A continuous aluminum nitride substrate preparation apparatus

Abstract

The present application relates to the technical field of aluminum nitride substrate, and particularly relates to a continuous aluminum nitride substrate preparation equipment, which comprises a base and two power rollers symmetrically arranged on the top surface of the base, a conveying belt formed by a plurality of metal sheets is arranged around the two power rollers, a drying bin is further arranged on the base, the conveying belt penetrates into the drying bin from one side of the drying bin and penetrates out from the other side of the drying bin, the drying bin comprises a heat insulation shell and a gas collection top cover welded and fixed to the top surface of the heat insulation shell, an exhaust pipe is welded and connected to the top end of the gas collection top cover, a plurality of heat pipe grids are arranged on the inner wall of the heat insulation shell, a plurality of penetrating holes are arranged on the conveying belt, an upper top air cylinder with a top end capable of penetrating through the penetrating holes is arranged at the bottom of the heat insulation shell, and a buffer lifting frame is arranged on the corresponding position of the gas collection top cover.

Description

Technical Field

[0001] The invention relates to the field of aluminum nitride substrate technology, and more specifically to a continuous aluminum nitride substrate preparation apparatus. Background Technology

[0002] Aluminum nitride (AlN) is a group III-V compound ceramic bonded by covalent bonds. Its crystal structure is mainly wurtzite (space group P63mc). Its theoretical thermal conductivity in a single crystal can reach 320 W / (m·K). This is due to the strong bonding between aluminum and nitrogen atoms, low atomic mass, and simple phonon spectrum, which results in a large mean free path of phonons and low thermal resistance. Aluminum nitride substrates are electronic packaging and circuit boards made primarily of aluminum nitride (AlN) ceramic. They are widely used advanced ceramic substrate materials with high thermal conductivity, low coefficient of thermal expansion, high electrical insulation, excellent mechanical properties, and chemical stability. They play a key role in modern high-power, high-frequency, and high-density electronic packaging.

[0003] In the production process of aluminum nitride substrates, aluminum nitride raw materials need to be bonded with adhesives and formed using a casting process with organic solvents. After forming, the substrates are dried, cleaned, and post-treated to form the aluminum nitride substrate. During the forming and post-treatment processes, the aluminum nitride substrate semi-finished products need to be heated and dried multiple times by drying equipment to remove solvents. Drying equipment is a combination of mechanical devices that remove moisture or other liquids from the surface of an object using specific technical means. The drying equipment converts the solvent in the material into steam and discharges it through heating, ventilation, evaporation, etc., thereby achieving the drying purpose. It is fast and safe.

[0004] Although the existing technologies mentioned above can solve the corresponding technical problems, they still have certain drawbacks: existing drying equipment is difficult to process aluminum nitride substrates with a thickness of more than 1.2 mm in one go. When the high-thickness aluminum nitride substrate semi-finished products are fed in, the solvent inside is difficult to evaporate fully when heated due to its high thickness. It is often necessary to divide the high-thickness aluminum nitride substrate into several thin plates of less than 1 mm, process them separately, and then combine them together through a stacking and firing process. This requires starting and stopping the drying equipment multiple times, making continuous operation difficult, and resulting in high production difficulty and low speed. Summary of the Invention

[0005] The purpose of this invention is to address the shortcomings and deficiencies of the prior art by providing a continuous aluminum nitride substrate preparation device that can operate continuously and has a good drying and volatilization effect.

[0006] To achieve the above objectives, the present invention adopts the following technical solution: a continuous aluminum nitride substrate preparation device, comprising a base and two power rollers symmetrically arranged at both ends of the top surface of the base. A conveyor belt formed by hinged multiple metal sheets is wound around the two power rollers. A drying chamber is also provided on the base. The conveyor belt enters from one side of the drying chamber and exits from the other side. The drying chamber includes a heat-insulating shell and a gas-collecting top cover welded and fixed to the top surface of the heat-insulating shell. An exhaust pipe is welded to the top of the gas-collecting top cover. A plurality of heat pipe meshes are laid on the inner wall of the heat-insulating shell. A plurality of through holes are provided on the conveyor belt. An upper-lifting cylinder with its top end passing through the through holes is provided at the bottom of the heat-insulating shell. A buffer support frame is provided at the corresponding position of the upper-lifting cylinder on the gas-collecting top cover. The buffer support frame includes a component that penetrates the gas-collecting top cover. The gas chamber includes a fixed block located at the bottom of the gas chamber and fixedly connected to the inner wall of the gas collection top cover. The fixed block has a slidable upper rod extending into the gas chamber. The upper rod has an upper sliding plate with its edge abutting the inner wall of the gas chamber. The top of the gas chamber also has a slow exhaust pipe. The slow exhaust pipe includes an exhaust pipe body and a slow ventilation device located in the middle of the exhaust pipe body. The inner wall of the top of the exhaust pipe body has an integrally formed converging step. The top of the exhaust pipe body is also connected to the slow exhaust device. The slow ventilation device includes a circular cavity and an opening integrally formed on the upper and lower ends of the circular cavity. A central shaft is fixedly provided on the inner wall of the circular cavity. A rotating sleeve is movably engaged on the outer wall of the central shaft. Several curved baffles with their ends and sides abutting the inner wall of the circular cavity are fixedly installed on the outer wall of the rotating sleeve.

[0007] A further improvement is that the inner wall of the heat-insulating shell is also provided with several positioning buffer devices.

[0008] A further improvement is that the bottom of the upper rod is provided with a trapezoidal bonding block, and the bottom surface of the bonding block is provided with a borosilicate rubber layer.

[0009] A further improvement is that the end of the barrier plate is also provided with a wedge-shaped slider that fits into the inner wall of the circular cavity.

[0010] A further improvement is that the slow exhaust device includes an exhaust pipe and a closed exhaust block fixedly and fitted to the inner wall of the top of the exhaust pipe. A limiting block is also fixedly installed on the inner wall of the exhaust pipe. The top surface of the limiting block is fitted to the bottom surface of the closed exhaust block, and a gas channel is formed between the side of the limiting block and the inner wall of the exhaust pipe.

[0011] A further improvement is that the closed exhaust block includes an exhaust block body fixed and fitted to the inner wall of the top of the exhaust pipe, and an exhaust channel integrally formed at the center of the exhaust block body and penetrating the exhaust block body. The exhaust block body also has an integrally formed gas groove, which extends spirally from the lower surface edge of the exhaust block body to the edge of the exhaust channel and is connected to the exhaust channel.

[0012] A further improvement is made to the positioning and buffering device, which includes a torsion spring ring installed on the inner wall of the heat insulation shell and a swing block fixedly installed on the outer wall of the torsion spring ring. The lower surface edge and end edge of the swing block are provided with a plurality of elastic blocks. The end of the elastic block is movably engaged with a contact post. The contact post includes an upper column made of elastic material and a lower column made of elastic material disposed below the upper column. An inner core is provided through the upper column, with its bottom end penetrating the lower column and its end movably engaged with the end of the elastic block. A recessed groove is formed between the upper column and the lower column. A buffer gasket is fitted on the inner core at the position of the recessed groove.

[0013] After adopting the above technical solution, the beneficial effects of the present invention are as follows:

[0014] In the application of this invention, if the substrate thickness requiring drying and solvent evaporation is high, the substrate can be fed in via a conveyor belt. The hot air output from the heat pipe mesh can be better applied to the lower surface of the substrate through the through-holes in the conveyor belt. After a period of baking, the upper cylinder is activated, causing its end to push upwards and pass through the through-holes, applying upward force to the substrate. This lifts the substrate upwards, preventing its lower surface from being obscured by the conveyor belt. The position where the upper cylinder pushes the substrate is at the location of the through-holes, allowing the substrate to be fully baked through them. After being lifted, both the upper and lower surfaces of the substrate are fully baked. Thus, a single baking cycle can fully evaporate and remove the solvent contained in a high-thickness substrate, eliminating the need for multiple start-ups and shutdowns. This results in better and faster baking, making it more suitable for high-thickness substrates.

[0015] In this invention, when the upper cylinder lifts the substrate upwards, after it reaches a certain distance, the upper surface of the substrate can be made to adhere to the bottom end of the upper lifting rod of the buffer support frame. This causes the substrate to transmit the force of the upper cylinder to push the upper lifting rod upwards, and simultaneously drives the upper sliding plate to move upwards. This allows the gas in the gas chamber to be slowly discharged outwards through the slow exhaust pipe. After the gas enters the slow ventilation device, it first needs to enter the circular cavity through the opening below the circular cavity, pushing the baffle plate to rotate. When the baffle plate moves to the opening above, the air can pass through the circular cavity, thereby slowing down the incoming air. This allows the air in the gas chamber to support the pushed substrate and absorb excessive impact pressure. This ensures that the substrate can always adhere to the top surface of the upper cylinder when it is pushed upwards, preventing it from falling off due to inertia and being damaged. At the same time, it provides flexible restraint, ensuring that its surface is not damaged while limiting its excessive rise, allowing its lower surface to be closer to the heat source for solvent evaporation and removal.

[0016] During the use of this invention, as the substrate is conveyed into the drying chamber by the conveyor belt, it passes through several positioning buffer devices and comes into contact with the swing block of the positioning buffer device. At the same time, it directly contacts the contact column. The upper and lower columns of the contact column, together with the inner core, rotate along the edge of the elastic block, thereby greatly reducing the frictional force during contact. At the same time, the elastic block can deform to absorb the impact force during contact. The positioning buffer devices on both sides operate simultaneously, so that the substrate can always be kept in the middle position of the conveyor belt during the conveying process, preventing it from tilting and causing the upper cylinder to fail to align with the substrate, and preventing the substrate from shifting and directly hitting the inner wall of the heat insulation shell and causing damage.

[0017] The present invention forms a recessed groove between the upper and lower columns. When the substrate contacts and impacts the upper and lower columns at the recessed groove, the contact area is reduced by the recessed groove, thereby reducing the wear on the substrate surface during the contact process. At the same time, the inner core is also provided with a buffer washer at the recessed groove. When the impact force of the substrate is large and causes the upper and lower columns to deform, the buffer washer can further buffer the impact. This avoids surface wear and impact damage caused when the substrate contacts the upper and lower columns when the conveyor belt moves at a high speed. Attached Figure Description

[0018] To more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0019] Figure 1This is a three-dimensional structural schematic diagram of the preparation equipment of the present invention;

[0020] Figure 2 This is a structural schematic diagram of the front cross-section of the drying chamber of the present invention;

[0021] Figure 3 This is a top view cross-section structural schematic diagram of the drying chamber of the present invention;

[0022] Figure 4 This is a structural schematic diagram of the front view cross-section of the positioning buffer device of the present invention;

[0023] Figure 5 This is a three-dimensional structural schematic diagram of the contact post of the present invention;

[0024] Figure 6 This is a structural schematic diagram of the front cross-section of the buffer support frame of the present invention;

[0025] Figure 7 This is a structural schematic diagram of the front view cross-section of the slow exhaust pipe of the present invention;

[0026] Figure 8 This is a structural schematic diagram of the front cross-section of the slow ventilation device of the present invention;

[0027] Figure 9 This is a structural schematic diagram of the front cross-section of the slow exhaust device of the present invention;

[0028] Figure 10 This is a top-view structural schematic diagram of the closed exhaust block of the present invention. Detailed Implementation

[0029] The present invention will now be further described in conjunction with the accompanying drawings and specific embodiments.

[0030] See Figure 1-10As shown, the technical solution adopted in this specific embodiment is: a continuous aluminum nitride substrate preparation device, including a base 1 and two power rollers 2 symmetrically arranged at both ends of the top surface of the base 1. A conveyor belt 4, formed by hinged multiple metal sheets, is wound around the two power rollers 2. A drying chamber 3 is also provided on the base 1. The conveyor belt 4 enters from one side of the drying chamber 3 and exits from the other side. The drying chamber 3 includes a heat-insulating shell 31 and a gas-collecting top cover 32 welded and fixed to the top surface of the heat-insulating shell 31. An exhaust pipe 33 is welded to the top of the gas-collecting top cover 32. A plurality of heat pipe meshes 34 are laid on the inner wall of the heat-insulating shell 31. A plurality of through holes 5 are provided on the conveyor belt 4. The heat-insulating shell 31... The bottom is provided with an upper cylinder 35 whose top can pass through a penetration hole 5. The air collecting top cover 32 is provided with a buffer support frame 36 at the corresponding position of the upper cylinder 35. The buffer support frame 36 includes a gas chamber 361 that penetrates the air collecting top cover 32 and a fixing block 363 that is located at the bottom of the gas chamber 361 and fixedly connected to the inner wall of the air collecting top cover 32. The fixing block 363 is provided with an upper rod 365 that penetrates and can slide through, with its top extending into the gas chamber 361. The top of the upper rod 365 is provided with an upper sliding plate 364 whose edge fits against the inner wall of the gas chamber 361. The top of the gas chamber 361 is also provided with a slow exhaust pipe 362. The slow exhaust pipe 362 includes an exhaust pipe body 11 and a part located at the exhaust pipe body 11. A slow ventilation device 12 is located in the middle section. The slow ventilation device 12 includes a circular cavity 121 and an opening 122 integrally formed on the upper and lower ends of the circular cavity 121. A central shaft 123 is fixedly provided on the inner wall of the circular cavity 121. A rotating sleeve 124 is movably engaged on the outer wall of the central shaft 123. Several curved baffles 125 are fixedly installed on the outer wall of the rotating sleeve 124, with their ends and sides abutting against the inner wall of the circular cavity 121. A contraction step 14 is integrally formed on the inner wall of the top of the exhaust pipe body 11. A slow exhaust device 13 is also connected to the top of the exhaust pipe body 11. The slow exhaust device 13 includes an exhaust pipe 131 and a seal fixed and abutting against the inner wall of the top of the exhaust pipe 131. The closed exhaust block 132 has a limiting block 133 fixedly installed on the inner wall of the exhaust pipe 131. The top surface of the limiting block 133 is attached to the bottom surface of the closed exhaust block 132. A gas channel 134 is formed between the side of the limiting block 133 and the inner wall of the exhaust pipe 131. The closed exhaust block 132 includes an exhaust block body 21 fixedly and attached to the top inner wall of the exhaust pipe 131 and an exhaust channel 22 integrally formed at the center of the exhaust block body 21 and penetrating the exhaust block body 21. A gas groove 23 is also integrally formed on the exhaust block body 21. The gas groove 23 extends spirally from the lower surface edge of the exhaust block body 21 to the edge of the exhaust channel 22 and is connected to the exhaust channel 22.

[0031] The inner wall of the heat insulation shell 31 is also provided with several positioning buffer devices 37. The positioning buffer device 37 includes a torsion spring ring 371 installed on the inner wall of the heat insulation shell 31 and a swing block 372 fixedly installed on the outer wall of the torsion spring ring 371. The lower surface edge and end edge of the swing block 372 are provided with several elastic blocks 373. The end of the elastic block 373 is movably engaged with a contact post 375. The contact post 375 includes an upper column 41 made of elastic material and a lower column 42 made of elastic material located below the upper column 41. An inner core 45 is provided through the upper column 41, with its bottom end penetrating the lower column 42 and its end movably engaged with the end of the elastic block 373. A recessed groove 44 is formed between the upper column 41 and the lower column 42. A buffer gasket 43 is sleeved on the inner core 45 at the position of the recessed groove 44. During use, as the substrate is transported to the drying chamber 3 by the conveyor belt 4, it will pass through several positioning buffer devices 37 and interact with the positioning buffer devices. The swing block 372 of the impact device 37 is in contact with the torsion spring ring 371. When the substrate presses the swing block 372, the torsion spring ring 371 twists, causing the swing block 372 to swing and change angle. At the same time, it limits the substrate so that it will not move to the inner wall of the heat insulation shell 31 due to inertia during movement to prevent collision. It also directly contacts the contact post 375. The upper post 41 and lower post 42 of the contact post 375 cooperate with the inner core 45 to rotate along the edge of the elastic block 373, thereby greatly reducing the friction during contact. At the same time, the elastic block 373 can deform to absorb the impact force during contact. The positioning buffer devices 37 on both sides operate at the same time so that the substrate can always be kept in the middle position of the conveyor belt 4 during the conveying process, preventing the upper cylinder 35 from being misaligned and preventing the substrate from shifting and directly hitting the inner wall of the heat insulation shell 31 and causing damage.

[0032] Meanwhile, a recessed groove 44 is formed between the upper column 41 and the lower column 42. The width of the recessed groove 44 is less than the thickness of the substrate. When the substrate contacts and impacts the upper column 41 and the lower column 42 at the position of the recessed groove 44, the contact area is reduced by the recessed groove 44, thereby reducing the wear on the substrate surface during the contact process. At the same time, the inner core 45 is also provided with a buffer washer 43 at the position of the recessed groove 44. When the impact force of the substrate is large and causes the upper column 41 and the lower column 42 to deform, the buffer washer 43 can further buffer the impact, thereby avoiding surface wear and impact damage when the substrate contacts the upper column 41 and the lower column 42 when the conveyor belt 4 moves at a high speed.

[0033] The bottom of the upper push rod 365 is provided with a trapezoidal bonding block 366. The bottom surface of the bonding block 366 is provided with a borosilicate rubber layer, which helps to increase the contact area between the bottom of the upper push rod 365 and the substrate, further reducing the probability of the substrate being crushed or scratched. In conjunction with the borosilicate rubber layer, the pressure on the upper surface of the substrate is further reduced, making it less likely to be damaged during the drying process.

[0034] The end of the barrier plate 125 is also provided with a wedge-shaped slider 126 that fits into the inner wall of the circular cavity 121.

[0035] Working principle of the invention: When using this invention, the substrate that needs to be dried and have its solvent removed is placed on the conveyor belt 4. Simultaneously, the heat pipe mesh 34 inside the drying chamber 3 is activated for preheating, bringing the temperature inside the drying chamber 3 to the required level. At this point, the power roller 2 is activated, driving the conveyor belt 4 to move. Simultaneously, an exhaust pipe is connected to the exhaust pipe 33 to feed the substrate into the drying chamber 3. After feeding, the power output of the power roller 2 is stopped, allowing the substrate to be dried at high temperature inside the drying chamber 3. The high temperature evaporates the solvent contained within the substrate, which is then discharged through the exhaust pipe 33. During the drying process, the upper surface of the substrate, without the shielding of the conveyor belt 4, can be dried quickly, thus rapidly evaporating the solvent. Simultaneously, the solvent is removed through the vents on the conveyor belt 4... The through hole 5 allows the hot air output from the heat pipe grid 34 to be better applied to the lower surface of the substrate. After the upper surface evaporation is completed, the upper cylinder 35 can be activated to push the end of the upper cylinder 35 upward and pass through the through hole 5, and apply the upward force to the substrate, so that the substrate is pushed upward and its lower surface is no longer blocked by the conveyor belt 4. The position of the upper cylinder 35 is the position of the through hole 5. The substrate here can be fully baked through the through hole 5. After being lifted, the lower surface of the substrate can be fully baked after the upper surface is baked. Thus, a single baking operation can fully evaporate and remove the solvent contained in the high-thickness substrate without the need for multiple start-ups and shutdowns of the equipment, making the baking effect better and faster, and more suitable for high-thickness substrates.

[0036] Simultaneously, when the upper cylinder 35 lifts the substrate upward, after lifting it to a certain distance, the upper surface of the substrate can be made to adhere to the bottom end of the upper rod 365 of the buffer support frame 36, causing the substrate to transmit the force of the upper cylinder 35 to push the upper rod 365 upward, and simultaneously drive the upper slide plate 364 to move upward, thereby allowing the gas in the gas chamber 361 to be slowly discharged outward through the slow exhaust pipe 362. After the gas enters the slow ventilation device 12, it first needs to enter the circular cavity 121 through the opening 122 below the circular cavity 121, pushing the baffle plate 125 to rotate. When the baffle plate 125 moves to the opening 122 above, the air can pass through the circular cavity 121, thereby slowing down the incoming air, and thus allowing the air in the gas chamber 361 to support the pushed substrate while absorbing excessive impact pressure, making the contact more gentle.

[0037] Meanwhile, after passing through the slow ventilation device 12, the gas moves to the slow exhaust device 13, and through the gas channel between the exhaust pipe 131 and the limiting block 133, it moves to the closed exhaust block 132, and then moves along the gas groove 23 to the exhaust channel 22 for discharge. The gas groove 23 is a spirally extended groove structure with a small volume, which allows the gas to be discharged slowly through the exhaust channel 22 in a small amount and over a long distance. This further slows down the gas discharge speed in the gas chamber 361, allowing it to better flexibly support the pushed substrate. This ensures that the substrate remains in contact with the top surface of the top cylinder 35 when it is pushed up, preventing it from falling off due to inertia and breaking. At the same time, it flexibly limits the substrate, ensuring that its surface is not damaged while restricting its excessive rise, allowing its lower surface to be closer to the heat source for faster solvent evaporation and removal.

[0038] This invention protects the structure of the product; the model numbers of the components are not protected by this invention, as they are common technology. Any component on the market that can achieve the functions described above can be used as an option. Therefore, the model numbers and other parameters of the components are not described in detail in this invention. The contribution of this invention lies in the scientific combination of the various components.

[0039] The foregoing has shown and described the basic principles, main features, and advantages of the present invention. Those skilled in the art should understand that the present invention is not limited to the above embodiments. The embodiments and descriptions above are merely illustrative of the principles of the invention. Various changes and modifications can be made to the present invention without departing from its spirit and scope, and all such changes and modifications fall within the scope of the present invention as claimed. The scope of protection of the present invention is defined by the appended claims and their equivalents. Any aspects not detailed in the present invention are well-known to those skilled in the art.

Claims

1. A continuous aluminum nitride substrate preparation apparatus, comprising a base (1) and two power rollers (2) symmetrically arranged at both ends of the top surface of the base (1), wherein a conveyor belt (4) formed by hinged multiple metal sheets is wound around the two power rollers (2), and a drying chamber (3) is also provided on the base (1), wherein the conveyor belt (4) enters from one side of the drying chamber (3) and exits from the other side of the drying chamber (3), wherein the drying chamber (3) comprises a heat insulation shell (31) and a gas collecting top cover (32) welded and fixed to the top surface of the heat insulation shell (31), wherein an exhaust pipe (33) is welded to the top of the gas collecting top cover (32), and a plurality of heat pipe grids (34) are laid on the inner wall of the heat insulation shell (31), characterized in that: The conveyor belt (4) is provided with several through holes (5). The bottom of the heat insulation shell (31) is provided with an upper cylinder (35) whose top end can pass through the through holes (5). The gas collecting top cover (32) is provided with a buffer support frame (36) at the corresponding position of the upper cylinder (35). The buffer support frame (36) includes a gas chamber (361) that penetrates the gas collecting top cover (32) and a fixing block (363) that is located at the bottom of the gas chamber (361) and fixedly connected to the inner wall of the gas collecting top cover (32). The fixing block (363) is provided with an upper rod (365) that penetrates and can slide, with its top end extending into the gas chamber (361). The top end of the upper rod (365) is provided with an upper sliding plate (364) whose edge fits against the inner wall of the gas chamber (361). The top of the gas chamber (361) is also provided with a slow discharge. The trachea (362) includes an exhaust pipe body (11) and a slow ventilation device (12) located in the middle section of the exhaust pipe body (11). The inner wall of the top of the exhaust pipe body (11) is integrally formed with a constriction step (14). The top of the exhaust pipe body (11) is also connected to a slow exhaust device (13). The slow ventilation device (12) includes a circular cavity (121) and an opening (122) integrally formed on the upper and lower ends of the circular cavity (121). The inner wall of the circular cavity (121) is fixedly provided with a central shaft (123). The outer wall of the central shaft (123) is movably engaged with a rotating sleeve (124). The outer wall of the rotating sleeve (124) is fixedly installed with several curved baffles (125) whose ends and sides are attached to the inner wall of the circular cavity (121).

2. The continuous aluminum nitride substrate fabrication equipment according to claim 1, characterized in that: The inner wall of the heat insulation shell (31) is also provided with several positioning buffer devices (37).

3. The continuous aluminum nitride substrate fabrication equipment according to claim 1, characterized in that: The bottom of the top rod (365) is provided with a trapezoidal bonding block (366), and the bottom surface of the bonding block (366) is provided with a borosilicate rubber layer.

4. The continuous aluminum nitride substrate fabrication equipment according to claim 1, characterized in that: The end of the barrier plate (125) is also provided with a wedge-shaped slider (126) that fits against the inner wall of the circular cavity (121).

5. The continuous aluminum nitride substrate fabrication apparatus according to claim 1, characterized in that: The slow exhaust device (13) includes an exhaust pipe (131) and a closed exhaust block (132) fixed and fitted to the inner wall of the top of the exhaust pipe (131). A limiting block (133) is also fixedly installed on the inner wall of the exhaust pipe (131). The top surface of the limiting block (133) is fitted to the bottom surface of the closed exhaust block (132). A gas channel (134) is formed between the side of the limiting block (133) and the inner wall of the exhaust pipe (131).

6. The continuous aluminum nitride substrate fabrication apparatus according to claim 5, characterized in that: The closed exhaust block (132) includes an exhaust block body (21) fixed and fitted to the inner wall of the top of the exhaust pipe (131) and an exhaust channel (22) integrally formed at the center of the exhaust block body (21) and penetrating the exhaust block body (21). The exhaust block body (21) also has an integrally formed gas groove (23), which extends spirally from the lower surface edge of the exhaust block body (21) to the edge of the exhaust channel (22) and is connected to the exhaust channel (22).

7. The continuous aluminum nitride substrate fabrication apparatus according to claim 2, characterized in that: The positioning buffer device (37) includes a torsion spring ring (371) installed on the inner wall of the heat insulation shell (31) and a swing block (372) fixedly installed on the outer wall of the torsion spring ring (371). The lower surface edge and end edge of the swing block (372) are provided with a plurality of elastic blocks (373). The end of the elastic block (373) is movably engaged with a contact post (375). The contact post (375) includes an upper column (41) made of elastic material and a lower column (42) made of elastic material disposed below the upper column (41). The upper column (41) is provided with an inner core (45) that penetrates the lower column (42) at its bottom end and is movably engaged with the end of the elastic block (373). A recessed groove (44) is formed between the upper column (41) and the lower column (42). The inner core (45) is fitted with a buffer washer (43) at the position of the recessed groove (44).

Images