Plasma polymerized thin film for regulating surface conduction of insulator and preparation method thereof
CN122117579APending Publication Date: 2026-05-29XI AN JIAOTONG UNIV +2
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- XI AN JIAOTONG UNIV
- Filing Date
- 2025-07-17
- Publication Date
- 2026-05-29
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Figure CN122117579A_ABST
Abstract
Disclosed are a plasma polymerized film for regulating surface conductivity of an insulator and a preparation method thereof. In the method, an insulator substrate is placed in a reaction cavity, and an inert gas is introduced to perform plasma cleaning on the surface of the insulator substrate; a monomer gas is introduced to perform plasma polymerization deposition on the insulator substrate, and the discharge power in the reaction cavity, the flow rate of the monomer gas, the gas pressure and / or the reaction time are changed during the deposition reaction, so as to obtain an insulator substrate covered with a polymer film. The present application has the advantages of simple preparation, low cost, firm combination without affecting the internal components of the insulator substrate, and can cope with complex stress. The present application can regulate the surface conductivity of the insulator substrate by changing the plasma polymerization reaction parameters, effectively regulate the accumulation of surface charge of the insulator substrate without significant influence on the leakage current, and has wide engineering application prospect.
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