基于分块相交的工艺窗口计算方法、系统、介质、产品及终端

By determining the region to be evaluated on the target mask and using the transmission spectral distribution and geometric characterization of the intersection operation of the sub-process windows, the problem of low computational efficiency and insufficient accuracy of process windows under advanced process nodes is solved. This achieves efficient and accurate process window prediction, improving the yield of lithography manufacturing and reducing costs.

CN122043850BActive Publication Date: 2026-07-17HUAXINCHENG (HANGZHOU) TECH CO LTD
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
HUAXINCHENG (HANGZHOU) TECH CO LTD
Filing Date
2026-04-20
Publication Date
2026-07-17

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Abstract

本申请提供一种基于分块相交的工艺窗口计算方法、系统、介质、产品及终端，通过预先在目标掩模板上确定多个待评估区域；通过基于所述目标掩模板的透射光谱分布，获得每个待评估区域的工艺变化曲线；通过根据每个待评估区域的工艺变化曲线，确定对应的至少一个子工艺窗口；其中，所述子工艺窗口由几何图形表征；通过对所有待评估区域的子工艺窗口进行交集运算，获得候选公共工艺窗口；通过根据预设的筛选条件，从所述候选公共工艺窗口中筛选出目标公共工艺窗口。相比传统工艺窗口计算方法，本申请通过分区设计、几何图形表征和交集运算，大幅简化了公共工艺窗口的求解逻辑，有效平衡并提升了计算效率和精度。
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