Anti-contamination soft x-ray mirror integrated with spectral purification and method of making the same

Abstract

The present application relates to integrated spectral purification anti-pollution soft X-ray mirror and its preparation method, including: substrate, soft X-ray multilayer film reflection structure and integrated reflection diffraction protective layer;Among them, the soft X-ray multilayer film reflection structure is the Bragg reflection structure formed by the periodic alternation of two materials;The integrated reflection diffraction protective layer is a periodic micro-nano structure, which is configured to exhibit equivalent uniform medium characteristics for soft X-ray with a wavelength less than 10 nm to achieve zero-order mirror reflection, while meeting the diffraction condition for visible light and / or infrared light to make the reflected light mainly distributed in high-angle diffraction orders deviating from the main optical axis.The beneficial effects of the present application are: the present application uses the physical mechanism of reflection diffraction structure to make the soft X-ray reflect along the main light path, and the stray light is diffracted to the high-angle area deviating from the main optical axis, so that the stray light suppression rate is improved, and the core problem of the plane protective film "reflecting stray light" is completely solved.

Description

Technical Field

[0001] This invention belongs to the field of optical device technology, and particularly relates to an anti-fouling soft X-ray reflector with integrated spectral purification and its preparation method. Background Technology

[0002] The core performance of soft X-ray optical systems (such as soft X-ray lithography and synchrotron radiation detection equipment) depends on the efficient reflection and spectral purification of soft X-rays at specific wavelengths (less than 10 nm). Currently, the industry commonly uses periodic multilayer film structures such as Mo-Si and Mo-Be as the core of the reflector, which achieves high reflectivity (typically above 60%) of soft X-rays through the Bragg interference effect. However, existing technologies face four major problems in practical applications, severely restricting system performance and stability: 1. Stray White Light Interference: While generating soft X-rays in the wavelength range of less than 10 nm, plasma soft X-ray sources also emit a large amount of visible light (400-760 nm) and infrared light (760 nm-1 mm). If these stray lights are not effectively suppressed, they will not only reduce the spectral purity of the system, but may also cause undesirable exposure of subsequent optical components (such as masks and detectors), affecting imaging accuracy or detection accuracy. 2. Technical Misconceptions about Planar Protective Films: Existing solutions often deposit planar thin films of metals such as zirconium (Zr) and tantalum (Ta) on the surface of multilayer films as protective layers, intending to block plasma erosion. However, such planar films still exhibit specular reflection characteristics to visible light, causing stray white light to be reflected along the main path of soft X-rays, failing to achieve spectral separation, and instead exacerbating stray light interference, thus violating the original design intention of protection and filtering. 3. Insufficient reliability of independent filters: Traditional solutions use independent transmission-type soft X-ray filters (such as self-supporting Zr films), but these filters are ultra-thin films with a structure of hundreds of nanometers, with extremely low mechanical strength and poor heat dissipation. They have a high breakage rate during vacuum pressure fluctuations, thermal shocks, or assembly, which seriously affects the stability of continuous system operation. 4. Plasma erosion leads to shortened lifespan: The plasma generated by soft X-ray sources contains a large number of high-energy ions (such as nitrogen ions). + O + The long-term bombardment of these particles, including neutral particles, directly erodes the multilayer film structure, leading to interfacial mixing, increased surface roughness, and rapid decay of soft X-ray reflectivity over time, significantly shortening the service life of the mirror.

[0003] In existing technologies, the filtering and protection functions are isolated from each other. There is no technical solution that integrates "spectral purification" and "plasma protection" into the reflector body. It is impossible to solve the three core problems of stray light separation, structural reliability and corrosion resistance at the same time. There is an urgent need for an integrated and highly stable technological breakthrough. Summary of the Invention

[0004] The purpose of this invention is to overcome the shortcomings of the prior art and provide an integrated spectral purification anti-fouling soft X-ray reflector and its preparation method.

[0005] Firstly, an integrated spectral purification anti-contamination soft X-ray reflector is provided, which, from bottom to top, includes: a substrate, a soft X-ray multilayer film reflective structure, and an integrated reflective diffraction protection layer. The soft X-ray multilayer film reflective structure is a Bragg reflective structure formed by periodically alternating layers of two materials; the integrated reflective diffraction protection layer is a periodic micro-nano structure configured to present equivalent homogeneous medium characteristics for soft X-rays with wavelengths less than 10 nm to achieve zero-order specular reflection, while satisfying diffraction conditions for visible light and / or infrared light so that after reflection, it is mainly distributed in high-angle diffraction orders deviating from the principal optical axis.

[0006] Preferably, the two materials are selected from Mo-Si, Mo-Be, Ru-Si or Nb-Si combination; the number of film layers in the soft X-ray multilayer reflective structure is 30-60 pairs, and the total thickness is 500-1000 nm.

[0007] Preferably, the integrated reflective diffraction protective layer is a one-dimensional periodic stripe grating or a two-dimensional periodic dot grating; the grating has a period of 200-1000 nm, a duty cycle of 0.3-0.7, and a thickness of 50-200 nm.

[0008] Preferably, the material of the integrated reflective diffraction protective layer is selected from zirconium, niobium, molybdenum or their alloys.

[0009] Preferably, a diffusion barrier layer is provided between the soft X-ray multilayer film reflective structure and the integrated reflective diffraction protection layer; the material of the diffusion barrier layer is selected from silicon nitride, boron carbide or a combination thereof, and the thickness is 10-50 nm.

[0010] Preferably, an encapsulation layer is also covered on the outermost surface of the integrated reflective diffraction protective layer; the material of the encapsulation layer is selected from ruthenium, iridium or platinum, and the thickness is 2-10 nm.

[0011] Preferably, the stripe direction of the integrated reflective diffraction protection layer is configured to be aligned along the soft X-ray polarization direction.

[0012] In a second aspect, a method for preparing an anti-fouling soft X-ray mirror with integrated spectral purification as described in any of the first aspects is provided, comprising: S1. Provide the substrate and perform surface pretreatment; S2. A soft X-ray multilayer film reflective structure is deposited on the surface of the substrate; S3, Deposition to form an integrated reflective diffraction protective layer material film; S4. A photoresist mask with a preset periodic micro-nano pattern is formed on the surface of the integrated reflective diffraction protective layer material film. S5. Using the photoresist mask as a shield, etch the integrated reflective diffraction protection layer material film to form the integrated reflective diffraction protection layer; S6. Remove the photoresist mask.

[0013] Preferably, after S2 and before S3, a diffusion blocking layer is deposited on the surface of the soft X-ray multilayer reflective structure.

[0014] Preferably, after S6, the method further includes depositing an encapsulation layer on the surface of the integrated reflective diffraction protection layer.

[0015] The beneficial effects of this invention are: 1. This invention utilizes the physical mechanism of a reflective diffraction structure to cause soft X-rays to be reflected at zero order along the main optical path, while stray white light is diffracted to a high-angle region deviating from the main optical axis, thereby improving the stray light suppression rate and completely solving the core problem of "reflecting stray light" in planar protective films. Furthermore, the reflective diffraction protective layer exhibits equivalent homogeneous medium characteristics in the soft X-ray band, without introducing additional reflection loss. The soft X-ray reflectivity of the multilayer film is maintained at over 50%, which is comparable to that of traditional unprotected multilayer films.

[0016] 2. Significantly improved structural reliability: This invention eliminates the need for independent self-supporting filters, integrates the protective layer with the reflector body, increases mechanical strength several times, reduces the breakage rate to below 1% in a vacuum environment, and is suitable for complex working conditions; in addition, the material (Zr / Nb / Mo) and thickness of the protective layer have been optimized, which can effectively block high-energy ion bombardment, reduce the reflectivity decay rate of the multilayer film by more than 60%, and extend the service life of the reflector by 2-3 times.

[0017] 3. Multifunctional Integrated Simplified System: This invention integrates spectral purification, plasma protection, and stress adjustment functions into a single protective layer, eliminating the need for additional components. This simplifies the structural design of soft X-ray optical systems and reduces assembly complexity and cost. Furthermore, the fabrication process can be directly integrated into existing soft X-ray multilayer mirror manufacturing processes without large-scale equipment modifications, making industrial-scale mass production feasible. In addition, this invention can further optimize soft X-ray reflection performance in specific scenarios by adjusting the grating fringe direction to meet system polarization requirements. Attached Figure Description

[0018] Figure 1 A schematic cross-sectional view of the soft X-ray anti-fouling multilayer film mirror with an integrated reflective diffraction structure provided by the present invention; Figure 2This is a schematic diagram of the physical path for spectral separation provided by the present invention; Figure 3 A flowchart illustrating the fabrication process of the integrated spectral purification anti-fouling soft X-ray reflector provided by this invention; Figure 4 This is a top view of the one-dimensional striped grating structure provided by the present invention; Figure 5 This is a top view of the two-dimensional dot matrix grating structure provided by the present invention; Figure reference numerals: 1. Encapsulation layer; 2. Periodic micro / nano structure; 3. Integrated reflective diffraction protection layer; 4. Diffusion blocking layer; 5. Extreme ultraviolet multilayer reflective structure; 6. Periodic alternating layer; 7. Incident mixed light; 8. Visible light diffraction; 9. Soft X-ray reflection; 10. Infrared diffraction; 11. Silicon wafer. Detailed Implementation

[0019] The present invention will be further described below with reference to embodiments. The description of the embodiments below is only for the purpose of helping to understand the present invention. It should be noted that those skilled in the art can make several modifications to the present invention without departing from the principle of the present invention, and these improvements and modifications also fall within the protection scope of the claims of the present invention.

[0020] Example 1: To address the technical problems of existing soft X-ray multilayer mirrors, such as ineffective separation of stray white light, low reliability of independent filters, and susceptibility of multilayer films to plasma corrosion, Embodiment 1 of this application provides an anti-contamination soft X-ray mirror with integrated spectral purification. Specifically, by integrating a periodic micro-nano reflective diffraction protective layer in situ on the surface of the multilayer reflective structure, spatial separation of soft X-rays and stray white light is achieved using diffraction physics. Simultaneously, this protective layer also functions as a plasma physical barrier. While maintaining high reflectivity of soft X-rays, it achieves synergistic optimization of spectral purification, plasma protection, and structural stability, eliminating the need for independent filters and significantly improving the stability and lifespan of the soft X-ray optical system.

[0021] like Figure 1 As shown, the integrated spectral purification anti-fouling soft X-ray reflector provided in this application embodiment includes, from bottom to top: a substrate, a soft X-ray multilayer film reflective structure, and an integrated reflective diffraction protection layer; Among them, such as Figure 2 As shown, the soft X-ray multilayer film reflective structure is a Bragg reflective structure formed by periodically alternating layers of two materials; the integrated reflective diffraction protection layer is a periodic micro-nano structure, configured to present equivalent homogeneous medium characteristics for soft X-rays with wavelengths less than 10 nm to achieve zero-order specular reflection, while satisfying diffraction conditions for visible light and / or infrared light so that after reflection, it is mainly distributed in high-angle diffraction orders deviating from the principal optical axis, thus achieving spatial separation.

[0022] The two materials are selected from Mo-Si, Mo-Be, Ru-Si or Nb-Si combination; the soft X-ray multilayer reflective structure has 30-60 film pairs and a total thickness of 500-1000 nm.

[0023] like Figure 4 and Figure 5 As shown, the integrated reflective diffraction protective layer is a one-dimensional periodic stripe grating or a two-dimensional periodic dot grating; the grating has a period of 200-1000 nm, a duty cycle of 0.3-0.7, and a thickness of 50-200 nm.

[0024] Example 2: Based on Example 1, Example 2 of this application provides a more specific integrated spectral purification anti-fouling soft X-ray reflector, which, from bottom to top, includes: a substrate, a soft X-ray multilayer film reflective structure, and an integrated reflective diffraction protection layer; The soft X-ray multilayer film reflective structure is a Bragg reflective structure formed by periodically alternating layers of two materials; the integrated reflective diffraction protection layer is a periodic micro-nano structure configured to present equivalent homogeneous medium characteristics for soft X-rays with wavelengths less than 10 nm to achieve zero-order specular reflection, while satisfying diffraction conditions for visible light and / or infrared light so that after reflection, it is mainly distributed in high-angle diffraction orders deviating from the principal optical axis.

[0025] The integrated reflective diffraction protective layer is made of zirconium (Zr), niobium (Nb), molybdenum (Mo), or their alloys, possessing excellent resistance to plasma erosion and suitable optical constants. Furthermore, the thickness and geometric parameters of the integrated reflective diffraction protective layer are optimized to act as a plasma physical barrier, preventing high-energy ions or neutral particles from directly eroding the soft X-ray multilayer reflective structure.

[0026] A diffusion barrier layer is also provided between the soft X-ray multilayer film reflective structure and the integrated reflective diffraction protective layer; the material is selected from silicon nitride (Si3N4), boron carbide (B4C) or a combination thereof, and the thickness is 10-50 nm, which is used to prevent interfacial diffusion or chemical reaction between the protective layer and the multilayer film.

[0027] An encapsulation layer is also covered on the outermost surface of the integrated reflective diffraction protective layer; the material of the encapsulation layer is selected from ruthenium (Ru), iridium or platinum, and the thickness is 2-10 nm, which is used to improve chemical stability and antioxidant capacity.

[0028] Furthermore, the fringe direction of the integrated reflective diffraction protection layer can be oriented according to the system polarization requirements (such as arranging it along the soft X-ray polarization direction) to optimize the soft X-ray reflection performance under a specific polarization state.

[0029] The aforementioned film layers exhibit significant synergistic enhancement effects. Specifically: the high catalytic threshold of the ruthenium encapsulation layer, combined with the thermal shunting effect of the integrated protective layer, suppresses surface carbonization under high-energy radiation through physical cooling and chemical passivation, improving the performance stability of the mirror under high-power loads; the diffusion barrier layer's inhibition of interfacial atomic penetration, combined with the protective layer's anisotropic compensation for stress gradients, maintains the long-term stability of the nanoscale multilayer film period, avoiding image quality degradation caused by thermo-mechanical coupling; the protective layer's directional diffraction stripping of infrared / visible light significantly reduces background noise in the back-end imaging system, and, in conjunction with the high selective conversion of the scintillation film layer, achieves a significant improvement in the signal-to-noise ratio of soft X-ray detection. This "multi-physics field joint regulation" mechanism produces technical effects far exceeding the linear superposition of individual functional layers.

[0030] It should be noted that the parts in this embodiment that are the same as or similar to those in Embodiment 1 can be referred to each other, and will not be repeated in this application.

[0031] Example 3: Based on Example 2, Example 3 of this application provides a method for preparing an integrated spectral purification anti-fouling soft X-ray reflector, such as... Figure 3 As shown, taking the fabrication of a Mo-Si multilayer film mirror with an integrated one-dimensional fringe grating protective layer as an example, the process includes: S1. Provide a substrate and perform surface pretreatment.

[0032] Specifically, the optical substrate is cleaned and planarized. For example, a silicon wafer (4 inches in diameter, 5 mm thick) is selected as the optical substrate. It is ultrasonically cleaned with acetone and isopropanol for 15 minutes each to remove organic contaminants from the surface. The surface residue is further removed by plasma cleaning (oxygen atmosphere, 100 W power, 5 minutes). Chemical mechanical polishing is then performed to make the RMS roughness of the substrate surface ≤0.1 nm.

[0033] Alternatively, single-crystal silicon, silicon carbide (SiC), or low-expansion glass (such as Zerodur) can be used to replace silicon wafers, as long as the surface RMS roughness is ≤0.2 nm.

[0034] S2. A soft X-ray multilayer reflective structure is deposited on the surface of the substrate.

[0035] For example, a Mo-Si soft X-ray multilayer reflective structure was deposited using magnetron sputtering equipment. The target materials used were pure Mo (99.99% purity) and pure Si (99.999% purity); the deposition environment had a vacuum level of 5 × 10⁻⁶. -4Pa, Mo layer sputtering power 120 W, Si layer sputtering power 100 W, argon flow rate 30 sccm; 45 pairs of Mo-Si films were deposited alternately, each pair having a thickness of 6.9 nm (Mo layer 2.8 nm, Si layer 4.1 nm), for a total thickness of 310.5 nm; the film thickness was monitored in real time using a quartz crystal film thickness gauge during the deposition process.

[0036] In addition, Mo-Be, Ru-Si or Nb-Si can be used to replace Mo-Si. Among them, Mo-Be multilayer film is suitable for short-wavelength soft X-ray scenarios (such as 6.7 nm), and the number of film layers is adjusted to 40-55 pairs.

[0037] S3, deposited to form an integrated reflective diffraction protective layer material film.

[0038] The protective layer was deposited using either electron beam evaporation or magnetron sputtering. The magnetron sputtering deposition parameters were: vacuum degree 5 × 10⁻⁶. -4 -1×10 -3 Pa, sputtering power 80-150 W, argon flow rate 20-40 sccm, deposition rate 0.3-0.8 nm / s. For example, a Zr integrated reflective diffraction protective layer was deposited using magnetron sputtering with a pure Zr target (99.99% purity) and a deposition environment vacuum of 5 × 10⁻⁶. -4 Pa, sputtering power 100 W, argon flow rate 30 sccm, deposition thickness 200 nm, deposition rate 0.5 nm / s.

[0039] In addition, Nb or Mo can be used instead of Zr. The deposition power of the Nb protective layer is adjusted to 120 W, and the deposition power of the Mo protective layer is adjusted to 130 W, with the thickness maintained at 50-200 nm.

[0040] Furthermore, the protective layer deposition can be performed using electron beam evaporation or pulsed laser deposition (PLD) instead of magnetron sputtering. The vacuum level for electron beam evaporation deposition of Zr is 1×10⁻⁶. -4 Pa, deposition rate 0.3 nm / s; laser energy density 2 J / cm² during PLD deposition, pulse frequency 10 Hz.

[0041] S4. A photoresist mask with a preset periodic micro-nano pattern is formed on the surface of the integrated reflective diffraction protective layer material film.

[0042] Specifically, an etch-resistant electron beam resist is spin-coated onto the surface of the protective layer material film. After baking, periodic micro-nano patterns are defined in the photoresist using electron beam lithography. The mask with the preset pattern is then obtained through development.

[0043] The etch-resistant electron beam resist is selected from PMMA series, AR-P 6200 series, ZEP series, XR 1541 series, AR-N 8200 series or H-SiOx series, with a thickness of 100-500 nm, a baking temperature of 90-180℃, and a baking time of 1-3 min.

[0044] For example, a 500 nm thick PMMA A4 sacrificial adhesive layer was spin-coated onto the surface of the diffusion barrier layer using a spin coater at a spin speed of 4000 rps for 50 s. The layer was then baked on a hot plate at 100°C for 3 min to remove residual solvent. A one-dimensional fringe grating pattern with a period of 500 nm and a duty cycle of 0.5 was defined using an electron beam lithography machine (accelerating voltage 100 kV) at an exposure dose of 3000 μc / cm². After exposure, the sample was immersed in a developer for 60 s for development, then fixed with IPA for 1 min, and dried with nitrogen to obtain a mask with the preset pattern.

[0045] S5. Using the photoresist mask as a shield, etch the integrated reflective diffraction protection layer material film to form the integrated reflective diffraction protection layer.

[0046] Specifically, by using plasma dry etching and controlling the etching time, a protective layer of a certain thickness is etched downwards under the mask of electron beam photoresist, thereby constructing a periodic micro-nano structure and forming an integrated reflective diffraction protective layer.

[0047] The plasma dry etching process uses fluorine-based or chlorine-based gases, with an etching pressure of 0.5-1.5 Pa, an ICP power of 400-600 W, a Bias power of 50-150 W, and an etching depth of 20-150 nm.

[0048] For example, the sample was placed in a plasma etching machine with etching gases of Cl2 30 sccm, BCl3 10 sccm, and Ar 5 sccm. The etching pressure was set to 1 Pa, the ICP power to 600 W, the Bias power to 100 W, and the etching depth to 100 nm, forming a periodic micro-nano structure protective layer.

[0049] S6. Remove the photoresist mask.

[0050] Specifically, residual electron beam photoresist is removed by wet immersion. The wet immersion solution is selected from acetone, NMP, BOE, BHF or DMSO, the stripping temperature is 25-60℃, and the stripping time is 5-20 min.

[0051] For example, the sample was immersed in acetone and soaked at 50°C for 10 min to dissolve the PMMA adhesive layer and remove excess material and photoresist mask; then it was cleaned with isopropanol for 5 min and dried with nitrogen.

[0052] Furthermore, NMP can be used instead of acetone, with a peeling temperature of 80°C and a peeling time shortened to 8 minutes, making it suitable for sacrificial adhesive systems with stronger adhesion.

[0053] Furthermore, after S2 and before S3, the process includes depositing a diffusion barrier layer on the surface of the soft X-ray multilayer reflective structure. For example, a 30 nm thick Si3N4 diffusion barrier layer is deposited on the multilayer surface using plasma-enhanced chemical vapor deposition (PECVD) at a deposition temperature of 200 °C, with SiH4 and NH3 (volume ratio 1:3) as the reactant gases, an RF power of 150 W, and a deposition pressure of 5 Torr. Additionally, a B4C or Si3N4-B4C composite layer can be used instead of a single Si3N4 layer. The B4C layer is prepared by magnetron sputtering, with a thickness adjusted to 10-30 nm.

[0054] Furthermore, after S6, the process also includes: depositing an encapsulation layer on the surface of the integrated reflective diffraction protection layer to complete the fabrication of a soft X-ray anti-fouling multilayer film mirror with an integrated reflective diffraction structure.

[0055] For example, a 5 nm thick Ru encapsulation layer was deposited on the surface of the Zr protective layer using electron beam evaporation at a vacuum level of 1×10⁻⁻⁶. -4 At a deposition rate of 0.1 nm / s, a soft X-ray anti-fouling multilayer mirror with an integrated reflective diffraction structure was successfully fabricated. Furthermore, Ir (iridium) or Pt (platinum) can be used instead of Ru as the encapsulation layer, with the thickness adjusted to 2-8 nm, to further enhance oxidation resistance and corrosion resistance.

[0056] like Figure 4 As shown, the grating structure of the above product is a one-dimensional fringe grating. Furthermore, as... Figure 5 As shown, a one-dimensional striped grating can be replaced with a two-dimensional dot matrix grating (period 300-800 nm, dot diameter 100-400 nm), and the pattern data can be adjusted during electron beam exposure.

[0057] It should be noted that the method provided in this embodiment is the corresponding preparation method of the product provided in Embodiment 2. Therefore, the parts that are the same as or similar to those in Embodiment 2 in this embodiment can be referred to each other, and will not be repeated in this application.

Claims

1. An anti-fouling soft X-ray reflector with integrated spectral purification, characterized in that, From bottom to top, it includes: a substrate, a soft X-ray multilayer reflective structure, and an integrated reflective diffraction protection layer; The soft X-ray multilayer film reflective structure is a Bragg reflective structure formed by periodically alternating layers of two materials; the integrated reflective diffraction protection layer is a periodic micro-nano structure configured to present equivalent homogeneous medium characteristics for soft X-rays with wavelengths less than 10 nm to achieve zero-order specular reflection, while satisfying diffraction conditions for visible light and / or infrared light so that after reflection, it is mainly distributed in high-angle diffraction orders deviating from the principal optical axis.

2. The integrated spectral purification anti-fouling soft X-ray reflector according to claim 1, characterized in that, The two materials are selected from Mo-Si, Mo-Be, Ru-Si or Nb-Si combination; the soft X-ray multilayer reflective structure has 30-60 film pairs and a total thickness of 500-1000 nm.

3. The integrated spectral purification anti-fouling soft X-ray reflector according to claim 2, characterized in that, The integrated reflective diffraction protective layer is a one-dimensional periodic stripe grating or a two-dimensional periodic dot matrix grating; the grating has a period of 200-1000 nm, a duty cycle of 0.3-0.7, and a thickness of 50-200 nm.

4. The integrated spectral purification anti-fouling soft X-ray reflector according to claim 3, characterized in that, The material of the integrated reflective diffraction protective layer is selected from zirconium, niobium, molybdenum or their alloys.

5. The integrated spectral purification anti-fouling soft X-ray reflector according to claim 4, characterized in that, A diffusion barrier layer is also provided between the soft X-ray multilayer film reflective structure and the integrated reflective diffraction protection layer; the material of the diffusion barrier layer is selected from silicon nitride, boron carbide or a combination thereof, and the thickness is 10-50 nm.

6. The integrated spectral purification anti-fouling soft X-ray reflector according to claim 5, characterized in that, An encapsulation layer is also covered on the outermost surface of the integrated reflective diffraction protective layer; the material of the encapsulation layer is selected from ruthenium, iridium or platinum, and the thickness is 2-10 nm.

7. The integrated spectral purification anti-fouling soft X-ray reflector according to claim 5, characterized in that, The stripe direction of the integrated reflective diffraction protection layer is configured to be aligned along the soft X-ray polarization direction.

8. A method for preparing an integrated spectral purification anti-fouling soft X-ray reflector as described in any one of claims 1 to 7, characterized in that, include: S1. Provide the substrate and perform surface pretreatment; S2. A soft X-ray multilayer film reflective structure is deposited on the surface of the substrate; S3, Deposition to form an integrated reflective diffraction protective layer material film; S4. A photoresist mask with a preset periodic micro-nano pattern is formed on the surface of the integrated reflective diffraction protective layer material film. S5. Using the photoresist mask as a shield, etch the integrated reflective diffraction protection layer material film to form the integrated reflective diffraction protection layer; S6. Remove the photoresist mask.

9. The method for preparing the integrated spectral purification anti-fouling soft X-ray reflector according to claim 8, characterized in that, After S2 and before S3, the process also includes: depositing a diffusion blocking layer on the surface of the soft X-ray multilayer reflective structure.

10. The method for preparing the integrated spectral purification anti-fouling soft X-ray reflector according to claim 9, characterized in that, Following S6, the process also includes depositing an encapsulation layer on the surface of the integrated reflective diffraction protection layer.

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