一种等离子体原位清洗方法、设备及存储介质
By using plasma in-situ cleaning, the cleaning parameters are dynamically adjusted, which solves the problems of contaminant redeposition and low equipment utilization in traditional cleaning methods, and achieves efficient cleaning of heat treatment chambers and optimized equipment operation.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- JIHUA LAB
- Filing Date
- 2026-04-15
- Publication Date
- 2026-07-17
AI Technical Summary
The cold wall design of traditional rapid heat treatment equipment leads to the problem of contaminant redeposition. Existing cleaning methods cannot adapt to the differences in contaminants generated by different processes, resulting in insufficient or excessive cleaning. Furthermore, offline cleaning reduces equipment utilization.
The plasma in-situ cleaning method is adopted. Through intelligent monitoring and dynamic adjustment of the cleaning process, the cleaning parameters, including gas supply flow rate, power supply operating parameters and exhaust flow rate, are dynamically adjusted based on the contaminant parameter information and historical process type by utilizing the plasma generation unit, cleaning gas delivery component and exhaust component, thereby achieving efficient cleaning of the heat treatment chamber.
It effectively reduces the accumulation of pollutants in the heat treatment chamber, prevents the redeposition of pollutants caused by the cold wall effect, improves equipment utilization and cleaning efficiency, and avoids resource waste and equipment damage.
Smart Images
Figure CN122007095B_ABST