embodiment, the amount of substance in the gas phase is calculated. According to Dalton's law of partial pressures, the ratio of the partial pressures of the components is equal to the ratio of their amounts of substance. ,

[0111] Therefore, the amount of gaseous trichlorosilane is: , Given the total pressure of the second gas and the known mass of hydrogen, the amount of hydrogen can be calculated using the molar mass of hydrogen. The specific value can then be calculated based on Dalton's law of partial pressure to obtain the amount of hydrogen. Based on Dalton's law of partial pressure, using saturated vapor pressure and the total pressure of the second gas as core parameters, the amount of trichlorosilane in the gas phase is accurately calculated, providing key data support for the control of the gas phase device. It relies on the core principle that the partial pressure ratio is equal to the ratio of the amount of substance, combined with the total pressure parameters collected under real operating conditions, to improve the accuracy and rigor of the calculation. The calculation logic is clear, the parameters can be directly collected, no complex debugging is required, and it is adapted to all gasification conditions. This not only ensures the accuracy of the subsequent trichlorosilane gas phase mass calculation, but also provides a basis for the generation of gas phase device path control commands, effectively improving the system control reliability and reducing the risk of operating condition fluctuations.

[0112] 704. Calculate the molar mass of trichlorosilane and the amount of gaseous trichlorosilane to obtain the mass of gaseous trichlorosilane;

[0113] In this embodiment, the formula for calculating the mass of trichlorosilane gas is as follows:

[0114] In the formula, The gaseous mass of trichlorosilane is obtained by accurately calculating the molar mass of trichlorosilane and the amount of trichlorosilane in the gaseous phase. Based on a clear formula derivation, the parameters are clearly sourced and can be directly reused. The result provides a core basis for subsequent error judgment and generation of control commands for the gas phase device, effectively improving the accuracy and reliability of system control, ensuring stable gas phase operation, and meeting the safe operation requirements of the device.

[0115] In this embodiment, relying on Dalton's law of partial pressures and combining the relationship between amount of substance and mass, and molar mass, the saturated vapor pressure, amount of gaseous substance, and mass of trichlorosilane are accurately calculated, providing comprehensive and reliable data support for the control of the gas phase device pathway. By collecting real-world operating condition partial pressure parameters through pressure sensors and combining them with explicit formula derivation, errors from empirical estimations are avoided, improving the accuracy and rigor of the calculations. The calculation logic is clear, the parameter sources are traceable, and the parameters can be directly collected and reused without complex debugging, adapting to all gasification conditions. The calculation results not only ensure the consistency and accuracy of data at each stage but also provide a core basis for subsequent error judgment and control command generation, effectively improving the reliability and stability of the gas phase device system control, reducing the risk of operating condition fluctuations, ensuring the safe and stable operation of the device, and adapting to the actual application needs of relevant gas phase transportation and reaction scenarios.

[0116] The second method to determine whether to switch the working path is: Substitute the saturated vapor pressure of trichlorosilane into the Antoni equation to calculate the target temperature. Compare the current temperature with the calculated target temperature. If the error between the current temperature and the target temperature is stable within 1%, then the three-way proportional valve can be switched to the working path, and the airflow can be normally introduced into the EPC pressure control.

[0117] The foregoing has described a method for controlling a gas phase device according to an embodiment of the present invention. The following describes a control device for a gas phase device according to an embodiment of the present invention. Please refer to [link / reference]. Figure 8 One embodiment of a gas phase device control device according to the present invention includes:

[0118] The first data acquisition module 1 is used to acquire the current total gas pressure and hydrogen flow rate to obtain the first total gas pressure and the first hydrogen flow rate;

[0119] The second data acquisition module 2 is used to collect pipeline temperature;

[0120] The calculation module 3 is used to calculate the total pressure of the first gas, the flow rate of the first hydrogen gas, and the pipeline temperature based on a preset liquid phase prediction algorithm to obtain possible values ​​of the liquid phase.

[0121] Module 4 is used to determine whether the possible value of the liquid phase is greater than a preset probability threshold.

[0122] The instruction generation module 5 is used to generate a bypass control instruction for the gas phase device if the possible value of the liquid phase is greater than the probability threshold.

[0123] Status module 6 is used to obtain the current vaporization state when in bypass operation mode;

[0124] Control module 7 is used to generate gas phase device passage control commands based on the current vaporization state and preset error threshold;

[0125] In this embodiment, a highly efficient and reliable trichlorosilane gas phase transport control system is constructed through real-time acquisition of multi-dimensional parameters, liquid phase risk prediction, precise valve switching, and vaporization state control. Real-time acquisition of flow rate, pressure, and temperature data provides a stable and accurate input for liquid phase prediction. Based on a preset liquid phase prediction algorithm, possible liquid phase values ​​are calculated to achieve accurate and real-time identification of liquid phase risks. In bypass mode, the vaporization state is further acquired, and path control commands are generated based on error thresholds. Switching is only executed when complete vaporization occurs, avoiding invalid calculations and malfunctions. The entire solution is logically rigorous, quantitatively judges, and responds promptly, improving the automation level and control accuracy of the gas phase device. This effectively ensures the continuous, stable, and safe operation of the entire trichlorosilane vaporization and transport process, enhancing overall process reliability.

[0126] Figure 9This is a schematic diagram of the structure of a gas phase device control device 900 provided in an embodiment of the present invention. This gas phase device control device 900 can vary significantly due to different configurations or performance. It may include one or more central processing units (CPUs) 910 (e.g., one or more processors) and a memory 920, and one or more storage media 930 (e.g., one or more mass storage devices) storing application programs 933 or data 932. The memory 920 and storage media 930 can be temporary or persistent storage. The program stored in the storage media 930 may include one or more modules (not shown in the diagram), each module may include a series of instruction operations on the gas phase device control device 900. Furthermore, the processor 910 may be configured to communicate with the storage media 930 and execute the series of instruction operations in the storage media 930 on the gas phase device control device 900 to implement the steps of the gas phase device control method provided in the above-described method embodiments.

[0127] A gas phase device control device 900 may further include one or more power supplies 940, one or more wired or wireless network interfaces 950, one or more input / output interfaces 960, and / or one or more operating systems 931, such as Windows Server, MacOSX, Unix, Linux, FreeBSD, etc. Those skilled in the art will understand that... Figure 9 The illustrated structure of a gas phase device control device does not constitute a limitation on a gas phase device control device. It may include more or fewer components than illustrated, or combine certain components, or have different component arrangements.

[0128] The present invention also provides a computer-readable storage medium, which can be a non-volatile computer-readable storage medium or a volatile computer-readable storage medium, wherein the computer-readable storage medium stores instructions that, when executed on a computer, cause the computer to perform the steps of a gas phase device control method.

[0129] Those skilled in the art will clearly understand that, for the sake of convenience and brevity, the specific working process of the system, device, or unit described above can be referred to the corresponding process in the foregoing method embodiments, and will not be repeated here.

[0130] If the integrated unit is implemented as a software functional unit and sold or used as an independent product, it can be stored in a computer-readable storage medium. Based on this understanding, the technical solution of the present invention, in essence, or the part that contributes to the prior art, or all or part of the technical solution, can be embodied in the form of a software product. This computer software product is stored in a storage medium and includes several instructions to cause a computer device (which may be a personal computer, server, or network device, etc.) to execute all or part of the steps of the methods described in the various embodiments of the present invention. The aforementioned storage medium includes various media capable of storing program code, such as USB flash drives, portable hard drives, read-only memory (ROM), random access memory (RAM), magnetic disks, or optical disks.

[0131] Finally, it should be noted that the above descriptions are merely preferred embodiments of the present invention and are not intended to limit the present invention. Although the present invention has been described in detail with reference to the foregoing embodiments, those skilled in the art can still modify the technical solutions described in the foregoing embodiments or make equivalent substitutions for some of the technical features. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of the present invention should be included within the protection scope of the present invention.

Claims

1. A method for controlling a gas-phase device, characterized in that, include: Collect the current total gas pressure and hydrogen flow rate to obtain the first total gas pressure and the first hydrogen flow rate; Collect pipeline temperature; The first gas total pressure, the first hydrogen flow rate and the pipeline temperature are calculated based on the preset liquid phase prediction algorithm to obtain the possible values ​​of the liquid phase. The algorithm for predicting the liquid phase based on a preset operating condition calculates the total pressure of the first gas, the first hydrogen flow rate, and the pipeline temperature to obtain possible values ​​for the liquid phase, including: The pressure fluctuation index is obtained by calculating the preset standard operating pressure and the total pressure of the first gas according to the preset pressure fluctuation calculation formula. Collect characteristic parameters of trichlorosilane; The temperature fluctuation index is obtained by calculating the pipeline temperature and trichlorosilane characteristic parameters according to the preset temperature fluctuation calculation formula. The first hydrogen flow rate and the preset average hydrogen flow rate are calculated according to the preset flow fluctuation calculation formula to obtain the flow fluctuation index. The pressure fluctuation index, temperature fluctuation index, and flow fluctuation index are calculated based on the liquid phase prediction algorithm to obtain the possible values ​​of the liquid phase. Determine whether the possible value of the liquid phase is greater than a preset probability threshold; If the possible value of the liquid phase is greater than the probability threshold, a bypass control command for the gas phase device is generated. In bypass operation mode, obtain the current vaporization state; Generate gas phase device pathway control commands based on the current vaporization state and preset error threshold; The step of generating gas phase device path control commands based on the current vaporization state and a preset error threshold includes: Analyze the current vaporization state; If the current vaporization state is complete vaporization, then the hydrogen flow rate is collected to obtain the second hydrogen flow rate; The gas phase device flow control command is generated based on the second hydrogen flow rate, the preset molar mass of trichlorosilane, and the error threshold.

2. The gas phase device control method as described in claim 1, characterized in that, The calculation of pipeline temperature and trichlorosilane characteristic parameters according to a preset temperature fluctuation calculation formula to obtain temperature fluctuation indicators includes: The characteristic parameters of trichlorosilane are calculated according to the pre-defined Antoni equation to obtain the saturation temperature; The temperature fluctuation index is obtained by calculating the preset reference temperature, pipe temperature, and saturation temperature according to the temperature fluctuation calculation formula.

3. The method for controlling a gas-phase device as described in claim 1, characterized in that, The process of generating gas phase device pathway control commands based on the second hydrogen flow rate, the preset molar mass of trichlorosilane, and an error threshold includes: The second hydrogen flow rate is calculated based on the preset mass calculation formula and preset hydrogen density to obtain the trichlorosilane mass value and mass ratio coefficient. The molar mass and mass ratio coefficient of trichlorosilane were calculated to obtain the mass of trichlorosilane in the gas phase; The difference between the mass value of trichlorosilane and the mass of trichlorosilane in the gas phase is calculated to obtain the error value; Determine whether the error value is less than the error threshold; If the error value is less than the error threshold, a gas phase device access control command is generated.

4. The gas phase device control method as described in claim 3, characterized in that, The calculation of the second hydrogen flow rate based on a preset mass calculation formula and a preset hydrogen density to obtain the trichlorosilane mass value and mass ratio coefficient includes: The second hydrogen flow rate is calculated according to the mass calculation formula to obtain the mass value of trichlorosilane; The second hydrogen flow rate is converted based on the hydrogen density to obtain the hydrogen mass; The ratio of the mass of trichlorosilane to the mass of hydrogen is calculated to obtain the mass ratio coefficient.

5. The gas phase device control method as described in claim 4, characterized in that, The calculation of the molar mass and mass ratio coefficient of trichlorosilane to obtain the gaseous mass of trichlorosilane includes: The mass ratio coefficient is analyzed based on the pre-defined Dalton partial pressure law to obtain the saturated vapor pressure; Collect the current total gas pressure to obtain the second total gas pressure; The amount of gaseous trichlorosilane was obtained by calculating the saturated vapor pressure and the total pressure of the second gas according to Dalton's law of partial pressures. The molar mass of trichlorosilane and the amount of gaseous trichlorosilane were calculated to obtain the mass of gaseous trichlorosilane.

6. A gas-phase apparatus, characterized in that, include: The first data acquisition module is used to acquire the current total gas pressure and hydrogen flow rate to obtain the first total gas pressure and the first hydrogen flow rate. The second data acquisition module is used to collect pipeline temperature; The calculation module is used to calculate the total pressure of the first gas, the first hydrogen flow rate, and the pipeline temperature based on a preset liquid phase prediction algorithm to obtain possible liquid phase values. The specific steps include: The pressure fluctuation index is obtained by calculating the preset standard operating pressure and the total pressure of the first gas according to the preset pressure fluctuation calculation formula. Collect characteristic parameters of trichlorosilane; The temperature fluctuation index is obtained by calculating the pipeline temperature and trichlorosilane characteristic parameters according to the preset temperature fluctuation calculation formula. The first hydrogen flow rate and the preset average hydrogen flow rate are calculated according to the preset flow fluctuation calculation formula to obtain the flow fluctuation index. The pressure fluctuation index, temperature fluctuation index, and flow fluctuation index are calculated based on the liquid phase prediction algorithm to obtain the possible values ​​of the liquid phase. The judgment module is used to determine whether the possible value of the liquid phase is greater than a preset probability threshold. The instruction generation module is used to generate a bypass control instruction for the gas phase device if the possible value of the liquid phase is greater than the probability threshold. The status module is used to obtain the current vaporization status when the bypass operation is in progress. The control module is used to generate control commands for the gas phase device pathway based on the current vaporization state and a preset error threshold. The specific steps include: Analyze the current vaporization state; If the current vaporization state is complete vaporization, then the hydrogen flow rate is collected to obtain the second hydrogen flow rate; The gas phase device flow control command is generated based on the second hydrogen flow rate, the preset molar mass of trichlorosilane, and the error threshold.

7. A control device for a gas phase apparatus, characterized in that, The gas phase device control device includes: a memory and at least one processor, wherein the memory stores instructions; At least one of the processors invokes the instructions in the memory to cause the gas phase device control apparatus to perform the steps of the gas phase device control method as claimed in any one of claims 1-5.

8. A computer-readable storage medium storing instructions thereon, characterized in that, When the instructions are executed by the processor, they implement the various steps of the gas phase device control method as described in any one of claims 1-5.

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