A multi-stage electric field controlled electrodeposition apparatus and method

Abstract

This invention discloses a multi-level electric field controlled electrodeposition apparatus and method, comprising a multi-level annular anode array for generating an independently controllable electric field, the multi-level annular anode array including at least an inner anode, a middle anode, and an outer anode; a pulsed electrolyte spraying system for directionally spraying electrolyte onto the workpiece surface, synchronized with the electric field control; and a flow field guide shroud for optimizing the electrolyte flow field distribution and reducing eddies and dead zones. The apparatus achieves a highly uniform metal coating on the workpiece surface through multi-level electric field coordinated control, a pulse-flow field coupling mechanism, and an adaptive feedback system. Through multi-level electric field coordinated control, the multi-level annular anode array adopts a three-layer annular structure, with each anode layer capable of independently applying different voltage waveforms. By independently controlling the voltage and timing of each anode layer, a dynamic equipotential distribution is formed on the workpiece surface, fundamentally solving the problem of uneven coating caused by concentrated edge electric fields.

Description

Technical Field

[0001] This invention relates to the field of metal surface treatment technology, and more specifically to an electrodeposition apparatus and method with multi-level electric field control. Background Technology

[0002] Electrodeposition is a film-forming technique based on electrochemical theory. It's a long-established and relatively mature surface treatment technology used to obtain functional films on material surfaces. Electrodeposition is a process where an external electric field reduces metal ions in solution and deposits them on an electrode surface. As a core surface treatment process, electrodeposition is widely used in precision electronics, aerospace, and medical devices. However, with the increasing demands for coating performance in high-end manufacturing, existing technologies have revealed the following key shortcomings: coating defects caused by uneven electric field distribution (see attached manual). Figure 1 The deterioration of bonding force due to instability in flow field control, as well as constraints on process efficiency and cost.

[0003] To address the aforementioned industry pain points, this invention proposes a multi-level electric field controlled electrodeposition device and method, achieving precise electric field control, pulse-flow field coordination, and adaptive feedback. Summary of the Invention

[0004] Therefore, the present invention provides an electrodeposition apparatus and method with multi-level electric field control to solve the problem of coating defects caused by uneven electric field distribution in the surface treatment technology of electrodeposition materials in the prior art.

[0005] To achieve the above objectives, the present invention provides the following technical solution:

[0006] A multi-stage electric field controlled electrodeposition device, comprising:

[0007] A multi-level annular anode array is used to generate an independently controllable electric field, wherein the multi-level annular anode array includes at least an inner anode, a middle anode, and an outer anode;

[0008] A pulsed electrolyte spraying system is used to directionally spray electrolyte onto the surface of a workpiece, and synchronize it with electric field control.

[0009] Adaptive cathode clamps are used to fix workpieces and monitor displacement data in real time to achieve tolerance compensation.

[0010] Flow field guide shroud is used to optimize the electrolyte flow field distribution and reduce eddies and dead zones;

[0011] The device achieves a highly uniform metal coating on the workpiece surface through multi-level electric field coordinated control, pulse-flow field coupling mechanism and adaptive feedback system.

[0012] As a preferred embodiment, the inner anode, middle anode, and outer anode in the multi-level annular anode array are independently voltage-applied, wherein the inner anode is configured to apply a high-voltage pulse with a pulse width of 50-200μs; the middle anode is configured to superimpose DC and pulse current; and the outer anode is configured to pass a reverse current to suppress edge thickening.

[0013] As a preferred embodiment, the injection frequency of the pulsed electrolyte injection system is synchronized with the phase of the current pulse to reduce the thickness of the diffusion layer and optimize the flow field control by directional flushing of the workpiece dead angle.

[0014] As a preferred embodiment, the adaptive cathode clamp adjusts the anode voltage in real time based on displacement data to achieve tolerance compensation of ±0.05mm and ensure coating adhesion.

[0015] As a preferred embodiment, the flow field guide shroud has a spiral groove structure to guide the electrolyte to form a uniform flow field and avoid local deposition defects.

[0016] A multi-level electric field controlled electrodeposition method includes the following steps:

[0017] Workpiece clamping and initialization: Fix the workpiece in the adaptive cathode fixture and immerse it in the electrolyte;

[0018] Initial crystal nucleus formation: Through primary control, a high-voltage pulse (pulse width 50-200μs) is applied to the inner anode to form an initial crystal nucleus layer on the workpiece surface;

[0019] Coating body deposition: Through two-stage regulation, a DC superimposed pulse current is turned on at the middle anode, and at the same time, a pulsed electrolyte spraying system is started to directionally flush the dead corners of the workpiece;

[0020] Edge thickening suppression: Through three-level regulation, a reverse current is introduced into the outer anode to suppress edge thickening and achieve dynamic equipotential distribution.

[0021] As a preferred embodiment, the method further includes process monitoring and adaptive adjustment steps, wherein the timing of the first-level regulation, second-level regulation and third-level regulation is synchronized based on the pulse-DC-reverse current superposition waveform, wherein the electrolyte injection frequency is matched with the phase of the current pulse.

[0022] As a preferred solution, the anode voltage is adjusted in real time by using the displacement data of the adaptive cathode fixture to compensate for the workpiece tolerance of ±0.05mm and ensure the uniformity of the coating.

[0023] As a preferred embodiment, the spiral groove structure of the flow field guide shroud is used to maintain the stability of the electrolyte flow field and reduce coating porosity and defects.

[0024] As a preferred embodiment, the injection frequency of the electrolyte injection system is strictly synchronized with the phase of the current pulse, wherein the injection action is triggered at the rising or falling edge of the current pulse to realize the pulse-flow field coupling mechanism and effectively reduce the thickness of the diffusion layer.

[0025] The spiral groove structure of the flow field guide shroud induces the formation of a spiral flow field when the electrolyte flows. The rotation direction of the spiral flow field matches the workpiece contour to eliminate local eddies and ensure that the coating is free of pore defects.

[0026] The timing of the first-level, second-level, and third-level control is based on a predetermined waveform sequence, wherein the timing of the reverse current application overlaps with the interval of the DC pulse to optimize the edge thickening suppression effect.

[0027] When the adaptive feedback system adjusts the anode voltage in real time, it dynamically calculates the voltage compensation value based on the displacement data. The voltage adjustment amount is linearly related to the displacement deviation, ensuring that the tolerance compensation accuracy is ±0.05mm.

[0028] The present invention has the following advantages:

[0029] Through multi-level electric field coordinated control, the multi-level annular anode array adopts a three-layer annular structure (inner layer, middle layer, and outer layer), and different voltage waveforms can be applied to each layer of anodes independently. By independently adjusting the voltage and timing of each layer of anodes, a dynamic equipotential distribution is formed on the workpiece surface, fundamentally solving the problem of uneven coating caused by edge electric field concentration.

[0030] By designing a pulse-flow field coupling mechanism, the pulsed electrolyte jetting system is strictly synchronized with the anode electric field control. When a pulsed current is applied to the anode at a specific level, the electrolyte jetting system will directionally jet the electrolyte onto the workpiece surface at the same phase frequency, effectively reducing the thickness of the diffusion layer and enhancing ion transport efficiency.

[0031] Through an adaptive feedback system, the adaptive cathode fixture monitors the workpiece's positional deviation in real time and feeds it back to the control system. The system dynamically adjusts the voltage parameters of each anode layer based on the displacement data, achieving real-time compensation. Through optimized flow field design, the electrolyte is guided to form a uniform and stable spiral flow field, avoiding localized eddies and dead zones, thus ensuring coating adhesion.

[0032] Compared to traditional electrodeposition technology, the coating uniformity is significantly improved. Multi-level dynamic electric field control overcomes the problem of concentrated electric field at the edges of traditional devices, allowing coating thickness deviations on complex-shaped workpieces to be controlled within ±5%, making it suitable for high-precision components. Coating adhesion is enhanced; the pulse-flow field coupling mechanism, through synchronous jetting and electric field pulses, effectively eliminates the influence of the diffusion layer, resulting in denser metal ion deposition and an increase in coating-substrate adhesion of over 30%. The process exhibits strong adaptability; the adaptive feedback system can compensate for clamping tolerances (±0.05mm) and process fluctuations in real time, significantly reducing scrap rates, making it particularly suitable for high-end manufacturing scenarios such as aerospace components. Cost and efficiency are optimized; through multi-level timing control, the deposition rate is increased by approximately 20%, while reducing waste of precious metal raw materials, resulting in an overall production cost reduction of over 15%. Reliability is high; the spiral groove structure design of the flow field guide shroud avoids flow field instability, and the device structure is simple, reliable, and easy to maintain. Attached Figure Description

[0033] Figure 1 This is a schematic diagram of traditional electrodeposition defects (edge ​​thickening / porosity).

[0034] Figure 2 A three-dimensional structural diagram of an electrodeposition device with multi-level electric field control provided in an embodiment of the present invention.

[0035] Figure 3 The flow field guide shroud cross-section (spiral groove structure) provided in the embodiment of the present invention.

[0036] Figure 4 A three-level electric field control timing diagram (pulse-DC-reverse current superimposed waveform) is provided for an embodiment of the present invention.

[0037] Figure 5 This is a flowchart of a multi-level electric field controlled electrodeposition method provided in an embodiment of the present invention.

[0038] In the figure: 101, multi-stage annular anode array; 201, pulsed electrolyte injection system; 301, adaptive cathode clamp; 401, flow field guide shroud. Detailed Implementation

[0039] The following specific embodiments illustrate the implementation of the present invention. Those skilled in the art can easily understand other advantages and effects of the present invention from the content disclosed in this specification. Obviously, the described embodiments are only some, not all, of the embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0040] Example 1

[0041] like Figures 2 to 4As shown, a multi-stage electric field controlled electrodeposition device includes:

[0042] A multi-level annular anode array 101 is used to generate an independently controllable electric field. The multi-level annular anode array 101 includes at least an inner anode, a middle anode, and an outer anode.

[0043] The pulsed electrolyte spraying system 201 is used to directionally spray electrolyte onto the surface of a workpiece and synchronize it with the electric field control.

[0044] The adaptive cathode clamp 301 is used to fix the workpiece and monitor displacement data in real time to achieve tolerance compensation;

[0045] The flow field guide shroud 401 is used to optimize the electrolyte flow field distribution and reduce eddies and dead zones.

[0046] The device achieves a highly uniform metal coating on the workpiece surface through multi-level electric field coordinated control, pulse-flow field coupling mechanism and adaptive feedback system.

[0047] In the multi-level annular anode array 101, the inner anode, middle anode and outer anode are independently voltage-applied. The inner anode is configured to apply a high-voltage pulse with a pulse width of 50-200μs; the middle anode is configured to superimpose DC and pulse current; and the outer anode is configured to pass a reverse current to suppress edge thickening.

[0048] The pulsed electrolyte injection system 201 has a spray frequency synchronized with the phase of the current pulse to reduce the thickness of the diffusion layer and optimize the flow field control by directional flushing of the workpiece dead angle.

[0049] The adaptive cathode clamp 301 adjusts the anode voltage in real time based on displacement data to achieve tolerance compensation of ±0.05mm and ensure coating adhesion.

[0050] like Figure 3 As shown, the flow field guide shroud 401 has a spiral groove structure, which is used to guide the electrolyte to form a uniform flow field and avoid local deposition defects.

[0051] Through multi-level electric field coordinated control, the multi-level annular anode array 101 adopts a three-layer annular structure (inner layer, middle layer, and outer layer), and different voltage waveforms can be applied to each layer of anodes independently. By independently adjusting the voltage and timing of each layer of anodes, a dynamic equipotential distribution is formed on the workpiece surface, fundamentally solving the problem of uneven coating caused by edge electric field concentration.

[0052] A pulse-flow field coupling mechanism is designed, and the pulsed electrolyte injection system 201 is strictly synchronized with the anode electric field control. When a pulsed current is applied to the anode at a specific level, the electrolyte injection system will directionally spray the electrolyte onto the workpiece surface at the same phase frequency, effectively reducing the thickness of the diffusion layer and enhancing ion transport efficiency.

[0053] The adaptive cathode fixture 301 incorporates a built-in displacement sensor via an adaptive feedback system, which monitors the workpiece's positional deviation (tolerance range ±0.05mm) in real time and feeds it back to the control system. The system dynamically adjusts the voltage parameters of each anode layer based on the displacement data, achieving real-time compensation.

[0054] Through optimized flow field design, the electrolyte can be guided to form a uniform and stable spiral flow field, avoiding local eddies and dead zones, and ensuring the adhesion of the coating.

[0055] Example 2

[0056] like Figure 4-5 As shown, a multi-level electric field controlled electrodeposition method includes the following steps:

[0057] Workpiece clamping and initialization: Fix the workpiece in the adaptive cathode fixture 301 and immerse it in the electrolyte;

[0058] Initial crystal nucleus formation: Through primary control, a high-voltage pulse (pulse width 50-200μs) is applied to the inner anode to form an initial crystal nucleus layer on the workpiece surface;

[0059] Deposition of the main coating: Through two-stage regulation, a DC superimposed pulse current is turned on at the middle anode, and at the same time, the pulsed electrolyte spraying system 201 is started to directionally flush the dead corners of the workpiece;

[0060] Edge thickening suppression: Through three-level regulation, a reverse current is introduced into the outer anode to suppress edge thickening and achieve dynamic equipotential distribution.

[0061] The method also includes process monitoring and adaptive adjustment steps. The timing of primary, secondary and tertiary control is synchronized based on the pulse-DC-reverse current superposition waveform, wherein the electrolyte injection frequency is matched with the phase of the current pulse.

[0062] The anode voltage is adjusted in real time by using the displacement data of the adaptive cathode fixture 301 to compensate for the workpiece tolerance of ±0.05mm and ensure the uniformity of the coating.

[0063] The spiral groove structure of the flow field guide shroud 401 is used to maintain the stability of the electrolyte flow field and reduce coating porosity and defects.

[0064] Compared with traditional electrodeposition technology, the present invention significantly improves the uniformity of the coating through the above-mentioned device and method. The multi-level electric field dynamic control overcomes the problem of electric field concentration at the edge of the traditional device, and controls the coating thickness deviation on the surface of complex-shaped workpieces within ±5%, which is suitable for high-precision parts.

[0065] The coating adhesion is enhanced. The pulse-flow field coupling mechanism effectively eliminates the influence of the diffusion layer through synchronous injection and electric field pulse, making the metal ion deposition more dense and improving the adhesion between the coating and the substrate by more than 30%.

[0066] With strong process adaptability, the adaptive feedback system can compensate for clamping tolerances (±0.05mm) and process fluctuations in real time, significantly reducing scrap rate, making it particularly suitable for high-end manufacturing scenarios such as aerospace components.

[0067] Cost and efficiency optimization, through multi-level timing control, increases the deposition rate by about 20%, while reducing the waste of precious metal raw materials, resulting in an overall production cost reduction of more than 15%.

[0068] With high reliability, the spiral groove structure design of the flow field guide shroud 401 avoids flow field instability. The device has a simple and reliable structure and is easy to maintain.

[0069] Example 3

[0070] A multi-level electric field-controlled electrodeposition method, including all the contents of Example 2, further includes a pulsed electrolyte jetting system 201 whose jetting frequency is strictly synchronized with the phase of the current pulse. The jetting action is triggered at the rising or falling edge of the current pulse to achieve a pulse-flow field coupling mechanism, effectively reducing the diffusion layer thickness. Specifically, the jetting frequency of the pulsed electrolyte jetting system 201 is strictly synchronized with the phase of the current pulse; in practice, the jetting action is triggered at the rising or falling edge of the current pulse. This design is based on the diffusion layer dynamics during electrochemical deposition: when a current pulse is applied, the concentration of metal ions near the workpiece surface rapidly decreases, forming a diffusion layer; by synchronously triggering electrolyte jetting at the pulse edge, the diffusion layer can be instantly flushed, breaking the ion concentration boundary layer and enhancing ion transport efficiency.

[0071] Simultaneously, the diffusion layer thickness is significantly reduced. Synchronous spraying coordinates electrolyte flow and ion migration, reducing the diffusion layer thickness by approximately 30% and preventing coating porosity caused by ion depletion. Coating density is improved; the pulse-flow field coupling mechanism promotes uniform metal ion deposition, reducing coating porosity by over 20%, making it particularly suitable for precision electronic components with high reliability requirements. Process stability is enhanced; the phase-triggered mechanism avoids flow field disturbances caused by asynchronous spraying and electric field, improving the controllability of the deposition process.

[0072] The spiral groove structure of the flow field guide shroud 401 induces a spiral flow field when the electrolyte flows. The rotation direction of the spiral flow field matches the workpiece contour to eliminate local eddies and ensure that the coating is free of porosity defects. The spiral groove structure of the flow field guide shroud 401 induces a spiral flow field when the electrolyte flows, and its rotation direction can be customized according to the workpiece geometry (such as deep holes, uneven surfaces). The centrifugal force of the spiral flow field causes the electrolyte to flow tangentially along the workpiece surface, eliminating local eddies and dead zones, and ensuring uniform electrolyte coverage.

[0073] Achieving seamless coverage, the spiral flow field matches the workpiece contour, avoiding deposition blind spots in complex structures where traditional straight flow fields are used, and improving coating thickness uniformity to within ±3%. Eddy current elimination reduces coating porosity, bubbles, and other defects, increasing the adhesion test pass rate by 15% and significantly reducing the defect rate. Suitable for electrodeposition of irregularly shaped components in aerospace parts, such as turbine blade surfaces.

[0074] The timing of the first-level, second-level, and third-level control is based on a predetermined waveform sequence. The application of the reverse current overlaps with the interval of the DC pulse to optimize the edge thickening suppression effect. In the third-level control timing, the application of the reverse current partially overlaps with the interval of the DC pulse. When the DC pulse is in an interval, the electric field strength on the workpiece surface weakens. Applying the reverse current at this time can selectively dissolve excess deposits in the edge region while avoiding damage to the main coating. This timing design is based on the dynamic compensation principle of the edge electric field concentration effect.

[0075] The reverse current is introduced during the trough of the electric field strength, controlling the coating thickness deviation in the edge region within ±5μm, and precisely suppressing edge thickening. Deposition efficiency is optimized, the overlapping sequence reduces the overall process time, and the deposition rate is increased by 15%, while avoiding energy waste caused by excessive reverse current. Coating quality is improved, with significantly enhanced consistency between the coating at the edges and the center, avoiding the "dog bone" defect commonly found in traditional processes.

[0076] When the adaptive feedback system adjusts the anode voltage in real time, it dynamically calculates the voltage compensation value based on displacement data. The voltage adjustment is linearly related to the displacement deviation, ensuring a tolerance compensation accuracy of ±0.05mm. The adaptive feedback system dynamically calculates the voltage compensation value based on the displacement data monitored by the adaptive cathode clamp 301. Specifically, the voltage adjustment ΔV and the displacement deviation Δd satisfy a linear relationship: ΔV = k·Δd (where k is the compensation coefficient, determined through process calibration). When the displacement deviation is ±0.05mm, the system adjusts the anode voltage in real time to rebalance the electric field distribution.

[0077] The linear algorithm achieves precise compensation for displacement deviations of ±0.05mm, improving workpiece clamping error tolerance by 50%. Adaptive feedback avoids uneven coating caused by clamping errors, ensuring a stable yield rate of over 98% in mass production. It is suitable for mixed-line production of workpieces of different sizes, reducing equipment adjustment time.

Claims

1. A multi-stage electric field controlled electrodeposition device, characterized in that, include: A multi-level annular anode array (101) is used to generate an independently controllable electric field, wherein the multi-level annular anode array (101) includes at least an inner anode, a middle anode, and an outer anode; A pulsed electrolyte spraying system (201) is used to directionally spray electrolyte onto the surface of a workpiece and synchronize it with an electric field control. The adaptive cathode fixture (301) is used to fix the workpiece and monitor displacement data in real time to achieve tolerance compensation. The flow field guide shroud (401) is used to optimize the electrolyte flow field distribution and reduce eddies and dead zones; The device achieves a highly uniform metal coating on the workpiece surface through multi-level electric field coordinated control, pulse-flow field coupling mechanism and adaptive feedback system.

2. The electrodeposition apparatus with multi-stage electric field control according to claim 1, characterized in that, The inner, middle, and outer anodes of the multi-level annular anode array (101) are independently voltage-applied, wherein the inner anode is configured to apply a high-voltage pulse with a pulse width of 50-200 μs; the middle anode is configured to superimpose DC and pulse current; and the outer anode is configured to pass a reverse current to suppress edge thickening.

3. The electrodeposition apparatus with multi-stage electric field control according to claim 1, characterized in that, The pulsed electrolyte injection system (201) has an injection frequency synchronized with the phase of the current pulse to reduce the thickness of the diffusion layer and optimize the flow field control by directional flushing of the workpiece dead angle.

4. The electrodeposition apparatus with multi-stage electric field control according to claim 1, characterized in that, The adaptive cathode clamp (301) adjusts the anode voltage in real time based on displacement data to achieve tolerance compensation of ±0.05mm and ensure coating adhesion.

5. The electrodeposition apparatus with multi-stage electric field control according to claim 1, characterized in that, The flow field guide shroud (401) has a spiral groove structure, which is used to guide the electrolyte to form a uniform flow field and avoid local deposition defects.

6. A multi-stage electric field controlled electrodeposition method, using the multi-stage electric field controlled electrodeposition apparatus as described in any one of claims 1-5, characterized in that, Includes the following steps: Workpiece clamping and initialization: Fix the workpiece in the adaptive cathode fixture (301) and immerse it in the electrolyte; Initial crystal nucleus formation: Through primary control, a high-voltage pulse (pulse width 50-200μs) is applied to the inner anode to form an initial crystal nucleus layer on the workpiece surface; Deposition of the coating body: Through secondary regulation, a DC superimposed pulse current is turned on at the middle anode, and at the same time, the pulsed electrolyte spraying system (201) is started to directionally flush the dead corners of the workpiece; Edge thickening suppression: Through three-level regulation, a reverse current is introduced into the outer anode to suppress edge thickening and achieve dynamic equipotential distribution.

7. The electrodeposition method with multi-level electric field control according to claim 6, characterized in that, The method further includes process monitoring and adaptive adjustment steps. The timing of the first-level control, second-level control and third-level control is synchronized based on the pulse-DC-reverse current superposition waveform, wherein the electrolyte injection frequency is matched with the phase of the current pulse.

8. The electrodeposition method with multi-level electric field control according to claim 7, characterized in that, The anode voltage is adjusted in real time by using the displacement data of the adaptive cathode fixture (301) to compensate for the workpiece tolerance of ±0.05mm and ensure the uniformity of the coating.

9. The electrodeposition method with multi-level electric field control according to claim 6, characterized in that, The spiral groove structure of the flow field guide shroud (401) is used to maintain the stability of the electrolyte flow field and reduce coating porosity and defects.

10. The electrodeposition method with multi-level electric field control according to claim 6, characterized in that, The injection frequency of the electrolyte injection system (201) is strictly synchronized with the phase of the current pulse, wherein the injection action is triggered at the rising or falling edge of the current pulse to realize the pulse-flow field coupling mechanism and effectively reduce the thickness of the diffusion layer. The spiral groove structure of the flow field guide hood (401) induces the formation of a spiral flow field when the electrolyte flows. The rotation direction of the spiral flow field matches the workpiece contour to eliminate local eddies and ensure that the coating is free of pore defects. The timing of the first-level, second-level, and third-level control is based on a predetermined waveform sequence, wherein the timing of the reverse current application overlaps with the interval of the DC pulse to optimize the edge thickening suppression effect. When the adaptive feedback system adjusts the anode voltage in real time, it dynamically calculates the voltage compensation value based on the displacement data. The voltage adjustment amount is linearly related to the displacement deviation, ensuring that the tolerance compensation accuracy is ±0.05mm.

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