Benzocyclobutene resin photoresist filtering equipment

Abstract

The invention relates to the technical field of semiconductor manufacturing, in particular to benzocyclobutene resin photoresist filtering equipment which comprises a filtering shell and a discharging pipe arranged on the lower surface of the filtering shell, a pressure buffering mechanism and a linkage mechanism are arranged on one side of the filtering shell, and a filtering mechanism is arranged in the filtering shell. Through cooperation of a plurality of components in the filtering mechanism, in the filtering process of benzocyclobutene resin photoresist, when the shell generates radial deformation due to pressure or the filter element center rod is slightly bent due to stress, the mounting boss can automatically slide in the mounting groove to drive the whole filter element to be subjected to radial fine adjustment, so that the filter element is prevented from being damaged, and the service life of the filter element is prolonged. The axis of the filter element is aligned with the axis of the deformed shell again, the bottom coaxiality deviation is prevented from being expanded, the conical boss at the upper end of the filter element can slightly slide and adjust the angle along the conical groove, the filter element is automatically pulled back to the position coaxial with the shell under the guidance of the conical groove, and coaxiality unbalance of the filter shell and the center rod is further avoided.

Description

Technical Field

[0001] This invention relates to the field of semiconductor manufacturing technology, and in particular to a benzocyclobutene resin photoresist filtration device. Background Technology

[0002] Benzocyclobutene (BCB) resin photoresist is a negative photoresist based on benzocyclobutene resin and modified by photosensitization. Its core advantages are ultra-low dielectric constant, ultra-high heat resistance, low loss, and high film-forming properties. It is a key material for advanced packaging, high-frequency and high-speed circuits, and MEMS. Benzocyclobutene resin photoresist filtration equipment is an auxiliary equipment for the photolithography process in semiconductor manufacturing. It is a high-precision filtration device for benzocyclobutene resin photoresist. Due to its excellent heat resistance and low dielectric constant, benzocyclobutene resin photoresist is widely used in advanced packaging and high-frequency device manufacturing.

[0003] A search revealed an existing invention patent (publication number: CN116272119B) disclosing a high-precision filtration device for photoresist, comprising: a tank, a flushing zone, a first filtration zone, and a second filtration zone. The flushing zone is connected to the feed end of the tank, and the second filtration zone is connected to the discharge end of the tank. It includes a rotating shaft and a drive motor; a hot runner pipe disposed within the flushing zone; a flow equalization plate located at the lower end of the hot runner pipe, the middle of which is engaged with the outer wall of the rotating shaft and rotates with it; a filtration structure comprising a first filter plate and a dividing hopper extending upwards from the top of the first filter plate to both sides, the dividing hopper communicating with the inner layer of the tank; and a sieving structure located in the second filtration zone. This structure can process some impurity particles inside the container, reducing the frequency of filter replacement and extending the filter lifespan. It solves the problem of production stoppage during filter replacement, which incurs significant costs upon restarting, leading to increased photoresist costs.

[0004] However, the aforementioned existing technologies still have the following problems: Although the solution is received from the feed end and transported through the hot flow pipe and the equalization plate, the solution is heated during the transport process to reduce the viscosity of the photoresist solution. Then the solution with reduced viscosity is passed into the rapidly rotating equalization plate, so that the equalization plate can evenly introduce the solution into the first filtration zone, so that the first filtration zone can be evenly contacted with the solution, thereby reducing the phenomenon of excessive wear of local filter elements. However, when directly applying it to high-precision filtration of benzocyclobutene resin photoresist, there are still unavoidable technical shortcomings. Benzocyclobutene resin photoresist itself has a high viscosity. In order to ensure that the viscous adhesive can pass through the filter element smoothly, this type of filtration equipment needs to create a high-pressure operating environment inside. However, in the actual operation of the above equipment, once the internal pressure distribution is uneven, the external high pressure will directly act on the filter element and the filter equipment shell, causing radial deformation of both. After the deformation occurs, the radial force of the filter element will be unbalanced instantly, resulting in the problem of filter element bending and displacement, which directly destroys the coaxiality between the filter element and the filter shell and breaks the internal flow field balance of the equipment. When the coaxiality is unbalanced, the flow rate of photoresist inside the filter housing will deviate significantly in certain areas, further exacerbating the uneven pressure distribution inside the housing and on the filter element surface. This will eventually lead to local overload and failure of the filter membrane on the filter element surface, making it impossible to achieve uniform filtration across the entire surface. This directly reduces the uniformity of photoresist flow rate and overall filtration efficiency, affecting the purity of the benzocyclobutene resin photoresist product.

[0005] Therefore, the present invention provides a benzocyclobutene resin photoresist filtration device to solve the above problems. Summary of the Invention

[0006] The purpose of this invention is to overcome the shortcomings of the prior art and to propose a benzocyclobutene resin photoresist filtration device.

[0007] To achieve the above objectives, the present invention adopts the following technical solution: A benzocyclobutene resin photoresist filtration device includes: a filter housing and a discharge pipe disposed on the lower surface of the filter housing. A pressure buffer mechanism and a linkage mechanism are disposed on one side of the filter housing, and a filtration mechanism is disposed inside the filter housing. The filtration mechanism includes a filter element, a central rod, a mounting boss, a mounting groove, an elastic pad, and a sealing gasket. The filter element is fixedly installed to the central rod and is located inside the filter housing. The mounting boss is fixedly connected to the central rod and inserted into the mounting groove, which is located on the inner bottom wall of the filter housing. The elastic pad is evenly fixedly installed inside the mounting groove and is in contact with the outer arc surface of the mounting boss. The sealing gasket is fixedly installed on the surface of the central rod, and its lower surface is in contact with the inner bottom wall of the filter housing. The filter element adopts an asymmetric pleated structure and optimized pleat height ratio to improve filtration efficiency and flow rate uniformity. Material selection: PTFE is used, with PTFE accounting for 82% to 88% of the mass. The membrane thickness is controlled at 8 to 15 μm. Performance indicators: bubble point range is 0.35 to 0.75 MPa, water permeability is 1.2 ± 0.2 ml / min·cm², surface treatment: plasma grafting modification process is adopted, with a power of 200W and a processing time of 30s, reducing the contact angle from 110° to below 75° to improve hydrophilicity, and the pleat height ratio design is set at 1.6 to 2.3 times. The pleat height ratio is the radial distance between the center rod and the inner wall of the filter housing; Asymmetric folded structure: the fold density at the inlet end is 60 folds / cm, and at the outlet end it is 40 folds / cm, optimizing the flow velocity distribution; The plasma treatment and chemical grafting process were optimized in sequence: plasma treatment was performed first, followed by membrane folding and molding, which improved the modification effect and structural consistency.

[0008] Preferably, the filtration mechanism further includes a conical boss fixedly disposed at one end of the central rod, and the inner top wall of the filter housing is provided with a conical groove similar in shape to the conical boss. The central rod is elastically inserted into the interior of the filter housing based on the conical boss and the mounting boss.

[0009] Preferably, the filtration mechanism further includes a spiral guide plate fixedly disposed inside the filter housing, with the inner side of the spiral guide plate disposed close to the outer side of the filter element. The spiral guide plate surrounds the surface of the filter element, and the discharge pipe is connected to the inner bottom wall of the filter housing for discharging the filtered photoresist out of the filter housing. The spiral guide plate adopts a 30° spiral angle design and undergoes electrochemical polishing treatment, with a surface roughness Ra≤0.8μm and a flow velocity uniformity deviation≤4%; Flow rate control: In benzocyclobutene resin photoresist with a viscosity of 15 cP, the initial filtration rate is not less than 3.0 ml / min·cm², and the attenuation rate after 200 hours of operation is less than 5%; By improving the hydrophilicity of the membrane material through plasma grafting modification and time-series optimization, the spiral angle design of the spiral guide plate 10 is combined with electrochemical polishing to significantly reduce flow velocity deviation.

[0010] Preferably, the inner wall of the filter housing is provided with guide blocks arranged in a circular array around the filter element, and the filter housing is provided with a groove for the guide blocks to slide. An elastic element is fixedly connected to the side of the guide block near the filter element, and an elastic rib is fixedly provided on the outer side of the multiple guide blocks, and the elastic rib is slidably connected to the filter housing.

[0011] Preferably, the pressure buffer mechanism includes a feed pipe fixedly connected to one side of the filter housing. One end of the feed pipe is fixedly connected to a buffer tank via a flange. A feed head and an air inlet pipe are fixedly connected to both sides of the upper surface of the buffer tank, and the feed head is connected to an external photoresist raw material storage tank, while the air inlet pipe is connected to an external nitrogen storage tank.

[0012] Preferably, the pressure buffer mechanism further includes a piston that is slidably connected to the inside of the buffer tank and whose surface is in close contact with the buffer tank. A damping spring that is slidably connected to the buffer tank is fixedly connected to one side of the piston. Limiting plates are fixedly connected to both sides of the inner wall of the buffer tank, and the limiting plates are arranged on the path of piston movement.

[0013] Preferably, the pressure buffer mechanism further includes a support frame that is fixedly connected to the surface of the filter housing by bolts, and the buffer tank is fixedly connected to the support frame. One end of the damping spring is fixedly connected to the inner wall of the buffer tank, and one end of the damping spring is fixedly connected to a linkage rod that is slidably connected to the buffer tank. A sealing ring that is sleeved on the surface of the linkage rod is fixedly connected to one side of the buffer tank.

[0014] Preferably, the linkage mechanism includes a fixed rod fixedly connected to one end of the linkage rod, a shaped block fixedly connected to one end of the fixed rod, a wedge block inserted inside the shaped block, the shaped block and the wedge block being slidably disposed inside the filter housing, and the wedge block being fixedly connected to one of the guide blocks.

[0015] Preferably, the linkage mechanism further includes a connecting rod fixedly connected to the lower surface of one of the guide blocks. The connecting rod is slidably disposed inside the filter housing, and one end of the connecting rod is fixedly connected to the sealing gasket, for driving the center rod and the filter element to finely adjust their positions in the filter housing.

[0016] Preferably, the linkage rod is slidably connected to the filter housing, and a sealing ring is also provided at the connection point to seal the connection between the linkage rod and the filter housing. A hollow box for guiding the linkage rod is fixedly connected to one side of the filter housing.

[0017] Compared with the prior art, the beneficial effects of the present invention are: 1. Through the synergy of multiple components in the filtration mechanism, during the filtration of benzocyclobutene resin photoresist, when the filter housing undergoes radial deformation due to pressure or the filter element's central rod slightly bends due to force, the mounting boss will automatically slide in the mounting groove, causing the filter element as a whole to make radial micro-adjustments, so that the filter element's axis is realigned with the housing's deformed axis, avoiding the expansion of the bottom coaxiality deviation. In addition, the tapered boss at the top of the filter element will make slight sliding and angle adjustments along the tapered groove. Guided by the tapered groove, it will automatically pull the filter element back to the coaxial position with the housing, further avoiding the imbalance of the coaxiality between the filter housing and the central rod. 2. Based on the synergy of multiple components in the pressure buffer mechanism, when the photoresist filtration equipment is turned on or the flow rate increases, the filtration pressure will rise or fall suddenly. When the pressure of the photoresist entering the buffer tank through the feed head is too high, the squeeze piston slides away from the feed pipe, compressing the damping spring and absorbing the energy of the sudden pressure rise. When the pressure entering the buffer tank is too low, the damping spring stretches, driving the piston to slide closer to the feed pipe, replenishing the vacuum caused by the sudden pressure drop, thereby controlling the filtration pressure of the filtration equipment, avoiding the water hammer effect, reducing the impact of fluid impact on the radial force of the filter element, reducing the load on the position adjustment of the filtration mechanism, and making the coaxiality adjustment more stable. 3. Based on the synergy of multiple components in the linkage mechanism, when the piston is driven to move by the pressure delivered by photoresist, the damping spring is synchronously compressed or stretched, thereby causing the linkage rod to move synchronously, which drives the irregular block and wedge block to slide inside the filter housing. This, in turn, drives multiple guide blocks to move radially synchronously through the elastic ribs. When the pressure rises sharply, the pressure buffer mechanism absorbs the pressure and drives the filter mechanism to finely adjust the filter element in the opposite direction of the pressure impact, dispersing the local pressure on the filter membrane. When the pressure drops sharply, the pressure buffer mechanism compensates for the pressure and drives the filter mechanism to reset the filter element, avoiding flow channel deviation. This prevents the uneven radial impact force generated by the fluid turbulence caused by pressure fluctuations from acting on the filter element and causing more serious damage to the filter element. 4. The equipment adopts an asymmetric pleated structure and an optimized pleat height ratio to improve filtration efficiency and flow rate uniformity. Furthermore, the combination of the guide plate helical angle design and electrochemical polishing further reduces flow rate deviation. Attached Figure Description

[0018] Figure 1 This is a front structural schematic diagram of a benzocyclobutene resin photoresist filtration device proposed in this invention. Figure 2 This is a side view of a benzocyclobutene resin photoresist filtration device proposed in this invention. Figure 3 This is a schematic diagram of the internal structure of a benzocyclobutene resin photoresist filtration device proposed in this invention; Figure 4 This is a schematic diagram of the pressure buffer mechanism of a benzocyclobutene resin photoresist filtration device proposed in this invention; Figure 5 This is a schematic diagram showing the disassembled structure of the pressure buffer mechanism of a benzocyclobutene resin photoresist filtration device proposed in this invention. Figure 6 This is a schematic diagram of the filter mechanism and filter housing structure of a benzocyclobutene resin photoresist filtration device proposed in this invention. Figure 7This is a schematic diagram of the pressure buffer mechanism, guide block, elastic rib, and central rod structure of a benzocyclobutene resin photoresist filtration device proposed in this invention. Figure 8 This is a schematic diagram of the connecting rod, wedge block, elastic rib, and sealing gasket structure of a benzocyclobutene resin photoresist filtration device proposed in this invention.

[0019] In the diagram: 1. Filter housing; 2. Filter element; 3. Center rod; 4. Mounting boss; 5. Mounting groove; 6. Elastic pad; 7. Sealing gasket; 8. Conical boss; 9. Conical groove; 10. Spiral guide plate; 11. Guide block; 12. Elastic element; 13. Elastic rib; 14. Feed pipe; 15. Buffer tank; 16. Feed head; 17. Air inlet pipe; 18. Limiting plate; 19. Support frame; 20. Linkage rod; 21. Fixing rod; 22. Irregular block; 23. Wedge block; 24. Connecting rod; 25. Piston; 26. Damping spring. Detailed Implementation

[0020] The technical solutions of the present invention will be clearly and completely described below with reference to the accompanying drawings of the embodiments of the present invention. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments.

[0021] The terms used in this invention, such as "upper," "lower," "left," "right," "middle," and "one," are merely for clarity of description and are not intended to limit the scope of the invention. Any changes or adjustments to their relative relationships, without substantially altering the technical content, should also be considered within the scope of the invention.

[0022] This application relates to a benzocyclobutene resin photoresist filtration device, with reference to... Figures 1-8 The present invention provides four embodiments: Example 1: The device includes: a filter housing 1 and a discharge pipe disposed on the lower surface of the filter housing 1. A pressure buffer mechanism and a linkage mechanism are disposed on one side of the filter housing 1, and a filter mechanism is disposed inside the filter housing 1. The filtration mechanism includes a filter element 2, a central rod 3, a mounting boss 4, a mounting groove 5, an elastic pad 6, and a sealing pad 7; Among them, a flexible silicone connecting layer is added between the root of the filter membrane folds and the outer wall of the central rod 3 to achieve an elastic connection between the filter membrane and the central rod, and the thickness of the flexible connecting layer is 0.5mm. Among them, filter element 2 adopts an asymmetric pleated structure and an optimized pleat height ratio to improve filtration efficiency and flow rate uniformity; Material selection: PTFE is used, with PTFE accounting for 82% to 88% of the mass, and the film thickness is controlled between 8 and 15 μm; Performance indicators: bubble point range is 0.35~0.75MPa, water permeability is 1.2±0.2ml / min·cm²; Surface treatment: Plasma grafting modification process is adopted, with a power of 200W and a processing time of 30s. The contact angle is reduced from 110° to below 75°, improving hydrophilicity. Pleat height ratio design: The pleat height ratio is set at 1.6 to 2.3 times; The pleat height ratio is the radial distance between the center rod and the inner wall of the filter housing; Asymmetric folded structure: the fold density at the inlet end is 60 folds / cm, and at the outlet end it is 40 folds / cm, optimizing the flow velocity distribution; The filtration mechanism also includes a spiral guide plate 10 fixedly disposed inside the filter housing 1, and the inner side of the spiral guide plate 10 is disposed close to the outer side of the filter element 2. The spiral guide plate 10 surrounds the surface of the filter element 2, and the discharge pipe is connected to the inner bottom wall of the filter housing 1 for discharging the filtered photoresist from the filter housing 1. Among them, the spiral guide plate 10 adopts a 30° spiral angle design, is electrochemically polished, and has a surface roughness Ra≤0.8μm and a flow velocity uniformity deviation≤4%; Flow rate control: In benzocyclobutene resin photoresist with a viscosity of 15 cP, the initial filtration rate is not less than 3.0 ml / min·cm², and the attenuation rate after 200 hours of operation is less than 5%; By improving the hydrophilicity of the membrane material through plasma grafting modification and time-series optimization, and by combining the spiral angle design of the spiral guide plate with electrochemical polishing, the flow velocity deviation is significantly reduced. The plasma treatment and chemical grafting process were optimized in sequence: plasma treatment was performed first, followed by membrane folding and molding, which improved the modification effect and structural consistency. Experiment 1: Using a composite membrane with 85% PTFE content, a membrane thickness of 12μm, and a bubble point of 0.55MPa, a filtration test was conducted on 50nm standard polystyrene particles, and the particle retention efficiency reached 99.93%.

[0023] Experiment 2: Using a 30° spiral guide plate 10 and electrolytic polishing, the measured flow velocity deviation was 3.8%. In benzocyclobutene resin photoresist filtration, the initial filtration rate was 3.2 ml / min·cm², and the attenuation rate was less than 5% after 200 hours. The wafer surface defect density decreased from 0.12 defects / cm² to 0.03 defects / cm², resulting in a significant improvement in yield. Specifically, after the filter element 2 and the center rod 3 are installed in the filter housing 1, the benzocyclobutene resin photoresist is delivered to the inside of the filter housing 1 through the feed head 16 in the pressure buffer mechanism. The benzocyclobutene resin photoresist is guided by the spiral guide plate 10, causing it to flow asymmetrically on the surface of the filter element 2. Due to the pressure difference between the inside and outside of the filter element 2, the benzocyclobutene resin photoresist passes through the filter element 2 and enters the interior of the filter element 2, thus completing the filtration of the benzocyclobutene resin photoresist. Finally, the filtered benzocyclobutene resin photoresist is discharged through the discharge pipe.

[0024] In Example 2, based on Example 1, the filter element 2 is fixedly installed with the central rod 3 and is located inside the filter housing 1. The mounting boss 4 is fixedly connected to the central rod 3 and inserted into the mounting groove 5. The mounting groove 5 is located on the inner bottom wall of the filter housing 1. The elastic pad 6 is evenly fixedly installed inside the mounting groove 5 and is in contact with the outer arc surface of the mounting boss 4. The sealing pad 7 is fixedly installed on the surface of the central rod 3 and its lower surface is in contact with the inner bottom wall of the filter housing 1. Among them, filter element 2 is used to filter the benzocyclobutene resin photoresist that enters the filter housing 1; The central rod 3 is used to install the filter element 2 inside the filter housing 1; The mounting boss 4 and the mounting groove 5 are used to restrict the positions of the center rod 3 and the filter element 2; Among them, the elastic pad 6 is used to limit the mounting boss 4; Among them, the sealing gasket 7 is used to seal the mounting groove 5 to prevent the benzocyclobutene resin photoresist from entering the interior of the mounting groove 5 during filtration, and the sealing gasket 7 moves with the filter element 2. The filtration mechanism also includes a conical boss 8 fixedly disposed at one end of the central rod 3, and a conical groove 9 with a similar shape to the conical boss 8 is provided on the inner top wall of the filter housing 1. The central rod 3 is elastically inserted into the interior of the filter housing 1 based on the conical boss 8 and the mounting boss 4. The conical boss 8 and the conical groove 9 are used to further limit the center rod 3 and the filter element 2; The inner wall of the filter housing 1 is provided with guide blocks 11 arranged in a circular array with the filter element 2 as the center. The filter housing 1 has a groove for the guide blocks 11 to slide. An elastic element 12 is fixedly connected to the side of the guide block 11 near the filter element 2. Elastic ribs 13 are fixedly provided on the outer sides of multiple guide blocks 11. The elastic ribs 13 are slidably connected to the filter housing 1. Among them, the guide block 11 does not contact the filter element 2. It only contacts the filter element 2 when the filter element 2 is deformed, and it no longer contacts the filter element 2 after the filter element 2 is adjusted. When the filter housing 1 deforms or the filter element 2 shifts, the guide block 11 will slide radially along the groove, and the elastic element 12 will automatically extend and retract according to the force, providing guidance and buffer for the radial fine adjustment of the filter element 2, ensuring that the filter element 2 is always adjusted along the axial direction, avoiding irregular shifts caused by fluid impact, and further preventing the expansion of coaxiality deviation. Among them, the elastic rib 13 is used to drive multiple guide blocks 11 to move synchronously; Specifically, the mounting boss 4 is inserted into the mounting groove 5, and the conical boss 8 is inserted into the conical groove 9, so that the central rod 3 and the filter element 2 are installed in the filter housing 1. The position of the mounting boss 4 is squeezed by the elastic pad 6 to make it more stably set in the filter housing 1. At the same time, the sealing pad 7 is attached to the inner bottom wall of the filter housing 1 to prevent benzocyclobutene resin photoresist from entering the mounting groove 5. Then, benzocyclobutene resin photoresist is fed into the filter housing 1 through the feed head 16. The benzocyclobutene resin photoresist is filtered by the pressure difference between the inner and outer sides of the filter element 2 and the filter housing 1 and the external environment. When the filter housing 1 undergoes radial deformation due to pressure or the central rod 3 inside the filter element 2 is slightly bent due to force, the mounting boss 4 will automatically slide in the mounting groove 5, thereby squeezing the elastic pad 6 and driving the filter element 2 to make radial micro-adjustment. This will realign the axis of the filter element 2 with the axis of the filter housing 1 after deformation, avoiding the expansion of the bottom coaxiality deviation. In addition, the conical boss 8 at the upper end of the filter element 2 will make slight sliding and angle adjustment along the conical groove 9. Under the guidance of the conical groove 9, the filter element 2 will be automatically pulled back to the coaxial position with the filter housing 1, further avoiding the coaxiality imbalance between the filter housing 1 and the central rod 3.

[0025] In Example 3, based on Example 2, the pressure buffer mechanism further includes a feed pipe 14 fixedly connected to one side of the filter housing 1. One end of the feed pipe 14 is fixedly connected to a buffer tank 15 via a flange. A feed head 16 and an air inlet pipe 17 are fixedly connected to both sides of the upper surface of the buffer tank 15, and the feed head 16 is connected to an external photoresist raw material storage tank, and the air inlet pipe 17 is connected to an external nitrogen storage tank. The feed pipe 14 is used to transport the benzocyclobutene resin photoresist in the buffer tank 15 to the filter housing 1. Among them, the buffer tank 15 is used to buffer or replenish the pressure during the delivery of benzocyclobutene resin photoresist. The feed head 16 is used to connect to an external feed device so that the benzocyclobutene resin photoresist enters the buffer tank 15. The air inlet pipe 17 is used to replenish the nitrogen in the buffer tank 15. The pressure buffer mechanism also includes a piston 25 that is slidably connected to the inside of the buffer tank 15 and whose surface is in close contact with the buffer tank 15. A damping spring 26 that is slidably connected to the buffer tank 15 is fixedly connected to one side of the piston 25. Limiting plates 18 are fixedly connected to both sides of the inner wall of the buffer tank 15, and the limiting plates 18 are arranged on the path of the piston 25. The piston 25 is used to slide in the buffer tank 15 and automatically adjust its position based on the pressure of the benzocyclobutene resin photoresist entering the buffer tank 15. The piston 25 divides the buffer tank 15 into two parts. One part is the side of the piston 25 close to the feed pipe 14, which is used to transport the benzocyclobutene resin photoresist. The other part is the side of the piston 25 away from the feed pipe 14, which is used to provide compression space and nitrogen storage space for the buffer tank 15 and the damping spring 26. Nitrogen is injected into the other part of the buffer tank 15 through the air inlet pipe 17, so that the nitrogen and the spring force of the damping spring 26 cooperate with each other to increase the upper limit of the pressure that the pressure buffer mechanism can absorb. Another part is pre-filled with 0.3MPa high-purity nitrogen gas to form a dual energy storage buffer of spring and nitrogen gas, which can adapt to bidirectional compensation for sudden pressure rise or fall. The damping spring 26 is used to absorb the compressive force on the piston 25. The damping spring 26 is initially in a semi-compressed state. When the pressure inside the buffer tank 15 is too high, the piston 25 squeezes the damping spring 26 to absorb the pressure in the buffer tank 15. When the pressure inside the buffer tank 15 is too low, the piston 25 is driven to move towards the feed pipe 14 based on the elastic force of the damping spring 26 to replenish the pressure in the buffer tank 15. The limiting plate 18 is used to limit the movement distance of the piston 25 to prevent the piston 25 from moving too far and affecting the operation of other components. The pressure buffer mechanism also includes a support frame 19 that is fixedly connected to the surface of the filter housing 1 by bolts, and the buffer tank 15 is fixedly connected to the support frame 19. One end of the damping spring 26 is fixedly connected to the inner wall of the buffer tank 15, and one end of the damping spring 26 is fixedly connected to a linkage rod 20 that is slidably connected to the buffer tank 15. A sealing ring that is sleeved on the surface of the linkage rod 20 is fixedly connected to one side of the buffer tank 15. The support frame 19 is used to support the buffer tank 15, making it more stable during use; Among them, the linkage rod 20 is used to follow the piston 25 to move and drive the linkage mechanism to move; The sealing ring is used to seal the connection between the linkage rod 20 and the buffer tank 15 to prevent nitrogen leakage inside the buffer tank 15. Specifically, when the photoresist filtration equipment is turned on or the flow rate increases, the filtration pressure will rise or fall suddenly. When the pressure of the photoresist entering the buffer tank 15 through the feed head 16 is too high, the squeeze piston 25 slides away from the feed pipe 14, compressing the damping spring 26 to absorb the energy of the sudden pressure rise. When the pressure of the benzocyclobutene resin photoresist entering the buffer tank 15 is too low, the damping spring 26 stretches, driving the piston 25 to slide closer to the feed pipe 14 to replenish the vacuum caused by the sudden pressure drop, thereby controlling the filtration pressure of the filtration equipment. This avoids the water hammer effect, reduces the impact of fluid impact on the radial force of the filter element 2, reduces the load on the position adjustment of the filtration mechanism, and makes the coaxiality adjustment more stable.

[0026] Example 4, based on Examples 2 and 3, further includes a fixed rod 21 fixedly connected to one end of the linkage rod 20, a shaped block 22 fixedly connected to one end of the fixed rod 21, a wedge block 23 inserted inside the shaped block 22, the shaped block 22 and the wedge block 23 being slidably disposed inside the filter housing 1, and the wedge block 23 being fixedly connected to one of the guide blocks 11; Among them, the fixed rod 21 is used to connect the linkage rod 20 and the irregular block 22, so that the linkage rod 20 can drive the irregular block 22 to slide in the filter housing 1; The irregular block 22 is used to engage with the wedge block 23, thereby driving the wedge block 23 to move along with the irregular block 22; The linkage mechanism also includes a connecting rod 24 fixedly connected to the lower surface of one of the guide blocks 11. The connecting rod 24 is slidably disposed inside the filter housing 1, and one end of the connecting rod 24 is fixedly connected to the sealing gasket 7, which is used to drive the center rod 3 and the filter element 2 to finely adjust their positions in the filter housing 1. Among them, the connecting rod 24 is used to connect the corresponding guide block 11 and the sealing gasket 7; The linkage rod 20 is slidably connected to the filter housing 1, and a sealing ring is also provided at the connection point to seal the connection between the linkage rod 20 and the filter housing 1. A hollow box for guiding the linkage rod 20 is fixedly connected to one side of the filter housing 1. Specifically, when the photoresist delivery pressure drives the piston 25 to move, the damping spring 26 is compressed or stretched synchronously, thereby causing the linkage rod 20 to move synchronously, which drives the irregular block 22 and the wedge block 23 to slide inside the filter housing 1, thereby causing the elastic rib 13 to deform inside the filter housing 1. The deformed elastic rib 13 will move towards the guide block 11 fixed to the irregular block 22, thereby causing multiple guide blocks 11 to move radially synchronously when it moves. When the pressure rises suddenly, the pressure buffer mechanism absorbs the pressure and drives the filtration mechanism to finely adjust the filter element 2 in the opposite direction of the pressure impact, thus dispersing the local pressure on the filter membrane. When the pressure drops suddenly, the pressure buffer mechanism compensates for the pressure and drives the filtration mechanism to reset the filter element 2, preventing flow channel deviation. This prevents the uneven radial impact force generated by the fluid turbulence caused by pressure fluctuations from acting on the filter element 2 and causing more serious damage to the filter element 2.

[0027] The above description is only a preferred embodiment of the present invention, but the scope of protection of the present invention is not limited thereto. Any equivalent substitutions or modifications made by those skilled in the art within the scope of the technology disclosed in the present invention, based on the technical solution and inventive concept of the present invention, should be covered within the scope of protection of the present invention.

Claims

1. A benzocyclobutene resin photoresist filtration device, comprising: The filter housing (1) and the discharge pipe disposed on the lower surface of the filter housing (1) are characterized in that a pressure buffer mechanism and a linkage mechanism are disposed on one side of the filter housing (1), and a filter mechanism is disposed inside the filter housing (1). The filtration mechanism includes a filter element (2), a central rod (3), a mounting boss (4), a mounting groove (5), an elastic pad (6), and a sealing gasket (7). The filter element (2) is fixedly installed with the central rod (3) and is located inside the filter housing (1). The mounting boss (4) is fixedly connected with the central rod (3) and inserted into the mounting groove (5). The mounting groove (5) is located on the inner bottom wall of the filter housing (1). The elastic pad (6) is evenly fixedly installed inside the mounting groove (5) and is in contact with the outer arc surface of the mounting boss (4). The sealing gasket (7) is fixedly installed on the surface of the central rod (3) and its lower surface is in contact with the inner bottom wall of the filter housing (1).

2. The benzocyclobutene resin photoresist filtration device according to claim 1, characterized in that, The filter mechanism also includes a conical boss (8) fixedly set at one end of the central rod (3), and the inner top wall of the filter housing (1) is provided with a conical groove (9) similar in shape to the conical boss (8). The central rod (3) is elastically inserted into the interior of the filter housing (1) based on the conical boss (8) and the mounting boss (4).

3. The benzocyclobutene resin photoresist filtration device according to claim 1, characterized in that, The filtration mechanism also includes a spiral guide plate (10) fixedly disposed inside the filter housing (1), and the inner side of the spiral guide plate (10) is disposed close to the outer side of the filter element (2). The spiral guide plate (10) surrounds the surface of the filter element (2). The discharge pipe is connected to the inner bottom wall of the filter housing (1) and is used to discharge the filtered photoresist from the filter housing (1).

4. The benzocyclobutene resin photoresist filtration device according to claim 1, characterized in that, The inner wall of the filter housing (1) is provided with guide blocks (11) arranged in a circular array with the filter element (2) as the center. The filter housing (1) has a groove for the guide blocks (11) to slide. An elastic element (12) is fixedly connected to the side of the guide block (11) near the filter element (2). Elastic ribs (13) are fixedly provided on the outer sides of multiple guide blocks (11), and the elastic ribs (13) are slidably connected to the filter housing (1).

5. The benzocyclobutene resin photoresist filtration device according to claim 4, characterized in that, The pressure buffer mechanism includes a feed pipe (14) fixedly connected to one side of the filter housing (1). One end of the feed pipe (14) is fixedly connected to a buffer tank (15) via a flange. The upper surface of the buffer tank (15) is fixedly connected to a feed head (16) and an air inlet pipe (17) on both sides respectively. The feed head (16) is connected to an external photoresist raw material storage tank, and the air inlet pipe (17) is connected to an external nitrogen storage tank.

6. The benzocyclobutene resin photoresist filtration device according to claim 5, characterized in that, The pressure buffer mechanism also includes a piston (25) which is slidably connected to the inside of the buffer tank (15) and whose surface is in close contact with the buffer tank (15). A damping spring (26) which is slidably connected to the side of the piston (25) is fixedly connected to one side of the buffer tank (15). Limiting plates (18) are fixedly connected to both sides of the inner wall of the buffer tank (15), and the limiting plates (18) are arranged on the path of the piston (25) movement.

7. The benzocyclobutene resin photoresist filtration device according to claim 6, characterized in that, The pressure buffer mechanism also includes a support frame (19) that is fixedly connected to the surface of the filter housing (1) by bolts, and the buffer tank (15) is fixedly connected to the support frame (19). One end of the damping spring (26) is fixedly connected to the inner wall of the buffer tank (15). One end of the damping spring (26) is fixedly connected to a linkage rod (20) that is slidably connected to the buffer tank (15). A sealing ring that is sleeved on the surface of the linkage rod (20) is fixedly connected to one side of the buffer tank (15).

8. The benzocyclobutene resin photoresist filtration device according to claim 7, characterized in that, The linkage mechanism includes a fixed rod (21) fixedly connected to one end of the linkage rod (20), a shaped block (22) fixedly connected to one end of the fixed rod (21), a wedge block (23) inserted inside the shaped block (22), the shaped block (22) and the wedge block (23) are both slidably disposed inside the filter housing (1), and the wedge block (23) is fixedly connected to one of the guide blocks (11).

9. A benzocyclobutene resin photoresist filtration device according to claim 8, characterized in that, The linkage mechanism also includes a connecting rod (24) fixedly connected to the lower surface of one of the guide blocks (11). The connecting rod (24) is slidably disposed inside the filter housing (1), and one end of the connecting rod (24) is fixedly connected to the sealing gasket (7) for driving the center rod (3) and the filter element (2) to finely adjust their positions in the filter housing (1).

10. A benzocyclobutene resin photoresist filtration device according to claim 8, characterized in that, The linkage rod (20) is slidably connected to the filter housing (1), and a sealing ring is also provided at the connection point to seal the connection between the linkage rod (20) and the filter housing (1). A hollow box for guiding the linkage rod (20) is fixedly connected to one side of the filter housing (1).

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